DE102013007913A8 - Photosäureerzeuger, Photolack, der den Photosäureerzeuger umfasst, und beschichteter Gegenstand, der diesen umfasst - Google Patents
Photosäureerzeuger, Photolack, der den Photosäureerzeuger umfasst, und beschichteter Gegenstand, der diesen umfasst Download PDFInfo
- Publication number
- DE102013007913A8 DE102013007913A8 DE201310007913 DE102013007913A DE102013007913A8 DE 102013007913 A8 DE102013007913 A8 DE 102013007913A8 DE 201310007913 DE201310007913 DE 201310007913 DE 102013007913 A DE102013007913 A DE 102013007913A DE 102013007913 A8 DE102013007913 A8 DE 102013007913A8
- Authority
- DE
- Germany
- Prior art keywords
- photoacid generator
- photoresist
- same
- coated article
- photoacid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D317/00—Heterocyclic compounds containing five-membered rings having two oxygen atoms as the only ring hetero atoms
- C07D317/08—Heterocyclic compounds containing five-membered rings having two oxygen atoms as the only ring hetero atoms having the hetero atoms in positions 1 and 3
- C07D317/10—Heterocyclic compounds containing five-membered rings having two oxygen atoms as the only ring hetero atoms having the hetero atoms in positions 1 and 3 not condensed with other rings
- C07D317/14—Heterocyclic compounds containing five-membered rings having two oxygen atoms as the only ring hetero atoms having the hetero atoms in positions 1 and 3 not condensed with other rings with substituted hydrocarbon radicals attached to ring carbon atoms
- C07D317/18—Radicals substituted by singly bound oxygen or sulfur atoms
- C07D317/24—Radicals substituted by singly bound oxygen or sulfur atoms esterified
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C381/00—Compounds containing carbon and sulfur and having functional groups not covered by groups C07C301/00 - C07C337/00
- C07C381/12—Sulfonium compounds
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D493/00—Heterocyclic compounds containing oxygen atoms as the only ring hetero atoms in the condensed system
- C07D493/02—Heterocyclic compounds containing oxygen atoms as the only ring hetero atoms in the condensed system in which the condensed system contains two hetero rings
- C07D493/04—Ortho-condensed systems
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D493/00—Heterocyclic compounds containing oxygen atoms as the only ring hetero atoms in the condensed system
- C07D493/02—Heterocyclic compounds containing oxygen atoms as the only ring hetero atoms in the condensed system in which the condensed system contains two hetero rings
- C07D493/08—Bridged systems
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D493/00—Heterocyclic compounds containing oxygen atoms as the only ring hetero atoms in the condensed system
- C07D493/12—Heterocyclic compounds containing oxygen atoms as the only ring hetero atoms in the condensed system in which the condensed system contains three hetero rings
- C07D493/14—Ortho-condensed systems
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07H—SUGARS; DERIVATIVES THEREOF; NUCLEOSIDES; NUCLEOTIDES; NUCLEIC ACIDS
- C07H13/00—Compounds containing saccharide radicals esterified by carbonic acid or derivatives thereof, or by organic acids, e.g. phosphonic acids
- C07H13/12—Compounds containing saccharide radicals esterified by carbonic acid or derivatives thereof, or by organic acids, e.g. phosphonic acids by acids having the group -X-C(=X)-X-, or halides thereof, in which each X means nitrogen, oxygen, sulfur, selenium or tellurium, e.g. carbonic acid, carbamic acid
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
- G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
- G03F7/0395—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition the macromolecular compound having a backbone with alicyclic moieties
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/092—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by backside coating or layers, by lubricating-slip layers or means, by oxygen barrier layers or by stripping-release layers or means
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201261664499P | 2012-06-26 | 2012-06-26 | |
US61/664,499 | 2012-06-26 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE102013007913A1 DE102013007913A1 (de) | 2014-01-02 |
DE102013007913A8 true DE102013007913A8 (de) | 2014-03-13 |
Family
ID=49754211
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE201310007913 Withdrawn DE102013007913A1 (de) | 2012-06-26 | 2013-05-07 | Photosäureerzeuger, Photolack, der den Photosäureerzeuger umfasst, und beschichteter Gegenstand, der diesen umfasst |
Country Status (6)
Country | Link |
---|---|
US (1) | US9110369B2 (de) |
JP (5) | JP2014005270A (de) |
KR (1) | KR101525420B1 (de) |
CN (2) | CN103508994B (de) |
DE (1) | DE102013007913A1 (de) |
TW (1) | TWI527792B (de) |
Families Citing this family (28)
Publication number | Priority date | Publication date | Assignee | Title |
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US9671689B2 (en) | 2009-12-10 | 2017-06-06 | Rohm And Haas Electronic Materials Llc | Cholate photoacid generators and photoresists comprising same |
JP2013079232A (ja) | 2011-09-30 | 2013-05-02 | Rohm & Haas Electronic Materials Llc | 光酸発生剤およびこれを含むフォトレジスト |
TWI527792B (zh) * | 2012-06-26 | 2016-04-01 | 羅門哈斯電子材料有限公司 | 光酸產生劑、含該光酸產生劑之光阻劑及含該光阻劑之經塗覆物件 |
US9029065B2 (en) | 2012-10-26 | 2015-05-12 | Rohm And Haas Electronic Materials Llc | Photoacid generating compound and photoresist composition comprising same, coated article comprising the photoresist and method of making an article |
JP6287369B2 (ja) * | 2013-03-08 | 2018-03-07 | Jsr株式会社 | フォトレジスト組成物、レジストパターン形成方法、化合物及び重合体 |
JP6287414B2 (ja) * | 2013-03-28 | 2018-03-07 | 住友化学株式会社 | レジスト組成物 |
JP6229285B2 (ja) * | 2013-03-28 | 2017-11-15 | 住友化学株式会社 | 塩、レジスト組成物及びレジストパターンの製造方法 |
US9256125B2 (en) | 2013-03-30 | 2016-02-09 | Rohm And Haas Electronic Materials, Llc | Acid generators and photoresists comprising same |
JP6131202B2 (ja) * | 2013-07-10 | 2017-05-17 | 富士フイルム株式会社 | 感活性光線性又は感放射線性樹脂組成物、それを用いたレジスト膜、レジスト塗布マスクブランクス、及びパターン形成方法、並びに、電子デバイスの製造方法 |
US9067909B2 (en) | 2013-08-28 | 2015-06-30 | Rohm And Haas Electronic Materials Llc | Photoacid generator, photoresist, coated substrate, and method of forming an electronic device |
US9046767B2 (en) | 2013-10-25 | 2015-06-02 | Rohm And Haas Electronic Materials Llc | Photoacid generator, photoresist, coated substrate, and method of forming an electronic device |
JP6950302B2 (ja) * | 2016-07-12 | 2021-10-13 | 住友化学株式会社 | 塩、酸発生剤、レジスト組成物及びレジストパターンの製造方法 |
JP7257149B2 (ja) * | 2018-01-19 | 2023-04-13 | 住友化学株式会社 | 塩、酸発生剤、レジスト組成物及びレジストパターンの製造方法 |
KR102611586B1 (ko) * | 2018-09-14 | 2023-12-07 | 도오꾜오까고오교 가부시끼가이샤 | 레지스트 조성물 및 레지스트 패턴 형성 방법 |
JP7344727B2 (ja) * | 2018-09-26 | 2023-09-14 | 住友化学株式会社 | 塩、酸発生剤、レジスト組成物及びレジストパターンの製造方法 |
JP7414500B2 (ja) | 2018-12-25 | 2024-01-16 | 住友化学株式会社 | 塩、酸発生剤、レジスト組成物及びレジストパターンの製造方法 |
USD923716S1 (en) | 2019-07-31 | 2021-06-29 | Ninebot (Beijing) Tech. Co., Ltd | Scooter |
CN111123645A (zh) * | 2019-12-24 | 2020-05-08 | 上海博栋化学科技有限公司 | 含柏木醇结构的锍鎓盐类光致酸产生剂及其制备方法 |
CN111138406A (zh) * | 2019-12-28 | 2020-05-12 | 上海博栋化学科技有限公司 | 由愈创木醇合成的磺酸锍盐类光酸产生剂及其合成方法 |
CN111138407A (zh) * | 2019-12-28 | 2020-05-12 | 上海博栋化学科技有限公司 | 由喇叭茶醇合成的磺酸锍盐类光酸产生剂及其合成方法 |
CN111138408A (zh) * | 2019-12-28 | 2020-05-12 | 上海博栋化学科技有限公司 | 由柏木醇合成的磺酸锍盐类光酸产生剂及其合成方法 |
CN111116605B (zh) * | 2019-12-28 | 2021-06-04 | 上海博栋化学科技有限公司 | 由戊醛糖合成的光刻胶树脂单体及其合成方法 |
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CN113045537A (zh) * | 2020-12-23 | 2021-06-29 | 上海博栋化学科技有限公司 | 一种由莪术醇合成的磺酸锍盐类光产酸剂及其合成方法 |
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CN102603586A (zh) * | 2010-11-15 | 2012-07-25 | 罗门哈斯电子材料有限公司 | 碱反应性光酸发生剂以及包含其的光致抗蚀剂 |
TWI530491B (zh) * | 2010-11-30 | 2016-04-21 | 住友化學股份有限公司 | 鹽及包括該鹽之光阻組成物 |
JP5947028B2 (ja) * | 2010-12-02 | 2016-07-06 | ローム アンド ハース エレクトロニック マテリアルズ エルエルシーRohm and Haas Electronic Materials LLC | ポリマー、フォトレジスト組成物、およびフォトリソグラフィパターンを形成する方法 |
JP2012153680A (ja) * | 2011-01-28 | 2012-08-16 | Sumitomo Chemical Co Ltd | 塩、酸発生剤、レジスト組成物及びレジストパターンの製造方法 |
JP5802510B2 (ja) * | 2011-09-30 | 2015-10-28 | 富士フイルム株式会社 | パターン形成方法、感電子線性又は感極紫外線性樹脂組成物、及び、レジスト膜、並びに、これらを用いた電子デバイスの製造方法 |
TWI527792B (zh) * | 2012-06-26 | 2016-04-01 | 羅門哈斯電子材料有限公司 | 光酸產生劑、含該光酸產生劑之光阻劑及含該光阻劑之經塗覆物件 |
JP5972765B2 (ja) | 2012-11-26 | 2016-08-17 | 住友化学株式会社 | 塩、酸発生剤、レジスト組成物及びレジストパターンの製造方法 |
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2013
- 2013-05-06 TW TW102116024A patent/TWI527792B/zh active
- 2013-05-07 DE DE201310007913 patent/DE102013007913A1/de not_active Withdrawn
- 2013-05-07 JP JP2013097483A patent/JP2014005270A/ja not_active Withdrawn
- 2013-06-12 KR KR1020130067082A patent/KR101525420B1/ko active IP Right Grant
- 2013-06-25 US US13/925,926 patent/US9110369B2/en active Active
- 2013-06-25 CN CN201310257323.4A patent/CN103508994B/zh active Active
- 2013-06-25 CN CN201610176795.0A patent/CN105777703B/zh active Active
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2016
- 2016-08-25 JP JP2016164633A patent/JP6613217B2/ja active Active
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- 2018-08-27 JP JP2018158621A patent/JP2018199702A/ja active Pending
- 2018-08-27 JP JP2018158622A patent/JP2019006796A/ja active Pending
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Also Published As
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JP2017025073A (ja) | 2017-02-02 |
JP2019006796A (ja) | 2019-01-17 |
CN105777703A (zh) | 2016-07-20 |
CN105777703B (zh) | 2018-11-13 |
KR101525420B1 (ko) | 2015-06-03 |
US20130344438A1 (en) | 2013-12-26 |
JP2020172538A (ja) | 2020-10-22 |
TWI527792B (zh) | 2016-04-01 |
CN103508994A (zh) | 2014-01-15 |
JP6613217B2 (ja) | 2019-11-27 |
DE102013007913A1 (de) | 2014-01-02 |
JP2018199702A (ja) | 2018-12-20 |
US9110369B2 (en) | 2015-08-18 |
TW201402531A (zh) | 2014-01-16 |
KR20140001116A (ko) | 2014-01-06 |
JP2014005270A (ja) | 2014-01-16 |
JP7049407B2 (ja) | 2022-04-06 |
CN103508994B (zh) | 2016-09-07 |
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