TW508289B - Self teaching robot - Google Patents
Self teaching robot Download PDFInfo
- Publication number
- TW508289B TW508289B TW090129815A TW90129815A TW508289B TW 508289 B TW508289 B TW 508289B TW 090129815 A TW090129815 A TW 090129815A TW 90129815 A TW90129815 A TW 90129815A TW 508289 B TW508289 B TW 508289B
- Authority
- TW
- Taiwan
- Prior art keywords
- workpiece
- sensor
- target
- transfer mechanism
- robot
- Prior art date
Links
- 230000007704 transition Effects 0.000 claims abstract description 71
- 238000012546 transfer Methods 0.000 claims description 54
- 230000007246 mechanism Effects 0.000 claims description 46
- 238000000034 method Methods 0.000 claims description 40
- 230000008859 change Effects 0.000 claims description 9
- 238000012937 correction Methods 0.000 claims description 9
- 239000004065 semiconductor Substances 0.000 claims description 8
- 230000006870 function Effects 0.000 claims description 5
- 230000001939 inductive effect Effects 0.000 claims description 5
- 230000000694 effects Effects 0.000 claims description 4
- 238000005259 measurement Methods 0.000 claims description 3
- 238000002310 reflectometry Methods 0.000 claims description 2
- 238000003860 storage Methods 0.000 claims description 2
- 230000009466 transformation Effects 0.000 claims 3
- 230000003213 activating effect Effects 0.000 claims 1
- 230000005292 diamagnetic effect Effects 0.000 claims 1
- 210000002784 stomach Anatomy 0.000 claims 1
- 210000003462 vein Anatomy 0.000 claims 1
- 239000012636 effector Substances 0.000 abstract description 28
- 235000012431 wafers Nutrition 0.000 description 29
- 230000008901 benefit Effects 0.000 description 17
- 230000009471 action Effects 0.000 description 9
- 229910052704 radon Inorganic materials 0.000 description 6
- SYUHGPGVQRZVTB-UHFFFAOYSA-N radon atom Chemical compound [Rn] SYUHGPGVQRZVTB-UHFFFAOYSA-N 0.000 description 6
- 239000000463 material Substances 0.000 description 5
- 239000011295 pitch Substances 0.000 description 5
- 229920000049 Carbon (fiber) Polymers 0.000 description 4
- 238000013459 approach Methods 0.000 description 4
- 239000004917 carbon fiber Substances 0.000 description 4
- 239000000835 fiber Substances 0.000 description 4
- 230000008569 process Effects 0.000 description 4
- 238000012545 processing Methods 0.000 description 4
- 230000006378 damage Effects 0.000 description 3
- 238000013461 design Methods 0.000 description 3
- 238000013507 mapping Methods 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 230000035945 sensitivity Effects 0.000 description 3
- 238000009434 installation Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 230000000007 visual effect Effects 0.000 description 2
- 241000208140 Acer Species 0.000 description 1
- 206010011469 Crying Diseases 0.000 description 1
- 241000196324 Embryophyta Species 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 208000027418 Wounds and injury Diseases 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 239000002775 capsule Substances 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 230000000295 complement effect Effects 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 238000007872 degassing Methods 0.000 description 1
- 238000003745 diagnosis Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 208000014674 injury Diseases 0.000 description 1
- 238000007648 laser printing Methods 0.000 description 1
- WABPQHHGFIMREM-UHFFFAOYSA-N lead(0) Chemical compound [Pb] WABPQHHGFIMREM-UHFFFAOYSA-N 0.000 description 1
- 238000010943 off-gassing Methods 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- 230000008439 repair process Effects 0.000 description 1
- 150000003377 silicon compounds Chemical class 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000010561 standard procedure Methods 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 239000013589 supplement Substances 0.000 description 1
- 229910052714 tellurium Inorganic materials 0.000 description 1
- PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical compound [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 238000013519 translation Methods 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67259—Position monitoring, e.g. misposition detection or presence detection
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
- H01L21/681—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment using optical controlling means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68707—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a robot blade, or gripped by a gripper for conveyance
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Robotics (AREA)
- Manipulator (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US09/729,463 US6591160B2 (en) | 2000-12-04 | 2000-12-04 | Self teaching robot |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TW508289B true TW508289B (en) | 2002-11-01 |
Family
ID=24931146
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW090129815A TW508289B (en) | 2000-12-04 | 2001-12-03 | Self teaching robot |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US6591160B2 (enExample) |
| JP (1) | JP4163950B2 (enExample) |
| AU (1) | AU2002236492A1 (enExample) |
| TW (1) | TW508289B (enExample) |
| WO (1) | WO2002047115A2 (enExample) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI447544B (zh) * | 2007-09-04 | 2014-08-01 | Musashi Engineering Inc | A memory medium, a device, and a computer program that has a program that creates a mobile program |
| TWI801456B (zh) * | 2017-12-12 | 2023-05-11 | 日商東京威力科創股份有限公司 | 搬送裝置之教導方法及基板處理系統 |
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| US6887026B1 (en) * | 2000-12-22 | 2005-05-03 | Infineon Technologie Sc300 Gmbh & Co. Kg | Semiconductor product container and system for handling a semiconductor product container |
| KR100383260B1 (ko) * | 2001-03-08 | 2003-05-09 | 삼성전자주식회사 | 레티클 위치감지장치기능을 갖는 포크 암을 구비한 레이클이송장치 |
| JP3694808B2 (ja) * | 2001-04-13 | 2005-09-14 | 株式会社安川電機 | ウェハ搬送用ロボットの教示方法および教示用プレート |
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| JP3832292B2 (ja) * | 2001-08-31 | 2006-10-11 | 株式会社ダイフク | 荷保管設備 |
| CN100431806C (zh) * | 2001-09-07 | 2008-11-12 | 株式会社安川电机 | 晶片位置教示方法和教示用夹具 |
| US20030053892A1 (en) * | 2001-09-17 | 2003-03-20 | Taiwan Semiconductor Manufacturing Co., Ltd. | Loadport equipped with automatic height adjustment means and method for operating |
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- 2000-12-04 US US09/729,463 patent/US6591160B2/en not_active Expired - Fee Related
-
2001
- 2001-11-28 WO PCT/US2001/044393 patent/WO2002047115A2/en not_active Ceased
- 2001-11-28 AU AU2002236492A patent/AU2002236492A1/en not_active Abandoned
- 2001-11-28 JP JP2002548748A patent/JP4163950B2/ja not_active Expired - Fee Related
- 2001-12-03 TW TW090129815A patent/TW508289B/zh not_active IP Right Cessation
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI447544B (zh) * | 2007-09-04 | 2014-08-01 | Musashi Engineering Inc | A memory medium, a device, and a computer program that has a program that creates a mobile program |
| TWI801456B (zh) * | 2017-12-12 | 2023-05-11 | 日商東京威力科創股份有限公司 | 搬送裝置之教導方法及基板處理系統 |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2002047115A3 (en) | 2003-05-15 |
| US20020068992A1 (en) | 2002-06-06 |
| JP2004536443A (ja) | 2004-12-02 |
| AU2002236492A1 (en) | 2002-06-18 |
| JP4163950B2 (ja) | 2008-10-08 |
| US6591160B2 (en) | 2003-07-08 |
| WO2002047115A2 (en) | 2002-06-13 |
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