JP4183299B2 - 窒化ガリウム系化合物半導体発光素子 - Google Patents
窒化ガリウム系化合物半導体発光素子 Download PDFInfo
- Publication number
- JP4183299B2 JP4183299B2 JP07747798A JP7747798A JP4183299B2 JP 4183299 B2 JP4183299 B2 JP 4183299B2 JP 07747798 A JP07747798 A JP 07747798A JP 7747798 A JP7747798 A JP 7747798A JP 4183299 B2 JP4183299 B2 JP 4183299B2
- Authority
- JP
- Japan
- Prior art keywords
- layer
- electrode
- metal layer
- light emitting
- emitting device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/83—Electrodes
- H10H20/832—Electrodes characterised by their material
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/83—Electrodes
- H10H20/832—Electrodes characterised by their material
- H10H20/833—Transparent materials
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/15—Structure, shape, material or disposition of the bump connectors after the connecting process
- H01L2224/16—Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
- H01L2224/161—Disposition
- H01L2224/16151—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/16221—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/16245—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/4805—Shape
- H01L2224/4809—Loop shape
- H01L2224/48091—Arched
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/481—Disposition
- H01L2224/48151—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/48221—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/48245—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
- H01L2224/48247—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic connecting the wire to a bond pad of the item
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/481—Disposition
- H01L2224/48151—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/48221—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/48245—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
- H01L2224/48257—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic connecting the wire to a die pad of the item
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/49—Structure, shape, material or disposition of the wire connectors after the connecting process of a plurality of wire connectors
- H01L2224/491—Disposition
- H01L2224/49105—Connecting at different heights
- H01L2224/49107—Connecting at different heights on the semiconductor or solid-state body
Landscapes
- Led Devices (AREA)
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP07747798A JP4183299B2 (ja) | 1998-03-25 | 1998-03-25 | 窒化ガリウム系化合物半導体発光素子 |
| US09/261,819 US5990500A (en) | 1998-03-25 | 1999-03-03 | Nitride compound semiconductor light emitting element and its manufacturing method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP07747798A JP4183299B2 (ja) | 1998-03-25 | 1998-03-25 | 窒化ガリウム系化合物半導体発光素子 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPH11274562A JPH11274562A (ja) | 1999-10-08 |
| JPH11274562A5 JPH11274562A5 (enExample) | 2005-06-16 |
| JP4183299B2 true JP4183299B2 (ja) | 2008-11-19 |
Family
ID=13635078
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP07747798A Expired - Fee Related JP4183299B2 (ja) | 1998-03-25 | 1998-03-25 | 窒化ガリウム系化合物半導体発光素子 |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US5990500A (enExample) |
| JP (1) | JP4183299B2 (enExample) |
Families Citing this family (76)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6291840B1 (en) | 1996-11-29 | 2001-09-18 | Toyoda Gosei Co., Ltd. | GaN related compound semiconductor light-emitting device |
| JPH10247747A (ja) | 1997-03-05 | 1998-09-14 | Toshiba Corp | 半導体発光素子およびその製造方法 |
| US6936859B1 (en) | 1998-05-13 | 2005-08-30 | Toyoda Gosei Co., Ltd. | Light-emitting semiconductor device using group III nitride compound |
| US6262440B1 (en) * | 1998-06-29 | 2001-07-17 | Philips Electronics North America Corp. | Metal electrical contact for high current density applications in LED and laser devices |
| JP3469484B2 (ja) | 1998-12-24 | 2003-11-25 | 株式会社東芝 | 半導体発光素子およびその製造方法 |
| JP2000252230A (ja) * | 1998-12-28 | 2000-09-14 | Sanyo Electric Co Ltd | 半導体素子およびその製造方法 |
| US6876003B1 (en) * | 1999-04-15 | 2005-04-05 | Sumitomo Electric Industries, Ltd. | Semiconductor light-emitting device, method of manufacturing transparent conductor film and method of manufacturing compound semiconductor light-emitting device |
| US6894391B1 (en) | 1999-04-26 | 2005-05-17 | Sharp Kabushiki Kaisha | Electrode structure on P-type III group nitride semiconductor layer and formation method thereof |
| US6803603B1 (en) * | 1999-06-23 | 2004-10-12 | Kabushiki Kaisha Toshiba | Semiconductor light-emitting element |
| US7211877B1 (en) * | 1999-09-13 | 2007-05-01 | Vishay-Siliconix | Chip scale surface mount package for semiconductor device and process of fabricating the same |
| US6812502B1 (en) * | 1999-11-04 | 2004-11-02 | Uni Light Technology Incorporation | Flip-chip light-emitting device |
| US7595547B1 (en) * | 2005-06-13 | 2009-09-29 | Vishay-Siliconix | Semiconductor die package including cup-shaped leadframe |
| US6744124B1 (en) * | 1999-12-10 | 2004-06-01 | Siliconix Incorporated | Semiconductor die package including cup-shaped leadframe |
| US6992334B1 (en) * | 1999-12-22 | 2006-01-31 | Lumileds Lighting U.S., Llc | Multi-layer highly reflective ohmic contacts for semiconductor devices |
| JP2001217456A (ja) * | 2000-02-03 | 2001-08-10 | Sharp Corp | 窒化ガリウム系化合物半導体発光素子 |
| JP4026294B2 (ja) * | 2000-03-07 | 2007-12-26 | 豊田合成株式会社 | Iii族窒化物系化合物半導体素子の製造方法 |
| US6526082B1 (en) * | 2000-06-02 | 2003-02-25 | Lumileds Lighting U.S., Llc | P-contact for GaN-based semiconductors utilizing a reverse-biased tunnel junction |
| JP4024994B2 (ja) * | 2000-06-30 | 2007-12-19 | 株式会社東芝 | 半導体発光素子 |
| DE10060439A1 (de) * | 2000-12-05 | 2002-06-13 | Osram Opto Semiconductors Gmbh | Kontaktmetallisierung für GaN-basierende Halbleiterstrukturen und Verfahren zu deren Herstellung |
| US6608360B2 (en) * | 2000-12-15 | 2003-08-19 | University Of Houston | One-chip micro-integrated optoelectronic sensor |
| US6888171B2 (en) * | 2000-12-22 | 2005-05-03 | Dallan Luming Science & Technology Group Co., Ltd. | Light emitting diode |
| JP4148664B2 (ja) * | 2001-02-02 | 2008-09-10 | 三洋電機株式会社 | 窒化物系半導体レーザ素子およびその形成方法 |
| JP5283293B2 (ja) * | 2001-02-21 | 2013-09-04 | ソニー株式会社 | 半導体発光素子 |
| JP3772098B2 (ja) | 2001-05-15 | 2006-05-10 | シャープ株式会社 | 窒化物系半導体発光装置 |
| JP3912044B2 (ja) * | 2001-06-06 | 2007-05-09 | 豊田合成株式会社 | Iii族窒化物系化合物半導体発光素子の製造方法 |
| TW543128B (en) * | 2001-07-12 | 2003-07-21 | Highlink Technology Corp | Surface mounted and flip chip type LED package |
| US6744075B2 (en) | 2001-09-17 | 2004-06-01 | Sanyo Electric Co., Ltd. | Nitride-based semiconductor light-emitting device and method of forming the same |
| TW588204B (en) * | 2002-03-14 | 2004-05-21 | Wintek Corp | Transparent conduction plate having low junction resistance and manufacturing method thereof |
| US8294172B2 (en) * | 2002-04-09 | 2012-10-23 | Lg Electronics Inc. | Method of fabricating vertical devices using a metal support film |
| JP2004006498A (ja) * | 2002-05-31 | 2004-01-08 | Toyoda Gosei Co Ltd | Iii族窒化物系化合物半導体発光素子 |
| US20030222263A1 (en) * | 2002-06-04 | 2003-12-04 | Kopin Corporation | High-efficiency light-emitting diodes |
| US6841802B2 (en) | 2002-06-26 | 2005-01-11 | Oriol, Inc. | Thin film light emitting diode |
| JP4507532B2 (ja) | 2002-08-27 | 2010-07-21 | 日亜化学工業株式会社 | 窒化物半導体素子 |
| KR100543696B1 (ko) * | 2002-09-09 | 2006-01-20 | 삼성전기주식회사 | 고효율 발광 다이오드 |
| TWI243488B (en) * | 2003-02-26 | 2005-11-11 | Osram Opto Semiconductors Gmbh | Electrical contact-area for optoelectronic semiconductor-chip and its production method |
| JP4519423B2 (ja) * | 2003-05-30 | 2010-08-04 | 創世理工株式会社 | 半導体を用いた光デバイス |
| KR100561841B1 (ko) * | 2003-08-23 | 2006-03-16 | 삼성전자주식회사 | 고품위 발광다이오드 및 레이저 다이오드의 구현을 위한질화 갈륨을 포함하는 p형 반도체의 오믹접촉형성을 위한투명박막전극 |
| KR100624411B1 (ko) * | 2003-08-25 | 2006-09-18 | 삼성전자주식회사 | 질화물계 발광소자 및 그 제조방법 |
| US20050070097A1 (en) * | 2003-09-29 | 2005-03-31 | International Business Machines Corporation | Atomic laminates for diffusion barrier applications |
| EP1548852B1 (en) * | 2003-12-22 | 2013-07-10 | Samsung Electronics Co., Ltd. | Top-emitting nitride-based light emitting device and method of manufacturing the same |
| KR100506741B1 (ko) * | 2003-12-24 | 2005-08-08 | 삼성전기주식회사 | 플립칩용 질화물 반도체 발광소자 및 그 제조방법 |
| TWI224877B (en) * | 2003-12-25 | 2004-12-01 | Super Nova Optoelectronics Cor | Gallium nitride series light-emitting diode structure and its manufacturing method |
| US7960746B2 (en) * | 2004-01-06 | 2011-06-14 | Samsung Led Co., Ltd. | Low resistance electrode and compound semiconductor light emitting device including the same |
| KR100586948B1 (ko) * | 2004-01-19 | 2006-06-07 | 삼성전기주식회사 | 질화물 반도체 발광소자 및 그 제조방법 |
| KR100601945B1 (ko) | 2004-03-10 | 2006-07-14 | 삼성전자주식회사 | 탑에미트형 질화물계 발광소자 및 그 제조방법 |
| KR100634503B1 (ko) * | 2004-03-12 | 2006-10-16 | 삼성전자주식회사 | 질화물계 발광소자 및 그 제조방법 |
| KR101119727B1 (ko) * | 2004-03-31 | 2012-03-23 | 니치아 카가쿠 고교 가부시키가이샤 | 질화물 반도체 발광 소자 |
| KR100611491B1 (ko) * | 2004-08-26 | 2006-08-10 | 엘지이노텍 주식회사 | 질화물 반도체 발광소자 및 그 제조방법 |
| US7215031B2 (en) * | 2004-11-10 | 2007-05-08 | Oki Electric Industry Co., Ltd. | Multi chip package |
| CN100358167C (zh) * | 2004-12-17 | 2007-12-26 | 北京工业大学 | 一种GaN基LED高反电极 |
| JP4603370B2 (ja) * | 2005-01-18 | 2010-12-22 | 創世理工株式会社 | 基板上に作製された半導体光デバイスおよびその作製方法 |
| JP5089020B2 (ja) * | 2005-01-19 | 2012-12-05 | 創世理工株式会社 | 基板上に作製された半導体電子デバイス |
| WO2006109760A1 (ja) * | 2005-04-08 | 2006-10-19 | Mitsubishi Cable Industries, Ltd. | 半導体素子およびその製造方法 |
| KR100878433B1 (ko) * | 2005-05-18 | 2009-01-13 | 삼성전기주식회사 | 발광소자의 오믹컨택층 제조방법 및 이를 이용한발광소자의 제조방법 |
| JP5138873B2 (ja) | 2005-05-19 | 2013-02-06 | 日亜化学工業株式会社 | 窒化物半導体素子 |
| JP4030556B2 (ja) * | 2005-06-30 | 2008-01-09 | シャープ株式会社 | 窒化物半導体レーザ素子および窒化物半導体レーザ装置 |
| JP5067158B2 (ja) * | 2005-07-08 | 2012-11-07 | 日本電気株式会社 | 電極構造、半導体素子、およびそれらの製造方法 |
| KR101041843B1 (ko) * | 2005-07-30 | 2011-06-17 | 삼성엘이디 주식회사 | 질화물계 화합물 반도체 발광소자 및 그 제조방법 |
| EP1821347B1 (en) * | 2006-02-16 | 2018-01-03 | LG Electronics Inc. | Light emitting device having vertical structure and method for manufacturing the same |
| KR100833489B1 (ko) * | 2006-02-21 | 2008-05-29 | 한국전자통신연구원 | 실리콘 나노 점을 이용한 반도체 발광 소자 및 그 제조방법 |
| GB2446611B (en) * | 2007-02-14 | 2011-08-17 | Bookham Technology Plc | Low creep metallization for optoelectronic applications |
| JP5077068B2 (ja) * | 2007-05-30 | 2012-11-21 | 日亜化学工業株式会社 | 窒化物半導体素子及びその製造方法 |
| TWI341600B (en) * | 2007-08-31 | 2011-05-01 | Huga Optotech Inc | Light optoelectronic device and forming method thereof |
| JP4486701B1 (ja) | 2008-11-06 | 2010-06-23 | パナソニック株式会社 | 窒化物系半導体素子およびその製造方法 |
| EP2273573A4 (en) * | 2009-03-11 | 2012-11-14 | Panasonic Corp | NITRIDE SEMICONDUCTOR ELEMENT AND MANUFACTURING METHOD THEREFOR |
| JP5502360B2 (ja) * | 2009-04-10 | 2014-05-28 | スタンレー電気株式会社 | 酸化亜鉛系半導体素子及びその製造方法 |
| JP5498723B2 (ja) * | 2009-04-10 | 2014-05-21 | スタンレー電気株式会社 | 酸化亜鉛系半導体素子及びその製造方法 |
| CN102511085A (zh) * | 2009-12-25 | 2012-06-20 | 松下电器产业株式会社 | 氮化物系半导体元件及其制造方法 |
| JP4843123B2 (ja) | 2010-04-01 | 2011-12-21 | パナソニック株式会社 | 窒化物系半導体素子およびその製造方法 |
| WO2011125290A1 (ja) * | 2010-04-02 | 2011-10-13 | パナソニック株式会社 | 窒化物系半導体素子およびその製造方法 |
| JP5547279B2 (ja) * | 2010-04-28 | 2014-07-09 | パナソニック株式会社 | 窒化物系半導体素子およびその製造方法 |
| JP5685035B2 (ja) * | 2010-09-24 | 2015-03-18 | 住友電気工業株式会社 | 半導体発光素子の製造方法 |
| JP5232338B2 (ja) * | 2011-04-08 | 2013-07-10 | パナソニック株式会社 | 窒化物系半導体素子およびその製造方法 |
| CN106328781B (zh) * | 2016-11-03 | 2018-12-11 | 湘能华磊光电股份有限公司 | 高反射率led电极及其制备方法 |
| JP2019134119A (ja) * | 2018-02-01 | 2019-08-08 | 豊田合成株式会社 | Iii族窒化物半導体発光素子 |
| CN116682915A (zh) * | 2021-02-20 | 2023-09-01 | 厦门三安光电有限公司 | 半导体发光元件及其制造方法 |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5740192A (en) * | 1994-12-19 | 1998-04-14 | Kabushiki Kaisha Toshiba | Semiconductor laser |
| JP3457468B2 (ja) * | 1995-09-12 | 2003-10-20 | 株式会社東芝 | 多層構造半導体装置 |
| JP2941743B2 (ja) * | 1996-06-05 | 1999-08-30 | 株式会社東芝 | 化合物半導体発光素子及びその製造方法 |
-
1998
- 1998-03-25 JP JP07747798A patent/JP4183299B2/ja not_active Expired - Fee Related
-
1999
- 1999-03-03 US US09/261,819 patent/US5990500A/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH11274562A (ja) | 1999-10-08 |
| US5990500A (en) | 1999-11-23 |
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