MX2011007955A - Microestructuras de realce de superficie, dispositivos relacionados y metodos para fabricarlos. - Google Patents
Microestructuras de realce de superficie, dispositivos relacionados y metodos para fabricarlos.Info
- Publication number
- MX2011007955A MX2011007955A MX2011007955A MX2011007955A MX2011007955A MX 2011007955 A MX2011007955 A MX 2011007955A MX 2011007955 A MX2011007955 A MX 2011007955A MX 2011007955 A MX2011007955 A MX 2011007955A MX 2011007955 A MX2011007955 A MX 2011007955A
- Authority
- MX
- Mexico
- Prior art keywords
- microstructure
- surface relief
- master
- layer
- replica
- Prior art date
Links
Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D1/00—Electroforming
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D1/00—Electroforming
- C25D1/10—Moulds; Masks; Masterforms
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/02—Diffusing elements; Afocal elements
- G02B5/0205—Diffusing elements; Afocal elements characterised by the diffusing properties
- G02B5/021—Diffusing elements; Afocal elements characterised by the diffusing properties the diffusion taking place at the element's surface, e.g. by means of surface roughening or microprismatic structures
- G02B5/0221—Diffusing elements; Afocal elements characterised by the diffusing properties the diffusion taking place at the element's surface, e.g. by means of surface roughening or microprismatic structures the surface having an irregular structure
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/02—Diffusing elements; Afocal elements
- G02B5/0205—Diffusing elements; Afocal elements characterised by the diffusing properties
- G02B5/0257—Diffusing elements; Afocal elements characterised by the diffusing properties creating an anisotropic diffusion characteristic, i.e. distributing output differently in two perpendicular axes
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/02—Diffusing elements; Afocal elements
- G02B5/0268—Diffusing elements; Afocal elements characterized by the fabrication or manufacturing method
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1847—Manufacturing methods
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1847—Manufacturing methods
- G02B5/1857—Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
- G02F1/13378—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0017—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor for the production of embossing, cutting or similar devices; for the production of casting means
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/26—Apparatus or processes specially adapted for the manufacture of record carriers
- G11B7/261—Preparing a master, e.g. exposing photoresist, electroforming
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24479—Structurally defined web or sheet [e.g., overall dimension, etc.] including variation in thickness
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24479—Structurally defined web or sheet [e.g., overall dimension, etc.] including variation in thickness
- Y10T428/24521—Structurally defined web or sheet [e.g., overall dimension, etc.] including variation in thickness with component conforming to contour of nonplanar surface
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Optics & Photonics (AREA)
- Manufacturing & Machinery (AREA)
- Organic Chemistry (AREA)
- Nonlinear Science (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Nanotechnology (AREA)
- Electrochemistry (AREA)
- Crystallography & Structural Chemistry (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Mathematical Physics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Diffracting Gratings Or Hologram Optical Elements (AREA)
- Credit Cards Or The Like (AREA)
- Optical Elements Other Than Lenses (AREA)
- Holo Graphy (AREA)
- Shaping Of Tube Ends By Bending Or Straightening (AREA)
- Printing Methods (AREA)
Abstract
La presente invención se refiere a un método para la duplicación de una microestructura de realce de superficie estampada, que comprende las etapas de generación de una primera capa con una microestructura de realce de superficie estampada, generación de un molde de referencia, copiar la microestructura de la primera capa en una segunda capa, por lo que implica por lo menos una etapa de ataque químico en seco o en húmedo, caracterizado por una etapa adicional, en la microestructura del molde de referencia se pone en contacto con un material de réplica, de manera que la microestructura del molde de referencia se reproduce en la réplica. La invención además se relaciona con elementos formados como una réplica de acuerdo con el método. Las microestructuras de realce de superficie son adecuadas para desplegar imágenes con un cambio de imagen de positivo-negativo y/o de color. Los elementos de acuerdo con la invención son particularmente útiles para documentos de seguridad y artículos contra falsificación e imitación.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP09153151 | 2009-02-18 | ||
PCT/EP2010/000909 WO2010094441A1 (en) | 2009-02-18 | 2010-02-15 | Surface relief microstructures, related devices and method of making them |
Publications (1)
Publication Number | Publication Date |
---|---|
MX2011007955A true MX2011007955A (es) | 2011-09-01 |
Family
ID=40796271
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
MX2011007955A MX2011007955A (es) | 2009-02-18 | 2010-02-15 | Microestructuras de realce de superficie, dispositivos relacionados y metodos para fabricarlos. |
Country Status (12)
Country | Link |
---|---|
US (1) | US9618839B2 (es) |
EP (1) | EP2399151B1 (es) |
JP (3) | JP2012517919A (es) |
CN (1) | CN102326102B (es) |
AU (1) | AU2010214906B2 (es) |
BR (1) | BRPI1008453A2 (es) |
CA (1) | CA2751668A1 (es) |
MX (1) | MX2011007955A (es) |
RU (1) | RU2540092C2 (es) |
UA (1) | UA106486C2 (es) |
WO (1) | WO2010094441A1 (es) |
ZA (1) | ZA201106743B (es) |
Families Citing this family (26)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5481306B2 (ja) * | 2010-07-30 | 2014-04-23 | 富士フイルム株式会社 | 積層体、光学フィルムおよびそれらの製造方法、偏光板、画像晶表示装置、立体画像表示システム |
RU2548945C2 (ru) * | 2013-05-06 | 2015-04-20 | Федеральное государственное бюджетное учреждение науки Институт ядерной физики им. Г.И. Будкера Сибирского отделения РАН (ИЯФ СО РАН) | Микроструктурные элементы для селекции электромагнитного излучения и способ их изготовления |
TWI653495B (zh) | 2014-06-26 | 2019-03-11 | 荷蘭商皇家飛利浦有限公司 | 發光二極體照明單元 |
EP3210058A1 (en) * | 2014-10-23 | 2017-08-30 | Corning Incorporated | A light diffusing component and a method of manufacturing a light diffusing component |
US9696468B2 (en) * | 2014-11-25 | 2017-07-04 | NanoMedia Solutions Inc. | Methods for fabricating color image display devices comprising structural color pixels from a generic stamp |
AU2016248847B2 (en) | 2015-04-16 | 2021-07-15 | Rolic Ag | Multiple image scattering device |
CN107850708B (zh) * | 2015-07-15 | 2022-03-22 | 凸版印刷株式会社 | 显示体 |
WO2017025336A1 (en) * | 2015-08-07 | 2017-02-16 | Rolic Ag | Azimuthally modulated scattering device |
EP3168057A1 (fr) * | 2015-11-11 | 2017-05-17 | Nivarox-FAR S.A. | Procede de fabrication d'une piece metallique avec au moins un motif a illusion d'optique |
EP4019269A1 (en) | 2016-06-30 | 2022-06-29 | Toppan Printing Co., Ltd. | Display body and article provided with display body |
CN105974731B (zh) * | 2016-07-25 | 2020-01-03 | 京东方科技集团股份有限公司 | 一种压印板、检测方法及检测装置 |
CN114185179A (zh) * | 2017-11-06 | 2022-03-15 | 奇跃公司 | 利用阴影掩模实现可调梯度图案化的方法和系统 |
US10475656B2 (en) * | 2017-12-19 | 2019-11-12 | Micron Technology, Inc. | Hydrosilylation in semiconductor processing |
AT520942B1 (de) * | 2018-03-15 | 2019-09-15 | Werner Faerber | Verfahren zur Herstellung einer Lichtlenkfolie und damit hergestellte Folie |
US11520077B2 (en) | 2018-12-11 | 2022-12-06 | Exxonmobil Upstream Research Company | Automated reservoir modeling using deep generative networks |
CA3122684C (en) | 2018-12-11 | 2023-12-19 | Exxonmobil Upstream Research Company | Data augmentation for seismic interpretation systems and methods |
CA3122685C (en) | 2018-12-11 | 2024-01-09 | Exxonmobil Upstream Research Company | Automated seismic interpretation systems and methods for continual learning and inference of geological features |
US10690821B1 (en) * | 2018-12-14 | 2020-06-23 | Applied Materials, Inc. | Methods of producing slanted gratings |
CN112128710A (zh) * | 2019-06-24 | 2020-12-25 | 宜兰汽车配件制造(平湖)有限公司 | 使用于汽车投影灯的彩色图案成像透光片的制造方法 |
EP4018230A1 (en) * | 2019-08-21 | 2022-06-29 | BAE SYSTEMS plc | Manufacture of surface relief structures |
FR3105088B1 (fr) * | 2019-12-20 | 2021-12-24 | Oberthur Fiduciaire Sas | Structure optique à effet de relief |
PL3888929T3 (pl) | 2020-03-31 | 2023-01-16 | Pentacomp Pte. Ltd. | Sposób wytwarzania dyskretyzowanej optycznej mikrostruktury zabezpieczającej na podłożu i podkładka do stosowania w tym sposobie |
WO2021224450A1 (en) * | 2020-05-08 | 2021-11-11 | Nil Technology Aps | Multi-level structures and methods for manufacturing the same |
WO2022090835A1 (en) * | 2020-10-27 | 2022-05-05 | 3M Innovative Properties Company | Multi-level optical diffuser with high near infrared clarity |
EP4283022A1 (en) * | 2021-01-21 | 2023-11-29 | FUJIFILM Corporation | Master mold, and method for producing metal molded article |
TW202247990A (zh) | 2021-05-12 | 2022-12-16 | 瑞士商羅立克科技股份公司 | 用於創造表面微結構的方法 |
Family Cites Families (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5084351A (en) | 1979-12-28 | 1992-01-28 | Flex Products, Inc. | Optically variable multilayer thin film interference stack on flexible insoluble web |
JPH10198259A (ja) | 1996-12-27 | 1998-07-31 | Victor Co Of Japan Ltd | 光記録媒体 |
DE60040011D1 (de) | 1999-10-19 | 2008-10-02 | Rolic Ag | Topologischstrukturierte polymerbeschichtung |
JP3582713B2 (ja) * | 2000-05-29 | 2004-10-27 | 日本ビクター株式会社 | 証明用シール |
EP1363143A1 (en) | 2002-05-17 | 2003-11-19 | Rolic AG | Bright and white optical diffusing film |
US6849558B2 (en) | 2002-05-22 | 2005-02-01 | The Board Of Trustees Of The Leland Stanford Junior University | Replication and transfer of microstructures and nanostructures |
JP3702445B2 (ja) * | 2002-07-30 | 2005-10-05 | 学校法人慶應義塾 | 光学素子及びその光学素子を用いた装置 |
EP1400838A1 (en) * | 2002-09-19 | 2004-03-24 | Rolic AG | Thin films with corrugated surface topologies and method to produce them |
JP2004177805A (ja) | 2002-11-28 | 2004-06-24 | Alps Electric Co Ltd | 反射体及び反射体の製造方法並びに液晶表示装置 |
WO2005019503A2 (en) * | 2003-08-19 | 2005-03-03 | Nanoopto Corporation | Sub-micron-scale patterning method and system |
BRPI0513694A (pt) | 2004-07-21 | 2008-05-13 | Rolic Ag | dispositivos ópticos anisotrópicos e método para produção do mesmo |
KR100676073B1 (ko) | 2004-12-07 | 2007-01-30 | 태산엘시디 주식회사 | 도광판 제조용 스탬퍼의 제작방법 |
JP4479491B2 (ja) | 2004-12-10 | 2010-06-09 | 住友電気工業株式会社 | 回折格子形成方法 |
EP1855127A1 (en) * | 2006-05-12 | 2007-11-14 | Rolic AG | Optically effective surface relief microstructures and method of making them |
US8318253B2 (en) * | 2006-06-30 | 2012-11-27 | Asml Netherlands B.V. | Imprint lithography |
ES2494293T3 (es) * | 2006-09-13 | 2014-09-15 | Rolic Ag | Retardador fotoalineado por volumen |
CN101016634B (zh) | 2006-12-30 | 2010-12-15 | 苏州大学 | 一种具有表面浮雕微结构金属滚筒的制作方法 |
-
2010
- 2010-02-15 AU AU2010214906A patent/AU2010214906B2/en active Active
- 2010-02-15 MX MX2011007955A patent/MX2011007955A/es active IP Right Grant
- 2010-02-15 UA UAA201111018A patent/UA106486C2/uk unknown
- 2010-02-15 JP JP2011550460A patent/JP2012517919A/ja active Pending
- 2010-02-15 CA CA2751668A patent/CA2751668A1/en not_active Abandoned
- 2010-02-15 EP EP10705286.2A patent/EP2399151B1/en active Active
- 2010-02-15 RU RU2011138073/28A patent/RU2540092C2/ru not_active IP Right Cessation
- 2010-02-15 US US13/148,849 patent/US9618839B2/en active Active
- 2010-02-15 WO PCT/EP2010/000909 patent/WO2010094441A1/en active Application Filing
- 2010-02-15 CN CN201080008146.0A patent/CN102326102B/zh active Active
- 2010-02-15 BR BRPI1008453A patent/BRPI1008453A2/pt not_active Application Discontinuation
-
2011
- 2011-09-15 ZA ZA2011/06743A patent/ZA201106743B/en unknown
-
2014
- 2014-12-26 JP JP2014266440A patent/JP6322568B2/ja active Active
-
2016
- 2016-12-01 JP JP2016234138A patent/JP2017072847A/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
WO2010094441A1 (en) | 2010-08-26 |
RU2540092C2 (ru) | 2015-01-27 |
US20120027998A1 (en) | 2012-02-02 |
CA2751668A1 (en) | 2010-08-26 |
JP2012517919A (ja) | 2012-08-09 |
AU2010214906B2 (en) | 2014-12-04 |
AU2010214906A1 (en) | 2011-08-18 |
CN102326102B (zh) | 2015-09-23 |
EP2399151B1 (en) | 2019-11-27 |
US9618839B2 (en) | 2017-04-11 |
CN102326102A (zh) | 2012-01-18 |
JP2017072847A (ja) | 2017-04-13 |
ZA201106743B (en) | 2012-06-27 |
JP6322568B2 (ja) | 2018-05-09 |
JP2015092268A (ja) | 2015-05-14 |
BRPI1008453A2 (pt) | 2016-02-23 |
UA106486C2 (uk) | 2014-09-10 |
EP2399151A1 (en) | 2011-12-28 |
RU2011138073A (ru) | 2013-03-27 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
FG | Grant or registration |