JP4938994B2 - シリカエアロゲル膜及びその製造方法 - Google Patents
シリカエアロゲル膜及びその製造方法 Download PDFInfo
- Publication number
- JP4938994B2 JP4938994B2 JP2005125593A JP2005125593A JP4938994B2 JP 4938994 B2 JP4938994 B2 JP 4938994B2 JP 2005125593 A JP2005125593 A JP 2005125593A JP 2005125593 A JP2005125593 A JP 2005125593A JP 4938994 B2 JP4938994 B2 JP 4938994B2
- Authority
- JP
- Japan
- Prior art keywords
- silica
- organic
- wet gel
- producing
- silica airgel
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims description 324
- 239000000377 silicon dioxide Substances 0.000 title claims description 120
- 238000004519 manufacturing process Methods 0.000 title claims description 33
- 239000012528 membrane Substances 0.000 title description 8
- 239000011240 wet gel Substances 0.000 claims description 76
- 125000001424 substituent group Chemical group 0.000 claims description 67
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 62
- 239000003607 modifier Substances 0.000 claims description 46
- 239000002904 solvent Substances 0.000 claims description 36
- 239000002612 dispersion medium Substances 0.000 claims description 33
- 238000000576 coating method Methods 0.000 claims description 26
- 239000011248 coating agent Substances 0.000 claims description 23
- 238000006116 polymerization reaction Methods 0.000 claims description 23
- 238000006460 hydrolysis reaction Methods 0.000 claims description 21
- 239000006185 dispersion Substances 0.000 claims description 19
- 125000003545 alkoxy group Chemical group 0.000 claims description 15
- 230000007062 hydrolysis Effects 0.000 claims description 15
- 125000004432 carbon atom Chemical group C* 0.000 claims description 14
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical compound Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 claims description 14
- 150000002576 ketones Chemical class 0.000 claims description 14
- 239000000758 substrate Substances 0.000 claims description 14
- 238000009210 therapy by ultrasound Methods 0.000 claims description 14
- 239000003054 catalyst Substances 0.000 claims description 13
- 239000000463 material Substances 0.000 claims description 13
- 238000000034 method Methods 0.000 claims description 13
- 239000003505 polymerization initiator Substances 0.000 claims description 8
- 230000000379 polymerizing effect Effects 0.000 claims description 6
- 239000003377 acid catalyst Substances 0.000 claims description 5
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims description 4
- 238000010304 firing Methods 0.000 claims description 4
- 230000003301 hydrolyzing effect Effects 0.000 claims description 3
- 150000001733 carboxylic acid esters Chemical class 0.000 claims description 2
- 230000001678 irradiating effect Effects 0.000 claims 3
- 239000010408 film Substances 0.000 description 74
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 45
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 42
- 239000000243 solution Substances 0.000 description 27
- IJOOHPMOJXWVHK-UHFFFAOYSA-N chlorotrimethylsilane Chemical compound C[Si](C)(C)Cl IJOOHPMOJXWVHK-UHFFFAOYSA-N 0.000 description 18
- 229910052814 silicon oxide Inorganic materials 0.000 description 18
- 239000000178 monomer Substances 0.000 description 17
- 238000009281 ultraviolet germicidal irradiation Methods 0.000 description 16
- 238000010908 decantation Methods 0.000 description 15
- 239000007858 starting material Substances 0.000 description 14
- 125000000962 organic group Chemical group 0.000 description 12
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 12
- 239000010410 layer Substances 0.000 description 11
- -1 methacryloxy group Chemical group 0.000 description 11
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 11
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 10
- 239000000499 gel Substances 0.000 description 10
- 238000006068 polycondensation reaction Methods 0.000 description 10
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 9
- KMVZWUQHMJAWSY-UHFFFAOYSA-N chloro-dimethyl-prop-2-enylsilane Chemical compound C[Si](C)(Cl)CC=C KMVZWUQHMJAWSY-UHFFFAOYSA-N 0.000 description 9
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 9
- 239000002245 particle Substances 0.000 description 9
- 238000002360 preparation method Methods 0.000 description 9
- 239000007787 solid Substances 0.000 description 9
- 239000005051 trimethylchlorosilane Substances 0.000 description 9
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 8
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 8
- 235000011114 ammonium hydroxide Nutrition 0.000 description 8
- 230000004927 fusion Effects 0.000 description 8
- 239000011521 glass Substances 0.000 description 8
- 239000007788 liquid Substances 0.000 description 8
- 239000011259 mixed solution Substances 0.000 description 8
- 239000000203 mixture Substances 0.000 description 8
- 238000001132 ultrasonic dispersion Methods 0.000 description 8
- LWRBVKNFOYUCNP-UHFFFAOYSA-N 2-methyl-1-(4-methylsulfanylphenyl)-2-morpholin-4-ylpropan-1-one Chemical compound C1=CC(SC)=CC=C1C(=O)C(C)(C)N1CCOCC1 LWRBVKNFOYUCNP-UHFFFAOYSA-N 0.000 description 7
- XDLMVUHYZWKMMD-UHFFFAOYSA-N 3-trimethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C(C)=C XDLMVUHYZWKMMD-UHFFFAOYSA-N 0.000 description 7
- 230000004048 modification Effects 0.000 description 7
- 238000012986 modification Methods 0.000 description 7
- 238000006467 substitution reaction Methods 0.000 description 7
- 125000000217 alkyl group Chemical group 0.000 description 6
- 239000003999 initiator Substances 0.000 description 6
- 238000003756 stirring Methods 0.000 description 6
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 5
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 5
- 229920006395 saturated elastomer Polymers 0.000 description 5
- 239000000741 silica gel Substances 0.000 description 5
- 229910002027 silica gel Inorganic materials 0.000 description 5
- 239000013638 trimer Substances 0.000 description 5
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical compound CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 4
- 125000003118 aryl group Chemical group 0.000 description 4
- ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical compound C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 4
- DCFKHNIGBAHNSS-UHFFFAOYSA-N chloro(triethyl)silane Chemical compound CC[Si](Cl)(CC)CC DCFKHNIGBAHNSS-UHFFFAOYSA-N 0.000 description 4
- 239000007791 liquid phase Substances 0.000 description 4
- 238000005240 physical vapour deposition Methods 0.000 description 4
- 238000005507 spraying Methods 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonium chloride Substances [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- 239000006087 Silane Coupling Agent Substances 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 230000002378 acidificating effect Effects 0.000 description 3
- 230000032683 aging Effects 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 238000009833 condensation Methods 0.000 description 3
- 230000005494 condensation Effects 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 3
- 230000002209 hydrophobic effect Effects 0.000 description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- 238000006011 modification reaction Methods 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 3
- 239000002994 raw material Substances 0.000 description 3
- 238000000527 sonication Methods 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- NJWGQARXZDRHCD-UHFFFAOYSA-N 2-methylanthraquinone Chemical compound C1=CC=C2C(=O)C3=CC(C)=CC=C3C(=O)C2=C1 NJWGQARXZDRHCD-UHFFFAOYSA-N 0.000 description 2
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 2
- 125000001494 2-propynyl group Chemical group [H]C#CC([H])([H])* 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- ROSDSFDQCJNGOL-UHFFFAOYSA-N Dimethylamine Chemical compound CNC ROSDSFDQCJNGOL-UHFFFAOYSA-N 0.000 description 2
- DXVYLFHTJZWTRF-UHFFFAOYSA-N Ethyl isobutyl ketone Chemical compound CCC(=O)CC(C)C DXVYLFHTJZWTRF-UHFFFAOYSA-N 0.000 description 2
- BAVYZALUXZFZLV-UHFFFAOYSA-N Methylamine Chemical compound NC BAVYZALUXZFZLV-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 2
- OFBQJSOFQDEBGM-UHFFFAOYSA-N Pentane Chemical compound CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 2
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 2
- 244000028419 Styrax benzoin Species 0.000 description 2
- 235000000126 Styrax benzoin Nutrition 0.000 description 2
- 235000008411 Sumatra benzointree Nutrition 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 230000000996 additive effect Effects 0.000 description 2
- 125000003342 alkenyl group Chemical group 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 229960002130 benzoin Drugs 0.000 description 2
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 2
- 239000012965 benzophenone Substances 0.000 description 2
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- HOYQJKNWCAKCJT-UHFFFAOYSA-N bis(but-3-enyl)-dimethoxysilane Chemical compound C=CCC[Si](OC)(CCC=C)OC HOYQJKNWCAKCJT-UHFFFAOYSA-N 0.000 description 2
- 238000009835 boiling Methods 0.000 description 2
- LUZRKMGMNFOSFZ-UHFFFAOYSA-N but-3-enyl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)CCC=C LUZRKMGMNFOSFZ-UHFFFAOYSA-N 0.000 description 2
- FNNYJATZZFNKNT-UHFFFAOYSA-N but-3-enyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)CCC=C FNNYJATZZFNKNT-UHFFFAOYSA-N 0.000 description 2
- BYLOHCRAPOSXLY-UHFFFAOYSA-N dichloro(diethyl)silane Chemical compound CC[Si](Cl)(Cl)CC BYLOHCRAPOSXLY-UHFFFAOYSA-N 0.000 description 2
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 2
- LYCAIKOWRPUZTN-UHFFFAOYSA-N ethylene glycol Natural products OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 2
- 125000000524 functional group Chemical group 0.000 description 2
- 235000019382 gum benzoic Nutrition 0.000 description 2
- FFUAGWLWBBFQJT-UHFFFAOYSA-N hexamethyldisilazane Chemical compound C[Si](C)(C)N[Si](C)(C)C FFUAGWLWBBFQJT-UHFFFAOYSA-N 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 2
- 239000002105 nanoparticle Substances 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
- WGYKZJWCGVVSQN-UHFFFAOYSA-N propylamine Chemical compound CCCN WGYKZJWCGVVSQN-UHFFFAOYSA-N 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- YRHRIQCWCFGUEQ-UHFFFAOYSA-N thioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3SC2=C1 YRHRIQCWCFGUEQ-UHFFFAOYSA-N 0.000 description 2
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical compound CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 description 2
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 2
- LTQBNYCMVZQRSD-UHFFFAOYSA-N (4-ethenylphenyl)-trimethoxysilane Chemical compound CO[Si](OC)(OC)C1=CC=C(C=C)C=C1 LTQBNYCMVZQRSD-UHFFFAOYSA-N 0.000 description 1
- FBADCSUQBLLAHW-VURMDHGXSA-N (z)-4-trimethylsilyloxypent-3-en-2-one Chemical compound CC(=O)\C=C(\C)O[Si](C)(C)C FBADCSUQBLLAHW-VURMDHGXSA-N 0.000 description 1
- CHHWNYBAWJMTRY-UHFFFAOYSA-N 1,2,2-tributoxyethenylsilane Chemical compound CCCCOC([SiH3])=C(OCCCC)OCCCC CHHWNYBAWJMTRY-UHFFFAOYSA-N 0.000 description 1
- MSAHTMIQULFMRG-UHFFFAOYSA-N 1,2-diphenyl-2-propan-2-yloxyethanone Chemical compound C=1C=CC=CC=1C(OC(C)C)C(=O)C1=CC=CC=C1 MSAHTMIQULFMRG-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- DKEGCUDAFWNSSO-UHFFFAOYSA-N 1,8-dibromooctane Chemical compound BrCCCCCCCCBr DKEGCUDAFWNSSO-UHFFFAOYSA-N 0.000 description 1
- 239000012956 1-hydroxycyclohexylphenyl-ketone Substances 0.000 description 1
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 1
- GIMQKKFOOYOQGB-UHFFFAOYSA-N 2,2-diethoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OCC)(OCC)C(=O)C1=CC=CC=C1 GIMQKKFOOYOQGB-UHFFFAOYSA-N 0.000 description 1
- KWVGIHKZDCUPEU-UHFFFAOYSA-N 2,2-dimethoxy-2-phenylacetophenone Chemical compound C=1C=CC=CC=1C(OC)(OC)C(=O)C1=CC=CC=C1 KWVGIHKZDCUPEU-UHFFFAOYSA-N 0.000 description 1
- LCHAFMWSFCONOO-UHFFFAOYSA-N 2,4-dimethylthioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(C)=CC(C)=C3SC2=C1 LCHAFMWSFCONOO-UHFFFAOYSA-N 0.000 description 1
- FPKCTSIVDAWGFA-UHFFFAOYSA-N 2-chloroanthracene-9,10-dione Chemical compound C1=CC=C2C(=O)C3=CC(Cl)=CC=C3C(=O)C2=C1 FPKCTSIVDAWGFA-UHFFFAOYSA-N 0.000 description 1
- ZCDADJXRUCOCJE-UHFFFAOYSA-N 2-chlorothioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(Cl)=CC=C3SC2=C1 ZCDADJXRUCOCJE-UHFFFAOYSA-N 0.000 description 1
- SJEBAWHUJDUKQK-UHFFFAOYSA-N 2-ethylanthraquinone Chemical compound C1=CC=C2C(=O)C3=CC(CC)=CC=C3C(=O)C2=C1 SJEBAWHUJDUKQK-UHFFFAOYSA-N 0.000 description 1
- BQZJOQXSCSZQPS-UHFFFAOYSA-N 2-methoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OC)C(=O)C1=CC=CC=C1 BQZJOQXSCSZQPS-UHFFFAOYSA-N 0.000 description 1
- AKRJXOYALOGLHQ-UHFFFAOYSA-N 2-methylheptan-4-one Chemical compound CCCC(=O)CC(C)C AKRJXOYALOGLHQ-UHFFFAOYSA-N 0.000 description 1
- YTPSFXZMJKMUJE-UHFFFAOYSA-N 2-tert-butylanthracene-9,10-dione Chemical compound C1=CC=C2C(=O)C3=CC(C(C)(C)C)=CC=C3C(=O)C2=C1 YTPSFXZMJKMUJE-UHFFFAOYSA-N 0.000 description 1
- JDMMZVAKMAONFU-UHFFFAOYSA-N 2-trimethylsilylacetic acid Chemical compound C[Si](C)(C)CC(O)=O JDMMZVAKMAONFU-UHFFFAOYSA-N 0.000 description 1
- 125000004975 3-butenyl group Chemical group C(CC=C)* 0.000 description 1
- URDOJQUSEUXVRP-UHFFFAOYSA-N 3-triethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CCO[Si](OCC)(OCC)CCCOC(=O)C(C)=C URDOJQUSEUXVRP-UHFFFAOYSA-N 0.000 description 1
- KBQVDAIIQCXKPI-UHFFFAOYSA-N 3-trimethoxysilylpropyl prop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C=C KBQVDAIIQCXKPI-UHFFFAOYSA-N 0.000 description 1
- KOAPFYDEMWONAR-UHFFFAOYSA-N C(C)(=O)C1=CC=CC=C1.ClC1(CC=CC=C1)Cl Chemical compound C(C)(=O)C1=CC=CC=C1.ClC1(CC=CC=C1)Cl KOAPFYDEMWONAR-UHFFFAOYSA-N 0.000 description 1
- 239000005046 Chlorosilane Substances 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- YKFRUJSEPGHZFJ-UHFFFAOYSA-N N-trimethylsilylimidazole Chemical compound C[Si](C)(C)N1C=CN=C1 YKFRUJSEPGHZFJ-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 229910018557 Si O Inorganic materials 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 239000004965 Silica aerogel Substances 0.000 description 1
- 229910002808 Si–O–Si Inorganic materials 0.000 description 1
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 1
- 238000005411 Van der Waals force Methods 0.000 description 1
- RVWADWOERKNWRY-UHFFFAOYSA-N [2-(dimethylamino)phenyl]-phenylmethanone Chemical compound CN(C)C1=CC=CC=C1C(=O)C1=CC=CC=C1 RVWADWOERKNWRY-UHFFFAOYSA-N 0.000 description 1
- PEGHITPVRNZWSI-UHFFFAOYSA-N [[bis(trimethylsilyl)amino]-dimethylsilyl]methane Chemical compound C[Si](C)(C)N([Si](C)(C)C)[Si](C)(C)C PEGHITPVRNZWSI-UHFFFAOYSA-N 0.000 description 1
- RQVFGTYFBUVGOP-UHFFFAOYSA-N [acetyloxy(dimethyl)silyl] acetate Chemical compound CC(=O)O[Si](C)(C)OC(C)=O RQVFGTYFBUVGOP-UHFFFAOYSA-N 0.000 description 1
- CNOSLBKTVBFPBB-UHFFFAOYSA-N [acetyloxy(diphenyl)silyl] acetate Chemical compound C=1C=CC=CC=1[Si](OC(C)=O)(OC(=O)C)C1=CC=CC=C1 CNOSLBKTVBFPBB-UHFFFAOYSA-N 0.000 description 1
- NOZAQBYNLKNDRT-UHFFFAOYSA-N [diacetyloxy(ethenyl)silyl] acetate Chemical compound CC(=O)O[Si](OC(C)=O)(OC(C)=O)C=C NOZAQBYNLKNDRT-UHFFFAOYSA-N 0.000 description 1
- TVJPBVNWVPUZBM-UHFFFAOYSA-N [diacetyloxy(methyl)silyl] acetate Chemical compound CC(=O)O[Si](C)(OC(C)=O)OC(C)=O TVJPBVNWVPUZBM-UHFFFAOYSA-N 0.000 description 1
- VLFKGWCMFMCFRM-UHFFFAOYSA-N [diacetyloxy(phenyl)silyl] acetate Chemical compound CC(=O)O[Si](OC(C)=O)(OC(C)=O)C1=CC=CC=C1 VLFKGWCMFMCFRM-UHFFFAOYSA-N 0.000 description 1
- BTHCBXJLLCHNMS-UHFFFAOYSA-N acetyloxysilicon Chemical compound CC(=O)O[Si] BTHCBXJLLCHNMS-UHFFFAOYSA-N 0.000 description 1
- 238000004220 aggregation Methods 0.000 description 1
- 230000002776 aggregation Effects 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 150000003973 alkyl amines Chemical class 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- PYKYMHQGRFAEBM-UHFFFAOYSA-N anthraquinone Natural products CCC(=O)c1c(O)c2C(=O)C3C(C=CC=C3O)C(=O)c2cc1CC(=O)OC PYKYMHQGRFAEBM-UHFFFAOYSA-N 0.000 description 1
- 150000004056 anthraquinones Chemical class 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- DONIBOABLYMWOF-UHFFFAOYSA-N bis(but-3-enyl)-diethoxysilane Chemical compound C=CCC[Si](OCC)(CCC=C)OCC DONIBOABLYMWOF-UHFFFAOYSA-N 0.000 description 1
- CSXPRVTYIFRYPR-UHFFFAOYSA-N bis(ethenyl)-diethoxysilane Chemical compound CCO[Si](C=C)(C=C)OCC CSXPRVTYIFRYPR-UHFFFAOYSA-N 0.000 description 1
- ZPECUSGQPIKHLT-UHFFFAOYSA-N bis(ethenyl)-dimethoxysilane Chemical compound CO[Si](OC)(C=C)C=C ZPECUSGQPIKHLT-UHFFFAOYSA-N 0.000 description 1
- MQDJYUACMFCOFT-UHFFFAOYSA-N bis[2-(1-hydroxycyclohexyl)phenyl]methanone Chemical compound C=1C=CC=C(C(=O)C=2C(=CC=CC=2)C2(O)CCCCC2)C=1C1(O)CCCCC1 MQDJYUACMFCOFT-UHFFFAOYSA-N 0.000 description 1
- HQABUPZFAYXKJW-UHFFFAOYSA-N butan-1-amine Chemical compound CCCCN HQABUPZFAYXKJW-UHFFFAOYSA-N 0.000 description 1
- 125000004106 butoxy group Chemical group [*]OC([H])([H])C([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 1
- 238000001354 calcination Methods 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- LMQNPINUXNVGGV-UHFFFAOYSA-N chloro-tris(prop-2-enyl)silane Chemical compound C=CC[Si](Cl)(CC=C)CC=C LMQNPINUXNVGGV-UHFFFAOYSA-N 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000001934 delay Effects 0.000 description 1
- MAYIDWCWWMOISO-UHFFFAOYSA-N dichloro-bis(ethenyl)silane Chemical compound C=C[Si](Cl)(Cl)C=C MAYIDWCWWMOISO-UHFFFAOYSA-N 0.000 description 1
- VTEHVUWHCBXMPI-UHFFFAOYSA-N dichloro-bis(prop-2-enyl)silane Chemical compound C=CC[Si](Cl)(Cl)CC=C VTEHVUWHCBXMPI-UHFFFAOYSA-N 0.000 description 1
- NWQIWFOQNHTTIA-UHFFFAOYSA-N diethoxy-bis(prop-2-enyl)silane Chemical compound CCO[Si](CC=C)(CC=C)OCC NWQIWFOQNHTTIA-UHFFFAOYSA-N 0.000 description 1
- ZXPDYFSTVHQQOI-UHFFFAOYSA-N diethoxysilane Chemical compound CCO[SiH2]OCC ZXPDYFSTVHQQOI-UHFFFAOYSA-N 0.000 description 1
- VGWJKDPTLUDSJT-UHFFFAOYSA-N diethyl dimethyl silicate Chemical compound CCO[Si](OC)(OC)OCC VGWJKDPTLUDSJT-UHFFFAOYSA-N 0.000 description 1
- OLLFKUHHDPMQFR-UHFFFAOYSA-N dihydroxy(diphenyl)silane Chemical compound C=1C=CC=CC=1[Si](O)(O)C1=CC=CC=C1 OLLFKUHHDPMQFR-UHFFFAOYSA-N 0.000 description 1
- JJQZDUKDJDQPMQ-UHFFFAOYSA-N dimethoxy(dimethyl)silane Chemical compound CO[Si](C)(C)OC JJQZDUKDJDQPMQ-UHFFFAOYSA-N 0.000 description 1
- WERMRYHPOOABQT-UHFFFAOYSA-N dimethoxy-bis(prop-2-enyl)silane Chemical compound C=CC[Si](OC)(CC=C)OC WERMRYHPOOABQT-UHFFFAOYSA-N 0.000 description 1
- LIKFHECYJZWXFJ-UHFFFAOYSA-N dimethyldichlorosilane Chemical compound C[Si](C)(Cl)Cl LIKFHECYJZWXFJ-UHFFFAOYSA-N 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- PZPGRFITIJYNEJ-UHFFFAOYSA-N disilane Chemical compound [SiH3][SiH3] PZPGRFITIJYNEJ-UHFFFAOYSA-N 0.000 description 1
- 238000010494 dissociation reaction Methods 0.000 description 1
- 230000005593 dissociations Effects 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- FWDBOZPQNFPOLF-UHFFFAOYSA-N ethenyl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)C=C FWDBOZPQNFPOLF-UHFFFAOYSA-N 0.000 description 1
- NKSJNEHGWDZZQF-UHFFFAOYSA-N ethenyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)C=C NKSJNEHGWDZZQF-UHFFFAOYSA-N 0.000 description 1
- RSIHJDGMBDPTIM-UHFFFAOYSA-N ethoxy(trimethyl)silane Chemical compound CCO[Si](C)(C)C RSIHJDGMBDPTIM-UHFFFAOYSA-N 0.000 description 1
- CWAFVXWRGIEBPL-UHFFFAOYSA-N ethoxysilane Chemical compound CCO[SiH3] CWAFVXWRGIEBPL-UHFFFAOYSA-N 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 238000001879 gelation Methods 0.000 description 1
- 230000036541 health Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- UQEAIHBTYFGYIE-UHFFFAOYSA-N hexamethyldisiloxane Chemical compound C[Si](C)(C)O[Si](C)(C)C UQEAIHBTYFGYIE-UHFFFAOYSA-N 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- 125000003253 isopropoxy group Chemical group [H]C([H])([H])C([H])(O*)C([H])([H])[H] 0.000 description 1
- 239000005453 ketone based solvent Substances 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 description 1
- 229910001635 magnesium fluoride Inorganic materials 0.000 description 1
- VUZPPFZMUPKLLV-UHFFFAOYSA-N methane;hydrate Chemical compound C.O VUZPPFZMUPKLLV-UHFFFAOYSA-N 0.000 description 1
- POPACFLNWGUDSR-UHFFFAOYSA-N methoxy(trimethyl)silane Chemical compound CO[Si](C)(C)C POPACFLNWGUDSR-UHFFFAOYSA-N 0.000 description 1
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 description 1
- LWFWUJCJKPUZLV-UHFFFAOYSA-N n-trimethylsilylacetamide Chemical compound CC(=O)N[Si](C)(C)C LWFWUJCJKPUZLV-UHFFFAOYSA-N 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 125000002572 propoxy group Chemical group [*]OC([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 1
- 125000005372 silanol group Chemical group 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Inorganic materials [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 238000003980 solgel method Methods 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000000352 supercritical drying Methods 0.000 description 1
- FGWRMMTYIZKYMA-UHFFFAOYSA-N tert-butyl-hydroxy-dimethylsilane Chemical compound CC(C)(C)[Si](C)(C)O FGWRMMTYIZKYMA-UHFFFAOYSA-N 0.000 description 1
- UQMOLLPKNHFRAC-UHFFFAOYSA-N tetrabutyl silicate Chemical compound CCCCO[Si](OCCCC)(OCCCC)OCCCC UQMOLLPKNHFRAC-UHFFFAOYSA-N 0.000 description 1
- ZQZCOBSUOFHDEE-UHFFFAOYSA-N tetrapropyl silicate Chemical compound CCCO[Si](OCCC)(OCCC)OCCC ZQZCOBSUOFHDEE-UHFFFAOYSA-N 0.000 description 1
- GQIUQDDJKHLHTB-UHFFFAOYSA-N trichloro(ethenyl)silane Chemical compound Cl[Si](Cl)(Cl)C=C GQIUQDDJKHLHTB-UHFFFAOYSA-N 0.000 description 1
- FRGPKMWIYVTFIQ-UHFFFAOYSA-N triethoxy(3-isocyanatopropyl)silane Chemical compound CCO[Si](OCC)(OCC)CCCN=C=O FRGPKMWIYVTFIQ-UHFFFAOYSA-N 0.000 description 1
- CPUDPFPXCZDNGI-UHFFFAOYSA-N triethoxy(methyl)silane Chemical compound CCO[Si](C)(OCC)OCC CPUDPFPXCZDNGI-UHFFFAOYSA-N 0.000 description 1
- JCVQKRGIASEUKR-UHFFFAOYSA-N triethoxy(phenyl)silane Chemical compound CCO[Si](OCC)(OCC)C1=CC=CC=C1 JCVQKRGIASEUKR-UHFFFAOYSA-N 0.000 description 1
- UMFJXASDGBJDEB-UHFFFAOYSA-N triethoxy(prop-2-enyl)silane Chemical compound CCO[Si](CC=C)(OCC)OCC UMFJXASDGBJDEB-UHFFFAOYSA-N 0.000 description 1
- WVMSIBFANXCZKT-UHFFFAOYSA-N triethyl(hydroxy)silane Chemical compound CC[Si](O)(CC)CC WVMSIBFANXCZKT-UHFFFAOYSA-N 0.000 description 1
- LFRDHGNFBLIJIY-UHFFFAOYSA-N trimethoxy(prop-2-enyl)silane Chemical compound CO[Si](OC)(OC)CC=C LFRDHGNFBLIJIY-UHFFFAOYSA-N 0.000 description 1
- AAPLIUHOKVUFCC-UHFFFAOYSA-N trimethylsilanol Chemical compound C[Si](C)(C)O AAPLIUHOKVUFCC-UHFFFAOYSA-N 0.000 description 1
- QHUNJMXHQHHWQP-UHFFFAOYSA-N trimethylsilyl acetate Chemical compound CC(=O)O[Si](C)(C)C QHUNJMXHQHHWQP-UHFFFAOYSA-N 0.000 description 1
- LCNWHVJMIOOGTC-UHFFFAOYSA-N trimethylsilyl prop-2-ynoate Chemical compound C[Si](C)(C)OC(=O)C#C LCNWHVJMIOOGTC-UHFFFAOYSA-N 0.000 description 1
- NLSXASIDNWDYMI-UHFFFAOYSA-N triphenylsilanol Chemical compound C=1C=CC=CC=1[Si](C=1C=CC=CC=1)(O)C1=CC=CC=C1 NLSXASIDNWDYMI-UHFFFAOYSA-N 0.000 description 1
- VEDJZFSRVVQBIL-UHFFFAOYSA-N trisilane Chemical compound [SiH3][SiH2][SiH3] VEDJZFSRVVQBIL-UHFFFAOYSA-N 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
- B01J19/12—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electromagnetic waves
- B01J19/122—Incoherent waves
- B01J19/123—Ultraviolet light
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/14—Colloidal silica, e.g. dispersions, gels, sols
- C01B33/157—After-treatment of gels
- C01B33/158—Purification; Drying; Dehydrating
- C01B33/1585—Dehydration into aerogels
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Dispersion Chemistry (AREA)
- Toxicology (AREA)
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Health & Medical Sciences (AREA)
- General Health & Medical Sciences (AREA)
- Inorganic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Paints Or Removers (AREA)
- Surface Treatment Of Optical Elements (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Laminated Bodies (AREA)
- Surface Treatment Of Glass (AREA)
- Silicon Compounds (AREA)
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005125593A JP4938994B2 (ja) | 2005-04-22 | 2005-04-22 | シリカエアロゲル膜及びその製造方法 |
| US11/407,907 US8298622B2 (en) | 2005-04-22 | 2006-04-21 | Silica aerogel coating and its production method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005125593A JP4938994B2 (ja) | 2005-04-22 | 2005-04-22 | シリカエアロゲル膜及びその製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2006297329A JP2006297329A (ja) | 2006-11-02 |
| JP2006297329A5 JP2006297329A5 (https=) | 2008-04-03 |
| JP4938994B2 true JP4938994B2 (ja) | 2012-05-23 |
Family
ID=37187132
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2005125593A Expired - Fee Related JP4938994B2 (ja) | 2005-04-22 | 2005-04-22 | シリカエアロゲル膜及びその製造方法 |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US8298622B2 (https=) |
| JP (1) | JP4938994B2 (https=) |
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8188492B2 (en) | 2006-08-29 | 2012-05-29 | Seoul Semiconductor Co., Ltd. | Light emitting device having plural light emitting diodes and at least one phosphor for emitting different wavelengths of light |
| US8252203B2 (en) | 2004-06-10 | 2012-08-28 | Seoul Semiconductor Co., Ltd. | Luminescent material |
| US8273266B2 (en) | 2005-11-11 | 2012-09-25 | Seoul Semiconductor Co., Ltd. | Copper-alkaline-earth-silicate mixed crystal phosphors |
| US8308980B2 (en) | 2004-06-10 | 2012-11-13 | Seoul Semiconductor Co., Ltd. | Light emitting device |
| US8431954B2 (en) | 2007-08-28 | 2013-04-30 | Seoul Semiconductor Co., Ltd. | Light emitting device employing non-stoichiometric tetragonal alkaline earth silicate phosphors |
| US8501040B2 (en) | 2007-08-22 | 2013-08-06 | Seoul Semiconductor Co., Ltd. | Non-stoichiometric tetragonal copper alkaline earth silicate phosphors and method of preparing the same |
| US8535564B2 (en) | 2009-06-24 | 2013-09-17 | Seoul Semiconductor, Co., Ltd. | Light emitting device employing luminescent substances with oxyorthosilicate luminophores |
| US8703014B2 (en) | 2009-06-24 | 2014-04-22 | Seoul Semiconductor Co., Ltd. | Luminescent substances having Eu2+-doped silicate luminophores |
| CN108027454A (zh) * | 2015-09-24 | 2018-05-11 | 日东电工株式会社 | 低折射率膜制造用凝胶和涂料及它们的制造方法、层叠膜及图像显示装置的制造方法 |
Families Citing this family (47)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100757229B1 (ko) * | 2005-12-05 | 2007-09-10 | 한국전자통신연구원 | 리눅스 시스템상에서 ｕｓｂ 디바이스 드라이버 개발을지원하는 운영체제 자원 진단 장치 및 방법 |
| JP2007183366A (ja) | 2006-01-05 | 2007-07-19 | Pentax Corp | 防塵性光透過性部材及びその用途、並びにその部材を具備する撮像装置 |
| TW200746123A (en) * | 2006-01-11 | 2007-12-16 | Pentax Corp | Optical element having anti-reflection coating |
| JP4949692B2 (ja) * | 2006-02-07 | 2012-06-13 | 東京応化工業株式会社 | 低屈折率シリカ系被膜形成用組成物 |
| TW200822975A (en) * | 2006-10-02 | 2008-06-01 | Pentax Corp | Method and apparatus for forming optical film, and optical article |
| JP5252810B2 (ja) * | 2007-02-13 | 2013-07-31 | 日本曹達株式会社 | 金属系界面活性剤オリゴマーを用いた有機薄膜形成方法 |
| JP5072395B2 (ja) * | 2007-03-19 | 2012-11-14 | ペンタックスリコーイメージング株式会社 | 反射防止膜及びこれを有する光学部品 |
| JP5362969B2 (ja) * | 2007-08-21 | 2013-12-11 | リコー光学株式会社 | 光学素子 |
| CN101376501A (zh) * | 2007-08-28 | 2009-03-04 | Hoya株式会社 | 二氧化硅气凝胶薄膜的制备方法、减反射涂层和光学元件 |
| JP5049731B2 (ja) * | 2007-10-15 | 2012-10-17 | ペンタックスリコーイメージング株式会社 | 光学膜の形成方法及びこれを有する光学素子 |
| US8199404B2 (en) * | 2007-12-27 | 2012-06-12 | Pentax Ricoh Imaging Company, Ltd. | Anti-reflection coating, optical member, exchange lens unit and imaging device |
| EP2077132A1 (en) | 2008-01-02 | 2009-07-08 | Boehringer Ingelheim Pharma GmbH & Co. KG | Dispensing device, storage device and method for dispensing a formulation |
| EP2414560B1 (de) * | 2009-03-31 | 2013-10-23 | Boehringer Ingelheim International GmbH | Verfahren zur beschichtung einer oberfläche eines bauteils |
| KR101093053B1 (ko) | 2009-04-27 | 2011-12-13 | 금오공과대학교 산학협력단 | 유무기 복합 실리카와 자외선 그라프팅법을 이용한 ｐｌａ 직물의 발수 가공 |
| US10016568B2 (en) | 2009-11-25 | 2018-07-10 | Boehringer Ingelheim International Gmbh | Nebulizer |
| WO2011064163A1 (en) | 2009-11-25 | 2011-06-03 | Boehringer Ingelheim International Gmbh | Nebulizer |
| WO2011160932A1 (en) | 2010-06-24 | 2011-12-29 | Boehringer Ingelheim International Gmbh | Nebulizer |
| US9827384B2 (en) | 2011-05-23 | 2017-11-28 | Boehringer Ingelheim International Gmbh | Nebulizer |
| JP5945172B2 (ja) * | 2011-06-29 | 2016-07-05 | 三洋化成工業株式会社 | 樹脂改質剤 |
| WO2013152894A1 (de) | 2012-04-13 | 2013-10-17 | Boehringer Ingelheim International Gmbh | Zerstäuber mit kodiermitteln |
| ES2836977T3 (es) | 2013-08-09 | 2021-06-28 | Boehringer Ingelheim Int | Nebulizador |
| WO2016047740A1 (ja) | 2014-09-25 | 2016-03-31 | 日立化成株式会社 | エアロゲル複合体、エアロゲル複合体付き支持部材及び断熱材 |
| JP6563750B2 (ja) | 2014-12-26 | 2019-08-21 | 日東電工株式会社 | 塗料およびその製造方法 |
| JP6612563B2 (ja) | 2014-12-26 | 2019-11-27 | 日東電工株式会社 | シリコーン多孔体およびその製造方法 |
| TWI691559B (zh) * | 2014-12-26 | 2020-04-21 | 日商日東電工股份有限公司 | 塗料及其製造方法 |
| JP6604781B2 (ja) * | 2014-12-26 | 2019-11-13 | 日東電工株式会社 | 積層フィルムロールおよびその製造方法 |
| JP6599699B2 (ja) | 2014-12-26 | 2019-10-30 | 日東電工株式会社 | 触媒作用を介して結合した空隙構造フィルムおよびその製造方法 |
| DE102015207944A1 (de) * | 2015-04-29 | 2016-11-03 | Wacker Chemie Ag | Verfahren zur Herstellung organisch modifizierter Aerogele |
| JP6713872B2 (ja) | 2015-07-31 | 2020-06-24 | 日東電工株式会社 | 積層フィルム、積層フィルムの製造方法、光学部材、画像表示装置、光学部材の製造方法および画像表示装置の製造方法 |
| JP6713871B2 (ja) | 2015-07-31 | 2020-06-24 | 日東電工株式会社 | 光学積層体、光学積層体の製造方法、光学部材、画像表示装置、光学部材の製造方法および画像表示装置の製造方法 |
| JP6892744B2 (ja) | 2015-08-24 | 2021-06-23 | 日東電工株式会社 | 積層光学フィルム、積層光学フィルムの製造方法、光学部材、および画像表示装置 |
| JP7152130B2 (ja) | 2015-09-07 | 2022-10-12 | 日東電工株式会社 | 低屈折率層、積層フィルム、低屈折率層の製造方法、積層フィルムの製造方法、光学部材および画像表示装置 |
| JP6615552B2 (ja) * | 2015-09-25 | 2019-12-04 | 日本ペイント・オートモーティブコーティングス株式会社 | カチオン電着塗料組成物 |
| JP2017066209A (ja) * | 2015-09-28 | 2017-04-06 | 日東電工株式会社 | 塗工液、塗工液の製造方法、積層フィルムの製造方法および画像表示装置の製造方法 |
| JP2017069003A (ja) | 2015-09-29 | 2017-04-06 | 日東電工株式会社 | フレキシブル発光デバイス、照明装置および画像表示装置 |
| JP6713760B2 (ja) * | 2015-12-03 | 2020-06-24 | 日東電工株式会社 | ゲルの製造方法、空隙構造フィルム製造用塗料の製造方法、および空隙構造フィルムの製造方法 |
| CN105582866B (zh) * | 2016-03-08 | 2022-12-09 | 浙江圣润纳米科技有限公司 | 一种射频辐射快速制备气凝胶的方法及生产线 |
| CN111232989B (zh) * | 2020-02-10 | 2023-01-20 | 佛山市农芯智能科技有限公司 | 一种含多烷氧基硅基苯化合物及杂化二氧化硅气凝胶 |
| US11603329B2 (en) | 2020-04-22 | 2023-03-14 | Waymo Llc | Methods for preparing a superomniphobic coating |
| US11155490B1 (en) | 2020-04-22 | 2021-10-26 | Waymo Llc | Superomniphobic thin film |
| JP7257995B2 (ja) * | 2020-07-20 | 2023-04-14 | 日東電工株式会社 | フレキシブル発光デバイス、照明装置および画像表示装置 |
| US11724955B2 (en) * | 2020-07-29 | 2023-08-15 | Waymo Llc | Superomniphobic bulk optical glass |
| US20240002241A1 (en) * | 2020-12-01 | 2024-01-04 | Aerobel Bv | Vertically integrated manufacturing of silica aerogels from various silica sources |
| CN114436267A (zh) * | 2022-02-14 | 2022-05-06 | 连云港淼晶硅材料有限公司 | 一种高纯超细硅微粉的制备方法 |
| EP4582381A3 (en) | 2022-03-09 | 2025-10-01 | Cardinal CG Company | Silica wet gel and aerogel |
| WO2025095907A1 (en) * | 2023-10-31 | 2025-05-08 | Odtü-Günam | Aerogel coating |
| CN120443505B (zh) * | 2025-06-26 | 2026-01-06 | 枣庄美迪格新型材料科技有限公司 | 肤感表面高分子涂装纸的压贴平贴复合工艺 |
Family Cites Families (29)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4530569A (en) * | 1981-08-20 | 1985-07-23 | E. I. Du Pont De Nemours And Company | Optical fibers comprising cores clad with amorphous copolymers of perfluoro-2,2-dimethyl-1,3-dioxole |
| US4754009A (en) * | 1981-08-20 | 1988-06-28 | E. I. Du Pont De Nemours And Company | Amorphous copolymers of perfluoro-2,2-dimethyl-1,3-dioxole |
| JPS61232214A (ja) * | 1985-04-04 | 1986-10-16 | Toa Nenryo Kogyo Kk | シランの製造方法 |
| JPH0767275B2 (ja) | 1986-07-11 | 1995-07-19 | 松下電器産業株式会社 | スイツチング電源 |
| JPS63238115A (ja) | 1987-03-27 | 1988-10-04 | Asahi Glass Co Ltd | 環状構造を有する含フツ素共重合体の製造法 |
| JPS63238111A (ja) | 1987-03-27 | 1988-10-04 | Asahi Glass Co Ltd | 環状構造を有する含フツ素重合体の製造方法 |
| JP2756366B2 (ja) | 1990-11-27 | 1998-05-25 | 松下電工株式会社 | 疎水性エアロゲルの製造方法 |
| US5236651A (en) * | 1991-12-02 | 1993-08-17 | Akzo N.V. | Extrusion, collection, and drying of ceramic precursor gel to form dried gel particles |
| US5948482A (en) * | 1995-09-19 | 1999-09-07 | University Of New Mexico | Ambient pressure process for preparing aerogel thin films reliquified sols useful in preparing aerogel thin films |
| JPH1045429A (ja) * | 1996-07-29 | 1998-02-17 | Nippon Sheet Glass Co Ltd | 撥水性物品およびその製造方法 |
| US6224976B1 (en) * | 1996-08-14 | 2001-05-01 | Asahi Kogaku Kogyo Kabushiki Kaisha | Adhesive transparent resin and a composite including the same |
| JPH10227902A (ja) | 1997-02-13 | 1998-08-25 | Nikon Corp | 広帯域反射防止膜 |
| US5993898A (en) | 1997-05-19 | 1999-11-30 | Nikon Corporation | Fabrication method and structure for multilayer optical anti-reflection coating, and optical component and optical system using multilayer optical anti-reflection coating |
| DE19932629A1 (de) * | 1999-07-13 | 2001-01-18 | Fraunhofer Ges Forschung | Organisch modifizierte, lagerstabile, UV-härtbare, NIR-durchlässige und in Schichtdicken von 1 bis 150 mum fotostrukturierbare Kieselsäurepolykondensate, deren Herstellung und deren Verwendung |
| EP1089093B1 (en) * | 1999-09-28 | 2008-04-02 | FUJIFILM Corporation | Anti-reflection film, polarizing plate comprising the same, and image display device using the anti-reflection film or the polarizing plate |
| JP4836316B2 (ja) * | 1999-09-29 | 2011-12-14 | 富士フイルム株式会社 | 反射防止膜、偏光板、及び画像表示装置 |
| JP2003043202A (ja) | 2001-07-31 | 2003-02-13 | Olympus Optical Co Ltd | 反射防止膜及び光学部品 |
| DE10148894A1 (de) * | 2001-10-04 | 2003-04-30 | Fraunhofer Ges Forschung | Photochemisch und/oder thermisch strukturierbare Harze auf Silanbasis, einstufiges Verfahren zu deren Herstellung, dabei einzetzbare Ausgangsverbindungen und Herstellungsverfahren für diese |
| JP2003119052A (ja) | 2001-10-12 | 2003-04-23 | Matsushita Electric Works Ltd | 光透過シート、これを用いた発光装置、及び、光透過シートの製造方法 |
| US6809170B2 (en) * | 2002-05-31 | 2004-10-26 | Bayer Materialscience Llc | Moisture-curable, polyether urethanes with reactive silane groups and their use as sealants, adhesive and coatings |
| JP4356308B2 (ja) * | 2002-11-29 | 2009-11-04 | 三菱化学株式会社 | 多孔性シリカ膜、それを有する積層基板、それらの製造方法およびエレクトロルミネッセンス素子 |
| JP2004277540A (ja) | 2003-03-14 | 2004-10-07 | Sumitomo Chem Co Ltd | 重合体、硬化性材料及び硬化被膜が形成された透明基材 |
| EP1479734B1 (en) | 2003-05-20 | 2009-02-11 | DSM IP Assets B.V. | Nano-structured surface coating process, nano-structured coatings and articles comprising the coating |
| TWI339741B (en) * | 2003-06-26 | 2011-04-01 | Zeon Corp | Optical laminated film, polarizer and optical article |
| JP2005037927A (ja) * | 2003-06-26 | 2005-02-10 | Nippon Zeon Co Ltd | 光学積層フィルム |
| JP4495476B2 (ja) | 2004-02-09 | 2010-07-07 | Ｈｏｙａ株式会社 | 反射防止膜を有する光学素子の製造方法 |
| JP4448392B2 (ja) | 2004-06-28 | 2010-04-07 | Ｈｏｙａ株式会社 | 反射防止膜を有する光学素子の製造方法 |
| US20060154044A1 (en) * | 2005-01-07 | 2006-07-13 | Pentax Corporation | Anti-reflection coating and optical element having such anti-reflection coating for image sensors |
| US8029871B2 (en) * | 2005-06-09 | 2011-10-04 | Hoya Corporation | Method for producing silica aerogel coating |
-
2005
- 2005-04-22 JP JP2005125593A patent/JP4938994B2/ja not_active Expired - Fee Related
-
2006
- 2006-04-21 US US11/407,907 patent/US8298622B2/en active Active
Cited By (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8252203B2 (en) | 2004-06-10 | 2012-08-28 | Seoul Semiconductor Co., Ltd. | Luminescent material |
| US8308980B2 (en) | 2004-06-10 | 2012-11-13 | Seoul Semiconductor Co., Ltd. | Light emitting device |
| US8318044B2 (en) | 2004-06-10 | 2012-11-27 | Seoul Semiconductor Co., Ltd. | Light emitting device |
| US8273266B2 (en) | 2005-11-11 | 2012-09-25 | Seoul Semiconductor Co., Ltd. | Copper-alkaline-earth-silicate mixed crystal phosphors |
| US8188492B2 (en) | 2006-08-29 | 2012-05-29 | Seoul Semiconductor Co., Ltd. | Light emitting device having plural light emitting diodes and at least one phosphor for emitting different wavelengths of light |
| US8674380B2 (en) | 2006-08-29 | 2014-03-18 | Seoul Semiconductor Co., Ltd. | Light emitting device having plural light emitting diodes and plural phosphors for emitting different wavelengths of light |
| US8501040B2 (en) | 2007-08-22 | 2013-08-06 | Seoul Semiconductor Co., Ltd. | Non-stoichiometric tetragonal copper alkaline earth silicate phosphors and method of preparing the same |
| US8431954B2 (en) | 2007-08-28 | 2013-04-30 | Seoul Semiconductor Co., Ltd. | Light emitting device employing non-stoichiometric tetragonal alkaline earth silicate phosphors |
| US8535564B2 (en) | 2009-06-24 | 2013-09-17 | Seoul Semiconductor, Co., Ltd. | Light emitting device employing luminescent substances with oxyorthosilicate luminophores |
| US8703014B2 (en) | 2009-06-24 | 2014-04-22 | Seoul Semiconductor Co., Ltd. | Luminescent substances having Eu2+-doped silicate luminophores |
| CN108027454A (zh) * | 2015-09-24 | 2018-05-11 | 日东电工株式会社 | 低折射率膜制造用凝胶和涂料及它们的制造方法、层叠膜及图像显示装置的制造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| US8298622B2 (en) | 2012-10-30 |
| JP2006297329A (ja) | 2006-11-02 |
| US20060239886A1 (en) | 2006-10-26 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP4938994B2 (ja) | シリカエアロゲル膜及びその製造方法 | |
| US8029871B2 (en) | Method for producing silica aerogel coating | |
| JP4953426B2 (ja) | シリカエアロゲル膜の製造方法 | |
| JP4448392B2 (ja) | 反射防止膜を有する光学素子の製造方法 | |
| US8125714B2 (en) | Anti-reflection coating, optical member, exchange lens unit and imaging device | |
| KR102207095B1 (ko) | 열적으로 경화가능한 코팅 시스템 | |
| JP6323861B2 (ja) | 表面修飾メソポーラスシリカナノ粒子の製造方法 | |
| JP4443318B2 (ja) | 反射防止膜及び反射防止膜を有する光学素子 | |
| JP5096933B2 (ja) | 反射防止膜及びこれを有する光学部品、交換レンズ及び撮像装置 | |
| JP2009066965A (ja) | 透明被膜付基材および透明被膜形成用塗料 | |
| JP4951237B2 (ja) | 防曇性反射防止膜の製造方法 | |
| JP5047488B2 (ja) | シリカエアロゲル膜の製造方法 | |
| JP5642535B2 (ja) | 新規シリカ系中空微粒子、透明被膜付基材および透明被膜形成用塗料 | |
| JPS58145614A (ja) | 有機溶剤に均質に分散可能な粉末状シリカとその製造法 | |
| JP5241199B2 (ja) | 繊維状中空シリカ微粒子の製造方法および反射防止被膜付基材 | |
| JP6304584B2 (ja) | 分散溶液及びその製造方法、並びに塗布液及びメソポーラスシリカ多孔質膜の製造方法 | |
| JP5480743B2 (ja) | 透明被膜付基材および透明被膜形成用塗料 | |
| JP2016128157A (ja) | シリカエアロゲル膜の製造方法 | |
| JP5096966B2 (ja) | 反射防止膜及びこれを有する光学部品、交換レンズ及び撮像装置 | |
| JP6582414B2 (ja) | 多孔質の光学薄膜用塗工液及びその製造方法 | |
| JP5841908B2 (ja) | 膜形成用組成物の製造方法、並びに、機能性膜およびその製造方法 | |
| TW201139535A (en) | Modified cerium(IV) oxide colloidal particles and production method thereof | |
| WO2023190023A1 (ja) | 透明多孔質形成塗料および透明多孔質形成塗料の製造方法 | |
| JP5766251B2 (ja) | 透明被膜形成用塗料の製造方法 | |
| JP5262055B2 (ja) | 球状シリカ系多孔体及びその製造方法、並びに球状カーボン系多孔体 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20080219 |
|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20080219 |
|
| A711 | Notification of change in applicant |
Free format text: JAPANESE INTERMEDIATE CODE: A712 Effective date: 20080501 |
|
| A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20100802 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20100811 |
|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20101005 |
|
| A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20110608 |
|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20110906 |
|
| A911 | Transfer to examiner for re-examination before appeal (zenchi) |
Free format text: JAPANESE INTERMEDIATE CODE: A911 Effective date: 20110914 |
|
| A711 | Notification of change in applicant |
Free format text: JAPANESE INTERMEDIATE CODE: A712 Effective date: 20111202 |
|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A821 Effective date: 20111202 |
|
| TRDD | Decision of grant or rejection written | ||
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20120118 |
|
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 |
|
| A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20120224 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20150302 Year of fee payment: 3 |
|
| R150 | Certificate of patent or registration of utility model |
Ref document number: 4938994 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
| S533 | Written request for registration of change of name |
Free format text: JAPANESE INTERMEDIATE CODE: R313533 |
|
| R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| LAPS | Cancellation because of no payment of annual fees |