JP4648408B2 - ナノ加工のためのチャッキング・システム - Google Patents

ナノ加工のためのチャッキング・システム Download PDF

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Publication number
JP4648408B2
JP4648408B2 JP2007553121A JP2007553121A JP4648408B2 JP 4648408 B2 JP4648408 B2 JP 4648408B2 JP 2007553121 A JP2007553121 A JP 2007553121A JP 2007553121 A JP2007553121 A JP 2007553121A JP 4648408 B2 JP4648408 B2 JP 4648408B2
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Prior art keywords
template
force
separation
substrate
chamber
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JP2007553121A
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English (en)
Japanese (ja)
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JP2008529826A (ja
JP2008529826A5 (enExample
Inventor
バブス，ダニエル・エイ
チョイ，ビュン・ジン
チェララ，アンシュマン
Original Assignee
モレキュラー・インプリンツ・インコーポレーテッド
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Priority claimed from US11/047,428 external-priority patent/US7798801B2/en
Application filed by モレキュラー・インプリンツ・インコーポレーテッド filed Critical モレキュラー・インプリンツ・インコーポレーテッド
Priority claimed from PCT/US2006/001145 external-priority patent/WO2006083518A2/en
Publication of JP2008529826A publication Critical patent/JP2008529826A/ja
Publication of JP2008529826A5 publication Critical patent/JP2008529826A5/ja
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Publication of JP4648408B2 publication Critical patent/JP4648408B2/ja
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6831—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using electrostatic chucks
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6838—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49764—Method of mechanical manufacture with testing or indicating
    • Y10T29/49778—Method of mechanical manufacture with testing or indicating with aligning, guiding, or instruction
    • Y10T29/4978—Assisting assembly or disassembly
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49998—Work holding

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Moulds For Moulding Plastics Or The Like (AREA)
  • Micromachines (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Manipulator (AREA)
JP2007553121A 2005-01-31 2006-01-12 ナノ加工のためのチャッキング・システム Active JP4648408B2 (ja)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US11/047,428 US7798801B2 (en) 2005-01-31 2005-01-31 Chucking system for nano-manufacturing
US11/047,499 US7636999B2 (en) 2005-01-31 2005-01-31 Method of retaining a substrate to a wafer chuck
US11/108,208 US7635445B2 (en) 2005-01-31 2005-04-18 Method of separating a mold from a solidified layer disposed on a substrate
PCT/US2006/001145 WO2006083518A2 (en) 2005-01-31 2006-01-12 Chucking system for nano-manufacturing

Publications (3)

Publication Number Publication Date
JP2008529826A JP2008529826A (ja) 2008-08-07
JP2008529826A5 JP2008529826A5 (enExample) 2010-08-19
JP4648408B2 true JP4648408B2 (ja) 2011-03-09

Family

ID=39730623

Family Applications (3)

Application Number Title Priority Date Filing Date
JP2007553121A Active JP4648408B2 (ja) 2005-01-31 2006-01-12 ナノ加工のためのチャッキング・システム
JP2007553123A Active JP5247153B2 (ja) 2005-01-31 2006-01-12 基板上に配置された固化層からモールドを分離させる方法
JP2007553122A Pending JP2008532263A (ja) 2005-01-31 2006-01-12 基板をウェハ・チャックに保持する方法

Family Applications After (2)

Application Number Title Priority Date Filing Date
JP2007553123A Active JP5247153B2 (ja) 2005-01-31 2006-01-12 基板上に配置された固化層からモールドを分離させる方法
JP2007553122A Pending JP2008532263A (ja) 2005-01-31 2006-01-12 基板をウェハ・チャックに保持する方法

Country Status (4)

Country Link
US (1) US7636999B2 (enExample)
JP (3) JP4648408B2 (enExample)
SG (2) SG158917A1 (enExample)
TW (1) TWI327351B (enExample)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8893620B2 (en) 2011-11-30 2014-11-25 SCREEN Holdings Co., Ltd. Printing apparatus and printing method with measurement of a carrier thickness
US8955432B2 (en) 2011-11-30 2015-02-17 SCREEN Holdings Co., Ltd. Pattern forming apparatus and pattern forming method
US11422462B2 (en) 2019-06-07 2022-08-23 Canon Kabushiki Kaisha Forming apparatus that controls chucking force

Families Citing this family (68)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7162035B1 (en) 2000-05-24 2007-01-09 Tracer Detection Technology Corp. Authentication method and system
CN1262883C (zh) 2000-07-17 2006-07-05 得克萨斯州大学系统董事会 影印用于平版印刷工艺中的自动化液体分配的方法和系统
US20080160129A1 (en) * 2006-05-11 2008-07-03 Molecular Imprints, Inc. Template Having a Varying Thickness to Facilitate Expelling a Gas Positioned Between a Substrate and the Template
US7641840B2 (en) * 2002-11-13 2010-01-05 Molecular Imprints, Inc. Method for expelling gas positioned between a substrate and a mold
FR2869601B1 (fr) * 2004-04-28 2006-06-09 Commissariat Energie Atomique Moule pour la nano-impression, procede de fabrication d'un tel moule et utilisation d'un tel moule
WO2005119802A2 (en) * 2004-05-28 2005-12-15 Board Of Regents, The University Of Texas System Adaptive shape substrate support system and method
US8334967B2 (en) * 2004-05-28 2012-12-18 Board Of Regents, The University Of Texas System Substrate support system having a plurality of contact lands
US20060177532A1 (en) * 2005-02-04 2006-08-10 Molecular Imprints, Inc. Imprint lithography method to control extrusion of a liquid from a desired region on a substrate
US7635263B2 (en) 2005-01-31 2009-12-22 Molecular Imprints, Inc. Chucking system comprising an array of fluid chambers
US7798801B2 (en) * 2005-01-31 2010-09-21 Molecular Imprints, Inc. Chucking system for nano-manufacturing
US20060177535A1 (en) * 2005-02-04 2006-08-10 Molecular Imprints, Inc. Imprint lithography template to facilitate control of liquid movement
JP2007134368A (ja) * 2005-11-08 2007-05-31 Nikon Corp パターン転写装置、露光装置及びパターン転写方法
EP1957249B1 (en) 2005-12-08 2014-11-12 Canon Nanotechnologies, Inc. Method and system for double-sided patterning of substrates
US7670530B2 (en) 2006-01-20 2010-03-02 Molecular Imprints, Inc. Patterning substrates employing multiple chucks
KR100689843B1 (ko) * 2006-01-03 2007-03-08 삼성전자주식회사 웨이퍼 스테이지 및 이를 이용한 웨이퍼 안착방법
JP2007250685A (ja) * 2006-03-14 2007-09-27 Engineering System Kk ナノインプリント装置の型押し機構
US20070231422A1 (en) * 2006-04-03 2007-10-04 Molecular Imprints, Inc. System to vary dimensions of a thin template
JP4814682B2 (ja) * 2006-04-18 2011-11-16 株式会社日立ハイテクノロジーズ 微細構造パターンの転写方法及び転写装置
JP4854383B2 (ja) * 2006-05-15 2012-01-18 アピックヤマダ株式会社 インプリント方法およびナノ・インプリント装置
US8215946B2 (en) * 2006-05-18 2012-07-10 Molecular Imprints, Inc. Imprint lithography system and method
US8377361B2 (en) * 2006-11-28 2013-02-19 Wei Zhang Imprint lithography with improved substrate/mold separation
TW200902332A (en) * 2007-03-26 2009-01-16 Hitachi Maxell Imprinting jig and imprinting apparatus
DE102007032608B4 (de) 2007-07-11 2009-05-07 Schenck Rotec Gmbh Verfahren und Vorrichtung zum Zentrieren und Spannen eines Werkstücks in einer Auswuchtmaschine
JP5069979B2 (ja) * 2007-09-03 2012-11-07 東芝機械株式会社 離型装置、給排システムおよび離型方法
US8814556B2 (en) * 2007-09-28 2014-08-26 Toray Industries, Inc Method and device for manufacturing sheet having fine shape transferred thereon
US8945444B2 (en) * 2007-12-04 2015-02-03 Canon Nanotechnologies, Inc. High throughput imprint based on contact line motion tracking control
US7995196B1 (en) 2008-04-23 2011-08-09 Tracer Detection Technology Corp. Authentication method and system
JP5517423B2 (ja) * 2008-08-26 2014-06-11 キヤノン株式会社 インプリント装置及びインプリント方法
NL2003380A (en) * 2008-10-17 2010-04-20 Asml Netherlands Bv Imprint lithography apparatus and method.
US8652393B2 (en) 2008-10-24 2014-02-18 Molecular Imprints, Inc. Strain and kinetics control during separation phase of imprint process
US8309008B2 (en) * 2008-10-30 2012-11-13 Molecular Imprints, Inc. Separation in an imprint lithography process
JP5288191B2 (ja) * 2009-03-17 2013-09-11 大日本印刷株式会社 基板固定装置
JP2012522327A (ja) 2009-03-23 2012-09-20 インテバック・インコーポレイテッド パターニングされた媒体の溝と島の比率の最適化のための方法
JP5363165B2 (ja) * 2009-03-31 2013-12-11 富士フイルム株式会社 微細凹凸パターンの形成方法及び形成装置
JP5377053B2 (ja) * 2009-04-17 2013-12-25 株式会社東芝 テンプレート及びその製造方法、並びにパターン形成方法
EP3293573A1 (en) * 2009-08-26 2018-03-14 Molecular Imprints, Inc. Functional nanoparticles
US8802747B2 (en) * 2009-08-26 2014-08-12 Molecular Imprints, Inc. Nanoimprint lithography processes for forming nanoparticles
US20110084417A1 (en) * 2009-10-08 2011-04-14 Molecular Imprints, Inc. Large area linear array nanoimprinting
US8747092B2 (en) 2010-01-22 2014-06-10 Nanonex Corporation Fast nanoimprinting apparatus using deformale mold
JP5438578B2 (ja) * 2010-03-29 2014-03-12 富士フイルム株式会社 微細凹凸パターンの形成方法及び形成装置
WO2011139782A1 (en) * 2010-04-27 2011-11-10 Molecular Imprints, Inc. Separation control substrate/template for nanoimprint lithography
WO2012061753A2 (en) 2010-11-05 2012-05-10 Molecular Imprints, Inc. Nanoimprint lithography formation of functional nanoparticles using dual release layers
DE102010063887B4 (de) * 2010-12-22 2012-07-19 BSH Bosch und Siemens Hausgeräte GmbH Verfahren zum Herstellen eines pyrolysetauglichen Bauteils eines Gargeräts sowie pyrolysetaugliches Bauteil für ein Gargerät
JP5875250B2 (ja) * 2011-04-28 2016-03-02 キヤノン株式会社 インプリント装置、インプリント方法及びデバイス製造方法
JP2014528177A (ja) * 2011-09-23 2014-10-23 １３６６ テクノロジーズ インク． 基板移送、ツール押下、ツール伸張、ツール撤退など、熱流動性材料コーティングにおいてツールによってパターンが形成される基板を取り扱い、加熱し、冷却する方法および装置
DE102012111114B4 (de) * 2012-11-19 2018-10-04 Ev Group E. Thallner Gmbh Halbleiterbearbeitungsvorrichtung und -verfahren
US10108086B2 (en) 2013-03-15 2018-10-23 Nanonex Corporation System and methods of mold/substrate separation for imprint lithography
WO2014145360A1 (en) 2013-03-15 2014-09-18 Nanonex Corporation Imprint lithography system and method for manufacturing
JP6242099B2 (ja) * 2013-07-23 2017-12-06 キヤノン株式会社 インプリント方法、インプリント装置およびデバイス製造方法
US9771998B1 (en) 2014-02-13 2017-09-26 Hrl Laboratories, Llc Hierarchical branched micro-truss structure and methods of manufacturing the same
JP6333031B2 (ja) * 2014-04-09 2018-05-30 キヤノン株式会社 インプリント装置および物品の製造方法
US9733429B2 (en) 2014-08-18 2017-08-15 Hrl Laboratories, Llc Stacked microlattice materials and fabrication processes
CN111496379B (zh) * 2014-08-19 2022-08-26 亮锐控股有限公司 用于减少在管芯级激光剥离期间所受机械损伤的蓝宝石收集器
JP6553926B2 (ja) * 2015-04-09 2019-07-31 キヤノン株式会社 インプリント装置、インプリント方法、および物品の製造方法
EP3295479B1 (en) * 2015-05-13 2018-09-26 Lumileds Holding B.V. Sapphire collector for reducing mechanical damage during die level laser lift-off
JP6774178B2 (ja) * 2015-11-16 2020-10-21 キヤノン株式会社 基板を処理する装置、及び物品の製造方法
US11104057B2 (en) * 2015-12-11 2021-08-31 Canon Kabushiki Kaisha Imprint apparatus and method of imprinting a partial field
JP6700936B2 (ja) * 2016-04-25 2020-05-27 キヤノン株式会社 インプリント装置、インプリント方法、および物品の製造方法
JP6762853B2 (ja) * 2016-11-11 2020-09-30 キヤノン株式会社 装置、方法、及び物品製造方法
TWI620351B (zh) * 2017-04-28 2018-04-01 光寶光電（常州）有限公司 紫外光發光二極體封裝結構、紫外光發光單元、及紫外光發光單元的製造方法
JP6995530B2 (ja) * 2017-08-29 2022-01-14 キヤノン株式会社 型を用いて基板上の組成物を成形する成形装置及び物品の製造方法
WO2019164640A1 (en) * 2018-02-20 2019-08-29 Applied Materials, Inc. Patterned vacuum chuck for double-sided processing
JP7071231B2 (ja) * 2018-06-28 2022-05-18 キヤノン株式会社 平坦化装置、平坦化方法、物品製造方法及び液滴配置パターンデータの作成方法
JP7218114B2 (ja) * 2018-07-12 2023-02-06 キヤノン株式会社 平坦化装置、平坦化方法及び物品の製造方法
WO2021110237A1 (de) * 2019-12-02 2021-06-10 Ev Group E. Thallner Gmbh Verfahren und vorrichtung zur ablösung eines stempels
JP7507641B2 (ja) 2020-09-08 2024-06-28 キヤノン株式会社 成形装置及び物品の製造方法
JP7710350B2 (ja) * 2021-09-28 2025-07-18 キヤノン株式会社 インプリント方法、インプリント装置、および物品の製造方法
CN118475718A (zh) * 2021-12-11 2024-08-09 朗姆研究公司 用于高弯曲衬底的浸泡和esc夹持序列

Family Cites Families (164)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL7710555A (nl) * 1977-09-28 1979-03-30 Philips Nv Werkwijze en inrichting voor het vervaardigen van informatie bevattende platen.
JPS5732629Y2 (enExample) 1978-09-20 1982-07-17
DE3110341C2 (de) * 1980-03-19 1983-11-17 Hitachi, Ltd., Tokyo Verfahren und Vorrichtung zum Ausrichten eines dünnen Substrats in der Bildebene eines Kopiergerätes
JPS57153434A (en) 1981-03-17 1982-09-22 Nec Corp Manufacturing device for semiconductor
FR2513934A1 (fr) * 1981-10-06 1983-04-08 Thomson Csf Procede de demoulage de disque porteur d'informations et dispositif mettant en oeuvre un tel procede
JPS5884808A (ja) 1981-11-13 1983-05-21 Nippon Synthetic Chem Ind Co Ltd:The 樹脂状物質の製造法
US4551192A (en) 1983-06-30 1985-11-05 International Business Machines Corporation Electrostatic or vacuum pinchuck formed with microcircuit lithography
US4506184A (en) * 1984-01-10 1985-03-19 Varian Associates, Inc. Deformable chuck driven by piezoelectric means
JPS60127935U (ja) 1984-02-03 1985-08-28 三菱電機株式会社 サ−マルヘツド
US4512848A (en) * 1984-02-06 1985-04-23 Exxon Research And Engineering Co. Procedure for fabrication of microstructures over large areas using physical replication
US4559717A (en) 1984-02-21 1985-12-24 The United States Of America As Represented By The Secretary Of Commerce Flexure hinge
WO1987002935A1 (en) 1985-11-18 1987-05-21 Eastman Kodak Company Process for making optical recording media
KR900004269B1 (ko) * 1986-06-11 1990-06-18 가부시기가이샤 도시바 제 1물체와 제 2 물체와의 위치 맞추는 방법 및 장치
FR2604553A1 (fr) 1986-09-29 1988-04-01 Rhone Poulenc Chimie Substrat polymere rigide pour disque optique et les disques optiques obtenus a partir dudit substrat
JPS63131352A (ja) * 1986-11-21 1988-06-03 Canon Inc 光学的記録媒体用基板の製造方法
US4731155A (en) * 1987-04-15 1988-03-15 General Electric Company Process for forming a lithographic mask
US5028361A (en) * 1987-11-09 1991-07-02 Takeo Fujimoto Method for molding a photosensitive composition
US5028366A (en) * 1988-01-12 1991-07-02 Air Products And Chemicals, Inc. Water based mold release compositions for making molded polyurethane foam
JPH01196749A (ja) 1988-01-30 1989-08-08 Hoya Corp 光情報記録媒体用基板の製造方法
JP2546350B2 (ja) 1988-09-09 1996-10-23 キヤノン株式会社 位置合わせ装置
JPH0292603A (ja) 1988-09-30 1990-04-03 Hoya Corp 案内溝付き情報記録用基板の製造方法
JPH02166645A (ja) * 1988-12-21 1990-06-27 Canon Inc 光学的記録媒体用基板の製造方法
JPH02192045A (ja) 1989-01-20 1990-07-27 Fujitsu Ltd 光ディスク基板の製造方法
US5110514A (en) * 1989-05-01 1992-05-05 Soane Technologies, Inc. Controlled casting of a shrinkable material
US4932358A (en) * 1989-05-18 1990-06-12 Genus, Inc. Perimeter wafer seal
DE4031637C2 (de) 1989-10-06 1997-04-10 Toshiba Kawasaki Kk Anordnung zum Messen einer Verschiebung zwischen zwei Objekten
DE4029912A1 (de) * 1990-09-21 1992-03-26 Philips Patentverwaltung Verfahren zur bildung mindestens eines grabens in einer substratschicht
US5331371A (en) * 1990-09-26 1994-07-19 Canon Kabushiki Kaisha Alignment and exposure method
JPH04148549A (ja) 1990-10-12 1992-05-21 Fujitsu Ltd 半導体装置の評価方法
US5362940A (en) 1990-11-09 1994-11-08 Litel Instruments Use of Fresnel zone plates for material processing
JPH0521584A (ja) * 1991-07-16 1993-01-29 Nikon Corp 保持装置
JPH0580530A (ja) 1991-09-24 1993-04-02 Hitachi Ltd 薄膜パターン製造方法
JP2867194B2 (ja) 1992-02-05 1999-03-08 東京エレクトロン株式会社 処理装置及び処理方法
US5545367A (en) * 1992-04-15 1996-08-13 Soane Technologies, Inc. Rapid prototype three dimensional stereolithography
US5371822A (en) 1992-06-09 1994-12-06 Digital Equipment Corporation Method of packaging and assembling opto-electronic integrated circuits
US5601641A (en) * 1992-07-21 1997-02-11 Tse Industries, Inc. Mold release composition with polybutadiene and method of coating a mold core
JPH06244269A (ja) * 1992-09-07 1994-09-02 Mitsubishi Electric Corp 半導体製造装置並びに半導体製造装置におけるウエハ真空チャック装置及びガスクリーニング方法及び窒化膜形成方法
DE69405451T2 (de) * 1993-03-16 1998-03-12 Koninkl Philips Electronics Nv Verfahren und Vorrichtung zur Herstellung eines strukturierten Reliefbildes aus vernetztem Photoresist auf einer flachen Substratoberfläche
JP2837063B2 (ja) * 1993-06-04 1998-12-14 シャープ株式会社 レジストパターンの形成方法
US6776094B1 (en) * 1993-10-04 2004-08-17 President & Fellows Of Harvard College Kit For Microcontact Printing
US5776748A (en) * 1993-10-04 1998-07-07 President And Fellows Of Harvard College Method of formation of microstamped patterns on plates for adhesion of cells and other biological materials, devices and uses therefor
US5512131A (en) * 1993-10-04 1996-04-30 President And Fellows Of Harvard College Formation of microstamped patterns on surfaces and derivative articles
DE4408537A1 (de) * 1994-03-14 1995-09-21 Leybold Ag Vorrichtung für den Transport von Substraten
US5573877A (en) * 1994-03-15 1996-11-12 Matsushita Electric Industrial Co., Ltd. Exposure method and exposure apparatus
US5515167A (en) * 1994-09-13 1996-05-07 Hughes Aircraft Company Transparent optical chuck incorporating optical monitoring
US5563684A (en) 1994-11-30 1996-10-08 Sgs-Thomson Microelectronics, Inc. Adaptive wafer modulator for placing a selected pattern on a semiconductor wafer
US5849209A (en) 1995-03-31 1998-12-15 Johnson & Johnson Vision Products, Inc. Mold material made with additives
US6342389B1 (en) 1995-04-10 2002-01-29 Roger S. Cubicciotti Modified phycobilisomes and uses therefore
GB9509487D0 (en) * 1995-05-10 1995-07-05 Ici Plc Micro relief element & preparation thereof
US5820769A (en) 1995-05-24 1998-10-13 Regents Of The University Of Minnesota Method for making magnetic storage having discrete elements with quantized magnetic moments
JP2976862B2 (ja) * 1995-09-28 1999-11-10 日本電気株式会社 研磨装置
US5849222A (en) 1995-09-29 1998-12-15 Johnson & Johnson Vision Products, Inc. Method for reducing lens hole defects in production of contact lens blanks
US20040137734A1 (en) * 1995-11-15 2004-07-15 Princeton University Compositions and processes for nanoimprinting
US7758794B2 (en) * 2001-10-29 2010-07-20 Princeton University Method of making an article comprising nanoscale patterns with reduced edge roughness
US5772905A (en) * 1995-11-15 1998-06-30 Regents Of The University Of Minnesota Nanoimprint lithography
US6309580B1 (en) 1995-11-15 2001-10-30 Regents Of The University Of Minnesota Release surfaces, particularly for use in nanoimprint lithography
US20040036201A1 (en) * 2000-07-18 2004-02-26 Princeton University Methods and apparatus of field-induced pressure imprint lithography
US20030080471A1 (en) * 2001-10-29 2003-05-01 Chou Stephen Y. Lithographic method for molding pattern with nanoscale features
US6518189B1 (en) 1995-11-15 2003-02-11 Regents Of The University Of Minnesota Method and apparatus for high density nanostructures
US6482742B1 (en) 2000-07-18 2002-11-19 Stephen Y. Chou Fluid pressure imprint lithography
US5900062A (en) * 1995-12-28 1999-05-04 Applied Materials, Inc. Lift pin for dechucking substrates
US5923408A (en) * 1996-01-31 1999-07-13 Canon Kabushiki Kaisha Substrate holding system and exposure apparatus using the same
US5669303A (en) 1996-03-04 1997-09-23 Motorola Apparatus and method for stamping a surface
US6355198B1 (en) * 1996-03-15 2002-03-12 President And Fellows Of Harvard College Method of forming articles including waveguides via capillary micromolding and microtransfer molding
US20030179354A1 (en) 1996-03-22 2003-09-25 Nikon Corporation Mask-holding apparatus for a light exposure apparatus and related scanning-exposure method
US5942443A (en) * 1996-06-28 1999-08-24 Caliper Technologies Corporation High throughput screening assay systems in microscale fluidic devices
US5888650A (en) * 1996-06-03 1999-03-30 Minnesota Mining And Manufacturing Company Temperature-responsive adhesive article
US6074827A (en) * 1996-07-30 2000-06-13 Aclara Biosciences, Inc. Microfluidic method for nucleic acid purification and processing
US6228539B1 (en) 1996-09-18 2001-05-08 Numerical Technologies, Inc. Phase shifting circuit manufacture method and apparatus
US5858580A (en) * 1997-09-17 1999-01-12 Numerical Technologies, Inc. Phase shifting circuit manufacture method and apparatus
JPH10172897A (ja) 1996-12-05 1998-06-26 Nikon Corp 基板アダプタ，基板保持装置及び基板保持方法
US5948470A (en) 1997-04-28 1999-09-07 Harrison; Christopher Method of nanoscale patterning and products made thereby
US5812629A (en) 1997-04-30 1998-09-22 Clauser; John F. Ultrahigh resolution interferometric x-ray imaging
US5996415A (en) * 1997-04-30 1999-12-07 Sensys Instruments Corporation Apparatus and method for characterizing semiconductor wafers during processing
AU3818997A (en) 1997-07-25 1999-02-16 Regents Of The University Of Minnesota Single-electron floating-gate mos memory
US5974150A (en) 1997-09-30 1999-10-26 Tracer Detection Technology Corp. System and method for authentication of goods
US6019166A (en) * 1997-12-30 2000-02-01 Intel Corporation Pickup chuck with an integral heatsink
US6198616B1 (en) * 1998-04-03 2001-03-06 Applied Materials, Inc. Method and apparatus for supplying a chucking voltage to an electrostatic chuck within a semiconductor wafer processing system
US6304424B1 (en) * 1998-04-03 2001-10-16 Applied Materials Inc. Method and apparatus for minimizing plasma destabilization within a semiconductor wafer processing system
JP3780700B2 (ja) 1998-05-26 2006-05-31 セイコーエプソン株式会社 パターン形成方法、パターン形成装置、パターン形成用版、パターン形成用版の製造方法、カラーフィルタの製造方法、導電膜の製造方法及び液晶パネルの製造方法
US6965506B2 (en) * 1998-09-30 2005-11-15 Lam Research Corporation System and method for dechucking a workpiece from an electrostatic chuck
AU1444800A (en) 1998-10-09 2000-05-01 Trustees Of Princeton University, The Microscale patterning and articles formed thereby
US6713238B1 (en) * 1998-10-09 2004-03-30 Stephen Y. Chou Microscale patterning and articles formed thereby
US6726195B1 (en) * 1998-10-13 2004-04-27 Dek International Gmbh Method for ensuring planarity when using a flexible, self conforming, workpiece support system
US6218316B1 (en) * 1998-10-22 2001-04-17 Micron Technology, Inc. Planarization of non-planar surfaces in device fabrication
JP4204128B2 (ja) * 1999-01-18 2009-01-07 東京応化工業株式会社 基板搬送装置及び基板搬送方法
US6274294B1 (en) * 1999-02-03 2001-08-14 Electroformed Stents, Inc. Cylindrical photolithography exposure process and apparatus
JP2000243806A (ja) * 1999-02-22 2000-09-08 Tamagawa Machinery Co Ltd ウエハの加熱処理装置
US6334960B1 (en) * 1999-03-11 2002-01-01 Board Of Regents, The University Of Texas System Step and flash imprint lithography
US6160430A (en) 1999-03-22 2000-12-12 Ati International Srl Powerup sequence artificial voltage supply circuit
US6305677B1 (en) 1999-03-30 2001-10-23 Lam Research Corporation Perimeter wafer lifting
US6220561B1 (en) * 1999-06-30 2001-04-24 Sandia Corporation Compound floating pivot micromechanisms
WO2001011431A2 (en) * 1999-08-06 2001-02-15 Applied Materials, Inc. Method and apparatus of holding semiconductor wafers for lithography and other wafer processes
JP2001127145A (ja) * 1999-08-19 2001-05-11 Canon Inc 基板吸着保持方法、基板吸着保持装置および該基板吸着保持装置を用いた露光装置ならびにデバイス製造方法
US6809802B1 (en) 1999-08-19 2004-10-26 Canon Kabushiki Kaisha Substrate attracting and holding system for use in exposure apparatus
JP4298078B2 (ja) * 1999-08-20 2009-07-15 キヤノン株式会社 基板吸着保持装置および該基板吸着保持装置を用いた露光装置ならびにデバイスの製造方法
US6589889B2 (en) * 1999-09-09 2003-07-08 Alliedsignal Inc. Contact planarization using nanoporous silica materials
US6512401B2 (en) 1999-09-10 2003-01-28 Intel Corporation Output buffer for high and low voltage bus
US6517995B1 (en) * 1999-09-14 2003-02-11 Massachusetts Institute Of Technology Fabrication of finely featured devices by liquid embossing
US6873087B1 (en) * 1999-10-29 2005-03-29 Board Of Regents, The University Of Texas System High precision orientation alignment and gap control stages for imprint lithography processes
WO2001047003A2 (en) 1999-12-23 2001-06-28 University Of Massachusetts Methods and apparatus for forming submicron patterns on films
US6498640B1 (en) 1999-12-30 2002-12-24 Koninklijke Philips Electronics N.V. Method to measure alignment using latent image grating structures
JP2001239487A (ja) * 2000-02-29 2001-09-04 Nippei Toyama Corp ウェーハの搬送装置における真空保持装置および真空保持解除方法
US6313567B1 (en) 2000-04-10 2001-11-06 Motorola, Inc. Lithography chuck having piezoelectric elements, and method
US7859519B2 (en) * 2000-05-01 2010-12-28 Tulbert David J Human-machine interface
JP4640876B2 (ja) * 2000-06-13 2011-03-02 株式会社アルバック 基板搬送装置
JP2001358056A (ja) * 2000-06-15 2001-12-26 Canon Inc 露光装置
EP2264522A3 (en) * 2000-07-16 2011-12-14 The Board of Regents of The University of Texas System Method of forming a pattern on a substrate
US7635262B2 (en) * 2000-07-18 2009-12-22 Princeton University Lithographic apparatus for fluid pressure imprint lithography
US7211214B2 (en) * 2000-07-18 2007-05-01 Princeton University Laser assisted direct imprint lithography
US20050037143A1 (en) * 2000-07-18 2005-02-17 Chou Stephen Y. Imprint lithography with improved monitoring and control and apparatus therefor
US6326627B1 (en) 2000-08-02 2001-12-04 Archimedes Technology Group, Inc. Mass filtering sputtered ion source
US8016277B2 (en) 2000-08-21 2011-09-13 Board Of Regents, The University Of Texas System Flexure based macro motion translation stage
US6718630B2 (en) * 2000-09-18 2004-04-13 Matsushita Electric Industrial Co., Ltd. Apparatus and method for mounting components on substrate
AU2001297642A1 (en) * 2000-10-12 2002-09-04 Board Of Regents, The University Of Texas System Template for room temperature, low pressure micro- and nano-imprint lithography
JP3834469B2 (ja) * 2000-11-15 2006-10-18 富士写真フイルム株式会社 基板搬送システム及びそれを用いた基板搬送方法
JP2004515918A (ja) * 2000-12-04 2004-05-27 株式会社荏原製作所 基板処理装置及びその方法
US6612590B2 (en) 2001-01-12 2003-09-02 Tokyo Electron Limited Apparatus and methods for manipulating semiconductor wafers
US6387787B1 (en) * 2001-03-02 2002-05-14 Motorola, Inc. Lithographic template and method of formation and use
US6955767B2 (en) 2001-03-22 2005-10-18 Hewlett-Packard Development Company, Lp. Scanning probe based lithographic alignment
US6517977B2 (en) * 2001-03-28 2003-02-11 Motorola, Inc. Lithographic template and method of formation and use
US6964793B2 (en) 2002-05-16 2005-11-15 Board Of Regents, The University Of Texas System Method for fabricating nanoscale patterns in light curable compositions using an electric field
US6847433B2 (en) * 2001-06-01 2005-01-25 Agere Systems, Inc. Holder, system, and process for improving overlay in lithography
US7049049B2 (en) 2001-06-27 2006-05-23 University Of South Florida Maskless photolithography for using photoreactive agents
JP2005505754A (ja) 2001-07-25 2005-02-24 ザ トラスティーズ オブ プリンストン ユニバーシテイ 高スループットのマクロ分子分析用のナノチャンネル・アレイ並びにその準備および使用
US6678038B2 (en) * 2001-08-03 2004-01-13 Nikon Corporation Apparatus and methods for detecting tool-induced shift in microlithography apparatus
US6898064B1 (en) * 2001-08-29 2005-05-24 Lsi Logic Corporation System and method for optimizing the electrostatic removal of a workpiece from a chuck
WO2003035932A1 (en) * 2001-09-25 2003-05-01 Minuta Technology Co., Ltd. Method for forming a micro-pattern on a substrate by using capillary force
US6771372B1 (en) * 2001-11-01 2004-08-03 Therma-Wave, Inc. Rotational stage with vertical axis adjustment
US6621960B2 (en) 2002-01-24 2003-09-16 Oplink Communications, Inc. Method of fabricating multiple superimposed fiber Bragg gratings
US6736408B2 (en) * 2002-01-25 2004-05-18 Applied Materials Inc. Rotary vacuum-chuck with venturi formed at base of rotating shaft
JP2004002702A (ja) 2002-02-28 2004-01-08 Merck Patent Gmbh プレポリマー材料、ポリマー材料、インプリンティングプロセスおよびその使用
US7117583B2 (en) 2002-03-18 2006-10-10 International Business Machines Corporation Method and apparatus using a pre-patterned seed layer for providing an aligned coil for an inductive head structure
US6759180B2 (en) 2002-04-23 2004-07-06 Hewlett-Packard Development Company, L.P. Method of fabricating sub-lithographic sized line and space patterns for nano-imprinting lithography
US6849558B2 (en) * 2002-05-22 2005-02-01 The Board Of Trustees Of The Leland Stanford Junior University Replication and transfer of microstructures and nanostructures
AU2003232962A1 (en) * 2002-05-27 2003-12-12 Koninklijke Philips Electronics N.V. Method and device for transferring a pattern from a stamp to a substrate
US7179079B2 (en) 2002-07-08 2007-02-20 Molecular Imprints, Inc. Conforming template for patterning liquids disposed on substrates
US7019819B2 (en) * 2002-11-13 2006-03-28 Molecular Imprints, Inc. Chucking system for modulating shapes of substrates
US6932934B2 (en) * 2002-07-11 2005-08-23 Molecular Imprints, Inc. Formation of discontinuous films during an imprint lithography process
US7077992B2 (en) * 2002-07-11 2006-07-18 Molecular Imprints, Inc. Step and repeat imprint lithography processes
US6908861B2 (en) * 2002-07-11 2005-06-21 Molecular Imprints, Inc. Method for imprint lithography using an electric field
US6900881B2 (en) * 2002-07-11 2005-05-31 Molecular Imprints, Inc. Step and repeat imprint lithography systems
US6916584B2 (en) * 2002-08-01 2005-07-12 Molecular Imprints, Inc. Alignment methods for imprint lithography
US6936194B2 (en) 2002-09-05 2005-08-30 Molecular Imprints, Inc. Functional patterning material for imprint lithography processes
US8349241B2 (en) 2002-10-04 2013-01-08 Molecular Imprints, Inc. Method to arrange features on a substrate to replicate features having minimal dimensional variability
US6980282B2 (en) 2002-12-11 2005-12-27 Molecular Imprints, Inc. Method for modulating shapes of substrates
US7641840B2 (en) 2002-11-13 2010-01-05 Molecular Imprints, Inc. Method for expelling gas positioned between a substrate and a mold
US7750059B2 (en) * 2002-12-04 2010-07-06 Hewlett-Packard Development Company, L.P. Polymer solution for nanoimprint lithography to reduce imprint temperature and pressure
EP1606834B1 (en) 2003-03-27 2013-06-05 Korea Institute Of Machinery & Materials Uv nanoimprint lithography process using elementwise embossed stamp
US6951173B1 (en) * 2003-05-14 2005-10-04 Molecular Imprints, Inc. Assembly and method for transferring imprint lithography templates
US6805054B1 (en) * 2003-05-14 2004-10-19 Molecular Imprints, Inc. Method, system and holder for transferring templates during imprint lithography processes
TWI228638B (en) 2003-06-10 2005-03-01 Ind Tech Res Inst Method for and apparatus for bonding patterned imprint to a substrate by adhering means
US20050160934A1 (en) 2004-01-23 2005-07-28 Molecular Imprints, Inc. Materials and methods for imprint lithography
US7150622B2 (en) 2003-07-09 2006-12-19 Molecular Imprints, Inc. Systems for magnification and distortion correction for imprint lithography processes
US6879191B2 (en) 2003-08-26 2005-04-12 Intel Corporation Voltage mismatch tolerant input/output buffer
JP4090416B2 (ja) * 2003-09-30 2008-05-28 日東電工株式会社 粘着テープ付ワークの離脱方法及び離脱装置
US7023238B1 (en) 2004-01-07 2006-04-04 Altera Corporation Input buffer with selectable threshold and hysteresis option
WO2005118914A2 (en) 2004-05-28 2005-12-15 Board Of Regents, The University Of Texas System Substrate support system and method
WO2005119802A2 (en) 2004-05-28 2005-12-15 Board Of Regents, The University Of Texas System Adaptive shape substrate support system and method
US7798801B2 (en) * 2005-01-31 2010-09-21 Molecular Imprints, Inc. Chucking system for nano-manufacturing
US7635263B2 (en) 2005-01-31 2009-12-22 Molecular Imprints, Inc. Chucking system comprising an array of fluid chambers
US20060177532A1 (en) * 2005-02-04 2006-08-10 Molecular Imprints, Inc. Imprint lithography method to control extrusion of a liquid from a desired region on a substrate
US20060177535A1 (en) * 2005-02-04 2006-08-10 Molecular Imprints, Inc. Imprint lithography template to facilitate control of liquid movement
US7670530B2 (en) * 2006-01-20 2010-03-02 Molecular Imprints, Inc. Patterning substrates employing multiple chucks

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8893620B2 (en) 2011-11-30 2014-11-25 SCREEN Holdings Co., Ltd. Printing apparatus and printing method with measurement of a carrier thickness
US8955432B2 (en) 2011-11-30 2015-02-17 SCREEN Holdings Co., Ltd. Pattern forming apparatus and pattern forming method
US11422462B2 (en) 2019-06-07 2022-08-23 Canon Kabushiki Kaisha Forming apparatus that controls chucking force

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US7636999B2 (en) 2009-12-29
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