JP4183299B2 - 窒化ガリウム系化合物半導体発光素子 - Google Patents

窒化ガリウム系化合物半導体発光素子 Download PDF

Info

Publication number
JP4183299B2
JP4183299B2 JP07747798A JP7747798A JP4183299B2 JP 4183299 B2 JP4183299 B2 JP 4183299B2 JP 07747798 A JP07747798 A JP 07747798A JP 7747798 A JP7747798 A JP 7747798A JP 4183299 B2 JP4183299 B2 JP 4183299B2
Authority
JP
Japan
Prior art keywords
layer
electrode
metal layer
light emitting
emitting device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP07747798A
Other languages
English (en)
Japanese (ja)
Other versions
JPH11274562A (ja
JPH11274562A5 (enExample
Inventor
崎 治 彦 岡
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP07747798A priority Critical patent/JP4183299B2/ja
Priority to US09/261,819 priority patent/US5990500A/en
Publication of JPH11274562A publication Critical patent/JPH11274562A/ja
Publication of JPH11274562A5 publication Critical patent/JPH11274562A5/ja
Application granted granted Critical
Publication of JP4183299B2 publication Critical patent/JP4183299B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Images

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80Constructional details
    • H10H20/83Electrodes
    • H10H20/832Electrodes characterised by their material
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80Constructional details
    • H10H20/83Electrodes
    • H10H20/832Electrodes characterised by their material
    • H10H20/833Transparent materials
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • H01L2224/161Disposition
    • H01L2224/16151Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/16221Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/16245Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48245Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
    • H01L2224/48247Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic connecting the wire to a bond pad of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48245Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
    • H01L2224/48257Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic connecting the wire to a die pad of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/49Structure, shape, material or disposition of the wire connectors after the connecting process of a plurality of wire connectors
    • H01L2224/491Disposition
    • H01L2224/49105Connecting at different heights
    • H01L2224/49107Connecting at different heights on the semiconductor or solid-state body

Landscapes

  • Led Devices (AREA)
JP07747798A 1998-03-25 1998-03-25 窒化ガリウム系化合物半導体発光素子 Expired - Fee Related JP4183299B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP07747798A JP4183299B2 (ja) 1998-03-25 1998-03-25 窒化ガリウム系化合物半導体発光素子
US09/261,819 US5990500A (en) 1998-03-25 1999-03-03 Nitride compound semiconductor light emitting element and its manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP07747798A JP4183299B2 (ja) 1998-03-25 1998-03-25 窒化ガリウム系化合物半導体発光素子

Publications (3)

Publication Number Publication Date
JPH11274562A JPH11274562A (ja) 1999-10-08
JPH11274562A5 JPH11274562A5 (enExample) 2005-06-16
JP4183299B2 true JP4183299B2 (ja) 2008-11-19

Family

ID=13635078

Family Applications (1)

Application Number Title Priority Date Filing Date
JP07747798A Expired - Fee Related JP4183299B2 (ja) 1998-03-25 1998-03-25 窒化ガリウム系化合物半導体発光素子

Country Status (2)

Country Link
US (1) US5990500A (enExample)
JP (1) JP4183299B2 (enExample)

Families Citing this family (76)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6291840B1 (en) 1996-11-29 2001-09-18 Toyoda Gosei Co., Ltd. GaN related compound semiconductor light-emitting device
JPH10247747A (ja) 1997-03-05 1998-09-14 Toshiba Corp 半導体発光素子およびその製造方法
US6936859B1 (en) 1998-05-13 2005-08-30 Toyoda Gosei Co., Ltd. Light-emitting semiconductor device using group III nitride compound
US6262440B1 (en) * 1998-06-29 2001-07-17 Philips Electronics North America Corp. Metal electrical contact for high current density applications in LED and laser devices
JP3469484B2 (ja) 1998-12-24 2003-11-25 株式会社東芝 半導体発光素子およびその製造方法
JP2000252230A (ja) * 1998-12-28 2000-09-14 Sanyo Electric Co Ltd 半導体素子およびその製造方法
US6876003B1 (en) * 1999-04-15 2005-04-05 Sumitomo Electric Industries, Ltd. Semiconductor light-emitting device, method of manufacturing transparent conductor film and method of manufacturing compound semiconductor light-emitting device
US6894391B1 (en) 1999-04-26 2005-05-17 Sharp Kabushiki Kaisha Electrode structure on P-type III group nitride semiconductor layer and formation method thereof
US6803603B1 (en) * 1999-06-23 2004-10-12 Kabushiki Kaisha Toshiba Semiconductor light-emitting element
US7211877B1 (en) * 1999-09-13 2007-05-01 Vishay-Siliconix Chip scale surface mount package for semiconductor device and process of fabricating the same
US6812502B1 (en) * 1999-11-04 2004-11-02 Uni Light Technology Incorporation Flip-chip light-emitting device
US7595547B1 (en) * 2005-06-13 2009-09-29 Vishay-Siliconix Semiconductor die package including cup-shaped leadframe
US6744124B1 (en) * 1999-12-10 2004-06-01 Siliconix Incorporated Semiconductor die package including cup-shaped leadframe
US6992334B1 (en) * 1999-12-22 2006-01-31 Lumileds Lighting U.S., Llc Multi-layer highly reflective ohmic contacts for semiconductor devices
JP2001217456A (ja) * 2000-02-03 2001-08-10 Sharp Corp 窒化ガリウム系化合物半導体発光素子
JP4026294B2 (ja) * 2000-03-07 2007-12-26 豊田合成株式会社 Iii族窒化物系化合物半導体素子の製造方法
US6526082B1 (en) * 2000-06-02 2003-02-25 Lumileds Lighting U.S., Llc P-contact for GaN-based semiconductors utilizing a reverse-biased tunnel junction
JP4024994B2 (ja) * 2000-06-30 2007-12-19 株式会社東芝 半導体発光素子
DE10060439A1 (de) * 2000-12-05 2002-06-13 Osram Opto Semiconductors Gmbh Kontaktmetallisierung für GaN-basierende Halbleiterstrukturen und Verfahren zu deren Herstellung
US6608360B2 (en) * 2000-12-15 2003-08-19 University Of Houston One-chip micro-integrated optoelectronic sensor
US6888171B2 (en) * 2000-12-22 2005-05-03 Dallan Luming Science & Technology Group Co., Ltd. Light emitting diode
JP4148664B2 (ja) * 2001-02-02 2008-09-10 三洋電機株式会社 窒化物系半導体レーザ素子およびその形成方法
JP5283293B2 (ja) * 2001-02-21 2013-09-04 ソニー株式会社 半導体発光素子
JP3772098B2 (ja) 2001-05-15 2006-05-10 シャープ株式会社 窒化物系半導体発光装置
JP3912044B2 (ja) * 2001-06-06 2007-05-09 豊田合成株式会社 Iii族窒化物系化合物半導体発光素子の製造方法
TW543128B (en) * 2001-07-12 2003-07-21 Highlink Technology Corp Surface mounted and flip chip type LED package
US6744075B2 (en) 2001-09-17 2004-06-01 Sanyo Electric Co., Ltd. Nitride-based semiconductor light-emitting device and method of forming the same
TW588204B (en) * 2002-03-14 2004-05-21 Wintek Corp Transparent conduction plate having low junction resistance and manufacturing method thereof
US8294172B2 (en) * 2002-04-09 2012-10-23 Lg Electronics Inc. Method of fabricating vertical devices using a metal support film
JP2004006498A (ja) * 2002-05-31 2004-01-08 Toyoda Gosei Co Ltd Iii族窒化物系化合物半導体発光素子
US20030222263A1 (en) * 2002-06-04 2003-12-04 Kopin Corporation High-efficiency light-emitting diodes
US6841802B2 (en) 2002-06-26 2005-01-11 Oriol, Inc. Thin film light emitting diode
JP4507532B2 (ja) 2002-08-27 2010-07-21 日亜化学工業株式会社 窒化物半導体素子
KR100543696B1 (ko) * 2002-09-09 2006-01-20 삼성전기주식회사 고효율 발광 다이오드
TWI243488B (en) * 2003-02-26 2005-11-11 Osram Opto Semiconductors Gmbh Electrical contact-area for optoelectronic semiconductor-chip and its production method
JP4519423B2 (ja) * 2003-05-30 2010-08-04 創世理工株式会社 半導体を用いた光デバイス
KR100561841B1 (ko) * 2003-08-23 2006-03-16 삼성전자주식회사 고품위 발광다이오드 및 레이저 다이오드의 구현을 위한질화 갈륨을 포함하는 p형 반도체의 오믹접촉형성을 위한투명박막전극
KR100624411B1 (ko) * 2003-08-25 2006-09-18 삼성전자주식회사 질화물계 발광소자 및 그 제조방법
US20050070097A1 (en) * 2003-09-29 2005-03-31 International Business Machines Corporation Atomic laminates for diffusion barrier applications
EP1548852B1 (en) * 2003-12-22 2013-07-10 Samsung Electronics Co., Ltd. Top-emitting nitride-based light emitting device and method of manufacturing the same
KR100506741B1 (ko) * 2003-12-24 2005-08-08 삼성전기주식회사 플립칩용 질화물 반도체 발광소자 및 그 제조방법
TWI224877B (en) * 2003-12-25 2004-12-01 Super Nova Optoelectronics Cor Gallium nitride series light-emitting diode structure and its manufacturing method
US7960746B2 (en) * 2004-01-06 2011-06-14 Samsung Led Co., Ltd. Low resistance electrode and compound semiconductor light emitting device including the same
KR100586948B1 (ko) * 2004-01-19 2006-06-07 삼성전기주식회사 질화물 반도체 발광소자 및 그 제조방법
KR100601945B1 (ko) 2004-03-10 2006-07-14 삼성전자주식회사 탑에미트형 질화물계 발광소자 및 그 제조방법
KR100634503B1 (ko) * 2004-03-12 2006-10-16 삼성전자주식회사 질화물계 발광소자 및 그 제조방법
KR101119727B1 (ko) * 2004-03-31 2012-03-23 니치아 카가쿠 고교 가부시키가이샤 질화물 반도체 발광 소자
KR100611491B1 (ko) * 2004-08-26 2006-08-10 엘지이노텍 주식회사 질화물 반도체 발광소자 및 그 제조방법
US7215031B2 (en) * 2004-11-10 2007-05-08 Oki Electric Industry Co., Ltd. Multi chip package
CN100358167C (zh) * 2004-12-17 2007-12-26 北京工业大学 一种GaN基LED高反电极
JP4603370B2 (ja) * 2005-01-18 2010-12-22 創世理工株式会社 基板上に作製された半導体光デバイスおよびその作製方法
JP5089020B2 (ja) * 2005-01-19 2012-12-05 創世理工株式会社 基板上に作製された半導体電子デバイス
WO2006109760A1 (ja) * 2005-04-08 2006-10-19 Mitsubishi Cable Industries, Ltd. 半導体素子およびその製造方法
KR100878433B1 (ko) * 2005-05-18 2009-01-13 삼성전기주식회사 발광소자의 오믹컨택층 제조방법 및 이를 이용한발광소자의 제조방법
JP5138873B2 (ja) 2005-05-19 2013-02-06 日亜化学工業株式会社 窒化物半導体素子
JP4030556B2 (ja) * 2005-06-30 2008-01-09 シャープ株式会社 窒化物半導体レーザ素子および窒化物半導体レーザ装置
JP5067158B2 (ja) * 2005-07-08 2012-11-07 日本電気株式会社 電極構造、半導体素子、およびそれらの製造方法
KR101041843B1 (ko) * 2005-07-30 2011-06-17 삼성엘이디 주식회사 질화물계 화합물 반도체 발광소자 및 그 제조방법
EP1821347B1 (en) * 2006-02-16 2018-01-03 LG Electronics Inc. Light emitting device having vertical structure and method for manufacturing the same
KR100833489B1 (ko) * 2006-02-21 2008-05-29 한국전자통신연구원 실리콘 나노 점을 이용한 반도체 발광 소자 및 그 제조방법
GB2446611B (en) * 2007-02-14 2011-08-17 Bookham Technology Plc Low creep metallization for optoelectronic applications
JP5077068B2 (ja) * 2007-05-30 2012-11-21 日亜化学工業株式会社 窒化物半導体素子及びその製造方法
TWI341600B (en) * 2007-08-31 2011-05-01 Huga Optotech Inc Light optoelectronic device and forming method thereof
JP4486701B1 (ja) 2008-11-06 2010-06-23 パナソニック株式会社 窒化物系半導体素子およびその製造方法
EP2273573A4 (en) * 2009-03-11 2012-11-14 Panasonic Corp NITRIDE SEMICONDUCTOR ELEMENT AND MANUFACTURING METHOD THEREFOR
JP5502360B2 (ja) * 2009-04-10 2014-05-28 スタンレー電気株式会社 酸化亜鉛系半導体素子及びその製造方法
JP5498723B2 (ja) * 2009-04-10 2014-05-21 スタンレー電気株式会社 酸化亜鉛系半導体素子及びその製造方法
CN102511085A (zh) * 2009-12-25 2012-06-20 松下电器产业株式会社 氮化物系半导体元件及其制造方法
JP4843123B2 (ja) 2010-04-01 2011-12-21 パナソニック株式会社 窒化物系半導体素子およびその製造方法
WO2011125290A1 (ja) * 2010-04-02 2011-10-13 パナソニック株式会社 窒化物系半導体素子およびその製造方法
JP5547279B2 (ja) * 2010-04-28 2014-07-09 パナソニック株式会社 窒化物系半導体素子およびその製造方法
JP5685035B2 (ja) * 2010-09-24 2015-03-18 住友電気工業株式会社 半導体発光素子の製造方法
JP5232338B2 (ja) * 2011-04-08 2013-07-10 パナソニック株式会社 窒化物系半導体素子およびその製造方法
CN106328781B (zh) * 2016-11-03 2018-12-11 湘能华磊光电股份有限公司 高反射率led电极及其制备方法
JP2019134119A (ja) * 2018-02-01 2019-08-08 豊田合成株式会社 Iii族窒化物半導体発光素子
CN116682915A (zh) * 2021-02-20 2023-09-01 厦门三安光电有限公司 半导体发光元件及其制造方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5740192A (en) * 1994-12-19 1998-04-14 Kabushiki Kaisha Toshiba Semiconductor laser
JP3457468B2 (ja) * 1995-09-12 2003-10-20 株式会社東芝 多層構造半導体装置
JP2941743B2 (ja) * 1996-06-05 1999-08-30 株式会社東芝 化合物半導体発光素子及びその製造方法

Also Published As

Publication number Publication date
JPH11274562A (ja) 1999-10-08
US5990500A (en) 1999-11-23

Similar Documents

Publication Publication Date Title
JP4183299B2 (ja) 窒化ガリウム系化合物半導体発光素子
CN102484185B (zh) 半导体发光二极管及其制造方法
CN100433379C (zh) 半导体发光元件及其制造方法
JP4449405B2 (ja) 窒化物半導体発光素子およびその製造方法
JP5092419B2 (ja) GaN系発光ダイオード素子
JP4159865B2 (ja) 窒化物系化合物半導体発光素子の製造方法
JP7049186B2 (ja) 半導体発光素子および半導体発光素子の製造方法
JP2001217456A (ja) 窒化ガリウム系化合物半導体発光素子
JP2697572B2 (ja) 窒化ガリウム系化合物半導体発光素子
JP3207773B2 (ja) 化合物半導体発光素子及びその製造方法
JP2000294837A (ja) 窒化ガリウム系化合物半導体発光素子
TWI274429B (en) Semiconductor light-emitting device and manufacturing method thereof
JPH09232632A (ja) 半導体発光素子及びその製造方法
JP5608589B2 (ja) 半導体発光素子および半導体発光素子の製造方法
JP2011151393A (ja) バーチカル型iii族窒化物半導体発光素子およびその製造方法
KR20080015794A (ko) InGaAlN 발광 장치 및 이의 제조 방법
JP2007103689A (ja) 半導体発光装置
KR20080053180A (ko) 반도체 발광소자용 지지기판 및 상기 지지기판을 이용한고성능 수직구조의 반도체 발광소자
KR101510382B1 (ko) 수직구조의 그룹 3족 질화물계 반도체 발광다이오드 소자및 제조방법
JP2005011857A (ja) 窒化物半導体発光素子
TWI568024B (zh) Nitride semiconductor light emitting device and manufacturing method thereof
JP2007042952A (ja) 窒化ガリウム系化合物半導体発光素子
US6653215B1 (en) Contact to n-GaN with Au termination
JP4868821B2 (ja) 窒化ガリウム系化合物半導体及び発光素子
JP2004319672A (ja) 発光ダイオード

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20040922

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20040922

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20070316

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20070508

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20070709

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20080311

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20080512

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20080826

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20080902

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20110912

Year of fee payment: 3

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20110912

Year of fee payment: 3

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20110912

Year of fee payment: 3

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20120912

Year of fee payment: 4

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20120912

Year of fee payment: 4

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20130912

Year of fee payment: 5

LAPS Cancellation because of no payment of annual fees