JP3554186B2 - 露光装置、デバイス製造方法および反力受け方法 - Google Patents

露光装置、デバイス製造方法および反力受け方法 Download PDF

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Publication number
JP3554186B2
JP3554186B2 JP09589598A JP9589598A JP3554186B2 JP 3554186 B2 JP3554186 B2 JP 3554186B2 JP 09589598 A JP09589598 A JP 09589598A JP 9589598 A JP9589598 A JP 9589598A JP 3554186 B2 JP3554186 B2 JP 3554186B2
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JP
Japan
Prior art keywords
stage
reaction force
exposure apparatus
floor
support member
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP09589598A
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English (en)
Japanese (ja)
Other versions
JPH11297587A (ja
JPH11297587A5 (enExample
Inventor
幸夫 徳田
浩通 原
幸夫 高林
信吉 出口
繁行 鵜澤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP09589598A priority Critical patent/JP3554186B2/ja
Priority to US09/286,447 priority patent/US6493062B2/en
Priority to KR1019990012420A priority patent/KR19990083062A/ko
Publication of JPH11297587A publication Critical patent/JPH11297587A/ja
Application granted granted Critical
Publication of JP3554186B2 publication Critical patent/JP3554186B2/ja
Publication of JPH11297587A5 publication Critical patent/JPH11297587A5/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16F—SPRINGS; SHOCK-ABSORBERS; MEANS FOR DAMPING VIBRATION
    • F16F15/00—Suppression of vibrations in systems; Means or arrangements for avoiding or reducing out-of-balance forces, e.g. due to motion
    • F16F15/02—Suppression of vibrations of non-rotating, e.g. reciprocating systems; Suppression of vibrations of rotating systems by use of members not moving with the rotating systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
    • G03B27/42—Projection printing apparatus, e.g. enlarger, copying camera for automatic sequential copying of the same original
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G03F7/70725—Stages control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • General Engineering & Computer Science (AREA)
  • Toxicology (AREA)
  • Mechanical Engineering (AREA)
  • Aviation & Aerospace Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Acoustics & Sound (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Vibration Prevention Devices (AREA)
JP09589598A 1998-04-08 1998-04-08 露光装置、デバイス製造方法および反力受け方法 Expired - Fee Related JP3554186B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP09589598A JP3554186B2 (ja) 1998-04-08 1998-04-08 露光装置、デバイス製造方法および反力受け方法
US09/286,447 US6493062B2 (en) 1998-04-08 1999-04-06 Driving apparatus and exposure apparatus
KR1019990012420A KR19990083062A (ko) 1998-04-08 1999-04-08 구동장치 및 노광장치

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP09589598A JP3554186B2 (ja) 1998-04-08 1998-04-08 露光装置、デバイス製造方法および反力受け方法

Publications (3)

Publication Number Publication Date
JPH11297587A JPH11297587A (ja) 1999-10-29
JP3554186B2 true JP3554186B2 (ja) 2004-08-18
JPH11297587A5 JPH11297587A5 (enExample) 2004-12-16

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Family Applications (1)

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JP09589598A Expired - Fee Related JP3554186B2 (ja) 1998-04-08 1998-04-08 露光装置、デバイス製造方法および反力受け方法

Country Status (3)

Country Link
US (1) US6493062B2 (enExample)
JP (1) JP3554186B2 (enExample)
KR (1) KR19990083062A (enExample)

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Also Published As

Publication number Publication date
KR19990083062A (ko) 1999-11-25
JPH11297587A (ja) 1999-10-29
US20020054280A1 (en) 2002-05-09
US6493062B2 (en) 2002-12-10

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