JP4689159B2 - 液滴吐出システム - Google Patents
液滴吐出システム Download PDFInfo
- Publication number
- JP4689159B2 JP4689159B2 JP2003405202A JP2003405202A JP4689159B2 JP 4689159 B2 JP4689159 B2 JP 4689159B2 JP 2003405202 A JP2003405202 A JP 2003405202A JP 2003405202 A JP2003405202 A JP 2003405202A JP 4689159 B2 JP4689159 B2 JP 4689159B2
- Authority
- JP
- Japan
- Prior art keywords
- film
- nozzle
- composition
- substrate
- pattern
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Images
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/12—Deposition of organic active material using liquid deposition, e.g. spin coating
- H10K71/13—Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/40—Thermal treatment, e.g. annealing in the presence of a solvent vapour
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/60—Forming conductive regions or layers, e.g. electrodes
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/0266—Marks, test patterns or identification means
- H05K1/0269—Marks, test patterns or identification means for visual or optical inspection
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0008—Apparatus or processes for manufacturing printed circuits for aligning or positioning of tools relative to the circuit board
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/12—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns
- H05K3/1241—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns by ink-jet printing or drawing by dispensing
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Coating Apparatus (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Electrodes Of Semiconductors (AREA)
- Thin Film Transistor (AREA)
- Electroluminescent Light Sources (AREA)
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003405202A JP4689159B2 (ja) | 2003-10-28 | 2003-10-28 | 液滴吐出システム |
| US10/970,712 US20050122351A1 (en) | 2003-10-28 | 2004-10-21 | Liquid droplet ejection system and control program of ejection condition of compositions |
| US13/049,078 US8322847B2 (en) | 2003-10-28 | 2011-03-16 | Liquid droplet ejection system and control program of ejection condition of compositions |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003405202A JP4689159B2 (ja) | 2003-10-28 | 2003-10-28 | 液滴吐出システム |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2005131621A JP2005131621A (ja) | 2005-05-26 |
| JP2005131621A5 JP2005131621A5 (enExample) | 2006-12-21 |
| JP4689159B2 true JP4689159B2 (ja) | 2011-05-25 |
Family
ID=34631697
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2003405202A Expired - Fee Related JP4689159B2 (ja) | 2003-10-28 | 2003-10-28 | 液滴吐出システム |
Country Status (2)
| Country | Link |
|---|---|
| US (2) | US20050122351A1 (enExample) |
| JP (1) | JP4689159B2 (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101477376B1 (ko) * | 2013-03-14 | 2014-12-29 | 삼성전기주식회사 | 유체 토출 장치 |
Families Citing this family (43)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7393081B2 (en) * | 2003-06-30 | 2008-07-01 | Semiconductor Energy Laboratory Co., Ltd. | Droplet jetting device and method of manufacturing pattern |
| US8263983B2 (en) | 2003-10-28 | 2012-09-11 | Semiconductor Energy Laboratory Co., Ltd. | Wiring substrate and semiconductor device |
| CN100483632C (zh) * | 2003-10-28 | 2009-04-29 | 株式会社半导体能源研究所 | 用于制造半导体器件的方法 |
| WO2005048223A1 (en) * | 2003-11-14 | 2005-05-26 | Semiconductor Energy Laboratory Co., Ltd. | Light-emitting device and method for manufacturing the same |
| KR101061888B1 (ko) | 2003-11-14 | 2011-09-02 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 발광 장치 및 그 제조방법 |
| CN101452893B (zh) * | 2003-11-14 | 2011-04-13 | 株式会社半导体能源研究所 | 显示装置及其制造法 |
| US8053780B2 (en) * | 2003-11-14 | 2011-11-08 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor element, method for manufacturing the same, liquid crystal display device, and method for manufacturing the same |
| KR101219038B1 (ko) * | 2004-10-26 | 2013-01-07 | 삼성디스플레이 주식회사 | 박막 트랜지스터 표시판 및 그 제조 방법 |
| JP3874003B2 (ja) * | 2004-10-27 | 2007-01-31 | セイコーエプソン株式会社 | 配線パターン形成方法、及び膜パターン形成方法 |
| US7858451B2 (en) | 2005-02-03 | 2010-12-28 | Semiconductor Energy Laboratory Co., Ltd. | Electronic device, semiconductor device and manufacturing method thereof |
| JP4636921B2 (ja) * | 2005-03-30 | 2011-02-23 | セイコーエプソン株式会社 | 表示装置の製造方法、表示装置および電子機器 |
| JP4743393B2 (ja) * | 2005-06-27 | 2011-08-10 | セイコーエプソン株式会社 | 液体噴射ヘッド及び液体噴射装置 |
| JP2007076156A (ja) * | 2005-09-14 | 2007-03-29 | Brother Ind Ltd | プリンタ |
| US7756600B2 (en) | 2005-09-22 | 2010-07-13 | Semiconductor Energy Laboratory Co., Ltd. | Method for manufacturing semiconductor device |
| ES2712479T3 (es) | 2005-10-31 | 2019-05-13 | Musashi Eng Inc | Dispositivo de aplicación de material líquido |
| JP2007152339A (ja) * | 2005-11-11 | 2007-06-21 | Seiko Epson Corp | 吐出方法およびカラーフィルタの製造方法、電気光学装置および電子機器 |
| KR101229280B1 (ko) * | 2005-12-28 | 2013-02-04 | 삼성디스플레이 주식회사 | 표시 기판과, 이의 제조 방법 및 이를 구비한 표시 패널 |
| KR100906171B1 (ko) * | 2006-03-24 | 2009-07-03 | 어플라이드 머티어리얼스, 인코포레이티드 | 복수 세트의 프린트 헤드를 이용한 잉크젯 프린팅 방법 및장치 |
| KR101184069B1 (ko) * | 2006-03-29 | 2012-09-19 | 엘지디스플레이 주식회사 | 폴리이미드막 도포 장치 및 그 방법 |
| KR100797093B1 (ko) * | 2006-07-07 | 2008-01-22 | 한국기계연구원 | 나노 소자 구조물 및 이의 제조 방법 |
| JP5085965B2 (ja) * | 2007-03-30 | 2012-11-28 | 富士フイルム株式会社 | 樹脂膜形成方法、樹脂膜形成装置、及び電子回路基板製造方法 |
| US8551556B2 (en) * | 2007-11-20 | 2013-10-08 | Palo Alto Research Center Incorporated | Method for obtaining controlled sidewall profile in print-patterned structures |
| JP2010040238A (ja) * | 2008-08-01 | 2010-02-18 | Panasonic Corp | プラズマディスプレイパネルの製造方法 |
| CN102484944B (zh) * | 2009-09-03 | 2015-05-20 | 应用材料公司 | 用于印刷电子组件的印刷方法及相关控制装置 |
| IT1398428B1 (it) * | 2009-09-03 | 2013-02-22 | Applied Materials Inc | Procedimento di controllo multiplo per la stampa di uno schema multistrato e relativo impianto |
| US8669644B2 (en) * | 2009-10-07 | 2014-03-11 | Texas Instruments Incorporated | Hydrogen passivation of integrated circuits |
| JP5919630B2 (ja) * | 2010-07-30 | 2016-05-18 | 株式会社リコー | 薄膜形成装置、薄膜形成方法、圧電素子の形成方法、及び液滴吐出ヘッドの製造方法 |
| EP2428994A1 (en) | 2010-09-10 | 2012-03-14 | Applied Materials, Inc. | Method and system for depositing a thin-film transistor |
| DE102011100554A1 (de) * | 2010-12-21 | 2012-06-21 | Jörg R. Bauer | Verfahren und Vorrichtung zur digitalen Herstellung einer Ummantelung einer Funktionsschicht auf einer Substratoberfläche |
| JP5675393B2 (ja) * | 2011-01-31 | 2015-02-25 | 武蔵エンジニアリング株式会社 | 動作プログラムの自動生成プログラムおよび装置 |
| JP5726804B2 (ja) * | 2012-04-19 | 2015-06-03 | 株式会社東芝 | 表示パネル及び表示装置 |
| WO2013173401A1 (en) * | 2012-05-16 | 2013-11-21 | U.S. Coatings Ip Co. Llc | Process for measuring liquid property and use thereof |
| US20130323434A1 (en) * | 2012-05-29 | 2013-12-05 | King Abdullah University Of Science And Technology | Inkjet printing with in situ fast annealing for patterned multilayer deposition |
| JP6011962B2 (ja) * | 2012-08-30 | 2016-10-25 | 国立研究開発法人産業技術総合研究所 | パターン印刷装置、パターン印刷方法、および試験装置 |
| US9442369B1 (en) * | 2013-02-15 | 2016-09-13 | Kla-Tencor Corporation | Method and apparatus for lithographic mask production |
| US11267012B2 (en) | 2014-06-25 | 2022-03-08 | Universal Display Corporation | Spatial control of vapor condensation using convection |
| US11220737B2 (en) * | 2014-06-25 | 2022-01-11 | Universal Display Corporation | Systems and methods of modulating flow during vapor jet deposition of organic materials |
| EP2960059B1 (en) | 2014-06-25 | 2018-10-24 | Universal Display Corporation | Systems and methods of modulating flow during vapor jet deposition of organic materials |
| US10566534B2 (en) | 2015-10-12 | 2020-02-18 | Universal Display Corporation | Apparatus and method to deliver organic material via organic vapor-jet printing (OVJP) |
| CN114223052A (zh) * | 2019-08-13 | 2022-03-22 | 科迪华公司 | 用于干燥沉积在用于电子装置制造的基板上的材料的系统、装置和方法 |
| KR102457107B1 (ko) * | 2021-01-26 | 2022-10-20 | 재단법인 오송첨단의료산업진흥재단 | 구조물 패키징을 위한 패키징 시스템 및 이를 이용한 구조물 패키징 방법 |
| CN114683729B (zh) * | 2022-06-01 | 2022-08-26 | 芯体素(杭州)科技发展有限公司 | 一种Mini-LED背光板反射层的打印方法及装置 |
| EP4599945A4 (en) * | 2023-06-30 | 2025-12-31 | Musashi Eng Inc | LIQUID COATING METHOD AND LIQUID COATING DEVICE |
Family Cites Families (36)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4435674A (en) * | 1981-10-05 | 1984-03-06 | The Gerber Scientific Instrument Company | Method and apparatus for generating a verified plot |
| US5132248A (en) * | 1988-05-31 | 1992-07-21 | The United States Of America As Represented By The United States Department Of Energy | Direct write with microelectronic circuit fabrication |
| JP2574963B2 (ja) * | 1992-01-08 | 1997-01-22 | 日立テクノエンジニアリング株式会社 | ペースト塗布機 |
| US5412410A (en) | 1993-01-04 | 1995-05-02 | Xerox Corporation | Ink jet printhead for continuous tone and text printing |
| US6164746A (en) * | 1993-09-24 | 2000-12-26 | Canon Kabushiki Kaisha | Ink-jet printer method and apparatus, color filter, display device, apparatus having display device, ink-jet head unit adjusting device and method, and ink-jet head unit |
| JP3424048B2 (ja) * | 1994-01-18 | 2003-07-07 | ノードソン株式会社 | 被塗物にコーティング剤を塗布する方法 |
| JPH08229478A (ja) * | 1995-02-23 | 1996-09-10 | Nec Eng Ltd | ペースト塗布装置 |
| JP3113212B2 (ja) * | 1996-05-09 | 2000-11-27 | 富士通株式会社 | プラズマディスプレイパネルの蛍光体層形成装置および蛍光体塗布方法 |
| DE69840914D1 (de) * | 1997-10-14 | 2009-07-30 | Patterning Technologies Ltd | Methode zur Herstellung eines elektrischen Kondensators |
| US6063339A (en) * | 1998-01-09 | 2000-05-16 | Cartesian Technologies, Inc. | Method and apparatus for high-speed dot array dispensing |
| US20020159919A1 (en) * | 1998-01-09 | 2002-10-31 | Carl Churchill | Method and apparatus for high-speed microfluidic dispensing using text file control |
| JPH11340129A (ja) * | 1998-05-28 | 1999-12-10 | Seiko Epson Corp | パターン製造方法およびパターン製造装置 |
| JP3504863B2 (ja) * | 1998-08-13 | 2004-03-08 | 東京エレクトロン株式会社 | レジスト塗布方法及び基板処理装置 |
| JP4477726B2 (ja) * | 1999-12-09 | 2010-06-09 | シャープ株式会社 | 有機led素子の製造方法 |
| JP2001260481A (ja) * | 2000-01-12 | 2001-09-25 | Fuji Photo Film Co Ltd | 記録装置 |
| JP4182657B2 (ja) * | 2000-10-17 | 2008-11-19 | セイコーエプソン株式会社 | インクジェット式記録装置 |
| JP2002134024A (ja) * | 2000-10-27 | 2002-05-10 | Toray Ind Inc | 平面ディスプレイパネルの製造方法 |
| JP4618750B2 (ja) * | 2000-11-30 | 2011-01-26 | リソテック ジャパン株式会社 | 上面ベークアンドクーリング装置 |
| JP4207778B2 (ja) * | 2001-06-01 | 2009-01-14 | セイコーエプソン株式会社 | カラーフィルタ、表示装置及び電子機器、及びこれらの製造方法、並びに表示装置の製造装置 |
| JP3619791B2 (ja) * | 2001-06-26 | 2005-02-16 | 株式会社 日立インダストリイズ | ペースト塗布機 |
| JP3976167B2 (ja) * | 2001-08-17 | 2007-09-12 | 大日本スクリーン製造株式会社 | 基板処理装置 |
| GB2379413A (en) * | 2001-09-10 | 2003-03-12 | Seiko Epson Corp | Printhead alignment method |
| JP2003158066A (ja) * | 2001-11-22 | 2003-05-30 | Seiko Epson Corp | レジスト除去装置及びレジスト除去方法 |
| JP2003159786A (ja) * | 2001-11-28 | 2003-06-03 | Seiko Epson Corp | 吐出方法およびその装置、電気光学装置、その製造方法およびその製造装置、カラーフィルタ、その製造方法およびその製造装置、ならびに基材を有するデバイス、その製造方法およびその製造装置 |
| JP4387111B2 (ja) * | 2002-01-24 | 2009-12-16 | 株式会社半導体エネルギー研究所 | 半導体装置の作製方法 |
| JP2003251245A (ja) * | 2002-03-06 | 2003-09-09 | Ricoh Co Ltd | 機能性素子基板、画像表示装置およびその製造装置 |
| JP2003260396A (ja) * | 2002-03-12 | 2003-09-16 | Seiko Epson Corp | 液状体塗布方法、液滴吐出装置、及び製膜装置 |
| JP2003282561A (ja) * | 2002-03-26 | 2003-10-03 | Seiko Epson Corp | デバイスの製造方法及びデバイス製造装置 |
| JP3894548B2 (ja) * | 2002-04-23 | 2007-03-22 | キヤノン株式会社 | 液体吐出ヘッドならびに前記液体吐出ヘッドを用いたヘッドカートリッジおよび画像形成装置 |
| US6702419B2 (en) * | 2002-05-03 | 2004-03-09 | Osram Opto Semiconductors Gmbh | System and method for delivering droplets |
| US6641251B1 (en) * | 2002-07-15 | 2003-11-04 | Hewlett-Packard Development Company, Lp. | Printing system for printing in scan and print media feed directions and method of performing a printing operation |
| US6890050B2 (en) * | 2002-08-20 | 2005-05-10 | Palo Alto Research Center Incorporated | Method for the printing of homogeneous electronic material with a multi-ejector print head |
| US20040077112A1 (en) * | 2002-10-18 | 2004-04-22 | Elliott Stephen J. | Conductive component manufacturing process employing an ink jet printer |
| US7183146B2 (en) * | 2003-01-17 | 2007-02-27 | Semiconductor Energy Laboratory Co., Ltd. | Method of manufacturing semiconductor device |
| US7061570B2 (en) * | 2003-03-26 | 2006-06-13 | Semiconductor Energy Laboratory Co., Ltd. | Display device and manufacturing method thereof |
| US7393081B2 (en) | 2003-06-30 | 2008-07-01 | Semiconductor Energy Laboratory Co., Ltd. | Droplet jetting device and method of manufacturing pattern |
-
2003
- 2003-10-28 JP JP2003405202A patent/JP4689159B2/ja not_active Expired - Fee Related
-
2004
- 2004-10-21 US US10/970,712 patent/US20050122351A1/en not_active Abandoned
-
2011
- 2011-03-16 US US13/049,078 patent/US8322847B2/en not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101477376B1 (ko) * | 2013-03-14 | 2014-12-29 | 삼성전기주식회사 | 유체 토출 장치 |
Also Published As
| Publication number | Publication date |
|---|---|
| US20110164083A1 (en) | 2011-07-07 |
| US8322847B2 (en) | 2012-12-04 |
| US20050122351A1 (en) | 2005-06-09 |
| JP2005131621A (ja) | 2005-05-26 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP4689159B2 (ja) | 液滴吐出システム | |
| KR101111995B1 (ko) | 박막 트랜지스터, 디스플레이 장치 및 액정 디스플레이장치, 그리고 그 제조방법 | |
| JP4667012B2 (ja) | 半導体素子及び液晶表示装置の作製方法 | |
| TWI392094B (zh) | 發光顯示裝置,製造發光顯示裝置之方法及電視機 | |
| CN101101872A (zh) | 显示装置的制造方法 | |
| CN101162703A (zh) | 显示装置的制造方法以及蚀刻设备 | |
| JP4549751B2 (ja) | 半導体装置の作製方法 | |
| JP4801347B2 (ja) | 表示装置 | |
| JP4667051B2 (ja) | 半導体装置の作製方法 | |
| JP2004241770A (ja) | 導電層の作製方法及び半導体装置の作製方法 | |
| JP4932150B2 (ja) | 半導体素子の作製方法 | |
| US7459379B2 (en) | Method for manufacturing semiconductor device | |
| JP4712361B2 (ja) | 薄膜トランジスタの作製方法 | |
| JP4583797B2 (ja) | 半導体装置の作製方法 | |
| JP2005159328A (ja) | 配線の作製方法、薄膜トランジスタの作製方法、及び液滴吐出方法 | |
| JP4712352B2 (ja) | 発光装置の作製方法 | |
| CN100592478C (zh) | 薄膜晶体管、显示器件和液晶显示器件、及其制造方法 | |
| JP4877868B2 (ja) | 表示装置の作製方法 | |
| JP4963156B2 (ja) | 半導体装置の作製方法 | |
| JP4522904B2 (ja) | 半導体装置の作製方法 | |
| JP4712332B2 (ja) | 薄膜トランジスタの作製方法 | |
| JP2005167225A (ja) | 発光装置及びその作製方法 | |
| JP2005311334A (ja) | 半導体装置の作製方法 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20061027 |
|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20061027 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20061107 |
|
| A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20090821 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20090825 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20091015 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20100518 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20100607 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20101207 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20110120 |
|
| TRDD | Decision of grant or rejection written | ||
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20110208 |
|
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 |
|
| A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20110216 |
|
| R150 | Certificate of patent or registration of utility model |
Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20140225 Year of fee payment: 3 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20140225 Year of fee payment: 3 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| LAPS | Cancellation because of no payment of annual fees |