JP2012507141A5 - - Google Patents

Download PDF

Info

Publication number
JP2012507141A5
JP2012507141A5 JP2011533187A JP2011533187A JP2012507141A5 JP 2012507141 A5 JP2012507141 A5 JP 2012507141A5 JP 2011533187 A JP2011533187 A JP 2011533187A JP 2011533187 A JP2011533187 A JP 2011533187A JP 2012507141 A5 JP2012507141 A5 JP 2012507141A5
Authority
JP
Japan
Prior art keywords
template
substrate
force applied
matching
solidified layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2011533187A
Other languages
English (en)
Japanese (ja)
Other versions
JP2012507141A (ja
Filing date
Publication date
Priority claimed from US12/604,517 external-priority patent/US8652393B2/en
Application filed filed Critical
Publication of JP2012507141A publication Critical patent/JP2012507141A/ja
Publication of JP2012507141A5 publication Critical patent/JP2012507141A5/ja
Pending legal-status Critical Current

Links

JP2011533187A 2008-10-24 2009-10-26 インプリント・プロセスの分離段階における歪みと動特性の制御 Pending JP2012507141A (ja)

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
US10813108P 2008-10-24 2008-10-24
US61/108,131 2008-10-24
US10955708P 2008-10-30 2008-10-30
US61/109,557 2008-10-30
US12/604,517 2009-10-23
US12/604,517 US8652393B2 (en) 2008-10-24 2009-10-23 Strain and kinetics control during separation phase of imprint process
PCT/US2009/005803 WO2010047837A2 (en) 2008-10-24 2009-10-26 Strain and kinetics control during separation phase of imprint process

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2014080783A Division JP5728602B2 (ja) 2008-10-24 2014-04-10 インプリント・プロセスの分離段階における歪みと動特性の制御

Publications (2)

Publication Number Publication Date
JP2012507141A JP2012507141A (ja) 2012-03-22
JP2012507141A5 true JP2012507141A5 (enExample) 2012-12-06

Family

ID=42116691

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2011533187A Pending JP2012507141A (ja) 2008-10-24 2009-10-26 インプリント・プロセスの分離段階における歪みと動特性の制御
JP2014080783A Active JP5728602B2 (ja) 2008-10-24 2014-04-10 インプリント・プロセスの分離段階における歪みと動特性の制御

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2014080783A Active JP5728602B2 (ja) 2008-10-24 2014-04-10 インプリント・プロセスの分離段階における歪みと動特性の制御

Country Status (8)

Country Link
US (3) US8652393B2 (enExample)
EP (1) EP2350741B1 (enExample)
JP (2) JP2012507141A (enExample)
KR (1) KR20110086832A (enExample)
CN (1) CN102203671B (enExample)
MY (1) MY152446A (enExample)
TW (2) TWI405659B (enExample)
WO (1) WO2010047837A2 (enExample)

Families Citing this family (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA2225784A1 (en) 1995-06-30 1997-01-23 Boston Scientific Corporation Ultrasound imaging catheter with a cutting element
US8652393B2 (en) 2008-10-24 2014-02-18 Molecular Imprints, Inc. Strain and kinetics control during separation phase of imprint process
JP4792096B2 (ja) * 2009-03-19 2011-10-12 株式会社東芝 テンプレートパターンの設計方法、テンプレートの製造方法及び半導体装置の製造方法。
JP4940262B2 (ja) * 2009-03-25 2012-05-30 株式会社東芝 インプリントパターン形成方法
JP5499668B2 (ja) * 2009-12-03 2014-05-21 大日本印刷株式会社 インプリント用モールドおよび該モールドを用いたパターン形成方法
WO2011139782A1 (en) * 2010-04-27 2011-11-10 Molecular Imprints, Inc. Separation control substrate/template for nanoimprint lithography
JP5750992B2 (ja) * 2011-04-27 2015-07-22 大日本印刷株式会社 インプリント方法およびそれを実施するためのインプリント装置
JP5875250B2 (ja) * 2011-04-28 2016-03-02 キヤノン株式会社 インプリント装置、インプリント方法及びデバイス製造方法
JP5747670B2 (ja) * 2011-06-10 2015-07-15 大日本印刷株式会社 成形部材およびその製造方法
JP6004738B2 (ja) * 2011-09-07 2016-10-12 キヤノン株式会社 インプリント装置、それを用いた物品の製造方法
JP5535162B2 (ja) * 2011-09-21 2014-07-02 株式会社東芝 パターン形成装置、パターン形成方法及びパターン形成用プログラム
JP2013069920A (ja) * 2011-09-22 2013-04-18 Toshiba Corp 成膜方法およびパターン形成方法
JP6140966B2 (ja) 2011-10-14 2017-06-07 キヤノン株式会社 インプリント装置、それを用いた物品の製造方法
JP2014033050A (ja) * 2012-08-02 2014-02-20 Toshiba Corp インプリントシステム及びインプリント方法
US20140239529A1 (en) * 2012-09-28 2014-08-28 Nanonex Corporation System and Methods For Nano-Scale Manufacturing
JP6060796B2 (ja) * 2013-04-22 2017-01-18 大日本印刷株式会社 インプリントモールド及びダミーパターン設計方法
CN103529644A (zh) * 2013-10-25 2014-01-22 无锡英普林纳米科技有限公司 一种纳米压印机
EP3126909B1 (en) * 2014-03-31 2021-12-01 Koninklijke Philips N.V. Imprinting method, computer program product and apparatus for the same
JP6472189B2 (ja) * 2014-08-14 2019-02-20 キヤノン株式会社 インプリント装置、インプリント方法及び物品の製造方法
JP6774178B2 (ja) * 2015-11-16 2020-10-21 キヤノン株式会社 基板を処理する装置、及び物品の製造方法
JP6335948B2 (ja) * 2016-02-12 2018-05-30 キヤノン株式会社 インプリント装置および物品製造方法
TWI672212B (zh) * 2016-08-25 2019-09-21 國立成功大學 奈米壓印組合體及其壓印方法
US10627715B2 (en) * 2016-10-31 2020-04-21 Canon Kabushiki Kaisha Method for separating a nanoimprint template from a substrate
JP6762853B2 (ja) 2016-11-11 2020-09-30 キヤノン株式会社 装置、方法、及び物品製造方法
US11442359B2 (en) 2019-03-11 2022-09-13 Canon Kabushiki Kaisha Method of separating a template from a shaped film on a substrate
JP7284639B2 (ja) * 2019-06-07 2023-05-31 キヤノン株式会社 成形装置、および物品製造方法
US11034057B2 (en) * 2019-08-15 2021-06-15 Canon Kabushiki Kaisha Planarization process, apparatus and method of manufacturing an article
TWI888630B (zh) * 2020-09-01 2025-07-01 美商伊路米納有限公司 夾具及相關系統及方法

Family Cites Families (65)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NO311797B1 (no) * 1999-05-12 2002-01-28 Thin Film Electronics Asa Fremgangsmåter til mönstring av polymerfilmer og anvendelse av fremgangsmåtene
US6873087B1 (en) * 1999-10-29 2005-03-29 Board Of Regents, The University Of Texas System High precision orientation alignment and gap control stages for imprint lithography processes
SE515607C2 (sv) 1999-12-10 2001-09-10 Obducat Ab Anordning och metod vid tillverkning av strukturer
JP3848070B2 (ja) * 2000-09-27 2006-11-22 株式会社東芝 パターン形成方法
JP2003017390A (ja) 2001-06-29 2003-01-17 Toshiba Corp パターン形成方法及びパターン形成に用いるマスク
DE20122197U1 (de) 2001-06-30 2004-12-02 Zf Friedrichshafen Ag Schaltelement-Baugruppe für ein Getriebe
US20050064344A1 (en) 2003-09-18 2005-03-24 University Of Texas System Board Of Regents Imprint lithography templates having alignment marks
JP3556647B2 (ja) 2001-08-21 2004-08-18 沖電気工業株式会社 半導体素子の製造方法
US7179079B2 (en) 2002-07-08 2007-02-20 Molecular Imprints, Inc. Conforming template for patterning liquids disposed on substrates
US20080160129A1 (en) 2006-05-11 2008-07-03 Molecular Imprints, Inc. Template Having a Varying Thickness to Facilitate Expelling a Gas Positioned Between a Substrate and the Template
US7442336B2 (en) 2003-08-21 2008-10-28 Molecular Imprints, Inc. Capillary imprinting technique
US7077992B2 (en) 2002-07-11 2006-07-18 Molecular Imprints, Inc. Step and repeat imprint lithography processes
US6932934B2 (en) 2002-07-11 2005-08-23 Molecular Imprints, Inc. Formation of discontinuous films during an imprint lithography process
US7019819B2 (en) 2002-11-13 2006-03-28 Molecular Imprints, Inc. Chucking system for modulating shapes of substrates
US6936194B2 (en) 2002-09-05 2005-08-30 Molecular Imprints, Inc. Functional patterning material for imprint lithography processes
US8349241B2 (en) 2002-10-04 2013-01-08 Molecular Imprints, Inc. Method to arrange features on a substrate to replicate features having minimal dimensional variability
US20040065252A1 (en) 2002-10-04 2004-04-08 Sreenivasan Sidlgata V. Method of forming a layer on a substrate to facilitate fabrication of metrology standards
EP1567913B1 (en) 2002-11-13 2009-07-29 Molecular Imprints, Inc. A chucking system and method for modulating shapes of substrates
US6980282B2 (en) 2002-12-11 2005-12-27 Molecular Imprints, Inc. Method for modulating shapes of substrates
US7641840B2 (en) 2002-11-13 2010-01-05 Molecular Imprints, Inc. Method for expelling gas positioned between a substrate and a mold
US20040168613A1 (en) 2003-02-27 2004-09-02 Molecular Imprints, Inc. Composition and method to form a release layer
US7179396B2 (en) 2003-03-25 2007-02-20 Molecular Imprints, Inc. Positive tone bi-layer imprint lithography method
EP1606834B1 (en) 2003-03-27 2013-06-05 Korea Institute Of Machinery & Materials Uv nanoimprint lithography process using elementwise embossed stamp
US7396475B2 (en) 2003-04-25 2008-07-08 Molecular Imprints, Inc. Method of forming stepped structures employing imprint lithography
US7157036B2 (en) 2003-06-17 2007-01-02 Molecular Imprints, Inc Method to reduce adhesion between a conformable region and a pattern of a mold
US7150622B2 (en) 2003-07-09 2006-12-19 Molecular Imprints, Inc. Systems for magnification and distortion correction for imprint lithography processes
JP2005085922A (ja) * 2003-09-08 2005-03-31 Canon Inc マスク作製方法及び微小開口を有するマスク
JPWO2005057634A1 (ja) 2003-12-11 2007-07-05 農工大ティー・エル・オー株式会社 ナノインプリントを利用するパターン形成方法および該方法を実行する装置
US8076386B2 (en) 2004-02-23 2011-12-13 Molecular Imprints, Inc. Materials for imprint lithography
EP1594001B1 (en) 2004-05-07 2015-12-30 Obducat AB Device and method for imprint lithography
WO2005119802A2 (en) 2004-05-28 2005-12-15 Board Of Regents, The University Of Texas System Adaptive shape substrate support system and method
WO2005118914A2 (en) 2004-05-28 2005-12-15 Board Of Regents, The University Of Texas System Substrate support system and method
US7768624B2 (en) 2004-06-03 2010-08-03 Board Of Regents, The University Of Texas System Method for obtaining force combinations for template deformation using nullspace and methods optimization techniques
US20050270516A1 (en) * 2004-06-03 2005-12-08 Molecular Imprints, Inc. System for magnification and distortion correction during nano-scale manufacturing
US20060081557A1 (en) 2004-10-18 2006-04-20 Molecular Imprints, Inc. Low-k dielectric functional imprinting materials
US7363854B2 (en) 2004-12-16 2008-04-29 Asml Holding N.V. System and method for patterning both sides of a substrate utilizing imprint lithography
US20060145398A1 (en) 2004-12-30 2006-07-06 Board Of Regents, The University Of Texas System Release layer comprising diamond-like carbon (DLC) or doped DLC with tunable composition for imprint lithography templates and contact masks
US7349076B2 (en) * 2005-01-14 2008-03-25 The Institute For Technology Development Video tracking-based real-time hyperspectral data acquisition
US7636999B2 (en) * 2005-01-31 2009-12-29 Molecular Imprints, Inc. Method of retaining a substrate to a wafer chuck
US7635263B2 (en) * 2005-01-31 2009-12-22 Molecular Imprints, Inc. Chucking system comprising an array of fluid chambers
US7798801B2 (en) * 2005-01-31 2010-09-21 Molecular Imprints, Inc. Chucking system for nano-manufacturing
US7922474B2 (en) 2005-02-17 2011-04-12 Asml Netherlands B.V. Imprint lithography
JP2006245072A (ja) 2005-02-28 2006-09-14 Canon Inc パターン転写用モールドおよび転写装置
US7762186B2 (en) 2005-04-19 2010-07-27 Asml Netherlands B.V. Imprint lithography
US20070035717A1 (en) 2005-08-12 2007-02-15 Wei Wu Contact lithography apparatus, system and method
JP2007081048A (ja) * 2005-09-13 2007-03-29 Canon Inc ナノインプリント用型、装置および方法
JP2007083626A (ja) * 2005-09-22 2007-04-05 Ricoh Co Ltd 微細構造転写装置
JP4533358B2 (ja) 2005-10-18 2010-09-01 キヤノン株式会社 インプリント方法、インプリント装置およびチップの製造方法
JP4923924B2 (ja) 2005-11-22 2012-04-25 コニカミノルタホールディングス株式会社 インプリント装置及びインプリント方法
US7803308B2 (en) 2005-12-01 2010-09-28 Molecular Imprints, Inc. Technique for separating a mold from solidified imprinting material
US7670530B2 (en) 2006-01-20 2010-03-02 Molecular Imprints, Inc. Patterning substrates employing multiple chucks
EP1957249B1 (en) 2005-12-08 2014-11-12 Canon Nanotechnologies, Inc. Method and system for double-sided patterning of substrates
EP2007566A4 (en) * 2006-04-03 2010-10-13 Molecular Imprints Inc CHUCK SYSTEM COMPRISING A NETWORK OF FLUID CHAMBERS
US20070231422A1 (en) 2006-04-03 2007-10-04 Molecular Imprints, Inc. System to vary dimensions of a thin template
US20070238815A1 (en) 2006-04-11 2007-10-11 Lai On Products Industrial, Ltd. Sponge-like sculpturing compound
WO2007136832A2 (en) 2006-05-18 2007-11-29 Molecular Imprints, Inc. Method for expelling gas positioned between a substrate and a mold
JP4810319B2 (ja) * 2006-06-09 2011-11-09 キヤノン株式会社 加工装置及びデバイス製造方法
JP4939134B2 (ja) 2006-07-07 2012-05-23 株式会社日立ハイテクノロジーズ インプリント装置およびインプリント方法
JP4999069B2 (ja) * 2007-01-23 2012-08-15 株式会社日立製作所 ナノインプリント用スタンパ、ナノインプリント用スタンパの製造方法、およびナノインプリント用スタンパの表面処理剤
JP5062521B2 (ja) 2007-02-27 2012-10-31 独立行政法人理化学研究所 レプリカモールドの製造方法およびレプリカモールド
US9778562B2 (en) 2007-11-21 2017-10-03 Canon Nanotechnologies, Inc. Porous template and imprinting stack for nano-imprint lithography
US8075299B2 (en) 2008-10-21 2011-12-13 Molecular Imprints, Inc. Reduction of stress during template separation
US8652393B2 (en) 2008-10-24 2014-02-18 Molecular Imprints, Inc. Strain and kinetics control during separation phase of imprint process
US8309008B2 (en) 2008-10-30 2012-11-13 Molecular Imprints, Inc. Separation in an imprint lithography process
JP4940262B2 (ja) * 2009-03-25 2012-05-30 株式会社東芝 インプリントパターン形成方法

Similar Documents

Publication Publication Date Title
JP2012507141A5 (enExample)
USRE47271E1 (en) Imprint recipe creating device and imprint device
CN102203671B (zh) 压印工艺的分离阶段中的应变和动力学控制
JP6239576B2 (ja) ワイヤグリッド偏光子の製造方法
RU2011129810A (ru) Способы изготовления панелей и изготавливаемая такими способами панель
EP1785770A3 (en) Stamp for micro/nano imprint lithography using diamond-like carbon and method of fabricating the same
US8309008B2 (en) Separation in an imprint lithography process
WO2004102624A3 (en) Unitary dual damascene process using imprint lithography
WO2005045524A3 (en) A method of forming a patterned layer on a substrate
KR101385976B1 (ko) 나노-마이크로 복합 패턴 형성을 위한 몰드의 제조 방법
WO2009024762A3 (en) Mems process and device
WO2006001880A3 (en) Rapid prototyping and filling commercial pipeline
JP2011513973A5 (enExample)
CN102144188B (zh) 改进的纳米压印方法
JP2018074159A5 (ja) 基板からテンプレートを引き離す方法、装置及び物品を製造する方法
KR20210098334A (ko) 평탄화 장치, 평탄화 공정, 및 물품 제조 방법
JP2018101779A5 (enExample)
DE112014006817T5 (de) Wandlerelement und Herstellungsverfahren für ein Wandlerelement
KR101885174B1 (ko) 플라즈모닉 메타표면 제작방법
JP2008041648A5 (enExample)
JP2011216917A5 (ja) パターン転写方法および金属薄膜パターン転写方法、ならびに転写装置
JP2009194170A (ja) 微細パターン形成方法
EP2146370A3 (en) Method of forming an in-situ recessed structure
US9955584B2 (en) Stamp for printed circuit process and method of fabricating the same and printed circuit process
CN110908239A (zh) 一种压印模具、纳米压印膜层的制备方法及电子器件