NL2002902A1 - Lithographic apparatus having a feed forward pressure pulse compensation for the metrology frame. - Google Patents

Lithographic apparatus having a feed forward pressure pulse compensation for the metrology frame. Download PDF

Info

Publication number
NL2002902A1
NL2002902A1 NL2002902A NL2002902A NL2002902A1 NL 2002902 A1 NL2002902 A1 NL 2002902A1 NL 2002902 A NL2002902 A NL 2002902A NL 2002902 A NL2002902 A NL 2002902A NL 2002902 A1 NL2002902 A1 NL 2002902A1
Authority
NL
Netherlands
Prior art keywords
lithographic apparatus
pressure pulse
feed forward
forward pressure
metrology frame
Prior art date
Application number
NL2002902A
Other languages
English (en)
Inventor
Hans Butler
Martinus Van Duijnhoven
Marc Van Der Wijst
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of NL2002902A1 publication Critical patent/NL2002902A1/nl

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
    • G03B27/52—Details
    • G03B27/54—Lamp housings; Illuminating means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
    • G03B27/52—Details
    • G03B27/62—Holders for the original
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
NL2002902A 2008-06-18 2009-05-18 Lithographic apparatus having a feed forward pressure pulse compensation for the metrology frame. NL2002902A1 (nl)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US12931608P 2008-06-18 2008-06-18

Publications (1)

Publication Number Publication Date
NL2002902A1 true NL2002902A1 (nl) 2009-12-22

Family

ID=41430887

Family Applications (1)

Application Number Title Priority Date Filing Date
NL2002902A NL2002902A1 (nl) 2008-06-18 2009-05-18 Lithographic apparatus having a feed forward pressure pulse compensation for the metrology frame.

Country Status (3)

Country Link
US (1) US8493553B2 (nl)
JP (1) JP4797089B2 (nl)
NL (1) NL2002902A1 (nl)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113303032A (zh) * 2019-01-17 2021-08-24 Asml荷兰有限公司 目标递送系统

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2013113632A2 (en) * 2012-02-03 2013-08-08 Asml Netherlands B.V. A stage system and a lithographic apparatus
DE102012219806A1 (de) 2012-10-30 2014-04-30 Carl Zeiss Smt Gmbh Projektionsbelichtungsanlage mit mindestens einem Mittel zur Reduktion des Einflusses von Druckschwankungen
EP3376289A1 (en) * 2017-03-17 2018-09-19 ASML Netherlands B.V. Stage system and metrology tool
CN111435222B (zh) * 2019-01-14 2021-04-02 上海微电子装备（集团）股份有限公司 一种运动台随动压力补偿装置、光刻机系统及其驱动方法
US20220276573A1 (en) * 2019-07-09 2022-09-01 Asml Netherlands B.V. Lithographic apparatus and method with improved contaminant particle capture

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5812420A (en) * 1995-09-05 1998-09-22 Nikon Corporation Vibration-preventive apparatus and exposure apparatus
JP3554186B2 (ja) * 1998-04-08 2004-08-18 キヤノン株式会社 露光装置、デバイス製造方法および反力受け方法
AU5447499A (en) * 1998-09-03 2000-03-27 Nikon Corporation Exposure apparatus and exposure method, and device and method for producing the same
KR100625625B1 (ko) * 1999-10-07 2006-09-20 가부시키가이샤 니콘 기판, 스테이지 장치, 스테이지 구동 방법, 노광 장치 및노광 방법
JP2003035335A (ja) * 2001-07-24 2003-02-07 Canon Inc 能動除振装置
JP2004100953A (ja) * 2002-08-23 2004-04-02 Nikon Corp 制振装置及び露光装置
JP2004335510A (ja) * 2003-04-30 2004-11-25 Nikon Corp ステージ装置及び露光装置
US7248339B2 (en) * 2003-07-04 2007-07-24 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7110083B2 (en) * 2003-11-19 2006-09-19 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP4502366B2 (ja) * 2004-01-21 2010-07-14 キヤノン株式会社 露光装置
US7817243B2 (en) * 2004-04-12 2010-10-19 Asml Netherlands B.V. Vibration isolation system
US7486381B2 (en) * 2004-05-21 2009-02-03 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7292317B2 (en) * 2005-06-08 2007-11-06 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method utilizing substrate stage compensating
US8908144B2 (en) * 2006-09-27 2014-12-09 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
WO2008146877A1 (ja) * 2007-05-31 2008-12-04 Nikon Corporation 防振装置、防振装置の制御方法、及び露光装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113303032A (zh) * 2019-01-17 2021-08-24 Asml荷兰有限公司 目标递送系统

Also Published As

Publication number Publication date
JP4797089B2 (ja) 2011-10-19
JP2010016369A (ja) 2010-01-21
US8493553B2 (en) 2013-07-23
US20090316129A1 (en) 2009-12-24

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AD1A A request for search or an international type search has been filed
WDAP Patent application withdrawn

Effective date: 20100504