JP2019520691A - 薄膜トランジスタ、薄膜トランジスタを有するゲートドライバオンアレイ及び表示装置、並びにそれらの製造方法 - Google Patents
薄膜トランジスタ、薄膜トランジスタを有するゲートドライバオンアレイ及び表示装置、並びにそれらの製造方法 Download PDFInfo
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- 239000010409 thin film Substances 0.000 title claims abstract description 125
- 238000004519 manufacturing process Methods 0.000 title claims description 16
- 239000004065 semiconductor Substances 0.000 claims abstract description 379
- 239000000758 substrate Substances 0.000 claims abstract description 159
- 238000005530 etching Methods 0.000 claims abstract description 79
- 239000000463 material Substances 0.000 claims abstract description 70
- 229910052751 metal Inorganic materials 0.000 claims abstract description 41
- 239000002184 metal Substances 0.000 claims abstract description 35
- 150000002739 metals Chemical class 0.000 claims abstract description 8
- 229920002120 photoresistant polymer Polymers 0.000 claims description 49
- 238000000034 method Methods 0.000 claims description 13
- 239000011248 coating agent Substances 0.000 claims description 11
- 238000000576 coating method Methods 0.000 claims description 11
- 238000000059 patterning Methods 0.000 claims description 10
- 239000007772 electrode material Substances 0.000 claims description 8
- 238000001039 wet etching Methods 0.000 claims description 5
- 101100517284 Caenorhabditis elegans nsun-1 gene Proteins 0.000 description 20
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 12
- 229910044991 metal oxide Inorganic materials 0.000 description 10
- 150000004706 metal oxides Chemical class 0.000 description 10
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 8
- 229910052710 silicon Inorganic materials 0.000 description 8
- 239000010703 silicon Substances 0.000 description 8
- 239000011787 zinc oxide Substances 0.000 description 6
- 229910052738 indium Inorganic materials 0.000 description 4
- 239000002210 silicon-based material Substances 0.000 description 4
- OFIYHXOOOISSDN-UHFFFAOYSA-N tellanylidenegallium Chemical compound [Te]=[Ga] OFIYHXOOOISSDN-UHFFFAOYSA-N 0.000 description 4
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 2
- 229910052581 Si3N4 Inorganic materials 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 229910000577 Silicon-germanium Inorganic materials 0.000 description 2
- 229910010413 TiO 2 Inorganic materials 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 2
- LEVVHYCKPQWKOP-UHFFFAOYSA-N [Si].[Ge] Chemical compound [Si].[Ge] LEVVHYCKPQWKOP-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 229910052793 cadmium Inorganic materials 0.000 description 2
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 description 2
- 239000000969 carrier Substances 0.000 description 2
- 238000005137 deposition process Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 239000010432 diamond Substances 0.000 description 2
- AJNVQOSZGJRYEI-UHFFFAOYSA-N digallium;oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Ga+3].[Ga+3] AJNVQOSZGJRYEI-UHFFFAOYSA-N 0.000 description 2
- 229910052733 gallium Inorganic materials 0.000 description 2
- 229910001195 gallium oxide Inorganic materials 0.000 description 2
- 229910052732 germanium Inorganic materials 0.000 description 2
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 230000017525 heat dissipation Effects 0.000 description 2
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 2
- 229910003437 indium oxide Inorganic materials 0.000 description 2
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 2
- 238000001755 magnetron sputter deposition Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 229910052758 niobium Inorganic materials 0.000 description 2
- 229910052755 nonmetal Inorganic materials 0.000 description 2
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 description 2
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 2
- 229910010271 silicon carbide Inorganic materials 0.000 description 2
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 2
- 229910052814 silicon oxide Inorganic materials 0.000 description 2
- 229910052718 tin Inorganic materials 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- 229910052725 zinc Inorganic materials 0.000 description 2
- 239000011701 zinc Substances 0.000 description 2
- 230000003321 amplification Effects 0.000 description 1
- 238000004380 ashing Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000001312 dry etching Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000002708 enhancing effect Effects 0.000 description 1
- 230000014509 gene expression Effects 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000003199 nucleic acid amplification method Methods 0.000 description 1
- 238000013021 overheating Methods 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
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Abstract
Description
AL−1 半導体領域
AL−2 半導体領域
AL−3 半導体領域
AL−4 半導体領域
AL−B 半導体ブリッジ
D ドレイン電極
D−M ドレイン電極本体
D−T ドレイン電極歯
ESL エッチング停止層
G ゲート電極
GI ゲート絶縁層
NOL−1 非重複部分
NOL−2 非重複部分
NOL−3 非重複部分
NOL−4 非重複部分
OL−1 重複部分
OL−2 重複部分
OL−3 重複部分
OL−4 重複部分
S ソース電極
S−M ソース電極本体
S−T ソース電極歯
Claims (25)
- ベース基板と、
前記ベース基板上に設けられ、第1半導体領域、第2半導体領域、及び各々が前記第1半導体領域と前記第2半導体領域とを接続する複数の半導体ブリッジを含み、前記複数の半導体ブリッジが互いに間隔を置いて配置され、活性層はM1OaNbを含む材料により作製され、M1は単独の金属又は金属の組み合わせであり、a>0かつb≧0である、活性層と、
前記活性層の前記ベース基板から離れた側に設けられ、前記第1半導体領域は、前記ベース基板を平面視した際、その投影がエッチング停止層の投影の外側に位置する第1非重複部分を含み、前記第2半導体領域は、前記ベース基板を平面視した際、その投影がエッチング停止層の投影の外側に位置する第2非重複部分を含む、エッチング停止層と、
前記第1非重複部分の前記ベース基板から離れた側に設けられる第1電極と、
前記第2非重複部分の前記ベース基板から離れた側に設けられる第2電極と、を含む薄膜トランジスタ。 - 前記第1半導体領域は、前記複数の半導体ブリッジの複数の第1ターミナスを接続する一体化された半導体ブロックであり、前記第2半導体領域は、前記複数の半導体ブリッジの複数の第2ターミナスを接続する一体化された半導体ブロックである、請求項1に記載の薄膜トランジスタ。
- 前記第1電極は前記第1非重複部分に接触し、前記第2電極は前記第2非重複部分に接触する、請求項1に記載の薄膜トランジスタ。
- 前記エッチング停止層は、各々が対応する半導体ブリッジと少なくとも部分的に重複する、互いに間隔を置いて配置される複数のエッチング停止ブロックを含む、請求項1に記載の薄膜トランジスタ。
- 前記複数の半導体ブリッジは、およそ3μmからおよそ15μmの範囲にある距離により互いに間隔を置いて配置される、請求項1に記載の薄膜トランジスタ。
- 前記複数の半導体ブリッジの各々は、幅がおよそ3μmからおよそ20μmの範囲にある、請求項1に記載の薄膜トランジスタ。
- 前記複数の半導体ブリッジの各々は長方形である、請求項1に記載の薄膜トランジスタ。
- 各半導体ブリッジは、凹状の側辺を有し前記各半導体ブリッジの他の部分より幅の狭い中間部分を含む、請求項1に記載の薄膜トランジスタ。
- 前記活性層は、第3半導体領域と、第4半導体領域と、各々が前記第3半導体領域と前記第4半導体領域とを接続する複数の追加半導体ブリッジと、をさらに含み、前記複数の追加半導体ブリッジは互いに間隔を置いて配置され、前記第3半導体領域は、前記ベース基板を平面視した際、その投影が前記エッチング停止層の投影の外側に位置する第3非重複部分を含み、前記第4半導体領域は、前記ベース基板を平面視した際、その投影が前記エッチング停止層の投影の外側に位置する第4非重複部分を含み、
前記第1電極は、前記第3非重複部分の前記ベース基板から離れた側に設けられ、
前記第2電極は、前記第4非重複部分の前記ベース基板から離れた側に設けられる、請求項1に記載の薄膜トランジスタ。 - 前記第3半導体領域は、前記複数の追加半導体ブリッジの複数の第1ターミナスを接続する一体化された半導体ブロックであり、前記第4半導体領域は、前記複数の追加半導体ブリッジの複数の第2ターミナスを接続する一体化された半導体ブロックである、請求項9に記載の薄膜トランジスタ。
- 前記第1電極は前記第3非重複部分に接触し、前記第2電極は前記第4非重複部分に接触する、請求項9に記載の薄膜トランジスタ。
- 前記エッチング停止層は、各々が対応する追加半導体ブリッジと少なくとも部分的に重複する、互いに間隔を置いて配置される複数の追加エッチング停止ブロックを含む、請求項9に記載の薄膜トランジスタ。
- 前記第1電極は、第1電極本体と、前記第1電極本体と一体化され、前記第1電極本体から複数の第1電極歯の自由端に向かって延伸する複数の第1電極歯とを含み、
前記第2電極は、第2電極本体と、前記第2電極本体と一体化され、前記第2電極本体から複数の第2電極歯の自由端に向かって延伸する複数の第2電極歯とを含み、
前記複数の第1電極歯の各々と前記複数の第2電極歯の各々は、前記第1電極と前記第2電極がインターリーブするように交互に、間隔を置いて配置され、
前記第1非重複部分及び前記第3非重複部分は、前記複数の第1電極歯の前記ベース基板に近い側に設けられ、前記第2非重複部分及び前記第4非重複部分は、前記複数の第2電極歯の前記ベース基板に近い側に設けられる、請求項9に記載の薄膜トランジスタ。 - 前記第1電極は、第1電極本体と、前記第1電極本体と一体化され、前記第1電極本体から2つの第1電極歯の自由端に向かって延伸する2つの第1電極歯とを含み、
前記第2電極は、第2電極本体と、前記第2電極本体と一体化され、前記第2電極本体から2つの第2電極歯の自由端に向かって延伸する2つの第2電極歯とを含み、
前記2つの第1電極歯は前記2つの第2電極歯に挟まれ、これにより、前記2つの第2電極歯のうちのひとつが前記2つの第1電極歯の一方の側に設けられ、前記2つの第2電極歯のうちのもうひとつが前記2つの第1電極歯の反対側に設けられ、前記2つの第1電極歯が中央に設けられ、
前記第1非重複部分及び前記第3非重複部分は、前記2つの第1電極歯の前記ベース基板に近い側に設けられ、前記第2非重複部分及び前記第4非重複部分は、前記2つの第2電極歯の前記ベース基板に近い側に設けられる、請求項9に記載の薄膜トランジスタ。 - 前記第1電極は、一体化された第1電極ブロックを含み、
前記第2電極は、第2電極本体と、前記第2電極本体と一体化され、前記第2電極本体から2つの第2電極歯の自由端に向かって延伸する2つの第2電極歯とを含み、
前記一体化された第1電極ブロックは前記2つの第2電極歯に挟まれ、これにより、前記2つの第2電極歯のうちのひとつが前記一体化された第1電極ブロックの一方の側に設けられ、前記2つの第2電極歯のうちのもうひとつが前記一体化された第1電極ブロックの反対側に設けられ、前記一体化された第1電極ブロックが中央に設けられ、
前記第1非重複部分及び前記第3非重複部分は、前記一体化された第1電極ブロックの前記ベース基板に近い側に設けられ、前記第2非重複部分及び前記第4非重複部分は、前記2つの第2電極歯の前記ベース基板に近い側に設けられる、請求項9に記載の薄膜トランジスタ。 - 前記第1非重複部分と前記第3非重複部分は、一体化された非重複部分をなす、請求項15に記載の薄膜トランジスタ。
- 前記第1半導体領域は、前記ベース基板を平面視した際、その投影が前記エッチング停止層の投影と重なる第1重複部分をさらに含み、前記第2半導体領域は、前記ベース基板を平面視した際、その投影が前記エッチング停止層の投影と重なる第2重複部分をさらに含む、請求項1に記載の薄膜トランジスタ。
- 前記エッチング停止層は、前記第1電極と前記第2電極をエッチングするためのウエットエッチング液に対して耐性が大きい、請求項1に記載の薄膜トランジスタ。
- 請求項1〜18のいずれか一項に記載の薄膜トランジスタを含む、ゲートドライバオンアレイ(GOA)回路。
- 請求項1〜18のいずれか一項に記載の薄膜トランジスタを含む、表示装置。
- 第1半導体領域、第2半導体領域、及び各々が前記第1半導体領域と前記第2半導体領域とを接続する複数の半導体ブリッジを含み、前記複数の半導体ブリッジが互いに間隔を置いて配置され、活性層はM1OaNbを含む材料により作製され、M1は単独の金属又は金属の組み合わせであり、a>0かつb≧0である、活性層をベース基板上に形成する工程と、
前記第1半導体領域は、前記ベース基板を平面視した際、その投影が前記エッチング停止層の投影の外側に位置する第1非重複部分を含み、前記第2半導体領域は、前記ベース基板を平面視した際、その投影が前記エッチング停止層の投影の外側に位置する第2非重複部分を含む、エッチング停止層を前記活性層の前記ベース基板から離れた側に形成する工程と、
前記第1非重複部分の前記ベース基板から離れた側に第1電極を形成する工程と、
前記第2非重複部分の前記ベース基板から離れた側に第2電極を形成する工程と、を含む、薄膜トランジスタの製造方法。 - 前記活性層を形成する工程及び前記エッチング停止層を形成する工程は、ひとつのパターニング工程において行われる、請求項21に記載の薄膜トランジスタの製造方法。
- 前記ひとつのパターニング工程は、
前記ベース基板上に、M1OaNbを含む半導体材料層を形成し、M1は単独の金属又は金属の組み合わせであり、a>0かつb≧0である、工程と、
前記半導体材料層の前記ベース基板から離れた側にエッチング停止材料層を形成する工程と、
前記エッチング停止材料層の前記半導体材料層から離れた側にフォトレジスト層をコーティングする工程と、
ハーフトーンマスク板又はグレイトーンマスク板を用いて前記フォトレジスト層を露光する工程と、
前記露光されたフォトレジスト層を現像して、前記活性層に対応する第1セクション及び前記第1セクションの外側に位置する第2セクションを含むフォトレジストパターンを取得し、前記第1セクションは、前記第1非重複部分及び前記第2非重複部分に対応する第1ゾーンと、前記第1セクションの残りの部分に対応する第2ゾーンを含み、前記第2ゾーンの奥行きは前記第1ゾーンの奥行きよりも深く、前記第2セクションにおける前記フォトレジスト材料が除去される、工程と、
前記第2セクションにおける前記エッチング停止材料層を除去する工程と、
前記第2セクションにおける前記半導体材料層を除去して、前記活性層に対応する活性層パターンを形成する工程と、
前記第2ゾーンにおける前記フォトレジスト層を維持しつつ、前記第1ゾーンにおける前記フォトレジスト層を除去する工程と、
前記第1ゾーンにおける前記エッチング停止材料層を除去して、前記エッチング停止層に対応するエッチング停止層パターンを形成する工程と、
前記第2ゾーンにおける前記フォトレジスト層を除去する工程と、を含む、請求項22に記載の薄膜トランジスタの製造方法。 - 前記活性層を形成する工程と、前記第1電極を形成する工程と、前記第2電極を形成する工程とを、ひとつのパターニング工程において行う、請求項21に記載の薄膜トランジスタの製造方法。
- 前記ベース基板上に、M1OaNbを含む半導体材料層を形成し、M1は単独の金属又は金属の組み合わせであり、a>0かつb≧0である、工程と、
前記半導体材料層の前記ベース基板から離れた側にエッチング停止材料層を形成する工程と、
前記エッチング停止材料層の前記半導体材料層から離れた側に第1フォトレジスト層をコーティングする工程と、
前記エッチング停止層に対応するパターンを有する第1マスク板を用いて前記第1フォトレジスト層を露光する工程と、
前記露光された第1フォトレジスト層を現像して、前記エッチング停止層に対応する第1セクション及び前記第1セクションの外側に位置する第2セクションを含む第1フォトレジストパターンを取得する工程と、
前記第2セクションにおける前記エッチング停止材料層を除去して、前記エッチング停止層に対応するエッチング停止層パターンを形成する工程と、
前記エッチング停止層及び前記半導体材料層の前記ベース基板から離れた側に電極材料層を形成する工程と、
前記電極材料層の前記ベース基板から離れた側に第2フォトレジスト層をコーティングする工程と、
前記第1電極及び前記第2電極に対応するパターンを有する第2マスク板を用いて前記第2フォトレジスト層を露光する工程と、
前記露光された第2フォトレジスト層を現像して、前記第1電極及び前記第2電極に対応する第3セクション及び前記第1セクションの外側に位置する第4セクションとを含む第2フォトレジストパターンを取得する工程と、
前記第4セクションにおける前記電極材料層を除去して、前記第1電極に対応する第1電極パターン及び前記第2電極に対応する第2電極パターンを形成する工程と、
前記第4セクションにおける前記半導体材料層を除去して、前記活性層に対応する活性層パターンを形成する工程と、を含む、請求項24に記載の薄膜トランジスタの製造方法。
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RU2705754C1 (ru) | 2019-11-11 |
KR20180016330A (ko) | 2018-02-14 |
CN106463545B (zh) | 2019-11-01 |
BR112017023119B1 (pt) | 2022-11-16 |
BR112017023119A2 (pt) | 2018-07-10 |
WO2018006412A1 (en) | 2018-01-11 |
KR20190079708A (ko) | 2019-07-05 |
US10032917B1 (en) | 2018-07-24 |
US20180212050A1 (en) | 2018-07-26 |
JP6779884B2 (ja) | 2020-11-04 |
EP3482420A4 (en) | 2020-03-04 |
CN106463545A (zh) | 2017-02-22 |
KR102104471B1 (ko) | 2020-04-24 |
EP3482420A1 (en) | 2019-05-15 |
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