KR19990083062A - 구동장치 및 노광장치 - Google Patents

구동장치 및 노광장치 Download PDF

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Publication number
KR19990083062A
KR19990083062A KR1019990012420A KR19990012420A KR19990083062A KR 19990083062 A KR19990083062 A KR 19990083062A KR 1019990012420 A KR1019990012420 A KR 1019990012420A KR 19990012420 A KR19990012420 A KR 19990012420A KR 19990083062 A KR19990083062 A KR 19990083062A
Authority
KR
South Korea
Prior art keywords
stage
floor
reaction force
substrate
receiving structure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
KR1019990012420A
Other languages
English (en)
Korean (ko)
Inventor
토쿠다유키오
데구치노부요시
우자와시게유키
타카바야시유키오
하라히로미치
Original Assignee
미다라이 후지오
캐논 가부시끼가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 미다라이 후지오, 캐논 가부시끼가이샤 filed Critical 미다라이 후지오
Publication of KR19990083062A publication Critical patent/KR19990083062A/ko
Ceased legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16F—SPRINGS; SHOCK-ABSORBERS; MEANS FOR DAMPING VIBRATION
    • F16F15/00—Suppression of vibrations in systems; Means or arrangements for avoiding or reducing out-of-balance forces, e.g. due to motion
    • F16F15/02—Suppression of vibrations of non-rotating, e.g. reciprocating systems; Suppression of vibrations of rotating systems by use of members not moving with the rotating systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
    • G03B27/42—Projection printing apparatus, e.g. enlarger, copying camera for automatic sequential copying of the same original
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G03F7/70725—Stages control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • General Engineering & Computer Science (AREA)
  • Toxicology (AREA)
  • Mechanical Engineering (AREA)
  • Aviation & Aerospace Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Acoustics & Sound (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Vibration Prevention Devices (AREA)
KR1019990012420A 1998-04-08 1999-04-08 구동장치 및 노광장치 Ceased KR19990083062A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP09589598A JP3554186B2 (ja) 1998-04-08 1998-04-08 露光装置、デバイス製造方法および反力受け方法
JP1998-95895 1998-04-08

Publications (1)

Publication Number Publication Date
KR19990083062A true KR19990083062A (ko) 1999-11-25

Family

ID=14150053

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019990012420A Ceased KR19990083062A (ko) 1998-04-08 1999-04-08 구동장치 및 노광장치

Country Status (3)

Country Link
US (1) US6493062B2 (enExample)
JP (1) JP3554186B2 (enExample)
KR (1) KR19990083062A (enExample)

Cited By (2)

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Publication number Priority date Publication date Assignee Title
KR100869921B1 (ko) * 2006-06-16 2008-11-21 스미도모쥬기가이고교 가부시키가이샤 스테이지용 반력처리장치
KR100986165B1 (ko) * 2007-10-05 2010-10-07 캐논 가부시끼가이샤 노광 장치 및 디바이스 제조방법

Families Citing this family (52)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6999162B1 (en) 1998-10-28 2006-02-14 Nikon Corporation Stage device, exposure system, method of device manufacture, and device
US6686991B1 (en) 2000-11-06 2004-02-03 Nikon Corporation Wafer stage assembly, servo control system, and method for operating the same
US6958808B2 (en) * 2000-11-16 2005-10-25 Nikon Corporation System and method for resetting a reaction mass assembly of a stage assembly
US6885430B2 (en) * 2000-11-16 2005-04-26 Nikon Corporation System and method for resetting a reaction mass assembly of a stage assembly
US6987558B2 (en) * 2001-01-16 2006-01-17 Nikon Corporation Reaction mass for a stage device
US6538720B2 (en) * 2001-02-28 2003-03-25 Silicon Valley Group, Inc. Lithographic tool with dual isolation system and method for configuring the same
US6784978B2 (en) * 2002-03-12 2004-08-31 Asml Holding N.V. Method, system, and apparatus for management of reaction loads in a lithography system
US6724466B2 (en) * 2002-03-26 2004-04-20 Nikon Corporation Stage assembly including a damping assembly
US7061577B2 (en) 2002-03-26 2006-06-13 Nikon Corporation Image adjustor including damping assembly
US6844635B2 (en) * 2002-05-24 2005-01-18 Dover Instrument Corporation Reaction force transfer system
US6757110B2 (en) * 2002-05-29 2004-06-29 Asml Holding N.V. Catadioptric lithography system and method with reticle stage orthogonal to wafer stage
JP3977214B2 (ja) * 2002-09-17 2007-09-19 キヤノン株式会社 露光装置
JP3984898B2 (ja) * 2002-09-18 2007-10-03 キヤノン株式会社 露光装置
JP4378938B2 (ja) * 2002-11-25 2009-12-09 株式会社ニコン 露光装置、及びデバイス製造方法
US20040119964A1 (en) * 2002-12-18 2004-06-24 Nikon Corporation Double isolation fine stage
JP4458322B2 (ja) * 2003-01-14 2010-04-28 キヤノン株式会社 露光装置およびデバイス製造方法
CN100472713C (zh) * 2003-09-03 2009-03-25 株式会社尼康 曝光设备和装置制造方法
US7119884B2 (en) * 2003-12-24 2006-10-10 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP2005227717A (ja) * 2004-02-16 2005-08-25 Fuji Photo Film Co Ltd 画像形成装置の固定構造
JP2005224532A (ja) * 2004-02-16 2005-08-25 Fuji Photo Film Co Ltd 画像形成装置の防振構造
US7224432B2 (en) * 2004-05-14 2007-05-29 Canon Kabushiki Kaisha Stage device, exposure apparatus, and device manufacturing method
US7126674B2 (en) * 2004-06-14 2006-10-24 Asml Netherlands B.V. Positioning device and device manufacturing method
JP4440031B2 (ja) * 2004-07-29 2010-03-24 キヤノン株式会社 露光装置及びデバイス製造方法
US7256866B2 (en) * 2004-10-12 2007-08-14 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
EP1805544A1 (en) * 2004-10-27 2007-07-11 Carl Zeiss SMT AG A six degree of freedom (dof) actuator reaction mass
US7227614B2 (en) * 2004-11-12 2007-06-05 Asml Netherlands B.V. Measurement method, device manufacturing method and lithographic apparatus
US7180571B2 (en) * 2004-12-08 2007-02-20 Asml Netherlands B.V. Lithographic projection apparatus and actuator
JP2006344685A (ja) * 2005-06-07 2006-12-21 Canon Inc 露光装置
WO2006133800A1 (en) 2005-06-14 2006-12-21 Carl Zeiss Smt Ag Lithography projection objective, and a method for correcting image defects of the same
KR100876912B1 (ko) * 2006-07-13 2009-01-08 부산대학교 산학협력단 변위증폭측정 메카니즘을 구비한 스테이지
US7587946B2 (en) * 2006-08-31 2009-09-15 Tunney Timothy T Method and apparatus for testing roof edge components
JP2008098311A (ja) 2006-10-10 2008-04-24 Canon Inc 露光装置及びデバイス製造方法
JP2008256155A (ja) * 2007-04-06 2008-10-23 Canon Inc 除振装置、演算装置、露光装置及びデバイス製造方法
SG10201502625RA (en) 2007-07-18 2015-05-28 Nikon Corp Measuring Method, Stage Apparatus, And Exposure Apparatus
JP4485550B2 (ja) * 2007-07-30 2010-06-23 住友重機械工業株式会社 反力処理装置
JP2009164307A (ja) 2007-12-28 2009-07-23 Canon Inc 支持構造、露光装置、支持構造の形成方法、及び、デバイス製造方法
NL2002902A1 (nl) * 2008-06-18 2009-12-22 Asml Netherlands Bv Lithographic apparatus having a feed forward pressure pulse compensation for the metrology frame.
JP5350139B2 (ja) * 2008-10-01 2013-11-27 キヤノン株式会社 露光装置、及びデバイスの製造方法
US8235351B1 (en) * 2009-08-27 2012-08-07 Lockheed Martin Corporation Shock load isolation mounting
JP5641878B2 (ja) * 2010-10-29 2014-12-17 キヤノン株式会社 振動制御装置、リソグラフィー装置、および、物品の製造方法
JP5773761B2 (ja) * 2010-12-17 2015-09-02 キヤノン株式会社 リソグラフィーシステム、及びそれを用いた物品の製造方法
US8899393B2 (en) * 2012-06-08 2014-12-02 Technical Manufacturing Corporation Active vibration isolation system
CN103472678B (zh) * 2012-06-08 2015-07-22 上海微电子装备有限公司 光刻机及应用于光刻机中的工件台系统
CN103809384B (zh) * 2012-11-12 2016-03-09 上海微电子装备有限公司 工件台与掩模台公用的平衡质量系统及光刻机
US10184539B2 (en) 2014-09-30 2019-01-22 Technical Manufacturing Corporation Vibration isolation system
CN105807575B (zh) * 2014-12-30 2017-08-25 上海微电子装备有限公司 一种硅片边缘保护装置
CN108141003A (zh) * 2015-10-16 2018-06-08 统雷有限公司 用于快速调谐激光器腔的线性电机或音圈
DE102017201598B4 (de) 2017-02-01 2019-02-14 Hiwin Mikrosystem Corp. Reaktionskraftentgegenwirkungsvorrichtung für ein metrologisches Werkzeug
JP7052197B2 (ja) * 2017-02-02 2022-04-12 ウシオ電機株式会社 露光装置
KR102771672B1 (ko) 2017-08-15 2025-02-25 테크니컬 매뉴팩처링 코포레이션 바닥 피드포워드 지원을 이용한 정밀 진동-격리 시스템
US11094499B1 (en) * 2020-10-04 2021-08-17 Borries Pte. Ltd. Apparatus of charged-particle beam such as electron microscope comprising sliding specimen table within objective lens
IL295833B2 (en) * 2022-08-22 2023-09-01 Elbit Systems Electro Optics Elop Ltd A passive stabilization system with a linear copy subsystem to maintain cargo orientation

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06188181A (ja) * 1992-12-21 1994-07-08 Jeol Ltd 荷電粒子ビーム描画方法
JPH06232021A (ja) * 1993-02-01 1994-08-19 Nikon Corp ステージ装置
JPH07254555A (ja) * 1994-03-15 1995-10-03 Canon Inc 露光装置
JPH08124843A (ja) * 1994-10-21 1996-05-17 Nikon Corp 走査型露光装置
JPH08293455A (ja) * 1995-04-21 1996-11-05 Canon Inc 半導体露光装置
KR970072026A (ko) * 1996-04-19 1997-11-07 오노 시게오 주사형 노광 장치
KR980005339A (ko) * 1996-06-07 1998-03-30 고노 시게오 진동절연 장치 및 노광 장치

Family Cites Families (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4473292A (en) * 1982-02-09 1984-09-25 Censor Patent-Und Versuchsanstalt Dampening system
US4927119A (en) * 1986-02-24 1990-05-22 Kimball Industries, Inc. Reversible flow valve for air isolated bases
JPH01188241A (ja) 1988-01-22 1989-07-27 Canon Inc 移動案内装置
JPH01284793A (ja) 1988-05-11 1989-11-16 Canon Inc 基板支持装置
DE3917408A1 (de) * 1988-06-06 1989-12-07 Takenaka Corp Daempfungssockel
JP2728898B2 (ja) 1988-10-05 1998-03-18 キヤノン株式会社 露光装置
JP3031940B2 (ja) 1990-02-21 2000-04-10 キヤノン株式会社 移動案内装置
US5187519A (en) 1990-10-05 1993-02-16 Canon Kabushiki Kaisha Exposure apparatus having mount means to suppress vibrations
NL9100407A (nl) 1991-03-07 1992-10-01 Philips Nv Optisch lithografische inrichting met een krachtgecompenseerd machinegestel.
JP2714502B2 (ja) 1991-09-18 1998-02-16 キヤノン株式会社 移動ステージ装置
JP3245932B2 (ja) 1992-02-06 2002-01-15 キヤノン株式会社 光半導体装置、その駆動方法及びそれを用いた光伝送方式
US5549269A (en) * 1992-03-27 1996-08-27 Gertel; Maurice Gas spring assembly
JP2974535B2 (ja) 1993-03-11 1999-11-10 キヤノン株式会社 位置決め装置
US5356110A (en) * 1993-06-08 1994-10-18 Newport Corporation Pneumatic isolation systems for damping vertical, horizontal and rotational vibrations
US5874820A (en) * 1995-04-04 1999-02-23 Nikon Corporation Window frame-guided stage mechanism
JPH08111371A (ja) 1994-10-06 1996-04-30 Canon Inc 投影露光装置
KR100399812B1 (ko) * 1994-10-11 2003-12-01 가부시키가이샤 니콘 스테이지용진동방지장치
US5765800A (en) * 1995-10-04 1998-06-16 Ebara Corporation Vibration damping apparatus
US5931441A (en) * 1996-02-29 1999-08-03 Nikon Corporation Method of isolating vibration in exposure apparatus
US6002987A (en) * 1996-03-26 1999-12-14 Nikon Corporation Methods to control the environment and exposure apparatus
JP3337906B2 (ja) * 1996-04-02 2002-10-28 キヤノン株式会社 空圧式振動絶縁除去装置、投影露光装置及びこれを用いたデバイス製造方法
JP3659529B2 (ja) * 1996-06-06 2005-06-15 キヤノン株式会社 露光装置およびデバイス製造方法
KR980006398A (ko) * 1996-06-21 1998-03-30 마에다 시게루 진동 감쇄장치
JP3266515B2 (ja) * 1996-08-02 2002-03-18 キヤノン株式会社 露光装置、デバイス製造方法およびステージ装置
JPH1089403A (ja) * 1996-09-10 1998-04-07 Nikon Corp 防振装置
US6222614B1 (en) * 1996-12-06 2001-04-24 Nikon Corporation Exposure elements with a cable-relaying support
JP3825869B2 (ja) * 1997-03-19 2006-09-27 キヤノン株式会社 能動除振装置
US5959427A (en) * 1998-03-04 1999-09-28 Nikon Corporation Method and apparatus for compensating for reaction forces in a stage assembly

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06188181A (ja) * 1992-12-21 1994-07-08 Jeol Ltd 荷電粒子ビーム描画方法
JPH06232021A (ja) * 1993-02-01 1994-08-19 Nikon Corp ステージ装置
JPH07254555A (ja) * 1994-03-15 1995-10-03 Canon Inc 露光装置
JPH08124843A (ja) * 1994-10-21 1996-05-17 Nikon Corp 走査型露光装置
JPH08293455A (ja) * 1995-04-21 1996-11-05 Canon Inc 半導体露光装置
KR970072026A (ko) * 1996-04-19 1997-11-07 오노 시게오 주사형 노광 장치
KR980005339A (ko) * 1996-06-07 1998-03-30 고노 시게오 진동절연 장치 및 노광 장치

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100869921B1 (ko) * 2006-06-16 2008-11-21 스미도모쥬기가이고교 가부시키가이샤 스테이지용 반력처리장치
KR100986165B1 (ko) * 2007-10-05 2010-10-07 캐논 가부시끼가이샤 노광 장치 및 디바이스 제조방법

Also Published As

Publication number Publication date
JP3554186B2 (ja) 2004-08-18
US20020054280A1 (en) 2002-05-09
US6493062B2 (en) 2002-12-10
JPH11297587A (ja) 1999-10-29

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PB0901 Examination by re-examination before a trial

Comment text: Amendment to Specification, etc.

Patent event date: 20020216

Patent event code: PB09011R02I

Comment text: Amendment to Specification, etc.

Patent event date: 20020209

Patent event code: PB09011R02I

Comment text: Request for Trial against Decision on Refusal

Patent event date: 20020114

Patent event code: PB09011R01I

Comment text: Amendment to Specification, etc.

Patent event date: 20010818

Patent event code: PB09011R02I

B601 Maintenance of original decision after re-examination before a trial
PB0601 Maintenance of original decision after re-examination before a trial
J301 Trial decision

Free format text: TRIAL DECISION FOR APPEAL AGAINST DECISION TO DECLINE REFUSAL REQUESTED 20020114

Effective date: 20030531

PJ1301 Trial decision

Patent event code: PJ13011S01D

Patent event date: 20030602

Comment text: Trial Decision on Objection to Decision on Refusal

Appeal kind category: Appeal against decision to decline refusal

Request date: 20020114

Decision date: 20030531

Appeal identifier: 2002101000187