JP4163950B2 - セルフティーチングロボット - Google Patents
セルフティーチングロボット Download PDFInfo
- Publication number
- JP4163950B2 JP4163950B2 JP2002548748A JP2002548748A JP4163950B2 JP 4163950 B2 JP4163950 B2 JP 4163950B2 JP 2002548748 A JP2002548748 A JP 2002548748A JP 2002548748 A JP2002548748 A JP 2002548748A JP 4163950 B2 JP4163950 B2 JP 4163950B2
- Authority
- JP
- Japan
- Prior art keywords
- robot
- target
- sensor
- end effector
- workpiece
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
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Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67259—Position monitoring, e.g. misposition detection or presence detection
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
- H01L21/681—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment using optical controlling means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68707—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a robot blade, or gripped by a gripper for conveyance
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Robotics (AREA)
- Manipulator (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US09/729,463 US6591160B2 (en) | 2000-12-04 | 2000-12-04 | Self teaching robot |
| PCT/US2001/044393 WO2002047115A2 (en) | 2000-12-04 | 2001-11-28 | Self teaching robot |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2004536443A JP2004536443A (ja) | 2004-12-02 |
| JP2004536443A5 JP2004536443A5 (enExample) | 2005-12-22 |
| JP4163950B2 true JP4163950B2 (ja) | 2008-10-08 |
Family
ID=24931146
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002548748A Expired - Fee Related JP4163950B2 (ja) | 2000-12-04 | 2001-11-28 | セルフティーチングロボット |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US6591160B2 (enExample) |
| JP (1) | JP4163950B2 (enExample) |
| AU (1) | AU2002236492A1 (enExample) |
| TW (1) | TW508289B (enExample) |
| WO (1) | WO2002047115A2 (enExample) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8309983B2 (en) | 2010-03-25 | 2012-11-13 | Lg Innotek Co., Ltd. | Light emitting device package and lighting system having the same |
| JP2014165439A (ja) * | 2013-02-27 | 2014-09-08 | Tokyo Electron Ltd | 基板搬送装置、基板受渡位置確認方法及び基板処理システム |
Families Citing this family (86)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6244121B1 (en) * | 1998-03-06 | 2001-06-12 | Applied Materials, Inc. | Sensor device for non-intrusive diagnosis of a semiconductor processing system |
| SE9900123L (sv) * | 1999-01-15 | 2000-07-16 | Abb Ab | Metod för robot |
| US6887026B1 (en) * | 2000-12-22 | 2005-05-03 | Infineon Technologie Sc300 Gmbh & Co. Kg | Semiconductor product container and system for handling a semiconductor product container |
| KR100383260B1 (ko) * | 2001-03-08 | 2003-05-09 | 삼성전자주식회사 | 레티클 위치감지장치기능을 갖는 포크 암을 구비한 레이클이송장치 |
| JP3694808B2 (ja) * | 2001-04-13 | 2005-09-14 | 株式会社安川電機 | ウェハ搬送用ロボットの教示方法および教示用プレート |
| US6678583B2 (en) * | 2001-08-06 | 2004-01-13 | Seminet, Inc. | Robotic storage buffer system for substrate carrier pods |
| JP3832292B2 (ja) * | 2001-08-31 | 2006-10-11 | 株式会社ダイフク | 荷保管設備 |
| CN100431806C (zh) * | 2001-09-07 | 2008-11-12 | 株式会社安川电机 | 晶片位置教示方法和教示用夹具 |
| US20030053892A1 (en) * | 2001-09-17 | 2003-03-20 | Taiwan Semiconductor Manufacturing Co., Ltd. | Loadport equipped with automatic height adjustment means and method for operating |
| US7289230B2 (en) | 2002-02-06 | 2007-10-30 | Cyberoptics Semiconductors, Inc. | Wireless substrate-like sensor |
| US7233841B2 (en) * | 2002-04-19 | 2007-06-19 | Applied Materials, Inc. | Vision system |
| US7085622B2 (en) | 2002-04-19 | 2006-08-01 | Applied Material, Inc. | Vision system |
| US6825485B1 (en) * | 2002-05-08 | 2004-11-30 | Storage Technology Corporation | System and method for aligning a robot device in a data storage library |
| US7039499B1 (en) * | 2002-08-02 | 2006-05-02 | Seminet Inc. | Robotic storage buffer system for substrate carrier pods |
| US6795786B2 (en) * | 2002-12-31 | 2004-09-21 | Intel Corporation | Robotic sensor calibration system |
| US7397539B2 (en) * | 2003-03-31 | 2008-07-08 | Asml Netherlands, B.V. | Transfer apparatus for transferring an object, lithographic apparatus employing such a transfer apparatus, and method of use thereof |
| SG125948A1 (en) * | 2003-03-31 | 2006-10-30 | Asml Netherlands Bv | Supporting structure for use in a lithographic apparatus |
| KR101015778B1 (ko) * | 2003-06-03 | 2011-02-22 | 도쿄엘렉트론가부시키가이샤 | 기판 처리장치 및 기판 수수 위치의 조정 방법 |
| JP4137711B2 (ja) * | 2003-06-16 | 2008-08-20 | 東京エレクトロン株式会社 | 基板処理装置及び基板搬送手段の位置合わせ方法 |
| US6934606B1 (en) * | 2003-06-20 | 2005-08-23 | Novellus Systems, Inc. | Automatic calibration of a wafer-handling robot |
| US7458763B2 (en) * | 2003-11-10 | 2008-12-02 | Blueshift Technologies, Inc. | Mid-entry load lock for semiconductor handling system |
| US10086511B2 (en) | 2003-11-10 | 2018-10-02 | Brooks Automation, Inc. | Semiconductor manufacturing systems |
| US20070269297A1 (en) | 2003-11-10 | 2007-11-22 | Meulen Peter V D | Semiconductor wafer handling and transport |
| US20050111956A1 (en) * | 2003-11-10 | 2005-05-26 | Blueshift Technologies, Inc. | Methods and systems for reducing the effect of vibration in a vacuum-based semiconductor handling system |
| KR100577582B1 (ko) * | 2004-06-09 | 2006-05-08 | 삼성전자주식회사 | 반도체 포토 스피너 설비 및 이를 이용한 웨이퍼 티칭불량방지방법 |
| JP4775584B2 (ja) * | 2004-06-25 | 2011-09-21 | 株式会社安川電機 | ポジショナおよび複合カールコード |
| US20060047363A1 (en) * | 2004-08-31 | 2006-03-02 | Farrelly Philip J | Machine vision system for lab workcells |
| US8000837B2 (en) | 2004-10-05 | 2011-08-16 | J&L Group International, Llc | Programmable load forming system, components thereof, and methods of use |
| TWI447061B (zh) * | 2005-07-11 | 2014-08-01 | Brooks Automation Inc | 備有自動化對準功能的基板移送裝置 |
| US7933685B1 (en) * | 2006-01-10 | 2011-04-26 | National Semiconductor Corporation | System and method for calibrating a wafer handling robot and a wafer cassette |
| US20070271638A1 (en) * | 2006-05-03 | 2007-11-22 | Data I/O Corporation | Auto-teaching system |
| WO2008051544A1 (en) * | 2006-10-23 | 2008-05-02 | Cyberoptics Semiconductor, Inc. | Improved calibration of a substrate handling robot |
| US8260461B2 (en) * | 2007-08-30 | 2012-09-04 | Applied Materials, Inc. | Method and system for robot calibrations with a camera |
| US8224607B2 (en) * | 2007-08-30 | 2012-07-17 | Applied Materials, Inc. | Method and apparatus for robot calibrations with a calibrating device |
| US8588958B2 (en) * | 2007-09-04 | 2013-11-19 | Musashi Engineering, Inc. | Moving program making-out program and device |
| JP4863985B2 (ja) * | 2007-12-20 | 2012-01-25 | 大日本スクリーン製造株式会社 | 基板処理装置 |
| US9269529B2 (en) * | 2007-12-27 | 2016-02-23 | Lam Research Corporation | Systems and methods for dynamic alignment beam calibration |
| CN101911276B (zh) * | 2007-12-27 | 2012-04-25 | 朗姆研究公司 | 使用至少一个光源校准末端执行器对准的系统和方法 |
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| US8751047B2 (en) * | 2007-12-27 | 2014-06-10 | Lam Research Corporation | Systems and methods for calibrating end effector alignment in a plasma processing system |
| US7921690B2 (en) * | 2008-01-10 | 2011-04-12 | Parata Systems, Llc | System and method for calibrating an automated materials handling system |
| NL1036673A1 (nl) * | 2008-04-09 | 2009-10-12 | Asml Holding Nv | Robot Position Calibration Tool (RPCT). |
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-
2000
- 2000-12-04 US US09/729,463 patent/US6591160B2/en not_active Expired - Fee Related
-
2001
- 2001-11-28 WO PCT/US2001/044393 patent/WO2002047115A2/en not_active Ceased
- 2001-11-28 AU AU2002236492A patent/AU2002236492A1/en not_active Abandoned
- 2001-11-28 JP JP2002548748A patent/JP4163950B2/ja not_active Expired - Fee Related
- 2001-12-03 TW TW090129815A patent/TW508289B/zh not_active IP Right Cessation
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8309983B2 (en) | 2010-03-25 | 2012-11-13 | Lg Innotek Co., Ltd. | Light emitting device package and lighting system having the same |
| JP2014165439A (ja) * | 2013-02-27 | 2014-09-08 | Tokyo Electron Ltd | 基板搬送装置、基板受渡位置確認方法及び基板処理システム |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2002047115A3 (en) | 2003-05-15 |
| US20020068992A1 (en) | 2002-06-06 |
| JP2004536443A (ja) | 2004-12-02 |
| TW508289B (en) | 2002-11-01 |
| AU2002236492A1 (en) | 2002-06-18 |
| US6591160B2 (en) | 2003-07-08 |
| WO2002047115A2 (en) | 2002-06-13 |
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