JP2010181862A5 - - Google Patents
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- JP2010181862A5 JP2010181862A5 JP2009257546A JP2009257546A JP2010181862A5 JP 2010181862 A5 JP2010181862 A5 JP 2010181862A5 JP 2009257546 A JP2009257546 A JP 2009257546A JP 2009257546 A JP2009257546 A JP 2009257546A JP 2010181862 A5 JP2010181862 A5 JP 2010181862A5
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- 230000005484 gravity Effects 0.000 claims description 18
- 239000000758 substrate Substances 0.000 claims description 15
- 238000005530 etching Methods 0.000 claims description 12
- 238000000034 method Methods 0.000 claims description 12
- 238000004519 manufacturing process Methods 0.000 claims description 9
- 239000000463 material Substances 0.000 claims description 8
- 239000004034 viscosity adjusting agent Substances 0.000 claims description 4
- 230000003287 optical effect Effects 0.000 claims 18
- 239000010408 film Substances 0.000 description 27
- 229920002284 Cellulose triacetate Polymers 0.000 description 11
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 11
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 11
- NNLVGZFZQQXQNW-ADJNRHBOSA-N [(2r,3r,4s,5r,6s)-4,5-diacetyloxy-3-[(2s,3r,4s,5r,6r)-3,4,5-triacetyloxy-6-(acetyloxymethyl)oxan-2-yl]oxy-6-[(2r,3r,4s,5r,6s)-4,5,6-triacetyloxy-2-(acetyloxymethyl)oxan-3-yl]oxyoxan-2-yl]methyl acetate Chemical compound O([C@@H]1O[C@@H]([C@H]([C@H](OC(C)=O)[C@H]1OC(C)=O)O[C@H]1[C@@H]([C@@H](OC(C)=O)[C@H](OC(C)=O)[C@@H](COC(C)=O)O1)OC(C)=O)COC(=O)C)[C@@H]1[C@@H](COC(C)=O)O[C@@H](OC(C)=O)[C@H](OC(C)=O)[C@H]1OC(C)=O NNLVGZFZQQXQNW-ADJNRHBOSA-N 0.000 description 11
- 239000003973 paint Substances 0.000 description 10
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 8
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 6
- 239000011248 coating agent Substances 0.000 description 6
- 238000000576 coating method Methods 0.000 description 6
- 239000012788 optical film Substances 0.000 description 5
- 239000002245 particle Substances 0.000 description 5
- 229920005989 resin Polymers 0.000 description 5
- 239000011347 resin Substances 0.000 description 5
- QNODIIQQMGDSEF-UHFFFAOYSA-N (1-hydroxycyclohexyl)-phenylmethanone Chemical compound C=1C=CC=CC=1C(=O)C1(O)CCCCC1 QNODIIQQMGDSEF-UHFFFAOYSA-N 0.000 description 4
- 239000003999 initiator Substances 0.000 description 4
- 239000000377 silicon dioxide Substances 0.000 description 4
- 239000007787 solid Substances 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 3
- 239000006185 dispersion Substances 0.000 description 3
- 238000011156 evaluation Methods 0.000 description 3
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 239000002216 antistatic agent Substances 0.000 description 2
- 239000012298 atmosphere Substances 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 230000004313 glare Effects 0.000 description 2
- 230000005865 ionizing radiation Effects 0.000 description 2
- 230000001788 irregular Effects 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 229920002120 photoresistant polymer Polymers 0.000 description 2
- 230000001629 suppression Effects 0.000 description 2
- 239000004094 surface-active agent Substances 0.000 description 2
- 229920005992 thermoplastic resin Polymers 0.000 description 2
- MYWOJODOMFBVCB-UHFFFAOYSA-N 1,2,6-trimethylphenanthrene Chemical compound CC1=CC=C2C3=CC(C)=CC=C3C=CC2=C1C MYWOJODOMFBVCB-UHFFFAOYSA-N 0.000 description 1
- WNXJIVFYUVYPPR-UHFFFAOYSA-N 1,3-dioxolane Chemical compound C1COCO1 WNXJIVFYUVYPPR-UHFFFAOYSA-N 0.000 description 1
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 description 1
- MFKRHJVUCZRDTF-UHFFFAOYSA-N 3-methoxy-3-methylbutan-1-ol Chemical compound COC(C)(C)CCO MFKRHJVUCZRDTF-UHFFFAOYSA-N 0.000 description 1
- 239000006087 Silane Coupling Agent Substances 0.000 description 1
- -1 acryl Chemical group 0.000 description 1
- 239000004480 active ingredient Substances 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 239000003570 air Substances 0.000 description 1
- 239000002519 antifouling agent Substances 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 230000003078 antioxidant effect Effects 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 238000000149 argon plasma sintering Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- UHESRSKEBRADOO-UHFFFAOYSA-N ethyl carbamate;prop-2-enoic acid Chemical compound OC(=O)C=C.CCOC(N)=O UHESRSKEBRADOO-UHFFFAOYSA-N 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 239000003063 flame retardant Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 239000004611 light stabiliser Substances 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 229920000058 polyacrylate Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000003505 polymerization initiator Substances 0.000 description 1
- TYRXZPXAGPSIDU-UHFFFAOYSA-N prop-2-enoic acid hydrofluoride Chemical compound F.C(C=C)(=O)O TYRXZPXAGPSIDU-UHFFFAOYSA-N 0.000 description 1
- 239000006097 ultraviolet radiation absorber Substances 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
- 238000004383 yellowing Methods 0.000 description 1
Priority Applications (7)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009257546A JP5724171B2 (ja) | 2009-01-09 | 2009-11-10 | 光学素子およびその製造方法、原盤およびその製造方法、ならびに表示装置 |
| TW098143985A TWI483006B (zh) | 2009-01-09 | 2009-12-21 | An optical element and a method for manufacturing the same, a master disk and a method for manufacturing the same, and a display device |
| RU2009148575/28A RU2009148575A (ru) | 2009-01-09 | 2009-12-25 | Оптический элемент и способ его изготовления, оригинал и способ его изготовления и устройство отображения |
| EP10000004A EP2207050A3 (en) | 2009-01-09 | 2010-01-04 | Optical element and method for making the same, master and method for making the same, and display apparatus |
| US12/652,878 US8547639B2 (en) | 2009-01-09 | 2010-01-06 | Optical element including a plurality of structures and hard coat layer formed thereon and method for making the same, master and method for making the same, and display apparatus |
| KR1020100001943A KR20100082733A (ko) | 2009-01-09 | 2010-01-08 | 광학 소자 및 그 제조 방법, 원반 및 그 제조 방법, 및 표시 장치 |
| CN201010003218A CN101819288A (zh) | 2009-01-09 | 2010-01-11 | 光学元件及其制造方法、原盘及其制造方法以及显示装置 |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009004110 | 2009-01-09 | ||
| JP2009004110 | 2009-01-09 | ||
| JP2009257546A JP5724171B2 (ja) | 2009-01-09 | 2009-11-10 | 光学素子およびその製造方法、原盤およびその製造方法、ならびに表示装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2010181862A JP2010181862A (ja) | 2010-08-19 |
| JP2010181862A5 true JP2010181862A5 (enExample) | 2012-11-15 |
| JP5724171B2 JP5724171B2 (ja) | 2015-05-27 |
Family
ID=41682250
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2009257546A Active JP5724171B2 (ja) | 2009-01-09 | 2009-11-10 | 光学素子およびその製造方法、原盤およびその製造方法、ならびに表示装置 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US8547639B2 (enExample) |
| EP (1) | EP2207050A3 (enExample) |
| JP (1) | JP5724171B2 (enExample) |
| KR (1) | KR20100082733A (enExample) |
| CN (1) | CN101819288A (enExample) |
| RU (1) | RU2009148575A (enExample) |
| TW (1) | TWI483006B (enExample) |
Families Citing this family (62)
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| US20090001339A1 (en) * | 2007-06-29 | 2009-01-01 | Tae Young Lee | Chemical Mechanical Polishing Slurry Composition for Polishing Phase-Change Memory Device and Method for Polishing Phase-Change Memory Device Using the Same |
| WO2012071740A1 (zh) * | 2010-12-03 | 2012-06-07 | Lee Chun-Yuan | 雾面基板与其制造方法 |
| KR101718864B1 (ko) * | 2010-12-14 | 2017-03-23 | 엘지디스플레이 주식회사 | 눈부심방지필름, 편광판 및 디스플레이장치 |
| WO2012128333A1 (ja) * | 2011-03-23 | 2012-09-27 | 大日本印刷株式会社 | 光学積層体、偏光板及び画像表示装置 |
| KR101458733B1 (ko) * | 2011-04-28 | 2014-11-05 | 아사히 가라스 가부시키가이샤 | 반사 방지 적층체 |
| JP2014198376A (ja) * | 2011-08-02 | 2014-10-23 | コニカミノルタ株式会社 | 機能性フィルム |
| WO2013067418A1 (en) * | 2011-11-04 | 2013-05-10 | Cambrios Technologies Corporation | Methods for reducing diffuse reflection of nanostructure-based transparent conductive films and touch panels made of the same |
| JP2013111874A (ja) * | 2011-11-29 | 2013-06-10 | Sony Corp | ガスバリア基材およびガスバリア積層体 |
| JP2013119041A (ja) * | 2011-12-06 | 2013-06-17 | Fujifilm Corp | 微細凹凸構造の形成方法、該形成方法を用いた構造体の製造方法および構造体 |
| DE102012200084B4 (de) * | 2012-01-04 | 2021-05-12 | Pictiva Displays International Limited | Strahlungsemittierendes organisches bauteil |
| JP6266858B2 (ja) * | 2012-01-11 | 2018-01-24 | 大日本印刷株式会社 | 光反射防止物品 |
| JP5900112B2 (ja) * | 2012-03-30 | 2016-04-06 | 大日本印刷株式会社 | 防眩シート、防眩シートの製造方法、防眩シートを成型するための金型、及び金型の製造方法 |
| WO2014031417A2 (en) * | 2012-08-22 | 2014-02-27 | 3M Innovative Properties Company | Polarizing beam splitter and methods of making same |
| US9581762B2 (en) | 2012-09-16 | 2017-02-28 | Shalom Wertsberger | Pixel structure using a tapered core waveguide, image sensors and camera using same |
| US9952388B2 (en) | 2012-09-16 | 2018-04-24 | Shalom Wertsberger | Nano-scale continuous resonance trap refractor based splitter, combiner, and reflector |
| US9112087B2 (en) * | 2012-09-16 | 2015-08-18 | Shalom Wretsberger | Waveguide-based energy converters, and energy conversion cells using same |
| KR20150068449A (ko) | 2012-10-08 | 2015-06-19 | 코닝 인코포레이티드 | 향상된 디스플레이 구성요소를 제공하기 위한 방법 및 그 기기 |
| CN104797961B (zh) | 2012-11-21 | 2018-02-02 | 3M创新有限公司 | 光学扩散膜及其制备方法 |
| WO2014091835A1 (ja) * | 2012-12-14 | 2014-06-19 | 中井工業株式会社 | ハードコートフィルム |
| KR102098213B1 (ko) * | 2012-12-18 | 2020-04-08 | 엘지이노텍 주식회사 | 광학시트 |
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| CN104871043B (zh) * | 2012-12-28 | 2017-09-26 | 旭硝子株式会社 | 光学元件、投影装置和光学元件的制造方法 |
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| KR102056314B1 (ko) * | 2013-09-27 | 2019-12-17 | 삼성디스플레이 주식회사 | 보호용 윈도우 및 이를 포함하는 가요성 표시 장치 |
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| TWI611218B (zh) * | 2013-11-08 | 2018-01-11 | 逢甲大學 | 一種光學擴散膜片製作方法 |
| JP6059695B2 (ja) * | 2014-09-01 | 2017-01-11 | デクセリアルズ株式会社 | 光学体の製造方法 |
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| KR20160079425A (ko) * | 2014-12-26 | 2016-07-06 | 삼성전자주식회사 | 디스플레이 장치 |
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| KR102013246B1 (ko) * | 2015-07-31 | 2019-08-22 | 후지필름 가부시키가이샤 | 반사 방지 필름의 제조 방법, 및 반사 방지 필름 |
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| JP6784487B2 (ja) * | 2015-10-30 | 2020-11-11 | デクセリアルズ株式会社 | 光学体、および表示装置 |
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| JP2005084113A (ja) * | 2003-09-04 | 2005-03-31 | Fuji Photo Film Co Ltd | 防眩性フィルム及びその製造方法、偏光板、画像表示装置 |
| JP2005156615A (ja) | 2003-11-20 | 2005-06-16 | Konica Minolta Opto Inc | 防眩フイルム、防眩性反射防止フィルム及びそれらの製造方法、並びに偏光板及び表示装置 |
| JP4606758B2 (ja) * | 2004-03-18 | 2011-01-05 | 藤森工業株式会社 | 光機能性フィルム |
| US20070141964A1 (en) * | 2005-12-19 | 2007-06-21 | Dan Zimmerman | Work rolls surface textured by media blasting and controlled surface modification |
| US7842376B2 (en) * | 2006-05-24 | 2010-11-30 | Zhijian Lu | Diffusers and methods of manufacture |
| JP2008090212A (ja) * | 2006-10-05 | 2008-04-17 | Nissan Motor Co Ltd | 反射防止性光学構造、反射防止性光学構造体及びその製造方法 |
| WO2008069223A1 (en) * | 2006-12-05 | 2008-06-12 | Semiconductor Energy Laboratory Co., Ltd. | Anti-reflection film and display device |
| JP5380832B2 (ja) * | 2006-12-27 | 2014-01-08 | 大日本印刷株式会社 | 光学積層体の製造方法 |
| JP4155338B1 (ja) * | 2007-03-14 | 2008-09-24 | ソニー株式会社 | 防眩性フィルムの製造方法 |
| JP4941744B2 (ja) | 2007-06-19 | 2012-05-30 | 住友電装株式会社 | 防水コネクタ |
| JP2009257546A (ja) | 2008-04-21 | 2009-11-05 | Toyota Motor Corp | 動力伝達装置 |
| JP2010015109A (ja) * | 2008-07-07 | 2010-01-21 | Sony Corp | 光学フィルムおよびその製造方法、防眩性偏光子、ならびに表示装置 |
| JP4678437B2 (ja) * | 2008-12-29 | 2011-04-27 | ソニー株式会社 | 光学素子およびその製造方法、ならびに表示装置 |
-
2009
- 2009-11-10 JP JP2009257546A patent/JP5724171B2/ja active Active
- 2009-12-21 TW TW098143985A patent/TWI483006B/zh not_active IP Right Cessation
- 2009-12-25 RU RU2009148575/28A patent/RU2009148575A/ru not_active Application Discontinuation
-
2010
- 2010-01-04 EP EP10000004A patent/EP2207050A3/en not_active Withdrawn
- 2010-01-06 US US12/652,878 patent/US8547639B2/en not_active Expired - Fee Related
- 2010-01-08 KR KR1020100001943A patent/KR20100082733A/ko not_active Withdrawn
- 2010-01-11 CN CN201010003218A patent/CN101819288A/zh active Pending
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