JP2016164304A5 - - Google Patents

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JP2016164304A5
JP2016164304A5 JP2016012938A JP2016012938A JP2016164304A5 JP 2016164304 A5 JP2016164304 A5 JP 2016164304A5 JP 2016012938 A JP2016012938 A JP 2016012938A JP 2016012938 A JP2016012938 A JP 2016012938A JP 2016164304 A5 JP2016164304 A5 JP 2016164304A5
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processing chamber
fluorine
precursor
substrate
supplying
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JP6749764B2 (ja
JP2016164304A (ja
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JP2016012938A 2015-02-03 2016-01-27 非晶質炭素ハードマスク膜の炭素‐水素含有量を減少させるシステムおよび方法 Active JP6749764B2 (ja)

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US14/612,814 2015-02-03
US14/612,814 US9928994B2 (en) 2015-02-03 2015-02-03 Methods for decreasing carbon-hydrogen content of amorphous carbon hardmask films

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JP2016164304A JP2016164304A (ja) 2016-09-08
JP2016164304A5 true JP2016164304A5 (enExample) 2019-03-07
JP6749764B2 JP6749764B2 (ja) 2020-09-02

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US (1) US9928994B2 (enExample)
JP (1) JP6749764B2 (enExample)
KR (1) KR102478222B1 (enExample)
CN (1) CN106024596B (enExample)
TW (1) TWI687539B (enExample)

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