MY152446A - Strain and kinetics control during separation phase of imprint process - Google Patents

Strain and kinetics control during separation phase of imprint process

Info

Publication number
MY152446A
MY152446A MYPI20111581A MY152446A MY 152446 A MY152446 A MY 152446A MY PI20111581 A MYPI20111581 A MY PI20111581A MY 152446 A MY152446 A MY 152446A
Authority
MY
Malaysia
Prior art keywords
strain
control during
during separation
imprint process
separation phase
Prior art date
Application number
Other languages
English (en)
Inventor
Khusnatdinov Niyaz
Frank Y Xu
Meissl Mario Johannes
Michael N Miller
Thompson Ecron
Schmid Gerard
Pawan K Nimmakayala
Lu Xiaoming
Choi Byung-Jin
Original Assignee
Molecular Imprints Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Molecular Imprints Inc filed Critical Molecular Imprints Inc
Publication of MY152446A publication Critical patent/MY152446A/en

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C37/00—Component parts, details, accessories or auxiliary operations, not covered by group B29C33/00 or B29C35/00
    • B29C37/0003—Discharging moulded articles from the mould
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
MYPI20111581 2008-10-24 2009-10-26 Strain and kinetics control during separation phase of imprint process MY152446A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US10813108P 2008-10-24 2008-10-24
US10955708P 2008-10-30 2008-10-30
US12/604,517 US8652393B2 (en) 2008-10-24 2009-10-23 Strain and kinetics control during separation phase of imprint process

Publications (1)

Publication Number Publication Date
MY152446A true MY152446A (en) 2014-09-30

Family

ID=42116691

Family Applications (1)

Application Number Title Priority Date Filing Date
MYPI20111581 MY152446A (en) 2008-10-24 2009-10-26 Strain and kinetics control during separation phase of imprint process

Country Status (8)

Country Link
US (3) US8652393B2 (enExample)
EP (1) EP2350741B1 (enExample)
JP (2) JP2012507141A (enExample)
KR (1) KR20110086832A (enExample)
CN (1) CN102203671B (enExample)
MY (1) MY152446A (enExample)
TW (2) TWI405659B (enExample)
WO (1) WO2010047837A2 (enExample)

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JP6774178B2 (ja) * 2015-11-16 2020-10-21 キヤノン株式会社 基板を処理する装置、及び物品の製造方法
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TWI672212B (zh) * 2016-08-25 2019-09-21 國立成功大學 奈米壓印組合體及其壓印方法
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Also Published As

Publication number Publication date
KR20110086832A (ko) 2011-08-01
TW201345698A (zh) 2013-11-16
TWI405659B (zh) 2013-08-21
US8652393B2 (en) 2014-02-18
TWI541125B (zh) 2016-07-11
CN102203671A (zh) 2011-09-28
EP2350741B1 (en) 2012-08-29
JP2012507141A (ja) 2012-03-22
EP2350741A2 (en) 2011-08-03
US20140117574A1 (en) 2014-05-01
WO2010047837A3 (en) 2010-10-07
JP5728602B2 (ja) 2015-06-03
US20190232533A1 (en) 2019-08-01
CN102203671B (zh) 2013-07-17
WO2010047837A2 (en) 2010-04-29
US11161280B2 (en) 2021-11-02
US20100102469A1 (en) 2010-04-29
JP2014160844A (ja) 2014-09-04
TW201026482A (en) 2010-07-16

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