JP4428533B2 - 薄膜蒸着用のマスクフレーム組立体及び有機電界発光表示装置 - Google Patents
薄膜蒸着用のマスクフレーム組立体及び有機電界発光表示装置 Download PDFInfo
- Publication number
- JP4428533B2 JP4428533B2 JP2005204259A JP2005204259A JP4428533B2 JP 4428533 B2 JP4428533 B2 JP 4428533B2 JP 2005204259 A JP2005204259 A JP 2005204259A JP 2005204259 A JP2005204259 A JP 2005204259A JP 4428533 B2 JP4428533 B2 JP 4428533B2
- Authority
- JP
- Japan
- Prior art keywords
- mask
- thin film
- frame assembly
- gap
- unit
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000000427 thin-film deposition Methods 0.000 title claims description 23
- 238000000151 deposition Methods 0.000 claims abstract description 25
- 230000008021 deposition Effects 0.000 claims abstract description 20
- 238000007740 vapor deposition Methods 0.000 claims description 44
- 239000010408 film Substances 0.000 claims description 30
- 239000000758 substrate Substances 0.000 claims description 24
- 230000000873 masking effect Effects 0.000 claims description 17
- 239000007787 solid Substances 0.000 claims 1
- 239000010409 thin film Substances 0.000 abstract description 6
- 239000010410 layer Substances 0.000 description 56
- 238000000034 method Methods 0.000 description 16
- 239000012044 organic layer Substances 0.000 description 15
- 239000004065 semiconductor Substances 0.000 description 11
- 239000011159 matrix material Substances 0.000 description 9
- 239000000463 material Substances 0.000 description 8
- 229910052751 metal Inorganic materials 0.000 description 8
- 239000002184 metal Substances 0.000 description 8
- 229910052782 aluminium Inorganic materials 0.000 description 7
- 238000004519 manufacturing process Methods 0.000 description 6
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 5
- 229910004205 SiNX Inorganic materials 0.000 description 5
- 229910004298 SiO 2 Inorganic materials 0.000 description 5
- 238000000059 patterning Methods 0.000 description 5
- 150000001875 compounds Chemical class 0.000 description 4
- 238000005530 etching Methods 0.000 description 4
- 239000011229 interlayer Substances 0.000 description 4
- -1 polyphenylene vinylene Polymers 0.000 description 4
- 238000002347 injection Methods 0.000 description 3
- 239000007924 injection Substances 0.000 description 3
- 229910052749 magnesium Inorganic materials 0.000 description 3
- 229910052759 nickel Inorganic materials 0.000 description 3
- 239000011368 organic material Substances 0.000 description 3
- 238000000206 photolithography Methods 0.000 description 3
- 229920000642 polymer Polymers 0.000 description 3
- 229920000123 polythiophene Polymers 0.000 description 3
- 238000003466 welding Methods 0.000 description 3
- 241000526960 Amaranthus acanthochiton Species 0.000 description 2
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 2
- 229910000990 Ni alloy Inorganic materials 0.000 description 2
- 229920001609 Poly(3,4-ethylenedioxythiophene) Polymers 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 238000002161 passivation Methods 0.000 description 2
- 230000035515 penetration Effects 0.000 description 2
- 229920000553 poly(phenylenevinylene) Polymers 0.000 description 2
- 229920002098 polyfluorene Polymers 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 230000004044 response Effects 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 238000001771 vacuum deposition Methods 0.000 description 2
- VLDPXPPHXDGHEW-UHFFFAOYSA-N 1-chloro-2-dichlorophosphoryloxybenzene Chemical compound ClC1=CC=CC=C1OP(Cl)(Cl)=O VLDPXPPHXDGHEW-UHFFFAOYSA-N 0.000 description 1
- YOZHUJDVYMRYDM-UHFFFAOYSA-N 4-(4-anilinophenyl)-3-naphthalen-1-yl-n-phenylaniline Chemical compound C=1C=C(C=2C(=CC(NC=3C=CC=CC=3)=CC=2)C=2C3=CC=CC=C3C=CC=2)C=CC=1NC1=CC=CC=C1 YOZHUJDVYMRYDM-UHFFFAOYSA-N 0.000 description 1
- MBPCKEZNJVJYTC-UHFFFAOYSA-N 4-[4-(n-phenylanilino)phenyl]aniline Chemical compound C1=CC(N)=CC=C1C1=CC=C(N(C=2C=CC=CC=2)C=2C=CC=CC=2)C=C1 MBPCKEZNJVJYTC-UHFFFAOYSA-N 0.000 description 1
- 229910004613 CdTe Inorganic materials 0.000 description 1
- 229910000531 Co alloy Inorganic materials 0.000 description 1
- 229910021578 Iron(III) chloride Inorganic materials 0.000 description 1
- 229910016048 MoW Inorganic materials 0.000 description 1
- 229910052779 Neodymium Inorganic materials 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 229920000265 Polyparaphenylene Polymers 0.000 description 1
- XBDYBAVJXHJMNQ-UHFFFAOYSA-N Tetrahydroanthracene Natural products C1=CC=C2C=C(CCCC3)C3=CC2=C1 XBDYBAVJXHJMNQ-UHFFFAOYSA-N 0.000 description 1
- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- UHYPYGJEEGLRJD-UHFFFAOYSA-N cadmium(2+);selenium(2-) Chemical compound [Se-2].[Cd+2] UHYPYGJEEGLRJD-UHFFFAOYSA-N 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 229920001940 conductive polymer Polymers 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000001186 cumulative effect Effects 0.000 description 1
- RAABOESOVLLHRU-UHFFFAOYSA-N diazene Chemical compound N=N RAABOESOVLLHRU-UHFFFAOYSA-N 0.000 description 1
- 229910000071 diazene Inorganic materials 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005323 electroforming Methods 0.000 description 1
- 125000005678 ethenylene group Chemical group [H]C([*:1])=C([H])[*:2] 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- RBTKNAXYKSUFRK-UHFFFAOYSA-N heliogen blue Chemical compound [Cu].[N-]1C2=C(C=CC=C3)C3=C1N=C([N-]1)C3=CC=CC=C3C1=NC([N-]1)=C(C=CC=C3)C3=C1N=C([N-]1)C3=CC=CC=C3C1=N2 RBTKNAXYKSUFRK-UHFFFAOYSA-N 0.000 description 1
- 230000005525 hole transport Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 238000007641 inkjet printing Methods 0.000 description 1
- 229910052741 iridium Inorganic materials 0.000 description 1
- RBTARNINKXHZNM-UHFFFAOYSA-K iron trichloride Chemical compound Cl[Fe](Cl)Cl RBTARNINKXHZNM-UHFFFAOYSA-K 0.000 description 1
- 238000005304 joining Methods 0.000 description 1
- 239000000696 magnetic material Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 239000005416 organic matter Substances 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 238000005192 partition Methods 0.000 description 1
- SLIUAWYAILUBJU-UHFFFAOYSA-N pentacene Chemical compound C1=CC=CC2=CC3=CC4=CC5=CC=CC=C5C=C4C=C3C=C21 SLIUAWYAILUBJU-UHFFFAOYSA-N 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- UGQZLDXDWSPAOM-UHFFFAOYSA-N pyrrolo[3,4-f]isoindole-1,3,5,7-tetrone Chemical compound C1=C2C(=O)NC(=O)C2=CC2=C1C(=O)NC2=O UGQZLDXDWSPAOM-UHFFFAOYSA-N 0.000 description 1
- 230000007261 regionalization Effects 0.000 description 1
- 238000007665 sagging Methods 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- SBIBMFFZSBJNJF-UHFFFAOYSA-N selenium;zinc Chemical compound [Se]=[Zn] SBIBMFFZSBJNJF-UHFFFAOYSA-N 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 238000000638 solvent extraction Methods 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- IFLREYGFSNHWGE-UHFFFAOYSA-N tetracene Chemical compound C1=CC=CC2=CC3=CC4=CC=CC=C4C=C3C=C21 IFLREYGFSNHWGE-UHFFFAOYSA-N 0.000 description 1
- TVIVIEFSHFOWTE-UHFFFAOYSA-K tri(quinolin-8-yloxy)alumane Chemical compound [Al+3].C1=CN=C2C([O-])=CC=CC2=C1.C1=CN=C2C([O-])=CC=CC2=C1.C1=CN=C2C([O-])=CC=CC2=C1 TVIVIEFSHFOWTE-UHFFFAOYSA-K 0.000 description 1
- 238000005019 vapor deposition process Methods 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
- 238000001039 wet etching Methods 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/12—Organic material
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B33/00—Electroluminescent light sources
- H05B33/10—Apparatus or processes specially adapted to the manufacture of electroluminescent light sources
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/30—Devices specially adapted for multicolour light emission
- H10K59/35—Devices specially adapted for multicolour light emission comprising red-green-blue [RGB] subpixels
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
- H10K71/164—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using vacuum deposition
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
- H10K71/166—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using selective deposition, e.g. using a mask
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
Description
本実施形態にかかるOLED装置200の副画素210は,少なくとも一つのストライプパターン211,及び複数個のドットパターン212を備えることができる。
31,32 第1支持部
33 開口部
34,35 第2支持部
100 マスク
110,110’ 単位マスク
111 蒸着用開口部
120 第1ギャップ
Claims (13)
- 開口部を有するフレームに少なくとも二つの単位マスクを備える有機電界発光表示装置の薄膜蒸着用のマスクフレーム組立体において,
前記単位マスクはストリップ形状を有していて、
前記各単位マスクは、前記単位マスクの長手方向に両端部が固定され、
前記各単位マスクは,複数個の蒸着用開口部を備え,
前記各単位マスク間には,前記蒸着用開口部と同一な幅の第1ギャップが備えられたことを特徴とする,薄膜蒸着用のマスクフレーム組立体。 - 前記単位マスクのうち,前記単位マスクの長手方向に直交する方向の最も外側に位置した単位マスクと前記フレームとの間には,前記蒸着用開口部と同一な幅の第2ギャップが備えられたことを特徴とする,請求項1に記載の薄膜蒸着用のマスクフレーム組立体。
- 前記蒸着用開口部の断面構造と前記第1ギャップの断面構造とは,相等しいことを特徴とする,請求項1に記載の薄膜蒸着用のマスクフレーム組立体。
- 前記蒸着用開口部の断面構造と前記第1ギャップの断面構造は相等しく、前記蒸着用開口部の断面構造と前記第2ギャップの断面構造も相等しいことを特徴とする,請求項2に記載の薄膜蒸着用のマスクフレーム組立体。
- 前記単位マスクの蒸着用開口部及び前記第1ギャップ全体により,一つのマスキングパターン部が形成されることを特徴とする,請求項1に記載の薄膜蒸着用のマスクフレーム組立体。
- 前記単位マスクの蒸着用開口部,前記第1ギャップ,及び前記第2ギャップ全体により,一つのマスキングパターン部が形成されることを特徴とする,請求項2に記載の薄膜蒸着用のマスクフレーム組立体。
- 前記第1ギャップは,前記単位マスクの長手方向に沿って設けられていることを特徴とする,請求項1に記載の薄膜蒸着用のマスクフレーム組立体。
- 前記第2ギャップは,前記単位マスクの長手方向に沿って設けられていることを特徴とする,請求項2に記載の薄膜蒸着用のマスクフレーム組立体。
- 前記蒸着用開口部は,長手方向に沿って、断続的に備えられたドットパターンであることを特徴とする,請求項8に記載の薄膜蒸着用のマスクフレーム組立体。
- 前記蒸着用開口部は,長手方向に沿って、連続的に備えられたストライプパターンであることを特徴とする,請求項1に記載の薄膜蒸着用のマスクフレーム組立体。
- 基板上に互いに対向した第1及び第2電極と,前記第1及び第2電極間に備えられた有機発光膜と,を備える有機電界発光表示装置において,
前記有機発光膜は、請求項1〜10の何れかに記載の薄膜蒸着用のマスクフレーム組立体を用いて製造されており、
前記有機発光膜は,少なくとも一つの連続的なストライプパターンと,複数個の不連続的なドットパターンとを備えることを特徴とする,有機電界発光表示装置。 - 前記ストライプパターンは,互いに所定間隔が離隔されて反復される複数個のストライプパターンで備えられ,前記ドットパターンは,前記ストライプパターン間に備えられたことを特徴とする,請求項11に記載の有機電界発光表示装置。
- 前記ストライプパターン及びドットパターンは,それぞれ赤色,緑色,青色ストライプパターンと,赤色,緑色,青色ドットパターンとを備え,前記赤色,緑色,青色ストライプパターンは,互いに隣接するように備えられたことを特徴とする,請求項11に記載の有機電界発光表示装置。
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020040055074A KR100659057B1 (ko) | 2004-07-15 | 2004-07-15 | 박막 증착용 마스크 프레임 조립체 및 유기 전계 발광표시장치 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2006032342A JP2006032342A (ja) | 2006-02-02 |
JP4428533B2 true JP4428533B2 (ja) | 2010-03-10 |
Family
ID=35058632
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2005204259A Active JP4428533B2 (ja) | 2004-07-15 | 2005-07-13 | 薄膜蒸着用のマスクフレーム組立体及び有機電界発光表示装置 |
Country Status (7)
Country | Link |
---|---|
US (1) | US7802537B2 (ja) |
EP (1) | EP1626103B1 (ja) |
JP (1) | JP4428533B2 (ja) |
KR (1) | KR100659057B1 (ja) |
CN (1) | CN100484348C (ja) |
AT (1) | ATE447051T1 (ja) |
DE (1) | DE602005017335D1 (ja) |
Families Citing this family (63)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8128753B2 (en) | 2004-11-19 | 2012-03-06 | Massachusetts Institute Of Technology | Method and apparatus for depositing LED organic film |
US8986780B2 (en) | 2004-11-19 | 2015-03-24 | Massachusetts Institute Of Technology | Method and apparatus for depositing LED organic film |
US8138075B1 (en) | 2006-02-06 | 2012-03-20 | Eberlein Dietmar C | Systems and methods for the manufacture of flat panel devices |
JP4677363B2 (ja) * | 2006-04-07 | 2011-04-27 | 九州日立マクセル株式会社 | 蒸着マスクおよびその製造方法 |
KR100739309B1 (ko) * | 2006-10-13 | 2007-07-12 | 삼성에스디아이 주식회사 | 박막 증착용 마스크 및 이를 이용한 유기 전계발광표시장치 |
US8556389B2 (en) | 2011-02-04 | 2013-10-15 | Kateeva, Inc. | Low-profile MEMS thermal printhead die having backside electrical connections |
KR20100021460A (ko) * | 2007-06-14 | 2010-02-24 | 메사츄세츠 인스티튜트 어브 테크놀로지 | 열방식 제트 인쇄 방법 및 장치 |
US10442226B2 (en) | 2008-06-13 | 2019-10-15 | Kateeva, Inc. | Gas enclosure assembly and system |
US8899171B2 (en) | 2008-06-13 | 2014-12-02 | Kateeva, Inc. | Gas enclosure assembly and system |
US10434804B2 (en) | 2008-06-13 | 2019-10-08 | Kateeva, Inc. | Low particle gas enclosure systems and methods |
US9604245B2 (en) | 2008-06-13 | 2017-03-28 | Kateeva, Inc. | Gas enclosure systems and methods utilizing an auxiliary enclosure |
US9048344B2 (en) | 2008-06-13 | 2015-06-02 | Kateeva, Inc. | Gas enclosure assembly and system |
US8383202B2 (en) | 2008-06-13 | 2013-02-26 | Kateeva, Inc. | Method and apparatus for load-locked printing |
US20100188457A1 (en) * | 2009-01-05 | 2010-07-29 | Madigan Connor F | Method and apparatus for controlling the temperature of an electrically-heated discharge nozzle |
KR101117645B1 (ko) * | 2009-02-05 | 2012-03-05 | 삼성모바일디스플레이주식회사 | 마스크 조립체 및 이를 이용한 평판표시장치용 증착 장치 |
KR101202346B1 (ko) * | 2009-04-16 | 2012-11-16 | 삼성디스플레이 주식회사 | 박막 증착용 마스크 프레임 조립체, 그 제조 방법 및 유기 발광 표시 장치의 제조 방법 |
EP2425470A2 (en) * | 2009-05-01 | 2012-03-07 | Kateeva, Inc. | Method and apparatus for organic vapor printing |
US8802200B2 (en) * | 2009-06-09 | 2014-08-12 | Samsung Display Co., Ltd. | Method and apparatus for cleaning organic deposition materials |
US9174250B2 (en) * | 2009-06-09 | 2015-11-03 | Samsung Display Co., Ltd. | Method and apparatus for cleaning organic deposition materials |
KR101182439B1 (ko) * | 2010-01-11 | 2012-09-12 | 삼성디스플레이 주식회사 | 박막 증착용 마스크 프레임 조립체 및 이를 이용한 유기 발광 표시장치의 제조방법 |
KR101309864B1 (ko) * | 2010-02-02 | 2013-09-16 | 엘지디스플레이 주식회사 | 마스크 어셈블리 |
KR101182239B1 (ko) * | 2010-03-17 | 2012-09-12 | 삼성디스플레이 주식회사 | 마스크 및 이를 포함하는 마스크 조립체 |
KR101058117B1 (ko) * | 2010-03-22 | 2011-08-24 | 삼성모바일디스플레이주식회사 | 박막 증착용 마스크 어셈블리와, 이를 이용한 유기 발광 장치와, 이의 제조 방법 |
KR101784467B1 (ko) * | 2011-01-10 | 2017-10-12 | 삼성디스플레이 주식회사 | 분할 마스크 및 그것을 이용한 마스크 프레임 조립체의 조립방법 |
KR101693578B1 (ko) * | 2011-03-24 | 2017-01-10 | 삼성디스플레이 주식회사 | 증착 마스크 |
WO2012138366A1 (en) | 2011-04-08 | 2012-10-11 | Kateeva, Inc. | Method and apparatus for printing using a facetted drum |
KR101820020B1 (ko) * | 2011-04-25 | 2018-01-19 | 삼성디스플레이 주식회사 | 박막 증착용 마스크 프레임 어셈블리 |
KR101813549B1 (ko) * | 2011-05-06 | 2018-01-02 | 삼성디스플레이 주식회사 | 분할 마스크와 그 분할 마스크를 포함한 마스크 프레임 조립체의 조립장치 |
KR101931770B1 (ko) | 2011-11-30 | 2018-12-24 | 삼성디스플레이 주식회사 | 마스크 조립체 및 유기 발광 표시장치 |
CN106274054B (zh) * | 2011-12-22 | 2018-04-17 | 科迪华公司 | 气体封闭系统 |
CN102522323A (zh) * | 2011-12-28 | 2012-06-27 | 华南理工大学 | 一种ito图案化方法 |
KR20130081528A (ko) * | 2012-01-09 | 2013-07-17 | 삼성디스플레이 주식회사 | 증착 마스크 및 이를 이용한 증착 설비 |
CN103225059A (zh) * | 2012-01-30 | 2013-07-31 | 群康科技(深圳)有限公司 | 阴影掩膜及其补偿设计方法 |
TWI480398B (zh) * | 2012-01-30 | 2015-04-11 | Innocom Tech Shenzhen Co Ltd | 陰影罩幕及其補償設計方法 |
US11161150B2 (en) | 2012-05-25 | 2021-11-02 | Derrick Corporation | Injection molded screening apparatuses and methods |
US9409209B2 (en) * | 2012-05-25 | 2016-08-09 | Derrick Corporation | Injection molded screening apparatuses and methods |
CN102766844B (zh) * | 2012-08-10 | 2014-10-22 | 深圳市华星光电技术有限公司 | 有机电致发光二极管有机材料蒸镀用掩模装置 |
CN102776473B (zh) * | 2012-08-10 | 2014-10-29 | 深圳市华星光电技术有限公司 | 有机电致发光二极管有机材料蒸镀用掩模装置 |
US20140041586A1 (en) * | 2012-08-10 | 2014-02-13 | Shenzhen China Star Optoelectronics Technology Co., Ltd. | Masking Device for Vapor Deposition of Organic Material of Organic Electroluminescent Diode |
KR20140057852A (ko) * | 2012-11-05 | 2014-05-14 | 삼성디스플레이 주식회사 | 유기 발광 표시 장치 및 유기 발광 표시 장치의 제조 방법 |
KR101980232B1 (ko) | 2012-11-14 | 2019-05-21 | 삼성디스플레이 주식회사 | 패터닝 슬릿 시트 프레임 어셈블리 |
KR102100446B1 (ko) | 2012-12-10 | 2020-04-14 | 삼성디스플레이 주식회사 | 박막 증착용 마스크 조립체 및 이의 제조 방법 |
DE102013101586A1 (de) | 2013-02-18 | 2014-08-21 | Aixtron Se | Mehrschichtige Schattenmaske |
KR102072679B1 (ko) * | 2013-02-27 | 2020-02-04 | 삼성디스플레이 주식회사 | 박막 증착용 마스크 어셈블리 제조 방법 |
KR20140109699A (ko) * | 2013-03-06 | 2014-09-16 | 삼성디스플레이 주식회사 | 마스크 구조체와 이를 포함하는 마스크 조립체 및 마스크 구조체 제조방법 |
KR102162790B1 (ko) * | 2013-05-02 | 2020-10-08 | 삼성디스플레이 주식회사 | 마스크 프레임 조립체용 용접기 |
JP2015069806A (ja) * | 2013-09-27 | 2015-04-13 | 株式会社ジャパンディスプレイ | 有機エレクトロルミネッセンス表示装置の製造方法 |
WO2015100375A1 (en) | 2013-12-26 | 2015-07-02 | Kateeva, Inc. | Thermal treatment of electronic devices |
JP6113923B2 (ja) | 2014-01-21 | 2017-04-12 | カティーバ, インコーポレイテッド | 電子デバイスのカプセル化のための装置および技術 |
KR102390045B1 (ko) | 2014-04-30 | 2022-04-22 | 카티바, 인크. | 가스 쿠션 장비 및 기판 코팅 기술 |
KR102330330B1 (ko) * | 2014-12-16 | 2021-11-25 | 삼성디스플레이 주식회사 | 마스크 프레임 조립체 및 그 제조방법 |
KR102352280B1 (ko) * | 2015-04-28 | 2022-01-18 | 삼성디스플레이 주식회사 | 마스크 프레임 조립체 제조 장치 및 이를 이용한 마스크 프레임 조립체 제조 방법 |
KR20170030685A (ko) * | 2015-09-09 | 2017-03-20 | 삼성디스플레이 주식회사 | 증착용 마스크 및 그 제조 방법 |
KR102549358B1 (ko) | 2015-11-02 | 2023-06-29 | 삼성디스플레이 주식회사 | 증착 마스크 조립체 및 이를 이용한 표시 장치의 제조 방법 |
KR102608420B1 (ko) * | 2016-03-09 | 2023-12-01 | 삼성디스플레이 주식회사 | 증착용 마스크, 표시 장치의 제조 장치 및 표시 장치의 제조 방법 |
KR20180062486A (ko) * | 2016-11-30 | 2018-06-11 | 엘지디스플레이 주식회사 | 증착용 마스크 및 그 제조방법 |
KR101963982B1 (ko) * | 2017-12-27 | 2019-03-29 | 캐논 톡키 가부시키가이샤 | 성막 장치, 성막 방법, 및 전자 디바이스의 제조 방법 |
CN108251796B (zh) * | 2018-01-31 | 2020-11-27 | 京东方科技集团股份有限公司 | 一种精细金属掩膜板及其制备方法、掩膜集成框架 |
CN109182964B (zh) * | 2018-08-31 | 2019-11-15 | 云谷(固安)科技有限公司 | 掩膜板排版方法 |
CN110172666A (zh) * | 2019-06-13 | 2019-08-27 | 京东方科技集团股份有限公司 | 掩膜板组件及其制作方法、像素生成方法 |
CN110724928A (zh) * | 2019-11-20 | 2020-01-24 | 京东方科技集团股份有限公司 | 掩膜板 |
CN110931639A (zh) * | 2019-11-26 | 2020-03-27 | 武汉华星光电半导体显示技术有限公司 | 可提高像素分辨率的像素排列显示设备与蒸镀方法 |
KR20210107217A (ko) * | 2020-02-21 | 2021-09-01 | 삼성디스플레이 주식회사 | 표시 장치의 제조장치, 마스크 어셈블리의 제조방법, 및 표시 장치의 제조방법 |
Family Cites Families (28)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3241519A (en) | 1962-04-05 | 1966-03-22 | Western Electric Co | Tensioned and cooled mask |
US3973965A (en) * | 1972-05-30 | 1976-08-10 | Tokyo Shibaura Electric Co., Ltd. | Making shadow mask with slit-shaped apertures for CRT |
US5707745A (en) | 1994-12-13 | 1998-01-13 | The Trustees Of Princeton University | Multicolor organic light emitting devices |
US5869929A (en) | 1997-02-04 | 1999-02-09 | Idemitsu Kosan Co., Ltd. | Multicolor luminescent device |
JP2848371B2 (ja) | 1997-02-21 | 1999-01-20 | 日本電気株式会社 | 有機el表示装置及びその製造方法 |
JPH10319870A (ja) * | 1997-05-15 | 1998-12-04 | Nec Corp | シャドウマスク及びこれを用いたカラー薄膜el表示装置の製造方法 |
JPH11260257A (ja) * | 1998-03-12 | 1999-09-24 | Sony Corp | 高精細度管用色選別マスクの製造方法 |
JP2000012238A (ja) | 1998-06-29 | 2000-01-14 | Futaba Corp | 有機el素子、有機el素子製造用マスク及び有機el素子の製造方法 |
JP3024641B1 (ja) * | 1998-10-23 | 2000-03-21 | 日本電気株式会社 | シャドウマスク及びその製造方法並びにシャドウマスクを用いた有機elディスプレイの製造方法 |
KR100595170B1 (ko) | 1999-03-17 | 2006-07-03 | 엘지전자 주식회사 | 풀-컬러 유기 el 디스플레이 패널 및 그 제조방법 |
EP1115268A1 (en) | 1999-07-07 | 2001-07-11 | Sony Corporation | Method and apparatus for manufacturing flexible organic el display |
TW480722B (en) | 1999-10-12 | 2002-03-21 | Semiconductor Energy Lab | Manufacturing method of electro-optical device |
JP2001237073A (ja) | 2000-02-24 | 2001-08-31 | Tohoku Pioneer Corp | 多面取り用メタルマスク及びその製造方法 |
JP2001247961A (ja) | 2000-03-06 | 2001-09-14 | Casio Comput Co Ltd | 蒸着用スクリーンマスク、蒸着方法及び有機el素子の製造方法 |
JP2001254169A (ja) | 2000-03-13 | 2001-09-18 | Optonix Seimitsu:Kk | 蒸着用金属マスクおよび蒸着用金属マスク製造方法 |
JP4006173B2 (ja) * | 2000-08-25 | 2007-11-14 | 三星エスディアイ株式会社 | メタルマスク構造体及びその製造方法 |
US6717342B2 (en) * | 2000-08-29 | 2004-04-06 | Lg Electronics Inc. | Shadow mask in color CRT |
KR100647573B1 (ko) * | 2000-10-13 | 2006-11-17 | 삼성에스디아이 주식회사 | 칼라 음극선관용 텐션마스크 조립체 |
JP2002220656A (ja) * | 2000-11-22 | 2002-08-09 | Sanyo Electric Co Ltd | 蒸着用マスクおよびその製造方法 |
KR100382491B1 (ko) | 2000-11-28 | 2003-05-09 | 엘지전자 주식회사 | 유기 el의 새도우 마스크 |
US7396558B2 (en) | 2001-01-31 | 2008-07-08 | Toray Industries, Inc. | Integrated mask and method and apparatus for manufacturing organic EL device using the same |
JP4590748B2 (ja) | 2001-02-08 | 2010-12-01 | ソニー株式会社 | マスク |
KR100490534B1 (ko) | 2001-12-05 | 2005-05-17 | 삼성에스디아이 주식회사 | 유기 전자 발광 소자의 박막 증착용 마스크 프레임 조립체 |
JP2003253434A (ja) * | 2002-03-01 | 2003-09-10 | Sanyo Electric Co Ltd | 蒸着方法及び表示装置の製造方法 |
JP4440563B2 (ja) * | 2002-06-03 | 2010-03-24 | 三星モバイルディスプレイ株式會社 | 有機電子発光素子の薄膜蒸着用マスクフレーム組立体 |
JP4309099B2 (ja) | 2002-06-21 | 2009-08-05 | 三星モバイルディスプレイ株式會社 | 有機電子発光素子用メタルマスク及びこれを利用した有機電子発光素子の製造方法 |
JP4173722B2 (ja) | 2002-11-29 | 2008-10-29 | 三星エスディアイ株式会社 | 蒸着マスク、これを利用した有機el素子の製造方法及び有機el素子 |
JP2005276480A (ja) | 2004-03-23 | 2005-10-06 | Seiko Epson Corp | マスク、マスクの製造方法、薄膜パターンの形成方法、電気光学装置の製造方法および電子機器 |
-
2004
- 2004-07-15 KR KR1020040055074A patent/KR100659057B1/ko active IP Right Grant
-
2005
- 2005-07-08 US US11/176,282 patent/US7802537B2/en active Active
- 2005-07-11 DE DE602005017335T patent/DE602005017335D1/de active Active
- 2005-07-11 EP EP05106299A patent/EP1626103B1/en active Active
- 2005-07-11 AT AT05106299T patent/ATE447051T1/de not_active IP Right Cessation
- 2005-07-13 JP JP2005204259A patent/JP4428533B2/ja active Active
- 2005-07-15 CN CNB2005100844383A patent/CN100484348C/zh active Active
Also Published As
Publication number | Publication date |
---|---|
US20060012290A1 (en) | 2006-01-19 |
EP1626103A3 (en) | 2006-08-30 |
US7802537B2 (en) | 2010-09-28 |
EP1626103A2 (en) | 2006-02-15 |
EP1626103B1 (en) | 2009-10-28 |
KR100659057B1 (ko) | 2006-12-21 |
ATE447051T1 (de) | 2009-11-15 |
CN100484348C (zh) | 2009-04-29 |
DE602005017335D1 (de) | 2009-12-10 |
CN1722918A (zh) | 2006-01-18 |
JP2006032342A (ja) | 2006-02-02 |
KR20060006177A (ko) | 2006-01-19 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP4428533B2 (ja) | 薄膜蒸着用のマスクフレーム組立体及び有機電界発光表示装置 | |
JP4790028B2 (ja) | 薄膜蒸着用マスク及びこれを用いた有機電界発光素子の製造方法 | |
JP6154572B2 (ja) | 薄膜蒸着用のマスクフレームアセンブリー | |
US8604489B2 (en) | Mask frame assembly for thin layer deposition and method of manufacturing organic light emitting display device by using the mask frame assembly | |
KR100696523B1 (ko) | 박막 증착용 마스크 프레임 조립체 및 이를 이용한 유기발광 표시장치의 제조방법 | |
EP2144292A2 (en) | Organic light emitting diode display apparatus and method of manufacturing the same | |
JP5565047B2 (ja) | 有機エレクトロルミネッセンス素子およびその製造方法 | |
WO2012090777A1 (ja) | 蒸着方法、蒸着膜および有機エレクトロルミネッセンス表示装置の製造方法 | |
KR100669772B1 (ko) | 디스플레이 장치 | |
KR20100119675A (ko) | 박막 증착용 마스크 프레임 조립체 및 이를 이용한 유기 발광 표시장치의 제조방법 | |
KR100741138B1 (ko) | 박막 증착용 마스크 프레임 조립체 및 이를 이용한 유기발광 표시장치의 제조방법 | |
JP2014110132A (ja) | 有機el表示装置 | |
KR100759578B1 (ko) | 유기 발광 표시장치 및 그 제조방법 | |
KR100603398B1 (ko) | 증착용 마스크 및 전계발광 디스플레이 장치 | |
KR100787452B1 (ko) | 유기 발광 표시소자 | |
KR100927584B1 (ko) | 유기 발광 표시 장치 및 그 제조 방법 | |
KR100669781B1 (ko) | 전계발광 디스플레이 장치 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20080728 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20080805 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20081105 |
|
A711 | Notification of change in applicant |
Free format text: JAPANESE INTERMEDIATE CODE: A712 Effective date: 20081209 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20090526 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20090826 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20091117 |
|
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 |
|
RD03 | Notification of appointment of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7423 Effective date: 20091209 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20091209 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20121225 Year of fee payment: 3 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 4428533 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20121225 Year of fee payment: 3 |
|
S111 | Request for change of ownership or part of ownership |
Free format text: JAPANESE INTERMEDIATE CODE: R313111 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20121225 Year of fee payment: 3 |
|
R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20131225 Year of fee payment: 4 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |