JP2011048374A - フレキシブル(flexible)表示装置及びその製造方法 - Google Patents
フレキシブル(flexible)表示装置及びその製造方法 Download PDFInfo
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- 150000004706 metal oxides Chemical class 0.000 claims abstract description 23
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- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 14
- 238000000231 atomic layer deposition Methods 0.000 claims description 14
- 239000004642 Polyimide Substances 0.000 claims description 12
- 229920001721 polyimide Polymers 0.000 claims description 12
- 239000010936 titanium Substances 0.000 claims description 12
- 229910005265 GaInZnO Inorganic materials 0.000 claims description 11
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 claims description 10
- YVTHLONGBIQYBO-UHFFFAOYSA-N zinc indium(3+) oxygen(2-) Chemical compound [O--].[Zn++].[In+3] YVTHLONGBIQYBO-UHFFFAOYSA-N 0.000 claims description 10
- 239000011787 zinc oxide Substances 0.000 claims description 9
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- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 7
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- AJNVQOSZGJRYEI-UHFFFAOYSA-N digallium;oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Ga+3].[Ga+3] AJNVQOSZGJRYEI-UHFFFAOYSA-N 0.000 claims description 6
- 229910052733 gallium Inorganic materials 0.000 claims description 6
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- 229910052750 molybdenum Inorganic materials 0.000 claims description 6
- 239000011733 molybdenum Substances 0.000 claims description 6
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims description 6
- 239000000126 substance Substances 0.000 claims description 6
- 229910052719 titanium Inorganic materials 0.000 claims description 6
- 239000004408 titanium dioxide Substances 0.000 claims description 6
- 238000000576 coating method Methods 0.000 claims description 5
- 238000007650 screen-printing Methods 0.000 claims description 5
- JBQYATWDVHIOAR-UHFFFAOYSA-N tellanylidenegermanium Chemical compound [Te]=[Ge] JBQYATWDVHIOAR-UHFFFAOYSA-N 0.000 claims description 4
- 230000001678 irradiating effect Effects 0.000 claims description 2
- 230000007547 defect Effects 0.000 abstract description 7
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- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 5
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- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 2
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- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- 229910017083 AlN Inorganic materials 0.000 description 1
- 229910017109 AlON Inorganic materials 0.000 description 1
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 1
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- 239000004698 Polyethylene Substances 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- GEIAQOFPUVMAGM-UHFFFAOYSA-N ZrO Inorganic materials [Zr]=O GEIAQOFPUVMAGM-UHFFFAOYSA-N 0.000 description 1
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- 230000005281 excited state Effects 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 230000005283 ground state Effects 0.000 description 1
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- 229910052744 lithium Inorganic materials 0.000 description 1
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- 239000012528 membrane Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
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- 239000011368 organic material Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 238000009751 slip forming Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
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- B05D5/00—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures
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- C09K2323/00—Functional layers of liquid crystal optical display excluding electroactive liquid crystal layer characterised by chemical composition
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Abstract
【解決手段】本発明の実施形態によるフレキシブル表示装置は、プラスチック物質で形成されたフレキシブル基板、前記フレキシブル基板の一方の面上に形成された表示素子、及び前記フレキシブル基板の他方の面の少なくとも一部の領域に結合された金属物質及び金属酸化物質のうちの一つ以上の物質を含む表面残留膜を含む。
【選択図】 図6
Description
10、20 薄膜トランジスター
70 有機発光素子
80 蓄電素子
110 表示素子
111 フレキシブル基板
119 表面残留膜
120 バリア膜
131 スイッチング半導体層
132 駆動半導体層
151 ゲートライン
152 スイッチングゲート電極
155 駆動ゲート電極
158、178 蓄電板
160 層間絶縁膜
171 データライン
172 共通電源ライン
173 スイッチングソース電極
174 スイッチングドレイン電極
176 駆動ソース電極
177 駆動ドレイン電極
210 薄膜封止層
211、213、215 無機膜
212、214 有機膜
710、730 電極
900 ガラス基板
950 接着物質膜
Claims (26)
- プラスチック物質で形成されたフレキシブル基板、
前記フレキシブル基板の一方の面上に形成された表示素子、及び
前記フレキシブル基板の前記一方の面と対向する他方の面の少なくとも一部の領域と結合された、金属物質及び金属酸化物質のうち、少なくとも一方の物質を含む表面残留膜を含むことを特徴とする、フレキシブル表示装置。 - 前記フレキシブル基板を形成するプラスチック物質は、−C(=O)NH−基を含むことを特徴とする、請求項1に記載のフレキシブル表示装置。
- 前記フレキシブル基板は、ポリイミドを含む物質で形成されることを特徴とする、請求項2に記載のフレキシブル表示装置。
- 前記フレキシブル基板は、厚さが5μm〜200μmの範囲内であることを特徴とする、請求項2に記載のフレキシブル表示装置。
- 前記フレキシブル基板は、熱膨張係数(CTE)が3ppm/C〜10ppm/Cの範囲内であることを特徴とする、請求項2に記載のフレキシブル表示装置。
- 前記表面残留膜は、前記−C(=O)NH−基と結合された物質を含むことを特徴とする、請求項2に記載のフレキシブル表示装置。
- 前記金属物質が前記−C(=O)NH−基と結合され、
前記金属物質は、アルミニウム(Al)、ガリウム(Ga)、インジウム(In)、チタン(Ti)、モリブデン(Mo)、及び亜鉛(Zn)のうちの一つ以上を含むことを特徴とする、請求項6に記載のフレキシブル表示装置。 - 前記金属酸化物質が前記−C(=O)NH−基と結合され、
前記金属酸化物質は、酸化アルミニウム(Aluminium oxide)、酸化ガリウム(Gallium oxide)、酸化亜鉛(Znic oxide)、二酸化チタン(Titanium dioxide)、酸化インジウム(Indium oxide)、酸化インジウムスズ(Indium Tin Oxide、ITO)、酸化インジウム亜鉛(Indium Zinc Oxide、IZO)、及びGaInZnO(GIZO)のうちの一つ以上を含むことを特徴とする、請求項6に記載のフレキシブル表示装置。 - 前記表示素子は、薄膜トランジスターを含むことを特徴とする、請求項1〜8のうちのいずれか一つに記載のフレキシブル表示装置。
- 前記表示素子は、有機発光表示素子、液晶表示素子、及び電気泳動表示素子のうちのいずれか一つであることを特徴とする、請求項9に記載のフレキシブル表示装置。
- ガラス基板を準備する段階、
前記ガラス基板上に金属物質及び金属酸化物質のうち少なくとも一方の物質で形成された接着物質膜を形成する段階、及び
前記接着物質膜上にプラスチック物質でフレキシブル基板を形成する段階を含むことを特徴とする、フレキシブル表示装置の製造方法。 - 前記フレキシブル基板を形成するプラスチック物質は、−C(=O)NH−基を含むことを特徴とする、請求項11に記載のフレキシブル表示装置の製造方法。
- 前記フレキシブル基板は、ポリイミドを含む物質で形成されることを特徴とする、請求項12に記載のフレキシブル表示装置の製造方法。
- 前記フレキシブル基板は、スリットコーティング法及びスクリーン印刷法のうちのいずれか一つの方法で形成されることを特徴とする、請求項12に記載のフレキシブル表示装置の製造方法。
- 前記フレキシブル基板は、厚さが5μm〜200μmの範囲内であることを特徴とする、請求項14に記載のフレキシブル表示装置の製造方法。
- 前記フレキシブル基板は、熱膨張係数が前記ガラス基板の熱膨張係数(CTE)と同一または10ppm/C以下であることを特徴とする、請求項12に記載のフレキシブル表示装置の製造方法。
- 前記接着物質膜は、前記−C(=O)NH−基と結合可能な物質を含むことを特徴とする、請求項12に記載のフレキシブル表示装置の製造方法。
- 前記金属物質が前記−C(=O)NH−基と結合され、
前記金属物質は、アルミニウム(Al)、ガリウム(Ga)、インジウム(In)、チタン(Ti)、モリブデン(Mo)、及び亜鉛(Zn)のうちの一つ以上を含むことを特徴とする、請求項17に記載のフレキシブル表示装置の製造方法。 - 前記金属酸化物質が前記−C(=O)NH−基と結合され、
前記金属酸化物質は、酸化アルミニウム(Aluminium oxide)、酸化ガリウム(Gallium oxide)、酸化亜鉛(Znic oxide)、二酸化チタン(Titanium dioxide)、酸化インジウム(Indium oxide)、酸化インジウムスズ(Indium Tin Oxide、ITO)、酸化インジウム亜鉛(Indium Zinc Oxide、IZO)、及びGaInZO(GIZO)のうちの一つ以上を含むことを特徴とする、請求項17に記載のフレキシブル表示装置の製造方法。 - 前記接着物質膜は、原子層蒸着法で形成されることを特徴とする、請求項17に記載のフレキシブル表示装置の製造方法。
- 前記接着物質膜は、厚さが0.1nm〜1000nmの範囲内であることを特徴とする、請求項20に記載のフレキシブル表示装置の製造方法。
- 前記フレキシブル基板及び前記ガラス基板を互いに分離させる段階をさらに含むことを特徴とする、請求項11〜21のうちのいずれか一つに記載のフレキシブル表示装置の製造方法。
- レーザーを照射して、前記フレキシブル基板及び前記接着物質膜を互いに分離したり、前記接着物質膜及び前記ガラス基板を互いに分離することを特徴とする、請求項22に記載のフレキシブル表示装置の製造方法。
- 前記フレキシブル基板上に表示素子を形成する段階をさらに含むことを特徴とする、請求項22に記載のフレキシブル表示装置の製造方法。
- 前記表示素子は、薄膜トランジスターを含むことを特徴とする、請求項24に記載のフレキシブル表示装置の製造方法。
- 前記表示素子は、有機発光表示素子、液晶表示素子、及び電気泳動表示素子のうちのいずれか一つであることを特徴とする、請求項25に記載のフレキシブル表示装置の製造方法。
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EP2290726A1 (en) | 2011-03-02 |
US20140050933A1 (en) | 2014-02-20 |
EP2290726B1 (en) | 2014-10-29 |
TWI441120B (zh) | 2014-06-11 |
US9623633B2 (en) | 2017-04-18 |
JP5819886B2 (ja) | 2015-11-24 |
KR101149433B1 (ko) | 2012-05-22 |
TW201128596A (en) | 2011-08-16 |
TWI554988B (zh) | 2016-10-21 |
TW201419235A (zh) | 2014-05-16 |
KR20110023138A (ko) | 2011-03-08 |
JP2013238863A (ja) | 2013-11-28 |
US20110052836A1 (en) | 2011-03-03 |
CN102082150A (zh) | 2011-06-01 |
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