AU1444800A - Microscale patterning and articles formed thereby - Google Patents
Microscale patterning and articles formed therebyInfo
- Publication number
- AU1444800A AU1444800A AU14448/00A AU1444800A AU1444800A AU 1444800 A AU1444800 A AU 1444800A AU 14448/00 A AU14448/00 A AU 14448/00A AU 1444800 A AU1444800 A AU 1444800A AU 1444800 A AU1444800 A AU 1444800A
- Authority
- AU
- Australia
- Prior art keywords
- articles formed
- microscale
- patterning
- microscale patterning
- articles
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10379098P | 1998-10-09 | 1998-10-09 | |
US60103790 | 1998-10-09 | ||
PCT/US1999/023717 WO2000021689A1 (en) | 1998-10-09 | 1999-10-08 | Microscale patterning and articles formed thereby |
Publications (1)
Publication Number | Publication Date |
---|---|
AU1444800A true AU1444800A (en) | 2000-05-01 |
Family
ID=22297049
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AU14448/00A Abandoned AU1444800A (en) | 1998-10-09 | 1999-10-08 | Microscale patterning and articles formed thereby |
Country Status (2)
Country | Link |
---|---|
AU (1) | AU1444800A (en) |
WO (1) | WO2000021689A1 (en) |
Families Citing this family (25)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
AU2880100A (en) | 1999-02-12 | 2000-08-29 | General Electric Company | Data storage media |
EP2264523A3 (en) | 2000-07-16 | 2011-11-30 | Board Of Regents, The University Of Texas System | A method of forming a pattern on a substrate in imprint lithographic processes |
EP1303793B1 (en) | 2000-07-17 | 2015-01-28 | Board Of Regents, The University Of Texas System | Method and system of automatic fluid dispensing for imprint lithography processes |
ATE356374T1 (en) * | 2001-05-16 | 2007-03-15 | Univ Texas | METHOD FOR PRODUCING NANOM SCALE STRUCTURES IN LIGHT-CURING COMPOSITIONS USING AN ELECTRICAL FIELD |
JP2005527974A (en) * | 2002-05-24 | 2005-09-15 | ワイ. チョウ,スティーヴン, | Method and apparatus for field induced pressure imprint lithography |
US6926929B2 (en) | 2002-07-09 | 2005-08-09 | Molecular Imprints, Inc. | System and method for dispensing liquids |
US7019819B2 (en) | 2002-11-13 | 2006-03-28 | Molecular Imprints, Inc. | Chucking system for modulating shapes of substrates |
US7365103B2 (en) | 2002-12-12 | 2008-04-29 | Board Of Regents, The University Of Texas System | Compositions for dark-field polymerization and method of using the same for imprint lithography processes |
US6951173B1 (en) | 2003-05-14 | 2005-10-04 | Molecular Imprints, Inc. | Assembly and method for transferring imprint lithography templates |
US7090716B2 (en) | 2003-10-02 | 2006-08-15 | Molecular Imprints, Inc. | Single phase fluid imprint lithography method |
US7261830B2 (en) | 2003-10-16 | 2007-08-28 | Molecular Imprints, Inc. | Applying imprinting material to substrates employing electromagnetic fields |
US7019835B2 (en) | 2004-02-19 | 2006-03-28 | Molecular Imprints, Inc. | Method and system to measure characteristics of a film disposed on a substrate |
US7504268B2 (en) | 2004-05-28 | 2009-03-17 | Board Of Regents, The University Of Texas System | Adaptive shape substrate support method |
TWI243796B (en) * | 2004-06-08 | 2005-11-21 | Ind Tech Res Inst | Device of nano-structure imprint for pattern transfer and method of the same |
US7105452B2 (en) | 2004-08-13 | 2006-09-12 | Molecular Imprints, Inc. | Method of planarizing a semiconductor substrate with an etching chemistry |
US7282550B2 (en) | 2004-08-16 | 2007-10-16 | Molecular Imprints, Inc. | Composition to provide a layer with uniform etch characteristics |
US7041604B2 (en) | 2004-09-21 | 2006-05-09 | Molecular Imprints, Inc. | Method of patterning surfaces while providing greater control of recess anisotropy |
US7252777B2 (en) | 2004-09-21 | 2007-08-07 | Molecular Imprints, Inc. | Method of forming an in-situ recessed structure |
US7241395B2 (en) | 2004-09-21 | 2007-07-10 | Molecular Imprints, Inc. | Reverse tone patterning on surfaces having planarity perturbations |
US7244386B2 (en) | 2004-09-27 | 2007-07-17 | Molecular Imprints, Inc. | Method of compensating for a volumetric shrinkage of a material disposed upon a substrate to form a substantially planar structure therefrom |
WO2007046110A1 (en) * | 2005-10-19 | 2007-04-26 | Indian Institute Of Technology, Kanpur | A method and apparatus for the formation of patterns on surfaces and an assembly and alignment of the structure thereof |
US8850980B2 (en) | 2006-04-03 | 2014-10-07 | Canon Nanotechnologies, Inc. | Tessellated patterns in imprint lithography |
FR2957715B1 (en) | 2010-03-18 | 2012-04-20 | Centre Nat Rech Scient | METHOD OF FORMING A PATTERN ON A SURFACE OF A SUPPORT |
CN103159164B (en) * | 2013-03-01 | 2015-08-05 | 西安交通大学 | A kind of electric field induce method for stamping of high-depth-to-width-microcolumn microcolumn array |
KR102284072B1 (en) * | 2015-01-14 | 2021-08-02 | 한국과학기술원 | Method of Preparing Vertical Cylinder or Lamella Structure of Organic Molecule Arranged in Large Area Single Domain |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4031268A (en) * | 1976-01-05 | 1977-06-21 | Sirius Corporation | Process for spraying metallic patterns on a substrate |
US4545610A (en) * | 1983-11-25 | 1985-10-08 | International Business Machines Corporation | Method for forming elongated solder connections between a semiconductor device and a supporting substrate |
US5395740A (en) * | 1993-01-27 | 1995-03-07 | Motorola, Inc. | Method for fabricating electrode patterns |
US5772905A (en) * | 1995-11-15 | 1998-06-30 | Regents Of The University Of Minnesota | Nanoimprint lithography |
-
1999
- 1999-10-08 WO PCT/US1999/023717 patent/WO2000021689A1/en active Application Filing
- 1999-10-08 AU AU14448/00A patent/AU1444800A/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
WO2000021689A1 (en) | 2000-04-20 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MK6 | Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase |