KR970072026A - 주사형 노광 장치 - Google Patents

주사형 노광 장치 Download PDF

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Publication number
KR970072026A
KR970072026A KR1019970013747A KR19970013747A KR970072026A KR 970072026 A KR970072026 A KR 970072026A KR 1019970013747 A KR1019970013747 A KR 1019970013747A KR 19970013747 A KR19970013747 A KR 19970013747A KR 970072026 A KR970072026 A KR 970072026A
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KR
South Korea
Prior art keywords
stage
substrate
mask
moving
exposure apparatus
Prior art date
Application number
KR1019970013747A
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English (en)
Inventor
다쓰오 한자와
Original Assignee
오노 시게오
니콘 가부시키가이샤
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Publication date
Application filed by 오노 시게오, 니콘 가부시키가이샤 filed Critical 오노 시게오
Publication of KR970072026A publication Critical patent/KR970072026A/ko

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70833—Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation

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  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Public Health (AREA)
  • Epidemiology (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

본 발명의 목적은 마스크와 기판의 상대적인 주사 동작의 정밀도를 향상시키는 것이다.
이와 같은 목적을 달성하기 위해, 본 발명에 따른 장치는 마스크(11)를 유지하는 마스크 스테이지(9)와, 감광 기판(6)을 유지하는 기판 스테이지(5)와, 상기 마스크 스테이지(9)와 기판 스테이지(5)를 동기 이동시키는 이동 수단(32,34)과, 상기 마스크 스테이지 (9)및 기판 스테이지(5)를 지지하는 지지 부재(12A,12B)를 구비한다. 또한 상기 지지 부재(12A,12B)에 힘을 부여함으로서 상기 지지 부재(12A,12B)에 발생하는 진동을 억제하는 진동 억제 수단(15A,22A 등)을 동작시키는 동시에, 마스크 스테이지(9)및 기판 스테이지(5)가 일정 속도로 이동하는 중에는 진동 억제 수단(15A,22A 등)의 동작을 정지하는 진동 억제 제어 수단(30)을 구비한다.

Description

주사형 노광 장치
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 본 발명의 실시예에 따른 주사형 투영 노광 장치를 도시한 전체 구성도.

Claims (2)

  1. 마스크와 기판을 동기 이동시킴으로써 상기 마스크의 패턴을 상기 기판상에 전사하는 주사형 노광 장치에 있어서, 상기 마스크를 유지하는 스테이지와; 상기 감광 기판을 유지하는 기판 스테이지와; 상기 마스크 스테이지와 상기 기판 스테이지를 동기 이동시키는 이동 수단과; 상기 마스크 스테이지 및 상기 기판 스테이지 중 한쪽 스테이지, 또는 2개의 스테이지 모두를 지지하는 지지부재와; 상기 지지 부재에 힘을 부여함으로써 상기 지지 부재에 발생하는 진동을 억제하는 진동 억제 장치와; 상기 마스크 스테이지 및 상기 기판 스테이지가 가속 또는 감속되어 이동하는 중에 상기 진동 억제 장치를 동작시키는 동시에, 상기 마스크 스테이지 및 상기 기판 스테이지가 일정 속도로 이동하는 중에 상기 진동 억제 장치의 동작을 정지시키는 제어 수단을 갖는 것을 특징으로 하는 주사형 노광 장치.
  2. 제1항에 있어서, 상기 진동 억제 수단은 작동기인 것을 특징으로 하는 주사형 노광 장치.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019970013747A 1996-04-19 1997-04-15 주사형 노광 장치 KR970072026A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP8122329A JPH09289155A (ja) 1996-04-19 1996-04-19 走査型露光装置
JP96-122329 1996-04-19

Publications (1)

Publication Number Publication Date
KR970072026A true KR970072026A (ko) 1997-11-07

Family

ID=14833282

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019970013747A KR970072026A (ko) 1996-04-19 1997-04-15 주사형 노광 장치

Country Status (3)

Country Link
US (1) US5986743A (ko)
JP (1) JPH09289155A (ko)
KR (1) KR970072026A (ko)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR19990083062A (ko) * 1998-04-08 1999-11-25 미다라이 후지오 구동장치 및 노광장치
KR100299504B1 (ko) * 1998-07-23 2001-09-22 미다라이 후지오 노광장치
KR100760880B1 (ko) * 2000-02-28 2007-09-21 가부시키가이샤 니콘 투영노광장치, 투영노광장치의 제조방법 및 조정방법
KR20150004890A (ko) * 2005-01-31 2015-01-13 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법

Families Citing this family (22)

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US5528118A (en) * 1994-04-01 1996-06-18 Nikon Precision, Inc. Guideless stage with isolated reaction stage
WO1999025011A1 (fr) * 1997-11-12 1999-05-20 Nikon Corporation Appareil d'exposition par projection
JPH11218854A (ja) * 1998-02-04 1999-08-10 Minolta Co Ltd 画像取込装置
EP1018669B1 (en) * 1999-01-08 2006-03-01 ASML Netherlands B.V. Projection lithography with servo control
TW479156B (en) 1999-01-08 2002-03-11 Asm Lithography Bv Lithographic projection apparatus, method of controlling the position of a moveable table in a lithographic projection apparatus, integrated circuits device manufacturing method, and integrated circuits device made by the manufacturing method
US6621556B2 (en) * 2000-02-28 2003-09-16 Nikon Corporation Projection exposure apparatus and manufacturing and adjusting methods thereof
TW509823B (en) * 2000-04-17 2002-11-11 Asml Netherlands Bv Lithographic apparatus, device manufacturing method, and device manufactured thereby
JP4474020B2 (ja) 2000-06-23 2010-06-02 キヤノン株式会社 移動装置及び露光装置
US6631038B1 (en) * 2000-08-10 2003-10-07 Nikon Corporation Catadioptric lens barrel structure having a plurality of connecting rods for positioning the lens barrel structure
JP2002289515A (ja) * 2000-12-28 2002-10-04 Nikon Corp 製品の製造方法、露光装置の製造方法、露光装置、及びデバイス製造方法
US6646719B2 (en) * 2001-01-31 2003-11-11 Nikon Corporation Support assembly for an exposure apparatus
US6834841B2 (en) * 2002-07-03 2004-12-28 Honeywell International Inc. Method and system for decoupling structural modes to provide consistent control system performance
JP4143438B2 (ja) * 2003-02-24 2008-09-03 キヤノン株式会社 支持装置、露光装置、デバイス製造方法
US7119884B2 (en) * 2003-12-24 2006-10-10 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7256866B2 (en) * 2004-10-12 2007-08-14 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
TWI510869B (zh) * 2005-03-29 2015-12-01 尼康股份有限公司 曝光裝置、曝光裝置的製造方法以及元件的製造方法
US20080225261A1 (en) * 2007-03-13 2008-09-18 Noriyuki Hirayanagi Exposure apparatus and device manufacturing method
JP5264112B2 (ja) * 2007-07-11 2013-08-14 キヤノン株式会社 露光装置
NL1036957A1 (nl) * 2008-06-13 2009-12-15 Asml Netherlands Bv Lithographic apparatus and device manufacturing method.
WO2012016744A1 (en) * 2010-08-05 2012-02-09 Asml Netherlands B.V. Imprint lithography
DE102010063337B9 (de) * 2010-12-17 2020-05-07 Carl Zeiss Ag Verfahren zur Maskeninspektion sowie Verfahren zur Emulation von Abbildungseigenschaften
DE102020207566B4 (de) 2020-06-18 2023-02-16 Carl Zeiss Smt Gmbh Vorrichtung und Verfahren zur Charakterisierung einer Maske für die Mikrolithographie

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NL9100407A (nl) * 1991-03-07 1992-10-01 Philips Nv Optisch lithografische inrichting met een krachtgecompenseerd machinegestel.
JP3336441B2 (ja) * 1992-11-25 2002-10-21 株式会社ニコン 露光方法及び装置、並びに前記方法を用いるデバイス製造方法
JP3277581B2 (ja) * 1993-02-01 2002-04-22 株式会社ニコン ステージ装置および露光装置
JP3226704B2 (ja) * 1994-03-15 2001-11-05 キヤノン株式会社 露光装置
GB2299827B (en) * 1995-04-12 1998-09-02 J P Whelan & Sons Guardrail support
US5812420A (en) * 1995-09-05 1998-09-22 Nikon Corporation Vibration-preventive apparatus and exposure apparatus

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR19990083062A (ko) * 1998-04-08 1999-11-25 미다라이 후지오 구동장치 및 노광장치
KR100299504B1 (ko) * 1998-07-23 2001-09-22 미다라이 후지오 노광장치
KR100760880B1 (ko) * 2000-02-28 2007-09-21 가부시키가이샤 니콘 투영노광장치, 투영노광장치의 제조방법 및 조정방법
KR20150004890A (ko) * 2005-01-31 2015-01-13 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법

Also Published As

Publication number Publication date
JPH09289155A (ja) 1997-11-04
US5986743A (en) 1999-11-16

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