JP2006297329A5 - - Google Patents
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- Publication number
- JP2006297329A5 JP2006297329A5 JP2005125593A JP2005125593A JP2006297329A5 JP 2006297329 A5 JP2006297329 A5 JP 2006297329A5 JP 2005125593 A JP2005125593 A JP 2005125593A JP 2005125593 A JP2005125593 A JP 2005125593A JP 2006297329 A5 JP2006297329 A5 JP 2006297329A5
- Authority
- JP
- Japan
- Prior art keywords
- methyl
- hours
- added
- wet gel
- butyl ketone
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 119
- 239000011240 wet gel Substances 0.000 description 49
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 48
- 239000000377 silicon dioxide Substances 0.000 description 47
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 43
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 33
- IJOOHPMOJXWVHK-UHFFFAOYSA-N chlorotrimethylsilane Chemical compound C[Si](C)(C)Cl IJOOHPMOJXWVHK-UHFFFAOYSA-N 0.000 description 16
- 239000002612 dispersion medium Substances 0.000 description 16
- 239000003607 modifier Substances 0.000 description 16
- 239000002904 solvent Substances 0.000 description 16
- 238000010908 decantation Methods 0.000 description 15
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical class Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 description 11
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 10
- KMVZWUQHMJAWSY-UHFFFAOYSA-N chloro-dimethyl-prop-2-enylsilane Chemical compound C[Si](C)(Cl)CC=C KMVZWUQHMJAWSY-UHFFFAOYSA-N 0.000 description 9
- 239000007787 solid Substances 0.000 description 9
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 8
- QGZKDVFQNNGYKY-UHFFFAOYSA-N ammonia Natural products N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 8
- 235000011114 ammonium hydroxide Nutrition 0.000 description 8
- 239000011248 coating agent Substances 0.000 description 8
- 238000000576 coating method Methods 0.000 description 8
- 239000006185 dispersion Substances 0.000 description 8
- 239000007788 liquid Substances 0.000 description 8
- 239000011259 mixed solution Substances 0.000 description 8
- 238000002360 preparation method Methods 0.000 description 8
- 229910052814 silicon oxide Inorganic materials 0.000 description 8
- 239000007858 starting material Substances 0.000 description 8
- 239000005051 trimethylchlorosilane Substances 0.000 description 8
- 238000001132 ultrasonic dispersion Methods 0.000 description 8
- LWRBVKNFOYUCNP-UHFFFAOYSA-N 2-methyl-1-(4-methylsulfanylphenyl)-2-morpholin-4-ylpropan-1-one Chemical compound C1=CC(SC)=CC=C1C(=O)C(C)(C)N1CCOCC1 LWRBVKNFOYUCNP-UHFFFAOYSA-N 0.000 description 7
- 239000000463 material Substances 0.000 description 7
- 239000000243 solution Substances 0.000 description 7
- XDLMVUHYZWKMMD-UHFFFAOYSA-N 3-trimethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C(C)=C XDLMVUHYZWKMMD-UHFFFAOYSA-N 0.000 description 6
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 6
- 239000003999 initiator Substances 0.000 description 6
- 239000000203 mixture Substances 0.000 description 6
- 239000003505 polymerization initiator Substances 0.000 description 6
- 238000003756 stirring Methods 0.000 description 6
- 238000006467 substitution reaction Methods 0.000 description 6
- 229920006395 saturated elastomer Polymers 0.000 description 5
- 239000013638 trimer Substances 0.000 description 5
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical compound CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 4
- ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical compound C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 4
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- 239000000741 silica gel Substances 0.000 description 3
- 229910002027 silica gel Inorganic materials 0.000 description 3
- NJWGQARXZDRHCD-UHFFFAOYSA-N 2-methylanthraquinone Chemical compound C1=CC=C2C(=O)C3=CC(C)=CC=C3C(=O)C2=C1 NJWGQARXZDRHCD-UHFFFAOYSA-N 0.000 description 2
- -1 4-methylthio-phenyl Chemical group 0.000 description 2
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonium chloride Substances [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 2
- 244000028419 Styrax benzoin Species 0.000 description 2
- 235000000126 Styrax benzoin Nutrition 0.000 description 2
- 235000008411 Sumatra benzointree Nutrition 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 230000000996 additive effect Effects 0.000 description 2
- 229960002130 benzoin Drugs 0.000 description 2
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 2
- 239000012965 benzophenone Substances 0.000 description 2
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 2
- 235000019382 gum benzoic Nutrition 0.000 description 2
- YRHRIQCWCFGUEQ-UHFFFAOYSA-N thioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3SC2=C1 YRHRIQCWCFGUEQ-UHFFFAOYSA-N 0.000 description 2
- MSAHTMIQULFMRG-UHFFFAOYSA-N 1,2-diphenyl-2-propan-2-yloxyethanone Chemical compound C=1C=CC=CC=1C(OC(C)C)C(=O)C1=CC=CC=C1 MSAHTMIQULFMRG-UHFFFAOYSA-N 0.000 description 1
- DKEGCUDAFWNSSO-UHFFFAOYSA-N 1,8-dibromooctane Chemical compound BrCCCCCCCCBr DKEGCUDAFWNSSO-UHFFFAOYSA-N 0.000 description 1
- 239000012956 1-hydroxycyclohexylphenyl-ketone Substances 0.000 description 1
- GIMQKKFOOYOQGB-UHFFFAOYSA-N 2,2-diethoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OCC)(OCC)C(=O)C1=CC=CC=C1 GIMQKKFOOYOQGB-UHFFFAOYSA-N 0.000 description 1
- KWVGIHKZDCUPEU-UHFFFAOYSA-N 2,2-dimethoxy-2-phenylacetophenone Chemical compound C=1C=CC=CC=1C(OC)(OC)C(=O)C1=CC=CC=C1 KWVGIHKZDCUPEU-UHFFFAOYSA-N 0.000 description 1
- LCHAFMWSFCONOO-UHFFFAOYSA-N 2,4-dimethylthioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(C)=CC(C)=C3SC2=C1 LCHAFMWSFCONOO-UHFFFAOYSA-N 0.000 description 1
- FPKCTSIVDAWGFA-UHFFFAOYSA-N 2-chloroanthracene-9,10-dione Chemical compound C1=CC=C2C(=O)C3=CC(Cl)=CC=C3C(=O)C2=C1 FPKCTSIVDAWGFA-UHFFFAOYSA-N 0.000 description 1
- ZCDADJXRUCOCJE-UHFFFAOYSA-N 2-chlorothioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(Cl)=CC=C3SC2=C1 ZCDADJXRUCOCJE-UHFFFAOYSA-N 0.000 description 1
- SJEBAWHUJDUKQK-UHFFFAOYSA-N 2-ethylanthraquinone Chemical compound C1=CC=C2C(=O)C3=CC(CC)=CC=C3C(=O)C2=C1 SJEBAWHUJDUKQK-UHFFFAOYSA-N 0.000 description 1
- BQZJOQXSCSZQPS-UHFFFAOYSA-N 2-methoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OC)C(=O)C1=CC=CC=C1 BQZJOQXSCSZQPS-UHFFFAOYSA-N 0.000 description 1
- YTPSFXZMJKMUJE-UHFFFAOYSA-N 2-tert-butylanthracene-9,10-dione Chemical compound C1=CC=C2C(=O)C3=CC(C(C)(C)C)=CC=C3C(=O)C2=C1 YTPSFXZMJKMUJE-UHFFFAOYSA-N 0.000 description 1
- KOAPFYDEMWONAR-UHFFFAOYSA-N C(C)(=O)C1=CC=CC=C1.ClC1(CC=CC=C1)Cl Chemical compound C(C)(=O)C1=CC=CC=C1.ClC1(CC=CC=C1)Cl KOAPFYDEMWONAR-UHFFFAOYSA-N 0.000 description 1
- RVWADWOERKNWRY-UHFFFAOYSA-N [2-(dimethylamino)phenyl]-phenylmethanone Chemical compound CN(C)C1=CC=CC=C1C(=O)C1=CC=CC=C1 RVWADWOERKNWRY-UHFFFAOYSA-N 0.000 description 1
- PYKYMHQGRFAEBM-UHFFFAOYSA-N anthraquinone Natural products CCC(=O)c1c(O)c2C(=O)C3C(C=CC=C3O)C(=O)c2cc1CC(=O)OC PYKYMHQGRFAEBM-UHFFFAOYSA-N 0.000 description 1
- 150000004056 anthraquinones Chemical class 0.000 description 1
- MQDJYUACMFCOFT-UHFFFAOYSA-N bis[2-(1-hydroxycyclohexyl)phenyl]methanone Chemical compound C=1C=CC=C(C(=O)C=2C(=CC=CC=2)C2(O)CCCCC2)C=1C1(O)CCCCC1 MQDJYUACMFCOFT-UHFFFAOYSA-N 0.000 description 1
- 238000000527 sonication Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005125593A JP4938994B2 (ja) | 2005-04-22 | 2005-04-22 | シリカエアロゲル膜及びその製造方法 |
| US11/407,907 US8298622B2 (en) | 2005-04-22 | 2006-04-21 | Silica aerogel coating and its production method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005125593A JP4938994B2 (ja) | 2005-04-22 | 2005-04-22 | シリカエアロゲル膜及びその製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2006297329A JP2006297329A (ja) | 2006-11-02 |
| JP2006297329A5 true JP2006297329A5 (https=) | 2008-04-03 |
| JP4938994B2 JP4938994B2 (ja) | 2012-05-23 |
Family
ID=37187132
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2005125593A Expired - Fee Related JP4938994B2 (ja) | 2005-04-22 | 2005-04-22 | シリカエアロゲル膜及びその製造方法 |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US8298622B2 (https=) |
| JP (1) | JP4938994B2 (https=) |
Families Citing this family (56)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8308980B2 (en) | 2004-06-10 | 2012-11-13 | Seoul Semiconductor Co., Ltd. | Light emitting device |
| KR100665299B1 (ko) | 2004-06-10 | 2007-01-04 | 서울반도체 주식회사 | 발광물질 |
| KR101258397B1 (ko) | 2005-11-11 | 2013-04-30 | 서울반도체 주식회사 | 구리 알칼리토 실리케이트 혼성 결정 형광체 |
| KR100757229B1 (ko) * | 2005-12-05 | 2007-09-10 | 한국전자통신연구원 | 리눅스 시스템상에서 usb 디바이스 드라이버 개발을지원하는 운영체제 자원 진단 장치 및 방법 |
| JP2007183366A (ja) | 2006-01-05 | 2007-07-19 | Pentax Corp | 防塵性光透過性部材及びその用途、並びにその部材を具備する撮像装置 |
| TW200746123A (en) * | 2006-01-11 | 2007-12-16 | Pentax Corp | Optical element having anti-reflection coating |
| JP4949692B2 (ja) * | 2006-02-07 | 2012-06-13 | 東京応化工業株式会社 | 低屈折率シリカ系被膜形成用組成物 |
| KR101258227B1 (ko) | 2006-08-29 | 2013-04-25 | 서울반도체 주식회사 | 발광 소자 |
| TW200822975A (en) * | 2006-10-02 | 2008-06-01 | Pentax Corp | Method and apparatus for forming optical film, and optical article |
| JP5252810B2 (ja) * | 2007-02-13 | 2013-07-31 | 日本曹達株式会社 | 金属系界面活性剤オリゴマーを用いた有機薄膜形成方法 |
| JP5072395B2 (ja) * | 2007-03-19 | 2012-11-14 | ペンタックスリコーイメージング株式会社 | 反射防止膜及びこれを有する光学部品 |
| JP5362969B2 (ja) * | 2007-08-21 | 2013-12-11 | リコー光学株式会社 | 光学素子 |
| CN101784636B (zh) | 2007-08-22 | 2013-06-12 | 首尔半导体株式会社 | 非化学计量四方铜碱土硅酸盐磷光体及其制备方法 |
| KR101055769B1 (ko) | 2007-08-28 | 2011-08-11 | 서울반도체 주식회사 | 비화학양론적 정방정계 알칼리 토류 실리케이트 형광체를채택한 발광 장치 |
| TW200914374A (en) * | 2007-08-28 | 2009-04-01 | Hoya Corp | Production method of silica aerogel film, anti-reflection coating and optical element |
| JP5049731B2 (ja) * | 2007-10-15 | 2012-10-17 | ペンタックスリコーイメージング株式会社 | 光学膜の形成方法及びこれを有する光学素子 |
| KR20090071417A (ko) * | 2007-12-27 | 2009-07-01 | 호야 가부시키가이샤 | 반사방지막, 광학부품, 교환 렌즈 및 촬상장치 |
| EP2077132A1 (en) | 2008-01-02 | 2009-07-08 | Boehringer Ingelheim Pharma GmbH & Co. KG | Dispensing device, storage device and method for dispensing a formulation |
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| KR101093053B1 (ko) | 2009-04-27 | 2011-12-13 | 금오공과대학교 산학협력단 | 유무기 복합 실리카와 자외선 그라프팅법을 이용한 pla 직물의 발수 가공 |
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| JP5658268B2 (ja) | 2009-11-25 | 2015-01-21 | ベーリンガー インゲルハイム インターナショナル ゲゼルシャフト ミット ベシュレンクテル ハフツング | ネブライザ |
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| JP5945172B2 (ja) * | 2011-06-29 | 2016-07-05 | 三洋化成工業株式会社 | 樹脂改質剤 |
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| PL2835146T3 (pl) | 2013-08-09 | 2021-04-06 | Boehringer Ingelheim International Gmbh | Nebulizator |
| CN114702724B (zh) | 2014-09-25 | 2024-07-16 | 株式会社力森诺科 | 气凝胶复合体及其制造方法、带有气凝胶复合体的支撑构件以及绝热材 |
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| DE102015207944A1 (de) * | 2015-04-29 | 2016-11-03 | Wacker Chemie Ag | Verfahren zur Herstellung organisch modifizierter Aerogele |
| JP6713872B2 (ja) | 2015-07-31 | 2020-06-24 | 日東電工株式会社 | 積層フィルム、積層フィルムの製造方法、光学部材、画像表示装置、光学部材の製造方法および画像表示装置の製造方法 |
| JP6713871B2 (ja) | 2015-07-31 | 2020-06-24 | 日東電工株式会社 | 光学積層体、光学積層体の製造方法、光学部材、画像表示装置、光学部材の製造方法および画像表示装置の製造方法 |
| JP6892744B2 (ja) | 2015-08-24 | 2021-06-23 | 日東電工株式会社 | 積層光学フィルム、積層光学フィルムの製造方法、光学部材、および画像表示装置 |
| JP7152130B2 (ja) | 2015-09-07 | 2022-10-12 | 日東電工株式会社 | 低屈折率層、積層フィルム、低屈折率層の製造方法、積層フィルムの製造方法、光学部材および画像表示装置 |
| JP2017061604A (ja) * | 2015-09-24 | 2017-03-30 | 日東電工株式会社 | 低屈折率膜製造用ゲル、低屈折率膜製造用ゲルの製造方法、低屈折率膜製造用塗料、低屈折率膜製造用塗料の製造方法、積層フィルムの製造方法および画像表示装置の製造方法 |
| JP6615552B2 (ja) * | 2015-09-25 | 2019-12-04 | 日本ペイント・オートモーティブコーティングス株式会社 | カチオン電着塗料組成物 |
| JP2017066209A (ja) * | 2015-09-28 | 2017-04-06 | 日東電工株式会社 | 塗工液、塗工液の製造方法、積層フィルムの製造方法および画像表示装置の製造方法 |
| JP2017069003A (ja) | 2015-09-29 | 2017-04-06 | 日東電工株式会社 | フレキシブル発光デバイス、照明装置および画像表示装置 |
| JP6713760B2 (ja) * | 2015-12-03 | 2020-06-24 | 日東電工株式会社 | ゲルの製造方法、空隙構造フィルム製造用塗料の製造方法、および空隙構造フィルムの製造方法 |
| CN105582866B (zh) * | 2016-03-08 | 2022-12-09 | 浙江圣润纳米科技有限公司 | 一种射频辐射快速制备气凝胶的方法及生产线 |
| CN111232989B (zh) * | 2020-02-10 | 2023-01-20 | 佛山市农芯智能科技有限公司 | 一种含多烷氧基硅基苯化合物及杂化二氧化硅气凝胶 |
| US11155490B1 (en) | 2020-04-22 | 2021-10-26 | Waymo Llc | Superomniphobic thin film |
| US11603329B2 (en) | 2020-04-22 | 2023-03-14 | Waymo Llc | Methods for preparing a superomniphobic coating |
| JP7257995B2 (ja) * | 2020-07-20 | 2023-04-14 | 日東電工株式会社 | フレキシブル発光デバイス、照明装置および画像表示装置 |
| US11724955B2 (en) * | 2020-07-29 | 2023-08-15 | Waymo Llc | Superomniphobic bulk optical glass |
| CA3200653A1 (en) * | 2020-12-01 | 2022-06-09 | Steve DE POOTER | Vertically integrated manufacturing of silica aerogels from various silica sources |
| CN114436267A (zh) * | 2022-02-14 | 2022-05-06 | 连云港淼晶硅材料有限公司 | 一种高纯超细硅微粉的制备方法 |
| EP4582381A3 (en) | 2022-03-09 | 2025-10-01 | Cardinal CG Company | Silica wet gel and aerogel |
| WO2025095907A1 (en) * | 2023-10-31 | 2025-05-08 | Odtü-Günam | Aerogel coating |
| CN120443505B (zh) * | 2025-06-26 | 2026-01-06 | 枣庄美迪格新型材料科技有限公司 | 肤感表面高分子涂装纸的压贴平贴复合工艺 |
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2005
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2006
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