JP2014005270A - 光酸発生剤、この光酸発生剤を含むフォトレジスト、およびこれを含むコーティングされた物品 - Google Patents

光酸発生剤、この光酸発生剤を含むフォトレジスト、およびこれを含むコーティングされた物品 Download PDF

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Publication number
JP2014005270A
JP2014005270A JP2013097483A JP2013097483A JP2014005270A JP 2014005270 A JP2014005270 A JP 2014005270A JP 2013097483 A JP2013097483 A JP 2013097483A JP 2013097483 A JP2013097483 A JP 2013097483A JP 2014005270 A JP2014005270 A JP 2014005270A
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formula
independently
group
integer
alkyl
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Japanese (ja)
Inventor
Emad Aqad
イマッド・アカッド
Bai Su Cheng
チェン−バイ・スー
Mingqi Li
ミンキ・リー
P Prokopovich Gregory
グレゴリー・ピー．プロコポビッチ
Kong Liu
コン・リュー
Kaur Irvinder
アービンダー・カー
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Rohm and Haas Electronic Materials LLC
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Rohm and Haas Electronic Materials LLC
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    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D317/00—Heterocyclic compounds containing five-membered rings having two oxygen atoms as the only ring hetero atoms
    • C07D317/08—Heterocyclic compounds containing five-membered rings having two oxygen atoms as the only ring hetero atoms having the hetero atoms in positions 1 and 3
    • C07D317/10—Heterocyclic compounds containing five-membered rings having two oxygen atoms as the only ring hetero atoms having the hetero atoms in positions 1 and 3 not condensed with other rings
    • C07D317/14—Heterocyclic compounds containing five-membered rings having two oxygen atoms as the only ring hetero atoms having the hetero atoms in positions 1 and 3 not condensed with other rings with substituted hydrocarbon radicals attached to ring carbon atoms
    • C07D317/18—Radicals substituted by singly bound oxygen or sulfur atoms
    • C07D317/24—Radicals substituted by singly bound oxygen or sulfur atoms esterified
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C381/00—Compounds containing carbon and sulfur and having functional groups not covered by groups C07C301/00 - C07C337/00
    • C07C381/12—Sulfonium compounds
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D493/00—Heterocyclic compounds containing oxygen atoms as the only ring hetero atoms in the condensed system
    • C07D493/02—Heterocyclic compounds containing oxygen atoms as the only ring hetero atoms in the condensed system in which the condensed system contains two hetero rings
    • C07D493/04—Ortho-condensed systems
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D493/00—Heterocyclic compounds containing oxygen atoms as the only ring hetero atoms in the condensed system
    • C07D493/02—Heterocyclic compounds containing oxygen atoms as the only ring hetero atoms in the condensed system in which the condensed system contains two hetero rings
    • C07D493/08—Bridged systems
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D493/00—Heterocyclic compounds containing oxygen atoms as the only ring hetero atoms in the condensed system
    • C07D493/12—Heterocyclic compounds containing oxygen atoms as the only ring hetero atoms in the condensed system in which the condensed system contains three hetero rings
    • C07D493/14—Ortho-condensed systems
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07H—SUGARS; DERIVATIVES THEREOF; NUCLEOSIDES; NUCLEOTIDES; NUCLEIC ACIDS
    • C07H13/00—Compounds containing saccharide radicals esterified by carbonic acid or derivatives thereof, or by organic acids, e.g. phosphonic acids
    • C07H13/12—Compounds containing saccharide radicals esterified by carbonic acid or derivatives thereof, or by organic acids, e.g. phosphonic acids by acids having the group -X-C(=X)-X-, or halides thereof, in which each X means nitrogen, oxygen, sulfur, selenium or tellurium, e.g. carbonic acid, carbamic acid
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
    • G03F7/0395—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition the macromolecular compound having a backbone with alicyclic moieties
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/092—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by backside coating or layers, by lubricating-slip layers or means, by oxygen barrier layers or by stripping-release layers or means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

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  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Structural Engineering (AREA)
  • Architecture (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Biochemistry (AREA)
  • Biotechnology (AREA)
  • General Health & Medical Sciences (AREA)
  • Genetics & Genomics (AREA)
  • Molecular Biology (AREA)
  • Materials For Photolithography (AREA)
  • Heterocyclic Carbon Compounds Containing A Hetero Ring Having Oxygen Or Sulfur (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
JP2013097483A 2012-06-26 2013-05-07 光酸発生剤、この光酸発生剤を含むフォトレジスト、およびこれを含むコーティングされた物品 Withdrawn JP2014005270A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201261664499P 2012-06-26 2012-06-26
US61/664,499 2012-06-26

Related Child Applications (1)

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JP2016164633A Division JP6613217B2 (ja) 2012-06-26 2016-08-25 光酸発生剤、この光酸発生剤を含むフォトレジスト、およびこれを含むコーティングされた物品

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JP2014005270A true JP2014005270A (ja) 2014-01-16

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JP2013097483A Withdrawn JP2014005270A (ja) 2012-06-26 2013-05-07 光酸発生剤、この光酸発生剤を含むフォトレジスト、およびこれを含むコーティングされた物品
JP2016164633A Active JP6613217B2 (ja) 2012-06-26 2016-08-25 光酸発生剤、この光酸発生剤を含むフォトレジスト、およびこれを含むコーティングされた物品
JP2018158622A Pending JP2019006796A (ja) 2012-06-26 2018-08-27 光酸発生剤、この光酸発生剤を含むフォトレジスト、およびこれを含むコーティングされた物品
JP2018158621A Pending JP2018199702A (ja) 2012-06-26 2018-08-27 光酸発生剤、この光酸発生剤を含むフォトレジスト、およびこれを含むコーティングされた物品
JP2020121907A Active JP7049407B2 (ja) 2012-06-26 2020-07-16 光酸発生剤、この光酸発生剤を含むフォトレジスト、およびこれを含むコーティングされた物品

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JP2016164633A Active JP6613217B2 (ja) 2012-06-26 2016-08-25 光酸発生剤、この光酸発生剤を含むフォトレジスト、およびこれを含むコーティングされた物品
JP2018158622A Pending JP2019006796A (ja) 2012-06-26 2018-08-27 光酸発生剤、この光酸発生剤を含むフォトレジスト、およびこれを含むコーティングされた物品
JP2018158621A Pending JP2018199702A (ja) 2012-06-26 2018-08-27 光酸発生剤、この光酸発生剤を含むフォトレジスト、およびこれを含むコーティングされた物品
JP2020121907A Active JP7049407B2 (ja) 2012-06-26 2020-07-16 光酸発生剤、この光酸発生剤を含むフォトレジスト、およびこれを含むコーティングされた物品

Country Status (6)

Country Link
US (1) US9110369B2 (zh)
JP (5) JP2014005270A (zh)
KR (1) KR101525420B1 (zh)
CN (2) CN105777703B (zh)
DE (1) DE102013007913A1 (zh)
TW (1) TWI527792B (zh)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014189534A (ja) * 2013-03-28 2014-10-06 Sumitomo Chemical Co Ltd 塩、レジスト組成物及びレジストパターンの製造方法
JP2014209208A (ja) * 2013-03-28 2014-11-06 住友化学株式会社 レジスト組成物
JP2014224984A (ja) * 2013-03-08 2014-12-04 Jsr株式会社 フォトレジスト組成物、レジストパターン形成方法、化合物及び重合体
JP2017025073A (ja) * 2012-06-26 2017-02-02 ローム アンド ハース エレクトロニック マテリアルズ エルエルシーＲｏｈｍ ａｎｄ Ｈａａｓ Ｅｌｅｃｔｒｏｎｉｃ Ｍａｔｅｒｉａｌｓ ＬＬＣ 光酸発生剤、この光酸発生剤を含むフォトレジスト、およびこれを含むコーティングされた物品
JP2018012687A (ja) * 2016-07-12 2018-01-25 住友化学株式会社 塩、酸発生剤、レジスト組成物及びレジストパターンの製造方法
JP2019127482A (ja) * 2018-01-19 2019-08-01 住友化学株式会社 塩、酸発生剤、レジスト組成物及びレジストパターンの製造方法
JP7414500B2 (ja) 2018-12-25 2024-01-16 住友化学株式会社 塩、酸発生剤、レジスト組成物及びレジストパターンの製造方法

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JP5809798B2 (ja) 2009-12-10 2015-11-11 ローム アンド ハース エレクトロニック マテリアルズ エルエルシーＲｏｈｍ ａｎｄ Ｈａａｓ Ｅｌｅｃｔｒｏｎｉｃ Ｍａｔｅｒｉａｌｓ ＬＬＣ コラート光酸発生剤およびこれを含むフォトレジスト
JP2013079232A (ja) 2011-09-30 2013-05-02 Rohm & Haas Electronic Materials Llc 光酸発生剤およびこれを含むフォトレジスト
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US9256125B2 (en) 2013-03-30 2016-02-09 Rohm And Haas Electronic Materials, Llc Acid generators and photoresists comprising same
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US9067909B2 (en) 2013-08-28 2015-06-30 Rohm And Haas Electronic Materials Llc Photoacid generator, photoresist, coated substrate, and method of forming an electronic device
US9046767B2 (en) 2013-10-25 2015-06-02 Rohm And Haas Electronic Materials Llc Photoacid generator, photoresist, coated substrate, and method of forming an electronic device
KR102611586B1 (ko) * 2018-09-14 2023-12-07 도오꾜오까고오교 가부시끼가이샤 레지스트 조성물 및 레지스트 패턴 형성 방법
JP7344727B2 (ja) * 2018-09-26 2023-09-14 住友化学株式会社 塩、酸発生剤、レジスト組成物及びレジストパターンの製造方法
USD923716S1 (en) 2019-07-31 2021-06-29 Ninebot (Beijing) Tech. Co., Ltd Scooter
CN111123645A (zh) * 2019-12-24 2020-05-08 上海博栋化学科技有限公司 含柏木醇结构的锍鎓盐类光致酸产生剂及其制备方法
CN111138405A (zh) * 2019-12-28 2020-05-12 上海博栋化学科技有限公司 由广藿香醇合成的磺酸锍盐类光酸产生剂及其合成方法
CN111138407A (zh) * 2019-12-28 2020-05-12 上海博栋化学科技有限公司 由喇叭茶醇合成的磺酸锍盐类光酸产生剂及其合成方法
CN111116546A (zh) * 2019-12-28 2020-05-08 上海博栋化学科技有限公司 由beta-桉叶醇合成的磺酸锍盐类光酸产生剂及其合成方法
CN111138406A (zh) * 2019-12-28 2020-05-12 上海博栋化学科技有限公司 由愈创木醇合成的磺酸锍盐类光酸产生剂及其合成方法
CN111116605B (zh) * 2019-12-28 2021-06-04 上海博栋化学科技有限公司 由戊醛糖合成的光刻胶树脂单体及其合成方法
CN111138408A (zh) * 2019-12-28 2020-05-12 上海博栋化学科技有限公司 由柏木醇合成的磺酸锍盐类光酸产生剂及其合成方法
CN111662267B (zh) * 2020-06-18 2021-09-17 徐州博康信息化学品有限公司 含二氧代双环[2.2.2]辛烷二羧酸脂结构的光刻胶产酸树脂单体及其制备方法
CN112661756A (zh) * 2020-12-23 2021-04-16 上海博栋化学科技有限公司 由20-羟基榴花碱合成的锍鎓盐类光致产酸剂及其制备方法
CN113045537A (zh) * 2020-12-23 2021-06-29 上海博栋化学科技有限公司 一种由莪术醇合成的磺酸锍盐类光产酸剂及其合成方法
CN113603668B (zh) * 2021-08-31 2022-04-22 杭州传化精细化工有限公司 2-溴-2,2-二氟乙酸丙酮叉保护甘油单酯、水性聚氨酯及制备方法

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JP2019006796A (ja) 2019-01-17
KR20140001116A (ko) 2014-01-06
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US20130344438A1 (en) 2013-12-26
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