JP2013522884A5 - - Google Patents

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JP2013522884A5
JP2013522884A5 JP2012557251A JP2012557251A JP2013522884A5 JP 2013522884 A5 JP2013522884 A5 JP 2013522884A5 JP 2012557251 A JP2012557251 A JP 2012557251A JP 2012557251 A JP2012557251 A JP 2012557251A JP 2013522884 A5 JP2013522884 A5 JP 2013522884A5
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temperature
plasma
chamber
substrate
etching
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JP2013522884A (ja
JP5921448B2 (ja
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JP2012557251A 2010-03-10 2011-03-10 周期的な酸化およびエッチングのための装置と方法 Active JP5921448B2 (ja)

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Application Number Priority Date Filing Date Title
US12/720,926 2010-03-10
US12/720,926 US20110061812A1 (en) 2009-09-11 2010-03-10 Apparatus and Methods for Cyclical Oxidation and Etching
PCT/US2011/027922 WO2011112823A2 (en) 2010-03-10 2011-03-10 Apparatus and methods for cyclical oxidation and etching

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JP2013522884A JP2013522884A (ja) 2013-06-13
JP2013522884A5 true JP2013522884A5 (enExample) 2014-04-24
JP5921448B2 JP5921448B2 (ja) 2016-05-24

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US (1) US20110061812A1 (enExample)
JP (1) JP5921448B2 (enExample)
KR (3) KR20180021244A (enExample)
CN (2) CN106024587B (enExample)
TW (1) TWI517240B (enExample)
WO (1) WO2011112823A2 (enExample)

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