JP4992389B2 - 載置装置、プラズマ処理装置及びプラズマ処理方法 - Google Patents

載置装置、プラズマ処理装置及びプラズマ処理方法 Download PDF

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Publication number
JP4992389B2
JP4992389B2 JP2006300923A JP2006300923A JP4992389B2 JP 4992389 B2 JP4992389 B2 JP 4992389B2 JP 2006300923 A JP2006300923 A JP 2006300923A JP 2006300923 A JP2006300923 A JP 2006300923A JP 4992389 B2 JP4992389 B2 JP 4992389B2
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Japan
Prior art keywords
plasma
layer
electrostatic chuck
mounting
processing
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JP2006300923A
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Japanese (ja)
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JP2008117982A (ja
JP2008117982A5 (https=
Inventor
弘治 伊藤
健一 加藤
雄大 上田
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Tokyo Electron Ltd
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Tokyo Electron Ltd
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Priority to JP2006300923A priority Critical patent/JP4992389B2/ja
Priority to US11/934,313 priority patent/US20080106842A1/en
Priority to CNB200710168038XA priority patent/CN100543960C/zh
Priority to KR1020070111908A priority patent/KR100964040B1/ko
Priority to TW096141619A priority patent/TWI440124B/zh
Publication of JP2008117982A publication Critical patent/JP2008117982A/ja
Publication of JP2008117982A5 publication Critical patent/JP2008117982A5/ja
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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
    • H10P72/72—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using electrostatic chucks
    • H10P72/722—Details of electrostatic chucks
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32798—Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus
    • H01J37/32853—Hygiene
    • H01J37/32862—In situ cleaning of vessels and/or internal parts

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  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Drying Of Semiconductors (AREA)
  • Plasma Technology (AREA)
  • Coating By Spraying Or Casting (AREA)
JP2006300923A 2006-11-06 2006-11-06 載置装置、プラズマ処理装置及びプラズマ処理方法 Active JP4992389B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2006300923A JP4992389B2 (ja) 2006-11-06 2006-11-06 載置装置、プラズマ処理装置及びプラズマ処理方法
US11/934,313 US20080106842A1 (en) 2006-11-06 2007-11-02 Mounting device, plasma processing apparatus and plasma processing method
CNB200710168038XA CN100543960C (zh) 2006-11-06 2007-11-02 载置装置、等离子体处理装置和等离子体处理方法
KR1020070111908A KR100964040B1 (ko) 2006-11-06 2007-11-05 탑재 장치, 플라즈마 처리 장치 및 플라즈마 처리 방법
TW096141619A TWI440124B (zh) 2006-11-06 2007-11-05 A placing device, a plasma processing device, and a plasma processing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006300923A JP4992389B2 (ja) 2006-11-06 2006-11-06 載置装置、プラズマ処理装置及びプラズマ処理方法

Publications (3)

Publication Number Publication Date
JP2008117982A JP2008117982A (ja) 2008-05-22
JP2008117982A5 JP2008117982A5 (https=) 2009-10-22
JP4992389B2 true JP4992389B2 (ja) 2012-08-08

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JP2006300923A Active JP4992389B2 (ja) 2006-11-06 2006-11-06 載置装置、プラズマ処理装置及びプラズマ処理方法

Country Status (4)

Country Link
JP (1) JP4992389B2 (https=)
KR (1) KR100964040B1 (https=)
CN (1) CN100543960C (https=)
TW (1) TWI440124B (https=)

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8734664B2 (en) 2008-07-23 2014-05-27 Applied Materials, Inc. Method of differential counter electrode tuning in an RF plasma reactor
US20100018648A1 (en) * 2008-07-23 2010-01-28 Applied Marterials, Inc. Workpiece support for a plasma reactor with controlled apportionment of rf power to a process kit ring
US8206829B2 (en) * 2008-11-10 2012-06-26 Applied Materials, Inc. Plasma resistant coatings for plasma chamber components
JP5390846B2 (ja) 2008-12-09 2014-01-15 東京エレクトロン株式会社 プラズマエッチング装置及びプラズマクリーニング方法
JP5642531B2 (ja) * 2010-12-22 2014-12-17 東京エレクトロン株式会社 基板処理装置及び基板処理方法
JP2012204644A (ja) * 2011-03-25 2012-10-22 Tokyo Electron Ltd プラズマ処理装置及びプラズマ処理方法
JP6014408B2 (ja) * 2012-08-07 2016-10-25 株式会社日立ハイテクノロジーズ プラズマ処理装置及びプラズマ処理方法
JP6071514B2 (ja) * 2012-12-12 2017-02-01 東京エレクトロン株式会社 静電チャックの改質方法及びプラズマ処理装置
KR101385950B1 (ko) * 2013-09-16 2014-04-16 주식회사 펨빅스 정전척 및 정전척 제조 방법
KR101598465B1 (ko) 2014-09-30 2016-03-02 세메스 주식회사 기판 처리 장치 및 방법
TWI593473B (zh) * 2015-10-28 2017-08-01 漢辰科技股份有限公司 清潔靜電吸盤的方法
KR101842124B1 (ko) 2016-05-27 2018-03-27 세메스 주식회사 지지 유닛, 기판 처리 장치 및 기판 처리 방법
JP6854600B2 (ja) * 2016-07-15 2021-04-07 東京エレクトロン株式会社 プラズマエッチング方法、プラズマエッチング装置、および基板載置台
CN108281342B (zh) * 2017-01-05 2020-01-21 东京毅力科创株式会社 等离子体处理装置
JP7038497B2 (ja) * 2017-07-07 2022-03-18 東京エレクトロン株式会社 静電チャックの製造方法
JP7224096B2 (ja) * 2017-07-13 2023-02-17 東京エレクトロン株式会社 プラズマ処理装置用部品の溶射方法及びプラズマ処理装置用部品
JP6768946B2 (ja) * 2017-10-17 2020-10-14 株式会社アルバック 被処理体の処理装置
JP2019151879A (ja) * 2018-03-01 2019-09-12 株式会社アルバック 成膜装置
CN111383986B (zh) * 2018-12-27 2024-11-29 东京毅力科创株式会社 基板载置台及基板处理装置
JP7401266B2 (ja) 2018-12-27 2023-12-19 東京エレクトロン株式会社 基板載置台、及び、基板処理装置
KR102370471B1 (ko) * 2019-02-08 2022-03-03 주식회사 히타치하이테크 플라스마 처리 장치
CN113454761B (zh) 2019-03-01 2024-11-08 日本发条株式会社 载物台以及载物台的制造方法
JP7204564B2 (ja) * 2019-03-29 2023-01-16 東京エレクトロン株式会社 プラズマ処理装置
CN112553592B (zh) * 2019-09-25 2023-03-31 中微半导体设备(上海)股份有限公司 一种利用ald工艺对静电吸盘进行处理的方法
CN114308907B (zh) * 2022-02-23 2023-11-28 深圳市震华等离子体智造有限公司 一种用于精密分析仪器的等离子清洗装置

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4104386B2 (ja) * 2002-06-24 2008-06-18 太平洋セメント株式会社 静電チャックの製造方法
JP2005012144A (ja) * 2003-06-23 2005-01-13 Kyocera Corp 静電チャック
JP2005072286A (ja) * 2003-08-25 2005-03-17 Kyocera Corp 静電チャック
JP2006019626A (ja) * 2004-07-05 2006-01-19 Tokyo Electron Ltd プラズマ処理装置及びその洗浄方法
JP4642528B2 (ja) * 2005-03-31 2011-03-02 東京エレクトロン株式会社 プラズマ処理装置およびプラズマ処理方法

Also Published As

Publication number Publication date
JP2008117982A (ja) 2008-05-22
KR100964040B1 (ko) 2010-06-16
CN100543960C (zh) 2009-09-23
KR20080041116A (ko) 2008-05-09
CN101179045A (zh) 2008-05-14
TWI440124B (zh) 2014-06-01
TW200837874A (en) 2008-09-16

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