JP4488004B2 - 液浸リソグラフィ流体制御システム - Google Patents

液浸リソグラフィ流体制御システム Download PDF

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Publication number
JP4488004B2
JP4488004B2 JP2006509534A JP2006509534A JP4488004B2 JP 4488004 B2 JP4488004 B2 JP 4488004B2 JP 2006509534 A JP2006509534 A JP 2006509534A JP 2006509534 A JP2006509534 A JP 2006509534A JP 4488004 B2 JP4488004 B2 JP 4488004B2
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Japan
Prior art keywords
fluid
pressurized gas
fluid control
exposure area
workpiece
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Expired - Lifetime
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JP2006509534A
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Japanese (ja)
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JP2006523026A (ja
JP2006523026A5 (https=
Inventor
デレク クーン，
アンドリュー， ジェイ． ハゼルトン，
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Nikon Corp
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Nikon Corp
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Publication of JP2006523026A5 publication Critical patent/JP2006523026A5/ja
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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
    • H10P76/20—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials
    • H10P76/204—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials of organic photoresist masks
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
    • G03B27/52—Details
    • G03B27/522—Projection optics
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2041—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2006509534A 2003-04-09 2004-03-29 液浸リソグラフィ流体制御システム Expired - Lifetime JP4488004B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US46214203P 2003-04-09 2003-04-09
PCT/US2004/009911 WO2004093159A2 (en) 2003-04-09 2004-03-29 Immersion lithography fluid control system

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2010024368A Division JP5428909B2 (ja) 2003-04-09 2010-02-05 液浸リソグラフィ流体制御システム

Publications (3)

Publication Number Publication Date
JP2006523026A JP2006523026A (ja) 2006-10-05
JP2006523026A5 JP2006523026A5 (https=) 2010-03-25
JP4488004B2 true JP4488004B2 (ja) 2010-06-23

Family

ID=33299914

Family Applications (3)

Application Number Title Priority Date Filing Date
JP2006509534A Expired - Lifetime JP4488004B2 (ja) 2003-04-09 2004-03-29 液浸リソグラフィ流体制御システム
JP2010024368A Expired - Fee Related JP5428909B2 (ja) 2003-04-09 2010-02-05 液浸リソグラフィ流体制御システム
JP2013200777A Expired - Fee Related JP5679023B2 (ja) 2003-04-09 2013-09-27 液浸リソグラフィ流体制御システム

Family Applications After (2)

Application Number Title Priority Date Filing Date
JP2010024368A Expired - Fee Related JP5428909B2 (ja) 2003-04-09 2010-02-05 液浸リソグラフィ流体制御システム
JP2013200777A Expired - Fee Related JP5679023B2 (ja) 2003-04-09 2013-09-27 液浸リソグラフィ流体制御システム

Country Status (5)

Country Link
US (6) US7339650B2 (https=)
JP (3) JP4488004B2 (https=)
KR (2) KR101177331B1 (https=)
TW (2) TWI372412B (https=)
WO (1) WO2004093159A2 (https=)

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US8797500B2 (en) 2014-08-05
JP2014013939A (ja) 2014-01-23
JP5679023B2 (ja) 2015-03-04
JP2006523026A (ja) 2006-10-05
KR20110104084A (ko) 2011-09-21
US8497973B2 (en) 2013-07-30
US9618852B2 (en) 2017-04-11
US20070115453A1 (en) 2007-05-24
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US8102501B2 (en) 2012-01-24
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US20060023184A1 (en) 2006-02-02
US7339650B2 (en) 2008-03-04
TWI372412B (en) 2012-09-11
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US20090075212A1 (en) 2009-03-19
JP5428909B2 (ja) 2014-02-26
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