JP2016028447A - 非平面ゲルマニウム量子井戸デバイス - Google Patents
非平面ゲルマニウム量子井戸デバイス Download PDFInfo
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- JP2016028447A JP2016028447A JP2015207296A JP2015207296A JP2016028447A JP 2016028447 A JP2016028447 A JP 2016028447A JP 2015207296 A JP2015207296 A JP 2015207296A JP 2015207296 A JP2015207296 A JP 2015207296A JP 2016028447 A JP2016028447 A JP 2016028447A
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- Prior art keywords
- germanium
- layer
- fin structure
- silicon
- quantum well
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- 229910052732 germanium Inorganic materials 0.000 title claims abstract description 89
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 title claims abstract description 87
- 230000004888 barrier function Effects 0.000 claims abstract description 52
- 239000000463 material Substances 0.000 claims abstract description 47
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 34
- 239000010703 silicon Substances 0.000 claims abstract description 34
- 239000000758 substrate Substances 0.000 claims abstract description 28
- 229910000577 Silicon-germanium Inorganic materials 0.000 claims abstract description 25
- 239000004065 semiconductor Substances 0.000 claims abstract description 14
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 33
- 239000003989 dielectric material Substances 0.000 claims description 25
- 238000002955 isolation Methods 0.000 claims description 14
- LEVVHYCKPQWKOP-UHFFFAOYSA-N [Si].[Ge] Chemical compound [Si].[Ge] LEVVHYCKPQWKOP-UHFFFAOYSA-N 0.000 claims description 13
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 8
- 125000006850 spacer group Chemical group 0.000 claims description 7
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 4
- 239000002800 charge carrier Substances 0.000 claims description 4
- 229910000449 hafnium oxide Inorganic materials 0.000 claims description 4
- WIHZLLGSGQNAGK-UHFFFAOYSA-N hafnium(4+);oxygen(2-) Chemical compound [O-2].[O-2].[Hf+4] WIHZLLGSGQNAGK-UHFFFAOYSA-N 0.000 claims description 4
- 238000005036 potential barrier Methods 0.000 claims description 4
- 235000012239 silicon dioxide Nutrition 0.000 claims description 4
- 239000000377 silicon dioxide Substances 0.000 claims description 4
- 229910052719 titanium Inorganic materials 0.000 claims description 4
- 239000010936 titanium Substances 0.000 claims description 4
- 238000004377 microelectronic Methods 0.000 claims description 3
- 238000000034 method Methods 0.000 abstract description 34
- 229910052751 metal Inorganic materials 0.000 abstract description 16
- 239000002184 metal Substances 0.000 abstract description 16
- 229910001218 Gallium arsenide Inorganic materials 0.000 abstract description 11
- 229910000980 Aluminium gallium arsenide Inorganic materials 0.000 abstract description 2
- 238000005530 etching Methods 0.000 description 19
- 230000015572 biosynthetic process Effects 0.000 description 16
- 238000000151 deposition Methods 0.000 description 16
- JBRZTFJDHDCESZ-UHFFFAOYSA-N AsGa Chemical compound [As]#[Ga] JBRZTFJDHDCESZ-UHFFFAOYSA-N 0.000 description 10
- 238000000059 patterning Methods 0.000 description 9
- 238000001312 dry etching Methods 0.000 description 7
- 230000006911 nucleation Effects 0.000 description 7
- 238000010899 nucleation Methods 0.000 description 7
- 230000008901 benefit Effects 0.000 description 6
- 230000008021 deposition Effects 0.000 description 6
- 238000001039 wet etching Methods 0.000 description 6
- 239000012212 insulator Substances 0.000 description 5
- 238000010586 diagram Methods 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 238000000206 photolithography Methods 0.000 description 4
- 239000012535 impurity Substances 0.000 description 3
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- 229910052796 boron Inorganic materials 0.000 description 2
- 239000002131 composite material Substances 0.000 description 2
- 239000002019 doping agent Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- MRELNEQAGSRDBK-UHFFFAOYSA-N lanthanum(3+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[La+3].[La+3] MRELNEQAGSRDBK-UHFFFAOYSA-N 0.000 description 2
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- XWCMFHPRATWWFO-UHFFFAOYSA-N [O-2].[Ta+5].[Sc+3].[O-2].[O-2].[O-2] Chemical compound [O-2].[Ta+5].[Sc+3].[O-2].[O-2].[O-2] XWCMFHPRATWWFO-UHFFFAOYSA-N 0.000 description 1
- ILCYGSITMBHYNK-UHFFFAOYSA-N [Si]=O.[Hf] Chemical compound [Si]=O.[Hf] ILCYGSITMBHYNK-UHFFFAOYSA-N 0.000 description 1
- HZEWFHLRYVTOIW-UHFFFAOYSA-N [Ti].[Ni] Chemical compound [Ti].[Ni] HZEWFHLRYVTOIW-UHFFFAOYSA-N 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- FTWRSWRBSVXQPI-UHFFFAOYSA-N alumanylidynearsane;gallanylidynearsane Chemical compound [As]#[Al].[As]#[Ga] FTWRSWRBSVXQPI-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- MDPILPRLPQYEEN-UHFFFAOYSA-N aluminium arsenide Chemical compound [As]#[Al] MDPILPRLPQYEEN-UHFFFAOYSA-N 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- VKJLWXGJGDEGSO-UHFFFAOYSA-N barium(2+);oxygen(2-);titanium(4+) Chemical compound [O-2].[O-2].[O-2].[Ti+4].[Ba+2] VKJLWXGJGDEGSO-UHFFFAOYSA-N 0.000 description 1
- 229910052790 beryllium Inorganic materials 0.000 description 1
- ATBAMAFKBVZNFJ-UHFFFAOYSA-N beryllium atom Chemical compound [Be] ATBAMAFKBVZNFJ-UHFFFAOYSA-N 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 230000005669 field effect Effects 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052746 lanthanum Inorganic materials 0.000 description 1
- -1 lanthanum aluminate Chemical class 0.000 description 1
- JQJCSZOEVBFDKO-UHFFFAOYSA-N lead zinc Chemical compound [Zn].[Pb] JQJCSZOEVBFDKO-UHFFFAOYSA-N 0.000 description 1
- 230000000873 masking effect Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000001451 molecular beam epitaxy Methods 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- KJXBRHIPHIVJCS-UHFFFAOYSA-N oxo(oxoalumanyloxy)lanthanum Chemical compound O=[Al]O[La]=O KJXBRHIPHIVJCS-UHFFFAOYSA-N 0.000 description 1
- SIWVEOZUMHYXCS-UHFFFAOYSA-N oxo(oxoyttriooxy)yttrium Chemical compound O=[Y]O[Y]=O SIWVEOZUMHYXCS-UHFFFAOYSA-N 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- VEALVRVVWBQVSL-UHFFFAOYSA-N strontium titanate Chemical compound [Sr+2].[O-][Ti]([O-])=O VEALVRVVWBQVSL-UHFFFAOYSA-N 0.000 description 1
- CZXRMHUWVGPWRM-UHFFFAOYSA-N strontium;barium(2+);oxygen(2-);titanium(4+) Chemical compound [O-2].[O-2].[O-2].[O-2].[Ti+4].[Sr+2].[Ba+2] CZXRMHUWVGPWRM-UHFFFAOYSA-N 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 229910001936 tantalum oxide Inorganic materials 0.000 description 1
- PBCFLUZVCVVTBY-UHFFFAOYSA-N tantalum pentoxide Inorganic materials O=[Ta](=O)O[Ta](=O)=O PBCFLUZVCVVTBY-UHFFFAOYSA-N 0.000 description 1
- 229910052714 tellurium Inorganic materials 0.000 description 1
- PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical compound [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 description 1
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Abstract
Description
上述のように、典型的にIII−V族材料系のエピタキシャル成長半導体ヘテロ構造内に形成された量子井戸トランジスタデバイスは、低い有効質量と変調デルタドーピングによる抑制された不純物散乱とによって、トランジスタチャネルに非常に高いキャリア移動度をもたらす。これらの従来デバイスは非常に高い駆動電流性能を提供する。このような量子井戸システムは典型的に、プレーナアーキテクチャを用いて製造される。
図1は、本発明の一実施形態に係る非平面ゲルマニウム量子井戸デバイスを製造するのに使用され得るGe量子井戸成長構造の一例の断面図を示している。量子井戸成長構造は、例えば、従来の、キャップ層を備えたSiGe/Ge又はGaAs/Ge量子井戸構造とし得る。しかしながら、上述のように、本発明の一実施形態に従って形成される変調/デルタドープ非平面Ge量子井戸トランジスタデバイスは、この開示を受けて明らかになるように、様々なIV族若しくはIII−V族材料、ドーピング層及びバッファ層で構成される如何なる数の量子井戸成長構造を用いて実現されてもよい。請求項記載発明は、何らかの特定の量子井戸成長構成に限定されるものではない。
図2−8は、本発明の一実施形態に従って構成されるGeフィンに基づく量子井戸構造の形成を示す断面図及び斜視図である。認識されるように、フィンに基づく構造は、図1に示したデバイススタックの上、又はアンドープのGeチャネルを有する他の何らかの変調/デルタドープ量子井戸成長構造の上に形成されることができる。なお、明示的には説明しないが、この形成プロセス全体を通して、例えば平坦化(例えば、化学機械研磨すなわちCMP)及びその後の洗浄処理などの中間プロセスが含められ得る。
図9は、本発明の一実施形態に係る、ゲルマニウムフィンベースの変調/デルタドープ量子井戸構造を形成する方法を示している。量子井戸構造は、所望のように構成されることができ、概して、基板、IV/III−V族バリア層、(変調/デルタドープされた)ドーピング層、及び量子井戸層を含んだスタック(積層体)を含む。
Claims (20)
- 非平面半導体デバイスであって:
シリコン基板と、
前記シリコン基板の上に形成されたシリコンゲルマニウムバリア層と、
前記シリコンゲルマニウムバリア層の上に形成されたゲルマニウム層であり、当該ゲルマニウム層の少なくとも一部が、頂面と横方向の両側の側壁面とを持つゲルマニウムフィン構造を有する、ゲルマニウム層と、
前記ゲルマニウムフィン構造の少なくとも一部上に形成されたシリコンキャップ層であり、前記ゲルマニウムフィン構造の前記頂面及び前記側壁面を覆うシリコンキャップ層と、
前記シリコンキャップ層上に形成されたゲート誘電体層であり、当該ゲート誘電体層は、前記ゲルマニウムフィン構造の前記頂面を覆っている前記シリコンキャップ層の部分の上に形成され、且つ前記ゲルマニウムフィン構造の前記側壁面を覆っている前記シリコンキャップ層の部分に隣接して形成されている、ゲート誘電体層と、
前記ゲート誘電体層上に形成されたゲート電極層と、
を有するデバイス。 - 前記ゲート誘電体層は酸化ハフニウムを有し、前記ゲート電極層はチタンを有する、請求項1に記載のデバイス。
- 前記ゲート誘電体層は、二酸化シリコンの誘電率より高い誘電率を持つhigh−kゲート誘電体材料を有する、請求項1に記載のデバイス。
- 前記ゲルマニウムフィン構造のそれぞれの位置のドレイン領域及びソース領域、を更に有する請求項1に記載のデバイス。
- 前記ゲルマニウムフィン構造に近接するシャロートレンチアイソレーション(STI)内の誘電体材料、を更に有する請求項1に記載のデバイス。
- 前記STI内の前記誘電体材料は、前記ゲルマニウム層の下の層から前記ゲルマニウム層の底面まで延在している、請求項5に記載のデバイス。
- 前記ゲルマニウム層は、前記シリコンゲルマニウムバリア層、若しくは前記シリコンキャップ層、又はこれら双方によって歪まされている、請求項1に記載のデバイス。
- 当該デバイスの導電チャネルが、前記ゲート誘電体層の下の前記ゲルマニウムフィン構造の前記頂面及び前記側壁面を有し、前記シリコンゲルマニウムバリア層及び前記シリコンキャップ層の各々が、それらの間の前記ゲルマニウム層のバンドギャップよりも高いバンドギャップを有して、前記導電チャネル内の電荷キャリアに対する電位障壁を提供するように構成されている、請求項1に記載のデバイス。
- 前記ゲルマニウム層を変調ドープするデルタドーピングを含んだドーピング層、及び前記ゲルマニウム層に圧縮歪みを与えるように構成されたスペーサ層、のうちの少なくとも1つを更に有する請求項1に記載のデバイス。
- 前記シリコンキャップ層は、前記ゲルマニウムフィン構造の前記頂面からシャロートレンチアイソレーション材料まで、前記ゲルマニウムフィン構造の前記側壁面を覆っている、請求項1に記載のデバイス。
- 当該デバイスはサラウンドゲートデバイスの一部である、請求項1に記載のデバイス。
- 当該デバイスはトライゲートFinFETデバイスの一部である、請求項1に記載のデバイス。
- 当該デバイスは中央演算処理ユニット又はメモリアレイの一部である、請求項1に記載のデバイス。
- 非平面半導体デバイスであって:
シリコン基板と、
前記シリコン基板の上に形成されたシリコンゲルマニウムバリア層と、
前記シリコンゲルマニウムバリア層の上に形成されたゲルマニウム層であり、当該ゲルマニウム層の少なくとも一部が、頂面と横方向の両側の側壁面とを持つゲルマニウムフィン構造を有する、ゲルマニウム層と、
前記ゲルマニウムフィン構造の少なくとも一部上に形成されたシリコンキャップ層であり、前記ゲルマニウムフィン構造の前記頂面及び前記側壁面を覆うシリコンキャップ層と、
前記シリコンキャップ層上に形成され且つ酸化ハフニウムを有するゲート誘電体層であり、当該ゲート誘電体層は、前記ゲルマニウムフィン構造の前記頂面を覆っている前記シリコンキャップ層の部分の上に形成され、且つ前記ゲルマニウムフィン構造の前記側壁面を覆っている前記シリコンキャップ層の部分に隣接して形成されている、ゲート誘電体層と、
前記ゲート誘電体層上に形成されたチタンを有するゲート電極層と、
前記ゲルマニウムフィン構造のそれぞれの位置のドレイン領域及びソース領域と、
を有するデバイス。 - 当該デバイスは更に、前記ゲルマニウムフィン構造に近接するシャロートレンチアイソレーション(STI)内の誘電体材料を有し、前記STI内の前記誘電体材料は、前記ゲルマニウム層の下の層から前記ゲルマニウム層の底面まで延在している、請求項14に記載のデバイス。
- 当該デバイスの導電チャネルが、前記ゲート誘電体層の下の前記ゲルマニウムフィン構造の前記頂面及び前記側壁面を有し、前記シリコンゲルマニウムバリア層及び前記シリコンキャップ層の各々が、それらの間の前記ゲルマニウム層のバンドギャップよりも高いバンドギャップを有するように構成され、前記シリコンキャップ層は、前記ゲルマニウムフィン構造の前記頂面からシャロートレンチアイソレーション材料まで、前記ゲルマニウムフィン構造の前記側壁面を覆っている、請求項14に記載のデバイス。
- 請求項14に記載のデバイスを有する集積回路であって、中央演算処理ユニット(CPU)、メモリアレイ、オンチップキャッシュ、論理ゲート、又はこれらの組み合わせを含む集積回路。
- 非平面半導体デバイスであって:
シリコン基板と、
前記シリコン基板の上に形成されたシリコンゲルマニウムバリア層と、
前記シリコンゲルマニウムバリア層の上に形成されたゲルマニウム層であり、当該ゲルマニウム層の少なくとも一部が、頂面と横方向の両側の側壁面とを持つゲルマニウムフィン構造を有する、ゲルマニウム層と、
前記ゲルマニウムフィン構造の少なくとも一部上に形成されたシリコンキャップ層であり、前記ゲルマニウムフィン構造の前記頂面及び前記側壁面を覆うシリコンキャップ層と、
前記シリコンキャップ層上に形成され且つ酸化ハフニウムを有するゲート誘電体層であり、当該ゲート誘電体層は、前記ゲルマニウムフィン構造の前記頂面を覆っている前記シリコンキャップ層の部分の上に形成され、且つ前記ゲルマニウムフィン構造の前記側壁面を覆っている前記シリコンキャップ層の部分に隣接して形成されている、ゲート誘電体層と、
前記ゲート誘電体層上に形成されたチタンを有するゲート電極層と、
前記ゲルマニウムフィン構造のそれぞれの位置のドレイン領域及びソース領域と、
前記ゲルマニウムフィン構造に近接するシャロートレンチアイソレーション(STI)内の誘電体材料と
を有し、
前記シリコンゲルマニウムバリア層及び前記シリコンキャップ層の各々が、それらの間の前記ゲルマニウム層のバンドギャップよりも高いバンドギャップを有するように構成されている、
デバイス。 - 前記シリコンキャップ層は、前記ゲルマニウムフィン構造の前記頂面からSTI内の前記誘電体材料の頂部まで、前記ゲルマニウムフィン構造の前記側壁面を覆っている、請求項18に記載のデバイス。
- 請求項18に記載のデバイスを有するマイクロエレクトロニクスデバイスであって、中央演算処理ユニット(CPU)、メモリアレイ、オンチップキャッシュ、又は論理ゲートであるマイクロエレクトロニクスデバイス。
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Families Citing this family (147)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101853882B (zh) | 2009-04-01 | 2016-03-23 | 台湾积体电路制造股份有限公司 | 具有改进的开关电流比的高迁移率多面栅晶体管 |
US9768305B2 (en) | 2009-05-29 | 2017-09-19 | Taiwan Semiconductor Manufacturing Company, Ltd. | Gradient ternary or quaternary multiple-gate transistor |
US8617976B2 (en) | 2009-06-01 | 2013-12-31 | Taiwan Semiconductor Manufacturing Company, Ltd. | Source/drain re-growth for manufacturing III-V based transistors |
US8283653B2 (en) | 2009-12-23 | 2012-10-09 | Intel Corporation | Non-planar germanium quantum well devices |
US8575653B2 (en) | 2010-09-24 | 2013-11-05 | Intel Corporation | Non-planar quantum well device having interfacial layer and method of forming same |
CN102468303B (zh) * | 2010-11-10 | 2015-05-13 | 中国科学院微电子研究所 | 半导体存储单元、器件及其制备方法 |
JP2012182369A (ja) * | 2011-03-02 | 2012-09-20 | Toshiba Corp | 半導体記憶装置 |
US8728881B2 (en) * | 2011-08-31 | 2014-05-20 | Institute of Microelectronics, Chinese Academy of Sciences | Semiconductor device and method for manufacturing the same |
CN102956498B (zh) * | 2011-08-31 | 2015-09-09 | 中国科学院微电子研究所 | 半导体器件及其制造方法 |
CN103000664B (zh) * | 2011-09-08 | 2015-12-16 | 中国科学院微电子研究所 | 半导体器件及其制造方法 |
US8674449B2 (en) * | 2011-09-08 | 2014-03-18 | Institute of Microelectronics, Chinese Academy of Sciences | Semiconductor device and method for manufacturing the same |
US9397104B2 (en) | 2011-09-21 | 2016-07-19 | Institute of Microelectronics, Chinese Academy of Sciences | SRAM cell and method for manufacturing the same |
CN103022038B (zh) * | 2011-09-21 | 2015-06-10 | 中国科学院微电子研究所 | Sram单元及其制作方法 |
CN103022100B (zh) * | 2011-09-27 | 2015-09-02 | 中芯国际集成电路制造(上海)有限公司 | 鳍式场效应管的结构及其形成方法 |
US9099388B2 (en) * | 2011-10-21 | 2015-08-04 | Taiwan Semiconductor Manufacturing Company, Ltd. | III-V multi-channel FinFETs |
KR101805634B1 (ko) * | 2011-11-15 | 2017-12-08 | 삼성전자 주식회사 | Ⅲ-ⅴ족 배리어를 포함하는 반도체 소자 및 그 제조방법 |
WO2013095376A1 (en) | 2011-12-20 | 2013-06-27 | Intel Corporation | Strained channel region transistors employing source and drain stressors and systems including the same |
US8928086B2 (en) | 2013-01-09 | 2015-01-06 | International Business Machines Corporation | Strained finFET with an electrically isolated channel |
US8994002B2 (en) * | 2012-03-16 | 2015-03-31 | Taiwan Semiconductor Manufacturing Company, Ltd. | FinFET having superlattice stressor |
US9735239B2 (en) * | 2012-04-11 | 2017-08-15 | Taiwan Semiconductor Manufacturing Company, Ltd. | Semiconductor device channel system and method |
CN103377898B (zh) * | 2012-04-24 | 2015-12-16 | 中芯国际集成电路制造(上海)有限公司 | 半导体器件的形成方法、鳍式场效应管的形成方法 |
US20130328135A1 (en) * | 2012-06-12 | 2013-12-12 | International Business Machines Corporation | Preventing fully silicided formation in high-k metal gate processing |
US9748338B2 (en) * | 2012-06-29 | 2017-08-29 | Intel Corporation | Preventing isolation leakage in III-V devices |
US8629420B1 (en) * | 2012-07-03 | 2014-01-14 | Intel Mobile Communications GmbH | Drain extended MOS device for bulk FinFET technology |
US8847281B2 (en) * | 2012-07-27 | 2014-09-30 | Intel Corporation | High mobility strained channels for fin-based transistors |
CN103594512B (zh) | 2012-08-16 | 2017-09-05 | 中国科学院微电子研究所 | 半导体器件及其制造方法 |
EP2701198A3 (en) * | 2012-08-24 | 2017-06-28 | Imec | Device with strained layer for quantum well confinement and method for manufacturing thereof |
CN103811341B (zh) | 2012-11-09 | 2016-05-11 | 中国科学院微电子研究所 | 半导体器件及其制造方法 |
CN103811339B (zh) * | 2012-11-09 | 2016-12-21 | 中国科学院微电子研究所 | 半导体器件及其制造方法 |
US8823102B2 (en) * | 2012-11-16 | 2014-09-02 | Taiwan Semiconductor Manufacturing Company, Ltd. | Device with a strained Fin |
CN103855015B (zh) * | 2012-11-30 | 2020-03-06 | 中国科学院微电子研究所 | FinFET及其制造方法 |
US8748940B1 (en) | 2012-12-17 | 2014-06-10 | Intel Corporation | Semiconductor devices with germanium-rich active layers and doped transition layers |
GB2544190B (en) * | 2012-12-17 | 2017-10-18 | Intel Corp | Semicoductor devices with germanium-rich active layers & doped transition layers |
CN103915336B (zh) * | 2013-01-08 | 2016-05-25 | 中芯国际集成电路制造(上海)有限公司 | 三维量子阱晶体管及其形成方法 |
US8901607B2 (en) | 2013-01-14 | 2014-12-02 | Taiwan Semiconductor Manufacturing Company, Ltd. | Semiconductor device and fabricating the same |
US9136343B2 (en) * | 2013-01-24 | 2015-09-15 | Intel Corporation | Deep gate-all-around semiconductor device having germanium or group III-V active layer |
US9362386B2 (en) * | 2013-02-27 | 2016-06-07 | Taiwan Semiconductor Manufacturing Company, Ltd. | FETs and methods for forming the same |
US9087902B2 (en) | 2013-02-27 | 2015-07-21 | Taiwan Semiconductor Manufacturing Company, Ltd. | FinFETs with strained well regions |
US9385234B2 (en) | 2013-02-27 | 2016-07-05 | Taiwan Semiconductor Manufacturing Company, Ltd. | FinFETs with strained well regions |
US9159824B2 (en) | 2013-02-27 | 2015-10-13 | Taiwan Semiconductor Manufacturing Company, Ltd. | FinFETs with strained well regions |
US9209066B2 (en) * | 2013-03-01 | 2015-12-08 | Taiwan Semiconductor Manufacturing Company, Ltd. | Isolation structure of semiconductor device |
US9412871B2 (en) * | 2013-03-08 | 2016-08-09 | Taiwan Semiconductor Manufacturing Company, Ltd. | FinFET with channel backside passivation layer device and method |
US9214555B2 (en) * | 2013-03-12 | 2015-12-15 | Taiwan Semiconductor Manufacturing Co., Ltd. | Barrier layer for FinFET channels |
US9385198B2 (en) * | 2013-03-12 | 2016-07-05 | Taiwan Semiconductor Manufacturing Company, Ltd. | Heterostructures for semiconductor devices and methods of forming the same |
TWI644433B (zh) | 2013-03-13 | 2018-12-11 | 半導體能源研究所股份有限公司 | 半導體裝置 |
WO2014142856A1 (en) | 2013-03-14 | 2014-09-18 | Intel Corporation | Leakage reduction structures for nanowire transistors |
TWI620324B (zh) * | 2013-04-12 | 2018-04-01 | 半導體能源研究所股份有限公司 | 半導體裝置 |
CN103236402B (zh) | 2013-04-27 | 2016-02-03 | 京东方科技集团股份有限公司 | 薄膜晶体管及其制作方法、阵列基板及显示装置 |
US9236444B2 (en) * | 2013-05-03 | 2016-01-12 | Samsung Electronics Co., Ltd. | Methods of fabricating quantum well field effect transistors having multiple delta doped layers |
CN104218082B (zh) | 2013-06-04 | 2017-08-25 | 中芯国际集成电路制造(上海)有限公司 | 高迁移率鳍型场效应晶体管及其制造方法 |
US9178043B2 (en) | 2013-06-21 | 2015-11-03 | Taiwan Semiconductor Manufacturing Company, Ltd. | Non-planar transistors with replacement fins and methods of forming the same |
CN104253044B (zh) * | 2013-06-26 | 2017-03-29 | 中芯国际集成电路制造(上海)有限公司 | 晶体管及其形成方法 |
DE112013007031B4 (de) * | 2013-06-28 | 2022-02-24 | Intel Corporation | Auf selektiv epitaktisch gezüchteten III-V-Materialien basierende Vorrichtungen |
CN104282562A (zh) * | 2013-07-03 | 2015-01-14 | 中芯国际集成电路制造(上海)有限公司 | 鳍式场效应晶体管及其形成方法 |
CN104347408B (zh) * | 2013-07-31 | 2017-12-26 | 中芯国际集成电路制造(上海)有限公司 | 半导体装置及其制造方法 |
CN104347407B (zh) * | 2013-07-31 | 2017-10-31 | 中芯国际集成电路制造(上海)有限公司 | 半导体装置及其制造方法 |
US20160190319A1 (en) * | 2013-09-27 | 2016-06-30 | Intel Corporation | Non-Planar Semiconductor Devices having Multi-Layered Compliant Substrates |
US9178045B2 (en) * | 2013-09-27 | 2015-11-03 | Samsung Electronics Co., Ltd. | Integrated circuit devices including FinFETS and methods of forming the same |
EP3748684B1 (en) | 2013-09-27 | 2022-06-08 | INTEL Corporation | Semiconductor device having group iii-v material active region and graded gate dielectric |
EP3050111A4 (en) * | 2013-09-27 | 2017-06-07 | Intel Corporation | Improved cladding layer epitaxy via template engineering for heterogeneous integration on silicon |
US9583590B2 (en) | 2013-09-27 | 2017-02-28 | Samsung Electronics Co., Ltd. | Integrated circuit devices including FinFETs and methods of forming the same |
US9425042B2 (en) | 2013-10-10 | 2016-08-23 | Taiwan Semiconductor Manufacturing Company Limited | Hybrid silicon germanium substrate for device fabrication |
US9437497B2 (en) * | 2013-10-18 | 2016-09-06 | Taiwan Semiconductor Manufacturing Company, Ltd. | Method of making a FinFET device |
DE102014220672A1 (de) | 2013-10-22 | 2015-05-07 | Semiconductor Energy Laboratory Co., Ltd. | Halbleitervorrichtung |
US9425257B2 (en) | 2013-11-20 | 2016-08-23 | Taiwan Semiconductor Manufacturing Company Limited | Non-planar SiGe channel PFET |
US9716176B2 (en) * | 2013-11-26 | 2017-07-25 | Samsung Electronics Co., Ltd. | FinFET semiconductor devices including recessed source-drain regions on a bottom semiconductor layer and methods of fabricating the same |
KR101515071B1 (ko) * | 2013-11-29 | 2015-04-24 | 가천대학교 산학협력단 | 실리콘 집적가능한 게르마늄 기반의 높은 정공이동도를 갖는 트랜지스터 |
US9373706B2 (en) | 2014-01-24 | 2016-06-21 | Samsung Electronics Co., Ltd. | Methods of forming semiconductor devices, including forming a semiconductor material on a fin, and related semiconductor devices |
US9236397B2 (en) * | 2014-02-04 | 2016-01-12 | Globalfoundries Inc. | FinFET device containing a composite spacer structure |
US9236483B2 (en) * | 2014-02-12 | 2016-01-12 | Qualcomm Incorporated | FinFET with backgate, without punchthrough, and with reduced fin height variation |
US9214513B2 (en) * | 2014-02-13 | 2015-12-15 | Taiwan Semiconductor Manufacturing Company Limited | Fin structure and method for forming the same |
US10553718B2 (en) * | 2014-03-14 | 2020-02-04 | Taiwan Semiconductor Manufacturing Co., Ltd. | Semiconductor devices with core-shell structures |
SG11201606451QA (en) | 2014-03-28 | 2016-09-29 | Intel Corp | Selective epitaxially grown iii-v materials based devices |
US10468528B2 (en) | 2014-04-16 | 2019-11-05 | Taiwan Semiconductor Manufacturing Company, Ltd. | FinFET device with high-k metal gate stack |
US9379218B2 (en) | 2014-04-25 | 2016-06-28 | International Business Machines Corporation | Fin formation in fin field effect transistors |
US9721955B2 (en) | 2014-04-25 | 2017-08-01 | Taiwan Semiconductor Manufacturing Company, Ltd. | Structure and method for SRAM FinFET device having an oxide feature |
US9178067B1 (en) | 2014-04-25 | 2015-11-03 | Taiwan Semiconductor Manufacturing Company, Ltd. | Structure and method for FinFET device |
KR102190477B1 (ko) * | 2014-04-25 | 2020-12-14 | 삼성전자주식회사 | 반도체 장치 및 그 제조 방법 |
CN105185712B (zh) * | 2014-05-02 | 2020-09-08 | 三星电子株式会社 | 包括鳍式场效应晶体管的集成电路器件及其形成方法 |
US9263586B2 (en) * | 2014-06-06 | 2016-02-16 | Taiwan Semiconductor Manufacturing Company, Ltd. | Quantum well fin-like field effect transistor (QWFinFET) having a two-section combo QW structure |
US9224736B1 (en) | 2014-06-27 | 2015-12-29 | Taiwan Semicondcutor Manufacturing Company, Ltd. | Structure and method for SRAM FinFET device |
EP2978016B1 (en) * | 2014-07-25 | 2018-06-13 | IMEC vzw | A method for providing an nMOS device and a pMOS device on a silicon substrate and silicon substrate comprising an nMOS device and a pMOS device |
CN105448917B (zh) * | 2014-09-01 | 2019-03-29 | 中芯国际集成电路制造(上海)有限公司 | 半导体结构及其形成方法 |
CN106575671A (zh) * | 2014-09-19 | 2017-04-19 | 英特尔公司 | 创建掺杂的子结构以减少微电子晶体管中的泄露的装置和方法 |
CN106663695B (zh) | 2014-09-19 | 2021-03-30 | 英特尔公司 | 用于创建缓冲区以减少微电子晶体管中的泄漏的装置和方法 |
EP3195366B1 (en) | 2014-09-19 | 2020-10-21 | Intel Corporation | Apparatus and methods to create an indium gallium arsenide active channel having indium rich surfaces |
US9299618B1 (en) * | 2014-09-24 | 2016-03-29 | International Business Machines Corporation | Structure and method for advanced bulk fin isolation |
US9331073B2 (en) | 2014-09-26 | 2016-05-03 | International Business Machines Corporation | Epitaxially grown quantum well finFETs for enhanced pFET performance |
KR102255174B1 (ko) | 2014-10-10 | 2021-05-24 | 삼성전자주식회사 | 활성 영역을 갖는 반도체 소자 및 그 형성 방법 |
US9240454B1 (en) * | 2014-10-22 | 2016-01-19 | Stmicroelectronics, Inc. | Integrated circuit including a liner silicide with low contact resistance |
US9741811B2 (en) | 2014-12-15 | 2017-08-22 | Samsung Electronics Co., Ltd. | Integrated circuit devices including source/drain extension regions and methods of forming the same |
US9502567B2 (en) | 2015-02-13 | 2016-11-22 | Taiwan Semiconductor Manufacturing Co., Ltd. | Semiconductor fin structure with extending gate structure |
US9929242B2 (en) | 2015-01-12 | 2018-03-27 | Taiwan Semiconductor Manufacturing Co., Ltd. | Semiconductor device and manufacturing method thereof |
KR102257423B1 (ko) * | 2015-01-23 | 2021-05-31 | 삼성전자주식회사 | 반도체 기판 및 이를 포함하는 반도체 장치 |
US9847333B2 (en) * | 2015-03-09 | 2017-12-19 | Globalfoundries Inc. | Reducing risk of punch-through in FinFET semiconductor structure |
US10833175B2 (en) * | 2015-06-04 | 2020-11-10 | International Business Machines Corporation | Formation of dislocation-free SiGe finFET using porous silicon |
CN107636834B (zh) * | 2015-06-16 | 2021-11-09 | 英特尔公司 | 具有子鳍状物层的晶体管 |
KR102492181B1 (ko) | 2015-06-27 | 2023-01-26 | 인텔 코포레이션 | 희생층으로서 gaas를 가지는 ge 나노와이어 트랜지스터 |
EP3314636A4 (en) * | 2015-06-27 | 2019-02-27 | Intel Corporation | REDUCTION OF PARASITICAL LEAKAGE CURRENT IN THE DEACTIVE CONDITION FOR TUNNEL FIELD EFFECT TRANSISTORS |
US9953881B2 (en) | 2015-07-20 | 2018-04-24 | Taiwan Semiconductor Manufacturing Company, Ltd. | Method of forming a FinFET device |
EP3125273A1 (en) | 2015-07-31 | 2017-02-01 | IMEC vzw | Strained group iv channels |
US9954083B2 (en) * | 2015-08-20 | 2018-04-24 | International Business Machines Corporation | Semiconductor structures having increased channel strain using fin release in gate regions |
CN106486377B (zh) * | 2015-09-01 | 2019-11-29 | 中芯国际集成电路制造(上海)有限公司 | 鳍片式半导体器件及其制造方法 |
KR102323943B1 (ko) | 2015-10-21 | 2021-11-08 | 삼성전자주식회사 | 반도체 장치 제조 방법 |
CN106611787A (zh) * | 2015-10-26 | 2017-05-03 | 联华电子股份有限公司 | 半导体结构及其制作方法 |
CN106611780A (zh) * | 2015-10-27 | 2017-05-03 | 上海新昇半导体科技有限公司 | 量子阱器件及其形成方法 |
US9773871B2 (en) * | 2015-11-16 | 2017-09-26 | Taiwan Semiconductor Manufacturing Co., Ltd. | Fin field effect transistor and method for fabricating the same |
US20170179232A1 (en) * | 2015-12-18 | 2017-06-22 | International Business Machines Corporation | Iii-v transistor device with doped bottom barrier |
US9941363B2 (en) | 2015-12-18 | 2018-04-10 | International Business Machines Corporation | III-V transistor device with self-aligned doped bottom barrier |
US9502420B1 (en) * | 2015-12-19 | 2016-11-22 | International Business Machines Corporation | Structure and method for highly strained germanium channel fins for high mobility pFINFETs |
CN108369925B (zh) * | 2015-12-22 | 2023-10-31 | 英特尔公司 | 基于鳍的iii-v/si或ge cmos sage集成 |
US10756202B2 (en) | 2016-06-08 | 2020-08-25 | Intel Corporation | Quantum dot device packages |
US20200119169A1 (en) * | 2016-06-08 | 2020-04-16 | Intel Corporation | Quantum dot devices |
US11450798B2 (en) | 2016-06-08 | 2022-09-20 | Intel Corporation | Interconnects for quantum dot devices |
WO2017213640A1 (en) * | 2016-06-08 | 2017-12-14 | Intel Corporation | Quantum dot devices |
WO2017213637A1 (en) * | 2016-06-08 | 2017-12-14 | Intel Corporation | Quantum dot devices with patterned gates |
WO2017213638A1 (en) * | 2016-06-08 | 2017-12-14 | Intel Corporation | Quantum dot devices with doped regions |
WO2017213646A1 (en) * | 2016-06-09 | 2017-12-14 | Intel Corporation | Quantum dot devices with modulation doped stacks |
US11158714B2 (en) | 2016-06-09 | 2021-10-26 | Intel Corporation | Quantum dot devices with trenched substrates |
US11387399B2 (en) | 2016-06-09 | 2022-07-12 | Intel Corporation | Quantum dot devices with back gates |
WO2017213651A1 (en) * | 2016-06-09 | 2017-12-14 | Intel Corporation | Quantum dot devices with top gates |
WO2017213660A1 (en) * | 2016-06-10 | 2017-12-14 | Intel Corporation | Gate patterning for quantum dot devices |
WO2017213661A1 (en) * | 2016-06-10 | 2017-12-14 | Intel Corporation | Quantum dot devices with magnet lines |
US10978582B2 (en) | 2016-06-10 | 2021-04-13 | Intel Corporation | Gate patterning for quantum dot devices |
US10991802B2 (en) * | 2016-06-10 | 2021-04-27 | Intel Corporation | Quantum dot devices with gate interface materials |
WO2018004571A1 (en) * | 2016-06-29 | 2018-01-04 | Intel Corporation | Wide bandgap group iv subfin to reduce leakage |
US10770545B2 (en) | 2016-08-30 | 2020-09-08 | Intel Corporation | Quantum dot devices |
US11101352B2 (en) | 2016-09-24 | 2021-08-24 | Intel Corporation | Quantum dot array devices with shared gates |
WO2018057023A1 (en) * | 2016-09-25 | 2018-03-29 | Intel Corporation | Quantum dot qubits with iii-v compounds |
WO2018057020A1 (en) | 2016-09-25 | 2018-03-29 | Intel Corporation | Quantum dot array devices |
US11288586B2 (en) * | 2016-09-27 | 2022-03-29 | Intel Corporation | Independent double-gate quantum dot qubits |
WO2018063270A1 (en) * | 2016-09-30 | 2018-04-05 | Intel Corporation | Quantum dot devices with single electron transistor detectors |
US10062782B2 (en) | 2016-11-29 | 2018-08-28 | Taiwan Semiconductor Manufacturing Co., Ltd. | Method of manufacturing a semiconductor device with multilayered channel structure |
BR112019010217A2 (pt) | 2016-12-23 | 2019-08-27 | Intel Corp | litografia avançada e dispositivos automontados |
US9947767B1 (en) * | 2017-01-26 | 2018-04-17 | International Business Machines Corporation | Self-limited inner spacer formation for gate-all-around field effect transistors |
US11482457B2 (en) * | 2017-09-22 | 2022-10-25 | Intel Corporation | Substrate defect blocking layers for strained channel semiconductor devices |
WO2019125348A1 (en) * | 2017-12-18 | 2019-06-27 | Intel Corporation | Quantum dot devices with vertical quantum dot arrays |
WO2019135770A1 (en) * | 2018-01-08 | 2019-07-11 | Intel Corporation | Quantum dot devices with ordered crystalline materials |
US11616126B2 (en) | 2018-09-27 | 2023-03-28 | Intel Corporation | Quantum dot devices with passive barrier elements in a quantum well stack between metal gates |
US11450765B2 (en) | 2018-09-27 | 2022-09-20 | Intel Corporation | Quantum dot devices with diodes for electrostatic discharge protection |
US20200251582A1 (en) * | 2019-02-04 | 2020-08-06 | Qualcomm Incorporated | High electron mobility transistor (hemt) fin field-effect transistor (finfet) |
US11373870B2 (en) * | 2019-06-27 | 2022-06-28 | Taiwan Semiconductor Manufacturing Co., Ltd. | Method for manufacturing semiconductor device including performing thermal treatment on germanium layer |
CN110364595B (zh) * | 2019-07-22 | 2022-04-22 | 宁波安芯美半导体有限公司 | 发光二极管外延结构及其制备方法 |
US11417764B2 (en) * | 2020-01-29 | 2022-08-16 | Taiwan Semiconductor Manufacturing Co., Ltd. | Interface profile control in epitaxial structures for semiconductor devices |
US11133388B1 (en) * | 2020-07-23 | 2021-09-28 | Wisconsin Alumni Research Foundation | Silicon-germanium heterostructures with quantum wells having oscillatory germanium concentration profiles for increased valley splitting |
US11569353B2 (en) | 2021-02-02 | 2023-01-31 | Micron Technology, Inc. | Apparatuses including passing word lines comprising a band offset material, and related methods and systems |
WO2023141993A1 (zh) * | 2022-01-28 | 2023-08-03 | 中国科学院半导体研究所 | 空穴线性Rashba自旋轨道耦合效应的增强方法 |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006093717A (ja) * | 2004-09-25 | 2006-04-06 | Samsung Electronics Co Ltd | 変形されたチャンネル層を有する電界効果トランジスタ及びその製造方法 |
JP2006245038A (ja) * | 2005-02-28 | 2006-09-14 | Seiko Epson Corp | 半導体装置および半導体装置の製造方法 |
JP2008504678A (ja) * | 2004-06-24 | 2008-02-14 | インターナショナル・ビジネス・マシーンズ・コーポレーション | 圧縮歪Ge層内にPMOSデバイスを作製する構造および方法(先端CMOS技術への歪Geの統合) |
US20080237636A1 (en) * | 2007-03-29 | 2008-10-02 | Been-Yih Jin | Transistor having tensile strained channel and system including same |
US20080237577A1 (en) * | 2007-03-27 | 2008-10-02 | Chi On Chui | Forming a non-planar transistor having a quantum well channel |
US20090001415A1 (en) * | 2007-06-30 | 2009-01-01 | Nick Lindert | Multi-gate transistor with strained body |
US20090085027A1 (en) * | 2007-09-29 | 2009-04-02 | Intel Corporation | Three dimensional strained quantum wells and three dimensional strained surface channels by ge confinement method |
Family Cites Families (46)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH031469A (ja) | 1989-05-29 | 1991-01-08 | Mitsubishi Electric Corp | 超電導線および化合物超電導線の接続方法 |
JP3135939B2 (ja) | 1991-06-20 | 2001-02-19 | 富士通株式会社 | Hemt型半導体装置 |
US5444016A (en) | 1993-06-25 | 1995-08-22 | Abrokwah; Jonathan K. | Method of making ohmic contacts to a complementary III-V semiconductor device |
JP3834074B2 (ja) * | 1993-06-25 | 2006-10-18 | フリースケール セミコンダクター インコーポレイテッド | 相補形半導体デバイスにオーム接触を形成する方法 |
JP3262747B2 (ja) * | 1996-09-17 | 2002-03-04 | 松下電器産業株式会社 | 半導体装置及びその製造方法 |
JPH1092952A (ja) * | 1996-09-18 | 1998-04-10 | Toshiba Corp | 半導体記憶装置 |
US6723621B1 (en) * | 1997-06-30 | 2004-04-20 | International Business Machines Corporation | Abrupt delta-like doping in Si and SiGe films by UHV-CVD |
JP2000031469A (ja) * | 1998-07-14 | 2000-01-28 | Hitachi Ltd | 半導体装置およびその製造方法 |
US7145167B1 (en) * | 2000-03-11 | 2006-12-05 | International Business Machines Corporation | High speed Ge channel heterostructures for field effect devices |
CN1331240C (zh) | 1999-03-12 | 2007-08-08 | 国际商业机器公司 | 异质结构的锗沟道场效应器件及其制作方法 |
US6500510B1 (en) * | 1999-11-04 | 2002-12-31 | Molecular Storage Technologies, Inc. | Molecular level optical information storage devices |
GB2368422B (en) | 2000-05-10 | 2003-03-26 | Sony Corp | Electronic settlement system, settlement management device, store device, client, data storage device, computer program, and storage medium |
US6800910B2 (en) * | 2002-09-30 | 2004-10-05 | Advanced Micro Devices, Inc. | FinFET device incorporating strained silicon in the channel region |
WO2004038778A1 (en) | 2002-10-22 | 2004-05-06 | Amberwave Systems Corporation | Gate material for semiconductor device fabrication |
US7045401B2 (en) | 2003-06-23 | 2006-05-16 | Sharp Laboratories Of America, Inc. | Strained silicon finFET device |
KR100487566B1 (ko) * | 2003-07-23 | 2005-05-03 | 삼성전자주식회사 | 핀 전계 효과 트랜지스터 및 그 형성 방법 |
US20050095763A1 (en) * | 2003-10-29 | 2005-05-05 | Samavedam Srikanth B. | Method of forming an NMOS transistor and structure thereof |
KR100674914B1 (ko) * | 2004-09-25 | 2007-01-26 | 삼성전자주식회사 | 변형된 채널층을 갖는 모스 트랜지스터 및 그 제조방법 |
TWI277210B (en) * | 2004-10-26 | 2007-03-21 | Nanya Technology Corp | FinFET transistor process |
US20060148182A1 (en) * | 2005-01-03 | 2006-07-06 | Suman Datta | Quantum well transistor using high dielectric constant dielectric layer |
US7544963B2 (en) * | 2005-04-29 | 2009-06-09 | Cree, Inc. | Binary group III-nitride based high electron mobility transistors |
US7205601B2 (en) * | 2005-06-09 | 2007-04-17 | Taiwan Semiconductor Manufacturing Company, Ltd. | FinFET split gate EEPROM structure and method of its fabrication |
US7569443B2 (en) * | 2005-06-21 | 2009-08-04 | Intel Corporation | Complementary metal oxide semiconductor integrated circuit using raised source drain and replacement metal gate |
US20080050883A1 (en) * | 2006-08-25 | 2008-02-28 | Atmel Corporation | Hetrojunction bipolar transistor (hbt) with periodic multilayer base |
JP4676285B2 (ja) | 2005-08-30 | 2011-04-27 | セイコーインスツル株式会社 | 表面実装型圧電振動子とその製造方法、発振器、電子機器及び電波時計 |
JP5167816B2 (ja) * | 2005-10-21 | 2013-03-21 | 富士通株式会社 | フィン型半導体装置及びその製造方法 |
JP2007258485A (ja) * | 2006-03-23 | 2007-10-04 | Toshiba Corp | 半導体装置及びその製造方法 |
US7494862B2 (en) * | 2006-09-29 | 2009-02-24 | Intel Corporation | Methods for uniform doping of non-planar transistor structures |
US7429747B2 (en) * | 2006-11-16 | 2008-09-30 | Intel Corporation | Sb-based CMOS devices |
US20080142786A1 (en) * | 2006-12-13 | 2008-06-19 | Suman Datta | Insulated gate for group iii-v devices |
US8017463B2 (en) * | 2006-12-29 | 2011-09-13 | Intel Corporation | Expitaxial fabrication of fins for FinFET devices |
US7601980B2 (en) * | 2006-12-29 | 2009-10-13 | Intel Corporation | Dopant confinement in the delta doped layer using a dopant segregation barrier in quantum well structures |
US9006707B2 (en) * | 2007-02-28 | 2015-04-14 | Intel Corporation | Forming arsenide-based complementary logic on a single substrate |
US7435987B1 (en) * | 2007-03-27 | 2008-10-14 | Intel Corporation | Forming a type I heterostructure in a group IV semiconductor |
US7713803B2 (en) * | 2007-03-29 | 2010-05-11 | Intel Corporation | Mechanism for forming a remote delta doping layer of a quantum well structure |
US7791063B2 (en) * | 2007-08-30 | 2010-09-07 | Intel Corporation | High hole mobility p-channel Ge transistor structure on Si substrate |
US8278687B2 (en) * | 2008-03-28 | 2012-10-02 | Intel Corporation | Semiconductor heterostructures to reduce short channel effects |
US8129749B2 (en) * | 2008-03-28 | 2012-03-06 | Intel Corporation | Double quantum well structures for transistors |
JP5159413B2 (ja) * | 2008-04-24 | 2013-03-06 | 株式会社東芝 | 半導体装置及びその製造方法 |
JP5403212B2 (ja) | 2008-10-06 | 2014-01-29 | 株式会社Ihi | 白色ledの製造装置と方法 |
US20100148153A1 (en) | 2008-12-16 | 2010-06-17 | Hudait Mantu K | Group III-V devices with delta-doped layer under channel region |
US7759142B1 (en) | 2008-12-31 | 2010-07-20 | Intel Corporation | Quantum well MOSFET channels having uni-axial strain caused by metal source/drains, and conformal regrowth source/drains |
US8115235B2 (en) | 2009-02-20 | 2012-02-14 | Intel Corporation | Modulation-doped halo in quantum well field-effect transistors, apparatus made therewith, and methods of using same |
JP5299773B2 (ja) | 2009-03-18 | 2013-09-25 | トヨタ自動車東日本株式会社 | 結晶性樹脂の射出成形シミュレーション方法 |
CN101853882B (zh) * | 2009-04-01 | 2016-03-23 | 台湾积体电路制造股份有限公司 | 具有改进的开关电流比的高迁移率多面栅晶体管 |
US8283653B2 (en) | 2009-12-23 | 2012-10-09 | Intel Corporation | Non-planar germanium quantum well devices |
-
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- 2009-12-23 US US12/646,477 patent/US8283653B2/en active Active
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Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008504678A (ja) * | 2004-06-24 | 2008-02-14 | インターナショナル・ビジネス・マシーンズ・コーポレーション | 圧縮歪Ge層内にPMOSデバイスを作製する構造および方法(先端CMOS技術への歪Geの統合) |
JP2006093717A (ja) * | 2004-09-25 | 2006-04-06 | Samsung Electronics Co Ltd | 変形されたチャンネル層を有する電界効果トランジスタ及びその製造方法 |
JP2006245038A (ja) * | 2005-02-28 | 2006-09-14 | Seiko Epson Corp | 半導体装置および半導体装置の製造方法 |
US20080237577A1 (en) * | 2007-03-27 | 2008-10-02 | Chi On Chui | Forming a non-planar transistor having a quantum well channel |
US20080237636A1 (en) * | 2007-03-29 | 2008-10-02 | Been-Yih Jin | Transistor having tensile strained channel and system including same |
US20090001415A1 (en) * | 2007-06-30 | 2009-01-01 | Nick Lindert | Multi-gate transistor with strained body |
US20090085027A1 (en) * | 2007-09-29 | 2009-04-02 | Intel Corporation | Three dimensional strained quantum wells and three dimensional strained surface channels by ge confinement method |
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CN102656699A (zh) | 2012-09-05 |
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EP2996154A2 (en) | 2016-03-16 |
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US20110147711A1 (en) | 2011-06-23 |
EP2996154B1 (en) | 2021-04-21 |
JP6301301B2 (ja) | 2018-03-28 |
EP2996154A3 (en) | 2016-04-20 |
US20140103397A1 (en) | 2014-04-17 |
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CN104900693A (zh) | 2015-09-09 |
US10236369B2 (en) | 2019-03-19 |
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US9153671B2 (en) | 2015-10-06 |
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JP6549208B2 (ja) | 2019-07-24 |
US9799759B2 (en) | 2017-10-24 |
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