WO2008146877A1 - 防振装置、防振装置の制御方法、及び露光装置 - Google Patents
防振装置、防振装置の制御方法、及び露光装置 Download PDFInfo
- Publication number
- WO2008146877A1 WO2008146877A1 PCT/JP2008/059902 JP2008059902W WO2008146877A1 WO 2008146877 A1 WO2008146877 A1 WO 2008146877A1 JP 2008059902 W JP2008059902 W JP 2008059902W WO 2008146877 A1 WO2008146877 A1 WO 2008146877A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- vibration control
- control equipment
- air
- damper
- vibration
- Prior art date
Links
Classifications
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16F—SPRINGS; SHOCK-ABSORBERS; MEANS FOR DAMPING VIBRATION
- F16F15/00—Suppression of vibrations in systems; Means or arrangements for avoiding or reducing out-of-balance forces, e.g. due to motion
- F16F15/02—Suppression of vibrations of non-rotating, e.g. reciprocating systems; Suppression of vibrations of rotating systems by use of members not moving with the rotating systems
- F16F15/023—Suppression of vibrations of non-rotating, e.g. reciprocating systems; Suppression of vibrations of rotating systems by use of members not moving with the rotating systems using fluid means
- F16F15/027—Suppression of vibrations of non-rotating, e.g. reciprocating systems; Suppression of vibrations of rotating systems by use of members not moving with the rotating systems using fluid means comprising control arrangements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation
Landscapes
- Engineering & Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Atmospheric Sciences (AREA)
- Mechanical Engineering (AREA)
- Aviation & Aerospace Engineering (AREA)
- Life Sciences & Earth Sciences (AREA)
- Acoustics & Sound (AREA)
- Toxicology (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- General Physics & Mathematics (AREA)
- Vibration Prevention Devices (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
気体ダンパを用いて、高い応答速度で高精度に防振を行うことができる能動型の防振装置である。圧縮空気源から供給される空気によって、設置面上に構造物を支持するエアダンパ(43)を有する防振装置であって、圧縮空気源から供給される空気の流量を制御してエアダンパ(43)に供給するサーボバルブ(47)と、エアダンパ(43)から構造物に付与される位置を計測する位置センサ(49)と、位置センサ(49)の計測値に基づいてサーボバルブ(47)における空気の流量を制御する防振台制御系(48)とを備える。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007-144864 | 2007-05-31 | ||
JP2007144864 | 2007-05-31 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2008146877A1 true WO2008146877A1 (ja) | 2008-12-04 |
Family
ID=40075110
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2008/059902 WO2008146877A1 (ja) | 2007-05-31 | 2008-05-29 | 防振装置、防振装置の制御方法、及び露光装置 |
Country Status (3)
Country | Link |
---|---|
US (1) | US20080309910A1 (ja) |
TW (1) | TW200907196A (ja) |
WO (1) | WO2008146877A1 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010016369A (ja) * | 2008-06-18 | 2010-01-21 | Asml Netherlands Bv | メトロロジーフレーム用のフィードフォワード圧力パルス補償を有するリソグラフィ装置 |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5641878B2 (ja) * | 2010-10-29 | 2014-12-17 | キヤノン株式会社 | 振動制御装置、リソグラフィー装置、および、物品の製造方法 |
US8485579B2 (en) * | 2011-03-17 | 2013-07-16 | Western Digital (Fremont), Llc | Vacuum pickup assemblies for picking up articles and minimizing contamination thereof |
US9022444B1 (en) | 2013-05-20 | 2015-05-05 | Western Digital Technologies, Inc. | Vacuum nozzle having back-pressure release hole |
JP6367382B2 (ja) * | 2014-06-19 | 2018-08-01 | エーエスエムエル ネザーランズ ビー.ブイ. | リソグラフィ装置、対象物位置決めシステムおよびデバイス製造方法 |
FR3052209B1 (fr) * | 2016-06-02 | 2018-06-01 | Airbus Helicopters | Resonateur, et aeronef muni de ce resonateur |
CN107781350B (zh) * | 2016-08-31 | 2019-05-31 | 上海微电子装备(集团)股份有限公司 | 减振器气动控制装置及其控制方法以及减振器 |
JP6556196B2 (ja) * | 2017-07-27 | 2019-08-07 | 倉敷化工株式会社 | アクティブ除振装置 |
CN112041749A (zh) * | 2018-04-25 | 2020-12-04 | Asml荷兰有限公司 | 气动支撑装置和具备气动支撑装置的光刻设备 |
US11346966B2 (en) * | 2020-06-23 | 2022-05-31 | Dennis Keith Reust | System and method to transfer inertial mass |
US11276470B2 (en) * | 2020-07-17 | 2022-03-15 | Micron Technology, Inc. | Bitline driver isolation from page buffer circuitry in memory device |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0886329A (ja) * | 1994-09-19 | 1996-04-02 | Meiritsu Seiki Kk | 制振装置 |
JP2005172135A (ja) * | 2003-12-11 | 2005-06-30 | Canon Inc | 除振マウント装置 |
JP2006070928A (ja) * | 2004-08-31 | 2006-03-16 | Nikon Corp | 防振装置の制御方法及び露光方法 |
JP2006250291A (ja) * | 2005-03-11 | 2006-09-21 | Tokyo Univ Of Agriculture & Technology | 防振装置 |
JP2007107604A (ja) * | 2005-10-13 | 2007-04-26 | Rikogaku Shinkokai | 除振装置および除振方法 |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5794509A (en) * | 1995-06-06 | 1998-08-18 | Raytheon Company | Proportional pneumatic fin actuator system without feedback control |
US6523695B1 (en) * | 2000-09-15 | 2003-02-25 | Nikon Corporation | Method and apparatus for operating a vibration isolation system having electronic and pneumatic control systems |
-
2008
- 2008-05-29 US US12/155,077 patent/US20080309910A1/en not_active Abandoned
- 2008-05-29 WO PCT/JP2008/059902 patent/WO2008146877A1/ja active Application Filing
- 2008-05-30 TW TW097119974A patent/TW200907196A/zh unknown
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0886329A (ja) * | 1994-09-19 | 1996-04-02 | Meiritsu Seiki Kk | 制振装置 |
JP2005172135A (ja) * | 2003-12-11 | 2005-06-30 | Canon Inc | 除振マウント装置 |
JP2006070928A (ja) * | 2004-08-31 | 2006-03-16 | Nikon Corp | 防振装置の制御方法及び露光方法 |
JP2006250291A (ja) * | 2005-03-11 | 2006-09-21 | Tokyo Univ Of Agriculture & Technology | 防振装置 |
JP2007107604A (ja) * | 2005-10-13 | 2007-04-26 | Rikogaku Shinkokai | 除振装置および除振方法 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010016369A (ja) * | 2008-06-18 | 2010-01-21 | Asml Netherlands Bv | メトロロジーフレーム用のフィードフォワード圧力パルス補償を有するリソグラフィ装置 |
Also Published As
Publication number | Publication date |
---|---|
TW200907196A (en) | 2009-02-16 |
US20080309910A1 (en) | 2008-12-18 |
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