JP2008041648A5 - - Google Patents

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Publication number
JP2008041648A5
JP2008041648A5 JP2007162555A JP2007162555A JP2008041648A5 JP 2008041648 A5 JP2008041648 A5 JP 2008041648A5 JP 2007162555 A JP2007162555 A JP 2007162555A JP 2007162555 A JP2007162555 A JP 2007162555A JP 2008041648 A5 JP2008041648 A5 JP 2008041648A5
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JP
Japan
Prior art keywords
substrate
mass spectrometry
inorganic material
material film
porous membrane
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JP2007162555A
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English (en)
Japanese (ja)
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JP5147307B2 (ja
JP2008041648A (ja
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Priority to JP2007162555A priority Critical patent/JP5147307B2/ja
Priority claimed from JP2007162555A external-priority patent/JP5147307B2/ja
Publication of JP2008041648A publication Critical patent/JP2008041648A/ja
Publication of JP2008041648A5 publication Critical patent/JP2008041648A5/ja
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Publication of JP5147307B2 publication Critical patent/JP5147307B2/ja
Expired - Fee Related legal-status Critical Current
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JP2007162555A 2006-07-11 2007-06-20 質量分析用基板及び質量分析用基板の製造方法 Expired - Fee Related JP5147307B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2007162555A JP5147307B2 (ja) 2006-07-11 2007-06-20 質量分析用基板及び質量分析用基板の製造方法

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2006190418 2006-07-11
JP2006190418 2006-07-11
JP2007162555A JP5147307B2 (ja) 2006-07-11 2007-06-20 質量分析用基板及び質量分析用基板の製造方法

Publications (3)

Publication Number Publication Date
JP2008041648A JP2008041648A (ja) 2008-02-21
JP2008041648A5 true JP2008041648A5 (enExample) 2010-07-15
JP5147307B2 JP5147307B2 (ja) 2013-02-20

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JP2007162555A Expired - Fee Related JP5147307B2 (ja) 2006-07-11 2007-06-20 質量分析用基板及び質量分析用基板の製造方法

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JP (1) JP5147307B2 (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5129628B2 (ja) * 2008-03-25 2013-01-30 財団法人神奈川科学技術アカデミー 質量分析法に用いられる試料ターゲットおよびその製造方法、並びに当該試料ターゲットを用いた質量分析装置
WO2013098606A1 (en) * 2011-12-28 2013-07-04 Dh Technologies Development Pte. Ltd. Gas diffuser ion inlet
JP6398096B2 (ja) * 2014-03-05 2018-10-03 三菱瓦斯化学株式会社 樹脂構造体、並びにそれを用いたプリプレグ、樹脂シート、金属箔張積層板、及びプリント配線板
CN107076705B (zh) * 2015-09-03 2019-11-26 浜松光子学株式会社 表面辅助激光解吸电离法、质量分析方法和质量分析装置
EP3214437B1 (en) * 2015-09-03 2020-02-26 Hamamatsu Photonics K.K. Sample supporting body and method of manufacturing sample supporting body

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3940546B2 (ja) * 1999-06-07 2007-07-04 株式会社東芝 パターン形成方法およびパターン形成材料
JP2001119003A (ja) * 1999-10-22 2001-04-27 Toyota Central Res & Dev Lab Inc 多結晶半導体膜の製造方法
JP2003081625A (ja) * 2001-09-10 2003-03-19 Canon Inc 多孔質膜の製造方法
JP2005059132A (ja) * 2003-08-11 2005-03-10 Canon Inc 多孔質体、及びその作製方法
JP4512589B2 (ja) * 2004-02-26 2010-07-28 独立行政法人科学技術振興機構 表面加工が施された試料保持面を有する試料ターゲットおよびその製造方法、並びに当該試料ターゲットを用いた質量分析装置
DE602005025401D1 (de) * 2004-10-29 2011-01-27 Japan Science & Tech Agency Hes verfahren unter verwendung davon
JP4563162B2 (ja) * 2004-12-10 2010-10-13 旭化成株式会社 ミクロ相分離構造体及びミクロ相分離体の製造方法
WO2007046162A1 (ja) * 2005-10-20 2007-04-26 Japan Science And Technology Agency 質量分析法に用いられる試料ターゲットおよびその製造方法、並びに当該試料ターゲットを用いた質量分析装置

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