JP2016503589A5 - - Google Patents
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- JP2016503589A5 JP2016503589A5 JP2015551148A JP2015551148A JP2016503589A5 JP 2016503589 A5 JP2016503589 A5 JP 2016503589A5 JP 2015551148 A JP2015551148 A JP 2015551148A JP 2015551148 A JP2015551148 A JP 2015551148A JP 2016503589 A5 JP2016503589 A5 JP 2016503589A5
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- 239000000758 substrate Substances 0.000 claims description 47
- 238000001514 detection method Methods 0.000 claims description 29
- 230000003287 optical effect Effects 0.000 claims description 3
- 238000000034 method Methods 0.000 claims 12
- 238000003384 imaging method Methods 0.000 description 1
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/EP2013/075831 WO2015082020A1 (de) | 2013-12-06 | 2013-12-06 | Vorrichtung und verfahren zum ausrichten von substraten |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2016503589A JP2016503589A (ja) | 2016-02-04 |
| JP2016503589A5 true JP2016503589A5 (enExample) | 2016-07-21 |
| JP6042564B2 JP6042564B2 (ja) | 2016-12-14 |
Family
ID=49753165
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2015551148A Active JP6042564B2 (ja) | 2013-12-06 | 2013-12-06 | 基板をアライメントする装置及び方法 |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US9851645B2 (enExample) |
| EP (1) | EP2893556B9 (enExample) |
| JP (1) | JP6042564B2 (enExample) |
| KR (2) | KR101741384B1 (enExample) |
| CN (1) | CN105247670B (enExample) |
| SG (1) | SG11201406979VA (enExample) |
| TW (1) | TWI637458B (enExample) |
| WO (1) | WO2015082020A1 (enExample) |
Families Citing this family (41)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20150155211A1 (en) * | 2013-12-03 | 2015-06-04 | Kulicke And Soffa Industries, Inc. | Systems and methods for bonding semiconductor elements |
| CN110707027B (zh) | 2014-02-03 | 2023-10-31 | Ev 集团 E·索尔纳有限责任公司 | 用于结合基体的方法及装置 |
| US9960030B2 (en) | 2014-04-01 | 2018-05-01 | Ev Group E. Thallner Gmbh | Method and device for the surface treatment of substrates |
| SG11201603148VA (en) | 2014-12-18 | 2016-07-28 | Ev Group E Thallner Gmbh | Method for bonding substrates |
| DE102015108901A1 (de) | 2015-06-05 | 2016-12-08 | Ev Group E. Thallner Gmbh | Verfahren zum Ausrichten von Substraten vor dem Bonden |
| EP3433875B1 (de) | 2016-03-22 | 2022-05-04 | EV Group E. Thallner GmbH | Verfahren zum bonden von substraten |
| JP6899891B2 (ja) | 2016-08-12 | 2021-07-07 | エーファウ・グループ・エー・タルナー・ゲーエムベーハー | 基板を制御して接合する方法およびサンプルホルダ |
| EP3504733B1 (de) | 2016-08-29 | 2020-09-23 | EV Group E. Thallner GmbH | Verfahren und vorrichtung zum ausrichten von substraten |
| CN110214369A (zh) | 2017-03-02 | 2019-09-06 | Ev 集团 E·索尔纳有限责任公司 | 用于键合芯片的方法和装置 |
| DE102017105697A1 (de) | 2017-03-16 | 2018-09-20 | Ev Group E. Thallner Gmbh | Verfahren und Vorrichtung zur Ausrichtung zweier optischer Teilsysteme |
| KR102396022B1 (ko) | 2017-03-16 | 2022-05-09 | 에베 그룹 에. 탈너 게엠베하 | 적어도 세 개의 기판들을 결합하기 위한 방법 |
| US11121091B2 (en) | 2017-03-20 | 2021-09-14 | Ev Group E. Thallner Gmbh | Method for arranging two substrates |
| WO2019022902A1 (en) | 2017-07-24 | 2019-01-31 | Cerebras Systems Inc. | APPARATUS AND METHOD FOR INTERCONNECTING MULTIPLE CHIPS |
| US10242891B2 (en) | 2017-08-24 | 2019-03-26 | Cerebras Systems Inc. | Apparatus and method for securing components of an integrated circuit |
| KR102274677B1 (ko) | 2017-09-21 | 2021-07-08 | 에베 그룹 에. 탈너 게엠베하 | 기판을 접합하기 위한 장치 및 방법 |
| TWI667728B (zh) * | 2017-10-30 | 2019-08-01 | 財團法人工業技術研究院 | 晶片接合裝置、晶片接合的方法以及晶片封裝結構 |
| US10541162B2 (en) * | 2017-11-28 | 2020-01-21 | Taiwan Semiconductor Manfacturing Co., Ltd. | Systems and methods for wafer pod calibration |
| KR102020236B1 (ko) * | 2018-04-20 | 2019-09-10 | 세메스 주식회사 | 패널 합착 장치 |
| US10636688B2 (en) * | 2018-06-22 | 2020-04-28 | Taiwan Semiconductor Manufacturing Co., Ltd. | Method for alignment, process tool and method for wafer-level alignment |
| US10957595B2 (en) | 2018-10-16 | 2021-03-23 | Cerebras Systems Inc. | Systems and methods for precision fabrication of an orifice within an integrated circuit |
| US10953539B2 (en) * | 2018-12-27 | 2021-03-23 | Kawasaki Jukogyo Kabushiki Kaisha | Substrate transfer robot and automatic teaching method |
| CN110246781B (zh) * | 2019-05-29 | 2021-06-22 | 桂林立德智兴电子科技有限公司 | 一种半导体晶圆平坦化设备 |
| JP7250641B2 (ja) | 2019-08-06 | 2023-04-03 | キオクシア株式会社 | アライメント装置及び半導体装置の製造方法 |
| KR102742480B1 (ko) | 2019-08-23 | 2024-12-12 | 에베 그룹 에. 탈너 게엠베하 | 기판의 정렬을 위한 방법 및 장치 |
| US11145530B2 (en) * | 2019-11-08 | 2021-10-12 | Cerebras Systems Inc. | System and method for alignment of an integrated circuit |
| CN114730719A (zh) | 2019-12-10 | 2022-07-08 | Ev 集团 E·索尔纳有限责任公司 | 用于对准基板的方法和装置 |
| JP7391733B2 (ja) * | 2020-03-17 | 2023-12-05 | キオクシア株式会社 | 半導体製造装置及び半導体装置の製造方法 |
| CN111524449B (zh) * | 2020-04-28 | 2022-03-29 | 昆山国显光电有限公司 | 贴合设备校正装置及方法、显示面板贴合设备及方法 |
| DE102020126211A1 (de) | 2020-05-28 | 2021-12-02 | Taiwan Semiconductor Manufacturing Co. Ltd. | Photolithographie-Ausrichtungsprozess für gebondete Wafer |
| WO2022002346A1 (de) | 2020-06-29 | 2022-01-06 | Ev Group E. Thallner Gmbh | Verfahren und vorrichtung zum bonden von substraten |
| JP7130720B2 (ja) * | 2020-11-25 | 2022-09-05 | エーファウ・グループ・エー・タルナー・ゲーエムベーハー | 基板を位置合わせする方法および装置 |
| US11845179B2 (en) * | 2020-12-22 | 2023-12-19 | Kawasaki Jukogyo Kabushiki Kaisha | Wafer jig, robot system, communication method, and robot teaching method |
| TWI792785B (zh) * | 2020-12-31 | 2023-02-11 | 南韓商Ｔｅｓ股份有限公司 | 基板接合裝置及基板接合方法 |
| KR102677190B1 (ko) * | 2020-12-31 | 2024-06-20 | 주식회사 테스 | 기판접합장치 및 기판접합방법 |
| TWM627561U (zh) * | 2021-08-26 | 2022-06-01 | 雷傑科技股份有限公司 | 對位設備 |
| EP4449485A1 (de) * | 2021-12-17 | 2024-10-23 | EV Group E. Thallner GmbH | Verfahren und vorrichtung zum ausrichten eines substrates |
| CN115312438A (zh) | 2022-03-21 | 2022-11-08 | 北京芯士联半导体科技有限公司 | 接合装置的推动销构造 |
| JP2023183276A (ja) * | 2022-06-15 | 2023-12-27 | キオクシア株式会社 | 接合装置、接合方法、及び半導体装置の製造方法 |
| EP4581668A1 (de) | 2022-09-02 | 2025-07-09 | EV Group E. Thallner GmbH | Vakuumsubstrathalter mit optimierter vakuumdichtung |
| KR102749845B1 (ko) * | 2022-11-14 | 2025-01-07 | 주식회사 큐빅셀 | 스캐닝 홀로그래피 기반의 기판 정렬 장치 및 방법 |
| WO2025061255A1 (de) | 2023-09-18 | 2025-03-27 | Erich Thallner | Substratstapel, modifiziertes schichtsystem, verfahren zum handhaben des substratstapels und vorrichtung für ein solches verfahren |
Family Cites Families (33)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4573791A (en) * | 1979-04-03 | 1986-03-04 | Optimetrix Corporation | Step-and-repeat projection alignment and exposure system |
| US4597664A (en) * | 1980-02-29 | 1986-07-01 | Optimetrix Corporation | Step-and-repeat projection alignment and exposure system with auxiliary optical unit |
| US4810941A (en) * | 1986-04-17 | 1989-03-07 | Canon Kabushiki Kaisha | Control system for a servomotor |
| JP3061150B2 (ja) | 1991-05-16 | 2000-07-10 | 三井・デュポンポリケミカル株式会社 | 水性分散体組成物及びそれより形成される被膜ならびにその製法 |
| JP2577140B2 (ja) | 1991-05-27 | 1997-01-29 | 日立テクノエンジニアリング株式会社 | 基板の位置合わせ装置 |
| US5639323A (en) * | 1995-02-17 | 1997-06-17 | Aiwa Research And Development, Inc. | Method for aligning miniature device components |
| US6048750A (en) * | 1997-11-24 | 2000-04-11 | Micron Technology, Inc. | Method for aligning and connecting semiconductor components to substrates |
| AT405775B (de) | 1998-01-13 | 1999-11-25 | Thallner Erich | Verfahren und vorrichtung zum ausgerichteten zusammenführen von scheibenförmigen halbleitersubstraten |
| JP4315420B2 (ja) * | 2003-04-18 | 2009-08-19 | キヤノン株式会社 | 露光装置及び露光方法 |
| US7695683B2 (en) * | 2003-05-20 | 2010-04-13 | Fluidigm Corporation | Method and system for microfluidic device and imaging thereof |
| JP4626160B2 (ja) * | 2004-03-04 | 2011-02-02 | 株式会社ニコン | ウェハ重ね合わせ方法及びウェハ重ね合わせ装置 |
| US7442476B2 (en) | 2004-12-27 | 2008-10-28 | Asml Netherlands B.V. | Method and system for 3D alignment in wafer scale integration |
| US7433038B2 (en) | 2006-04-27 | 2008-10-07 | Asml Netherlands B.V. | Alignment of substrates for bonding |
| JP5339056B2 (ja) * | 2006-07-14 | 2013-11-13 | 株式会社ニコン | 露光装置及びデバイス製造方法 |
| WO2008038788A1 (en) | 2006-09-29 | 2008-04-03 | Tokyo Electron Limited | Method for forming silicon oxide film, plasma processing apparatus and storage medium |
| US20080083818A1 (en) * | 2006-10-06 | 2008-04-10 | Asml Netherlands B.V. | Measuring the bonding of bonded substrates |
| WO2009022457A1 (ja) * | 2007-08-10 | 2009-02-19 | Nikon Corporation | 基板貼り合わせ装置及び基板貼り合わせ方法 |
| TWI478272B (zh) * | 2007-08-15 | 2015-03-21 | 尼康股份有限公司 | A positioning device, a bonding device, a laminated substrate manufacturing device, an exposure device, and a positioning method |
| US20090123874A1 (en) * | 2007-11-14 | 2009-05-14 | Tadashi Nagayama | Exposure method, exposure apparatus, and method for manufacturing device |
| WO2010023935A1 (ja) * | 2008-08-29 | 2010-03-04 | 株式会社ニコン | 基板位置合わせ装置、基板位置合わせ方法および積層型半導体の製造方法 |
| US8148646B2 (en) * | 2008-09-29 | 2012-04-03 | Formfactor, Inc. | Process of positioning groups of contact structures |
| JP5353892B2 (ja) | 2008-10-01 | 2013-11-27 | 株式会社ニコン | アラインメント装置およびアラインメント方法 |
| DE102009018977A1 (de) * | 2009-04-25 | 2010-11-04 | Ev Group Gmbh | Vorrichtung zur Ausrichtung und Vorfixierung eines Wafers |
| EP3731258A1 (de) | 2009-09-22 | 2020-10-28 | EV Group E. Thallner GmbH | Vorrichtung zum ausrichten zweier substrate |
| JP5565792B2 (ja) * | 2009-11-02 | 2014-08-06 | ボンドテック株式会社 | アライメント装置 |
| JP5628549B2 (ja) * | 2010-04-27 | 2014-11-19 | 芝浦メカトロニクス株式会社 | 基板貼合装置 |
| JP5889581B2 (ja) * | 2010-09-13 | 2016-03-22 | 東京エレクトロン株式会社 | ウエハ検査装置 |
| EP2463892B1 (de) | 2010-12-13 | 2013-04-03 | EV Group E. Thallner GmbH | Einrichtung, Vorrichtung und Verfahren zur Ermittlung von Ausrichtungsfehlern |
| KR101877600B1 (ko) * | 2011-11-25 | 2018-07-12 | 신에츠 엔지니어링 가부시키가이샤 | 기판 반송 장치 및 기판 조립 라인 |
| CN103246170B (zh) * | 2012-02-09 | 2015-07-08 | 中芯国际集成电路制造(上海)有限公司 | 曝光装置及曝光方法 |
| EP3373328A1 (de) * | 2012-06-06 | 2018-09-12 | EV Group E. Thallner GmbH | Vorrichtung und verfahren zur ermittlung von ausrichtungsfehlern |
| US9772564B2 (en) * | 2012-11-12 | 2017-09-26 | Nikon Corporation | Exposure apparatus and exposure method, and device manufacturing method |
| JP6294686B2 (ja) * | 2014-02-04 | 2018-03-14 | キヤノン株式会社 | インプリント装置、インプリント方法及び物品の製造方法 |
-
2013
- 2013-12-06 KR KR1020167022033A patent/KR101741384B1/ko active Active
- 2013-12-06 US US14/396,995 patent/US9851645B2/en active Active
- 2013-12-06 SG SG11201406979VA patent/SG11201406979VA/en unknown
- 2013-12-06 CN CN201380042562.6A patent/CN105247670B/zh active Active
- 2013-12-06 KR KR1020147030498A patent/KR20150080449A/ko not_active Ceased
- 2013-12-06 WO PCT/EP2013/075831 patent/WO2015082020A1/de not_active Ceased
- 2013-12-06 JP JP2015551148A patent/JP6042564B2/ja active Active
- 2013-12-06 EP EP13802610.9A patent/EP2893556B9/de active Active
-
2014
- 2014-10-20 TW TW103136195A patent/TWI637458B/zh active
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