JP2009517882A - 固化したインプリンティング材料からモールドを分離する方法 - Google Patents
固化したインプリンティング材料からモールドを分離する方法 Download PDFInfo
- Publication number
- JP2009517882A JP2009517882A JP2008543272A JP2008543272A JP2009517882A JP 2009517882 A JP2009517882 A JP 2009517882A JP 2008543272 A JP2008543272 A JP 2008543272A JP 2008543272 A JP2008543272 A JP 2008543272A JP 2009517882 A JP2009517882 A JP 2009517882A
- Authority
- JP
- Japan
- Prior art keywords
- mold
- template
- substrate
- imprinting material
- separating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000463 material Substances 0.000 title claims abstract description 74
- 238000000034 method Methods 0.000 title claims abstract description 39
- 239000000758 substrate Substances 0.000 claims abstract description 88
- 238000005452 bending Methods 0.000 claims description 8
- 230000007935 neutral effect Effects 0.000 claims description 7
- 230000001939 inductive effect Effects 0.000 claims 1
- 239000000853 adhesive Substances 0.000 abstract description 3
- 230000001070 adhesive effect Effects 0.000 abstract description 3
- 230000015572 biosynthetic process Effects 0.000 description 38
- 238000000926 separation method Methods 0.000 description 15
- 239000012530 fluid Substances 0.000 description 9
- 238000005530 etching Methods 0.000 description 8
- 230000008569 process Effects 0.000 description 6
- 230000003993 interaction Effects 0.000 description 5
- 238000001459 lithography Methods 0.000 description 5
- 238000004891 communication Methods 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 230000008859 change Effects 0.000 description 3
- 230000008878 coupling Effects 0.000 description 3
- 238000010168 coupling process Methods 0.000 description 3
- 238000005859 coupling reaction Methods 0.000 description 3
- 230000002093 peripheral effect Effects 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 230000001276 controlling effect Effects 0.000 description 2
- 229910052734 helium Inorganic materials 0.000 description 2
- 239000001307 helium Substances 0.000 description 2
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 238000000059 patterning Methods 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 230000000295 complement effect Effects 0.000 description 1
- 238000002508 contact lithography Methods 0.000 description 1
- 238000012937 correction Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000001627 detrimental effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000005350 fused silica glass Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 230000000977 initiatory effect Effects 0.000 description 1
- 230000000873 masking effect Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 238000013519 translation Methods 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
- B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C43/00—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor
- B29C43/02—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor of articles of definite length, i.e. discrete articles
- B29C43/021—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor of articles of definite length, i.e. discrete articles characterised by the shape of the surface
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C33/00—Moulds or cores; Details thereof or accessories therefor
- B29C33/44—Moulds or cores; Details thereof or accessories therefor with means for, or specially constructed to facilitate, the removal of articles, e.g. of undercut articles
- B29C33/442—Moulds or cores; Details thereof or accessories therefor with means for, or specially constructed to facilitate, the removal of articles, e.g. of undercut articles with mechanical ejector or drive means therefor
- B29C33/444—Moulds or cores; Details thereof or accessories therefor with means for, or specially constructed to facilitate, the removal of articles, e.g. of undercut articles with mechanical ejector or drive means therefor for stripping articles from a mould core, e.g. using stripper plates
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C43/00—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C43/00—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor
- B29C43/003—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor characterised by the choice of material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C43/00—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor
- B29C43/32—Component parts, details or accessories; Auxiliary operations
- B29C43/50—Removing moulded articles
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C69/00—Combinations of shaping techniques not provided for in a single one of main groups B29C39/00 - B29C67/00, e.g. associations of moulding and joining techniques; Apparatus therefore
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41F—PRINTING MACHINES OR PRESSES
- B41F1/00—Platen presses, i.e. presses in which printing is effected by at least one essentially-flat pressure-applying member co-operating with a flat type-bed
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C43/00—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor
- B29C43/02—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor of articles of definite length, i.e. discrete articles
- B29C43/021—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor of articles of definite length, i.e. discrete articles characterised by the shape of the surface
- B29C2043/023—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor of articles of definite length, i.e. discrete articles characterised by the shape of the surface having a plurality of grooves
- B29C2043/025—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor of articles of definite length, i.e. discrete articles characterised by the shape of the surface having a plurality of grooves forming a microstructure, i.e. fine patterning
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
- Y10T156/10—Methods of surface bonding and/or assembly therefor
Abstract
Description
Claims (18)
- 基板上に付着した固化したインプリンティング材料から、テンプレート内に含まれるモールドを分離する方法であって、
前記テンプレート内に、前記固化したインプリンティング材料と前記モールドの間の接着力よりも大きな戻り力を生み出すのに十分な変形を、前記モールドに隣接して形成するステップ
を含む方法。 - 前記テンプレートが前記モールドとは反対側の第1の側面を有し、形成するステップが、前記第1の側面と前記モールドの間に圧力差を誘発させることをさらに含む、請求項1に記載の方法。
- 形成するステップが、前記基板に接触するのに十分な大きさの起伏を前記モールド内に生成することをさらに含む、請求項1に記載の方法。
- 前記モールドが周辺部を含み、前記モールドにおける前記周辺部に同心に位置する領域を、前記固化したインプリンティング材料から分離するステップをさらに含む、請求項1に記載の方法。
- 前記モールドが周辺部を含み、前記モールドにおける前記周辺部に同心に位置する複数の領域を順次に、前記固化したインプリンティング材料から分離するステップをさらに含む、請求項1に記載の方法。
- 前記モールドの中央を通過する軸の周りに径方向対称に配設された前記モールドの領域を、前記固化したインプリンティング材料から分離することをさらに含む、請求項1に記載の方法。
- 前記モールドの中央を通過する軸の周りに径方向対称に配設された前記モールドの複数の領域を順次に、前記固化したインプリンティング材料から分離することをさらに含む、請求項1に記載の方法。
- 前記モールドの領域を前記固化したインプリンティング材料から、前記モールドを前記モールドの表面の法線に対して交差するように延びる軸の周りで回転させることによって分離することをさらに含む、請求項1に記載の方法。
- 形成するステップには、モールドを囲む前記テンプレートの表面を、一定の曲率半径となるように形成することが含まれる、請求項1に記載の方法。
- 基板とモールドを有するテンプレートとの間に形状適合性性材料を広げる方法であって、
前記モールドを、前記基板と重なるようにして、それら間に容積が画定されるように配置し、
前記容積の第1の副部分に前記形状適合性性材料を、前記形状適合性性材料と前記モールドおよび前記基板の一方との間の毛管作用によって装入し、
前記容積の第2の副部分を、前記モールド内に変形を形成することによって充填する
ことを含む方法。 - 前記テンプレートが、前記モールドとは反対側の側面を含み、充填するステップが、前記第1の側面と前記モールドの間に圧力差を生み出すことをさらに含む、請求項10に記載の方法。
- 前記モールドが中央部分を含み、充填するステップが、形状適合性性材料を前記中央部分に接触させ、後に前記モールドの残りの部分を前記形状適合性性材料に接触させることをさらに含む、請求項10に記載の方法。
- 前記モールドが中立軸を含み、装入するステップが、前記形状適合性性材料に接触する前に前記中立軸を弓形に曲げることをさらに含む、請求項10に記載の方法。
- 配置するステップが、前記モールドを前記基板に対して中央に配置することをさらに含む、請求項10に記載の方法。
- 前記モールドがそれに付随する、前記基板の面積よりも広い面積を有する、請求項10に記載の方法。
- 前記テンプレートが前記モールドとは反対側の側面を含み、装入するステップが、実質的に等しい圧力が前記第1の側面と前記モールドにかかるのを維持しながら、前記モールドと前記基板の間の距離を変化させることをさらに含む、請求項10に記載の方法。
- 装入するステップが、充填するステップよりも前に行われる、請求項10に記載の方法。
- 前記第1および第2の副部分がそれらに関連する、前記容積未満の総容積を有する、請求項10に記載の方法。
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/292,568 | 2005-12-01 | ||
US11/292,568 US7803308B2 (en) | 2005-12-01 | 2005-12-01 | Technique for separating a mold from solidified imprinting material |
US11/303,777 US7906058B2 (en) | 2005-12-01 | 2005-12-16 | Bifurcated contact printing technique |
US11/303,777 | 2005-12-16 | ||
PCT/US2006/037109 WO2007064386A1 (en) | 2005-12-01 | 2006-09-22 | Technique for separating a mold from solidified imprinting material |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2012016219A Division JP5543502B2 (ja) | 2005-12-01 | 2012-01-30 | 固化したインプリンティング材料からモールドを分離する方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2009517882A true JP2009517882A (ja) | 2009-04-30 |
JP5236484B2 JP5236484B2 (ja) | 2013-07-17 |
Family
ID=38092554
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2008543272A Active JP5236484B2 (ja) | 2005-12-01 | 2006-09-22 | 固化したインプリンティング材料からモールドを分離する方法 |
JP2012016219A Active JP5543502B2 (ja) | 2005-12-01 | 2012-01-30 | 固化したインプリンティング材料からモールドを分離する方法 |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2012016219A Active JP5543502B2 (ja) | 2005-12-01 | 2012-01-30 | 固化したインプリンティング材料からモールドを分離する方法 |
Country Status (6)
Country | Link |
---|---|
US (1) | US7906058B2 (ja) |
EP (2) | EP2413189A1 (ja) |
JP (2) | JP5236484B2 (ja) |
KR (2) | KR101340922B1 (ja) |
TW (1) | TWI310730B (ja) |
WO (1) | WO2007064386A1 (ja) |
Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008098633A (ja) * | 2006-10-06 | 2008-04-24 | Asml Netherlands Bv | インプリントリソグラフィ |
JP2011210942A (ja) * | 2010-03-30 | 2011-10-20 | Fujifilm Corp | ナノインプリント方法およびモールド製造方法 |
JP2012256680A (ja) * | 2011-06-08 | 2012-12-27 | Toshiba Corp | テンプレート、テンプレートの製造方法及びテンプレートの製造装置 |
KR20130009983A (ko) | 2010-03-29 | 2013-01-24 | 후지필름 가부시키가이샤 | 미세 요철 패턴의 형성 방법 및 형성 장치, 전사용 기판의 제조 방법, 및 전사용 기판 |
JP2013532369A (ja) * | 2010-04-27 | 2013-08-15 | モレキュラー・インプリンツ・インコーポレーテッド | ナノインプリント・リソグラフィのテンプレート製作方法およびそのシステム |
JP2013162046A (ja) * | 2012-02-07 | 2013-08-19 | Canon Inc | インプリント装置及び物品の製造方法 |
JP2013162045A (ja) * | 2012-02-07 | 2013-08-19 | Canon Inc | インプリント装置及び物品の製造方法 |
US9541825B2 (en) | 2012-01-16 | 2017-01-10 | Canon Kabushiki Kaisha | Imprint apparatus and article manufacturing method |
JP2018503251A (ja) * | 2014-12-22 | 2018-02-01 | コーニンクレッカ フィリップス エヌ ヴェKoninklijke Philips N.V. | パターン化されたスタンプの製造方法、パターン化されたスタンプ及びインプリント方法 |
JP2018531786A (ja) * | 2015-10-15 | 2018-11-01 | ボード・オブ・リージエンツ,ザ・ユニバーシテイ・オブ・テキサス・システム | 精密なナノスケール製造のための汎用性のある方法 |
KR20230053678A (ko) | 2020-09-08 | 2023-04-21 | 캐논 가부시끼가이샤 | 성형 장치 및 물품의 제조 방법 |
Families Citing this family (37)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7162035B1 (en) | 2000-05-24 | 2007-01-09 | Tracer Detection Technology Corp. | Authentication method and system |
US7442336B2 (en) * | 2003-08-21 | 2008-10-28 | Molecular Imprints, Inc. | Capillary imprinting technique |
US7019819B2 (en) | 2002-11-13 | 2006-03-28 | Molecular Imprints, Inc. | Chucking system for modulating shapes of substrates |
US7077992B2 (en) | 2002-07-11 | 2006-07-18 | Molecular Imprints, Inc. | Step and repeat imprint lithography processes |
US8211214B2 (en) | 2003-10-02 | 2012-07-03 | Molecular Imprints, Inc. | Single phase fluid imprint lithography method |
US20060062922A1 (en) | 2004-09-23 | 2006-03-23 | Molecular Imprints, Inc. | Polymerization technique to attenuate oxygen inhibition of solidification of liquids and composition therefor |
US7803308B2 (en) | 2005-12-01 | 2010-09-28 | Molecular Imprints, Inc. | Technique for separating a mold from solidified imprinting material |
US7670529B2 (en) | 2005-12-08 | 2010-03-02 | Molecular Imprints, Inc. | Method and system for double-sided patterning of substrates |
US7670530B2 (en) | 2006-01-20 | 2010-03-02 | Molecular Imprints, Inc. | Patterning substrates employing multiple chucks |
US8142850B2 (en) * | 2006-04-03 | 2012-03-27 | Molecular Imprints, Inc. | Patterning a plurality of fields on a substrate to compensate for differing evaporation times |
US7802978B2 (en) * | 2006-04-03 | 2010-09-28 | Molecular Imprints, Inc. | Imprinting of partial fields at the edge of the wafer |
WO2007117524A2 (en) * | 2006-04-03 | 2007-10-18 | Molecular Imprints, Inc. | Method of concurrently patterning a substrate having a plurality of fields and alignment marks |
US8012395B2 (en) | 2006-04-18 | 2011-09-06 | Molecular Imprints, Inc. | Template having alignment marks formed of contrast material |
US8215946B2 (en) | 2006-05-18 | 2012-07-10 | Molecular Imprints, Inc. | Imprint lithography system and method |
US20080303187A1 (en) * | 2006-12-29 | 2008-12-11 | Molecular Imprints, Inc. | Imprint Fluid Control |
US20090014917A1 (en) * | 2007-07-10 | 2009-01-15 | Molecular Imprints, Inc. | Drop Pattern Generation for Imprint Lithography |
KR101503331B1 (ko) | 2007-09-28 | 2015-03-17 | 도레이 카부시키가이샤 | 미세 형상 전사시트의 제조방법 및 제조장치 |
NL1036034A1 (nl) | 2007-10-11 | 2009-04-15 | Asml Netherlands Bv | Imprint lithography. |
US8119052B2 (en) * | 2007-11-02 | 2012-02-21 | Molecular Imprints, Inc. | Drop pattern generation for imprint lithography |
US20090148619A1 (en) * | 2007-12-05 | 2009-06-11 | Molecular Imprints, Inc. | Controlling Thickness of Residual Layer |
US8361371B2 (en) * | 2008-02-08 | 2013-01-29 | Molecular Imprints, Inc. | Extrusion reduction in imprint lithography |
US7995196B1 (en) | 2008-04-23 | 2011-08-09 | Tracer Detection Technology Corp. | Authentication method and system |
WO2010044756A2 (en) * | 2008-10-16 | 2010-04-22 | Teng Hwee Koh | Mold imprinting |
US20100096764A1 (en) * | 2008-10-20 | 2010-04-22 | Molecular Imprints, Inc. | Gas Environment for Imprint Lithography |
US8512797B2 (en) * | 2008-10-21 | 2013-08-20 | Molecular Imprints, Inc. | Drop pattern generation with edge weighting |
US8586126B2 (en) | 2008-10-21 | 2013-11-19 | Molecular Imprints, Inc. | Robust optimization to generate drop patterns in imprint lithography which are tolerant of variations in drop volume and drop placement |
US20100112220A1 (en) * | 2008-11-03 | 2010-05-06 | Molecular Imprints, Inc. | Dispense system set-up and characterization |
CN102349131A (zh) | 2009-03-12 | 2012-02-08 | 应用材料公司 | 大面积可溶解模板光刻 |
JP5662741B2 (ja) * | 2009-09-30 | 2015-02-04 | キヤノン株式会社 | インプリント装置および物品の製造方法 |
TWI400160B (zh) * | 2010-11-18 | 2013-07-01 | Univ Nat Taiwan Science Tech | 應用於微奈米壓印製程之模具 |
JP6060796B2 (ja) * | 2013-04-22 | 2017-01-18 | 大日本印刷株式会社 | インプリントモールド及びダミーパターン設計方法 |
KR102336499B1 (ko) * | 2014-08-04 | 2021-12-07 | 삼성전자주식회사 | 패턴 구조체 및 그 제조방법과, 금속 와이어 그리드 편광판을 채용한 액정 표시장치 |
JP2017045849A (ja) * | 2015-08-26 | 2017-03-02 | 東京エレクトロン株式会社 | シーズニング方法およびエッチング方法 |
US9993962B2 (en) * | 2016-05-23 | 2018-06-12 | Canon Kabushiki Kaisha | Method of imprinting to correct for a distortion within an imprint system |
TWI672212B (zh) * | 2016-08-25 | 2019-09-21 | 國立成功大學 | 奈米壓印組合體及其壓印方法 |
US10627715B2 (en) | 2016-10-31 | 2020-04-21 | Canon Kabushiki Kaisha | Method for separating a nanoimprint template from a substrate |
US11249405B2 (en) * | 2018-04-30 | 2022-02-15 | Canon Kabushiki Kaisha | System and method for improving the performance of a nanoimprint system |
Citations (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2124711A (en) * | 1937-06-25 | 1938-07-26 | George S Rowell | Method and apparatus for reproducing images on curved surfaces |
JPH09240125A (ja) * | 1996-03-04 | 1997-09-16 | Motorola Inc | 物品の面をスタンピングするための装置および方法 |
JP2001068411A (ja) * | 1999-07-28 | 2001-03-16 | Lucent Technol Inc | デバイス製作のためのリソグラフィ・プロセス |
JP2001138482A (ja) * | 1999-11-17 | 2001-05-22 | Fujitsu Ltd | 立体構造物転写方法及びその装置 |
US20030017424A1 (en) * | 2001-07-18 | 2003-01-23 | Miri Park | Method and apparatus for fabricating complex grating structures |
JP2003517727A (ja) * | 1999-10-29 | 2003-05-27 | ボード・オブ・リージエンツ,ザ・ユニバーシテイ・オブ・テキサス・システム | インプリント・リソグラフィのための高精度方向付けアライメントデバイスおよびギャップ制御デバイス |
JP2004335012A (ja) * | 2003-05-09 | 2004-11-25 | Tdk Corp | インプリント装置およびインプリント方法 |
WO2005006076A2 (en) * | 2003-07-09 | 2005-01-20 | Molecular Imprints, Inc. | Systems for magnification and distortion correction for imprint lithography processes |
JP2005053214A (ja) * | 2003-07-22 | 2005-03-03 | Meiki Co Ltd | 樹脂成形品の成形装置および成形方法 |
JP2005527406A (ja) * | 2002-05-27 | 2005-09-15 | コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ | スタンプから基板にパターンを転写する方法及び装置 |
JP2005533393A (ja) * | 2002-07-11 | 2005-11-04 | モレキュラー・インプリンツ・インコーポレーテッド | インプリント・リソグラフィ・プロセスおよびシステム |
JP2006510223A (ja) * | 2002-12-13 | 2006-03-23 | モレキュラー・インプリンツ・インコーポレーテッド | 基板の面曲がりを使用する倍率補正 |
JP2006326927A (ja) * | 2005-05-24 | 2006-12-07 | Hitachi High-Technologies Corp | インプリント装置、及び微細構造転写方法 |
JP2007083626A (ja) * | 2005-09-22 | 2007-04-05 | Ricoh Co Ltd | 微細構造転写装置 |
Family Cites Families (239)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US1236304A (en) * | 1917-02-03 | 1917-08-07 | Riley L Howell | Cushioned hand-stamp. |
US2201302A (en) * | 1938-11-30 | 1940-05-21 | Westinghouse Electric & Mfg Co | Printing device |
GB1183056A (en) | 1966-11-29 | 1970-03-04 | Bp Chemicals U K Ltd Formerly | Metering Process for Dispensing Measured Quantities of Liquefied Gas |
US3868901A (en) * | 1972-05-22 | 1975-03-04 | Interspace Corp | Apparatus for mechanical contact in printing on ceramic tableware |
US4022855A (en) * | 1975-03-17 | 1977-05-10 | Eastman Kodak Company | Method for making a plastic optical element having a gradient index of refraction |
FR2325018A1 (fr) * | 1975-06-23 | 1977-04-15 | Ibm | Dispositif de mesure d'intervalle pour definir la distance entre deux faces ou plus |
US4208240A (en) * | 1979-01-26 | 1980-06-17 | Gould Inc. | Method and apparatus for controlling plasma etching |
DE3022709A1 (de) | 1980-06-18 | 1982-01-07 | Felix Schoeller jr. GmbH & Co KG, 4500 Osnabrück | Wasserfestes fotografisches papier und verfahren zu seiner herstellung |
US4576900A (en) * | 1981-10-09 | 1986-03-18 | Amdahl Corporation | Integrated circuit multilevel interconnect system and method |
DE3208081A1 (de) | 1982-03-06 | 1983-09-08 | Braun Ag, 6000 Frankfurt | Verfahren zur herstellung einer siebartigen scherfolie fuer einen elektrisch betriebenen trockenrasierapparat mit erhebungen auf ihrer der haut zugewandten flaeche |
US4440804A (en) * | 1982-08-02 | 1984-04-03 | Fairchild Camera & Instrument Corporation | Lift-off process for fabricating self-aligned contacts |
US4490409A (en) * | 1982-09-07 | 1984-12-25 | Energy Sciences, Inc. | Process and apparatus for decorating the surfaces of electron irradiation cured coatings on radiation-sensitive substrates |
US4637904A (en) * | 1983-11-14 | 1987-01-20 | Rohm And Haas Company | Process for molding a polymeric layer onto a substrate |
US4512848A (en) | 1984-02-06 | 1985-04-23 | Exxon Research And Engineering Co. | Procedure for fabrication of microstructures over large areas using physical replication |
US4908298A (en) * | 1985-03-19 | 1990-03-13 | International Business Machines Corporation | Method of creating patterned multilayer films for use in production of semiconductor circuits and systems |
EP0228671A1 (en) | 1985-12-23 | 1987-07-15 | General Electric Company | Method for the production of a coated substrate with controlled surface characteristics |
DE3767317D1 (de) | 1986-02-13 | 1991-02-21 | Philips Nv | Matrize fuer einen abdruck-process. |
US4676868A (en) * | 1986-04-23 | 1987-06-30 | Fairchild Semiconductor Corporation | Method for planarizing semiconductor substrates |
US4737425A (en) * | 1986-06-10 | 1988-04-12 | International Business Machines Corporation | Patterned resist and process |
KR900004269B1 (ko) | 1986-06-11 | 1990-06-18 | 가부시기가이샤 도시바 | 제 1물체와 제 2 물체와의 위치 맞추는 방법 및 장치 |
JPS6376330A (ja) | 1986-09-18 | 1988-04-06 | Oki Electric Ind Co Ltd | 半導体装置の製造方法 |
FR2604553A1 (fr) | 1986-09-29 | 1988-04-01 | Rhone Poulenc Chimie | Substrat polymere rigide pour disque optique et les disques optiques obtenus a partir dudit substrat |
US4707218A (en) | 1986-10-28 | 1987-11-17 | International Business Machines Corporation | Lithographic image size reduction |
JPH06104375B2 (ja) * | 1986-11-10 | 1994-12-21 | 松下電器産業株式会社 | 印刷方法 |
JP2823016B2 (ja) * | 1986-12-25 | 1998-11-11 | ソニー株式会社 | 透過型スクリーンの製造方法 |
US5736424A (en) * | 1987-02-27 | 1998-04-07 | Lucent Technologies Inc. | Device fabrication involving planarization |
US6391798B1 (en) * | 1987-02-27 | 2002-05-21 | Agere Systems Guardian Corp. | Process for planarization a semiconductor substrate |
US6048799A (en) * | 1987-02-27 | 2000-04-11 | Lucent Technologies Inc. | Device fabrication involving surface planarization |
US4731155A (en) | 1987-04-15 | 1988-03-15 | General Electric Company | Process for forming a lithographic mask |
US5028361A (en) * | 1987-11-09 | 1991-07-02 | Takeo Fujimoto | Method for molding a photosensitive composition |
US4936465A (en) | 1987-12-07 | 1990-06-26 | Zoeld Tibor | Method and apparatus for fast, reliable, and environmentally safe dispensing of fluids, gases and individual particles of a suspension through pressure control at well defined parts of a closed flow-through system |
US5028366A (en) | 1988-01-12 | 1991-07-02 | Air Products And Chemicals, Inc. | Water based mold release compositions for making molded polyurethane foam |
US4866307A (en) | 1988-04-20 | 1989-09-12 | Texas Instruments Incorporated | Integrated programmable bit circuit using single-level poly construction |
US4862019A (en) | 1988-04-20 | 1989-08-29 | Texas Instruments Incorporated | Single-level poly programmable bit circuit |
JPH0269936A (ja) | 1988-07-28 | 1990-03-08 | Siemens Ag | 半導体材料上の樹脂構造の形成方法 |
US4921778A (en) * | 1988-07-29 | 1990-05-01 | Shipley Company Inc. | Photoresist pattern fabrication employing chemically amplified metalized material |
JP2546350B2 (ja) | 1988-09-09 | 1996-10-23 | キヤノン株式会社 | 位置合わせ装置 |
US4964945A (en) | 1988-12-09 | 1990-10-23 | Minnesota Mining And Manufacturing Company | Lift off patterning process on a flexible substrate |
US5110514A (en) * | 1989-05-01 | 1992-05-05 | Soane Technologies, Inc. | Controlled casting of a shrinkable material |
US5053318A (en) | 1989-05-18 | 1991-10-01 | Shipley Company Inc. | Plasma processing with metal mask integration |
US4932358A (en) | 1989-05-18 | 1990-06-12 | Genus, Inc. | Perimeter wafer seal |
CA2011927C (en) * | 1989-06-02 | 1996-12-24 | Alan Lee Sidman | Microlithographic method for producing thick, vertically-walled photoresist patterns |
US4919748A (en) * | 1989-06-30 | 1990-04-24 | At&T Bell Laboratories | Method for tapered etching |
US5151754A (en) | 1989-10-06 | 1992-09-29 | Kabushiki Kaisha Toshiba | Method and an apparatus for measuring a displacement between two objects and a method and an apparatus for measuring a gap distance between two objects |
US5362606A (en) | 1989-10-18 | 1994-11-08 | Massachusetts Institute Of Technology | Positive resist pattern formation through focused ion beam exposure and surface barrier silylation |
US5073230A (en) | 1990-04-17 | 1991-12-17 | Arizona Board Of Regents Acting On Behalf Of Arizona State University | Means and methods of lifting and relocating an epitaxial device layer |
US5003062A (en) * | 1990-04-19 | 1991-03-26 | Taiwan Semiconductor Manufacturing Co. | Semiconductor planarization process for submicron devices |
US5328810A (en) * | 1990-05-07 | 1994-07-12 | Micron Technology, Inc. | Method for reducing, by a factor or 2-N, the minimum masking pitch of a photolithographic process |
US5451435A (en) | 1990-06-18 | 1995-09-19 | At&T Corp. | Method for forming dielectric |
DE4029912A1 (de) | 1990-09-21 | 1992-03-26 | Philips Patentverwaltung | Verfahren zur bildung mindestens eines grabens in einer substratschicht |
US5126006A (en) * | 1990-10-30 | 1992-06-30 | International Business Machines Corp. | Plural level chip masking |
US5288436A (en) * | 1990-11-06 | 1994-02-22 | Colloptics, Inc. | Methods of fabricating a collagen lenticule precursor for modifying the cornea |
US5362940A (en) | 1990-11-09 | 1994-11-08 | Litel Instruments | Use of Fresnel zone plates for material processing |
US5240878A (en) | 1991-04-26 | 1993-08-31 | International Business Machines Corporation | Method for forming patterned films on a substrate |
US5212147A (en) * | 1991-05-15 | 1993-05-18 | Hewlett-Packard Company | Method of forming a patterned in-situ high Tc superconductive film |
FR2677043B1 (fr) | 1991-05-29 | 1993-12-24 | Solems | Procede, dispositif et appareil pour traiter un substrat par un plasma basse pression. |
EP0524759A1 (en) | 1991-07-23 | 1993-01-27 | AT&T Corp. | Device fabrication process |
US5357122A (en) | 1991-09-05 | 1994-10-18 | Sony Corporation | Three-dimensional optical-electronic integrated circuit device with raised sections |
JPH0580530A (ja) | 1991-09-24 | 1993-04-02 | Hitachi Ltd | 薄膜パターン製造方法 |
US5277749A (en) * | 1991-10-17 | 1994-01-11 | International Business Machines Corporation | Methods and apparatus for relieving stress and resisting stencil delamination when performing lift-off processes that utilize high stress metals and/or multiple evaporation steps |
US5263073A (en) * | 1991-12-20 | 1993-11-16 | Board Of Supervisors Of Louisiana State University And Agricultural And Mechanical College | Scanning systems for high resolution E-beam and X-ray lithography |
JP2867194B2 (ja) | 1992-02-05 | 1999-03-08 | 東京エレクトロン株式会社 | 処理装置及び処理方法 |
US5244818A (en) | 1992-04-08 | 1993-09-14 | Georgia Tech Research Corporation | Processes for lift-off of thin film materials and for the fabrication of three dimensional integrated circuits |
US5545367A (en) | 1992-04-15 | 1996-08-13 | Soane Technologies, Inc. | Rapid prototype three dimensional stereolithography |
US5246880A (en) | 1992-04-27 | 1993-09-21 | Eastman Kodak Company | Method for creating substrate electrodes for flip chip and other applications |
JP3157605B2 (ja) | 1992-04-28 | 2001-04-16 | 東京エレクトロン株式会社 | プラズマ処理装置 |
US5371822A (en) | 1992-06-09 | 1994-12-06 | Digital Equipment Corporation | Method of packaging and assembling opto-electronic integrated circuits |
US5232874A (en) | 1992-06-22 | 1993-08-03 | Micron Technology, Inc. | Method for producing a semiconductor wafer having shallow and deep buried contacts |
US5376810A (en) | 1992-06-26 | 1994-12-27 | California Institute Of Technology | Growth of delta-doped layers on silicon CCD/S for enhanced ultraviolet response |
US5445195A (en) | 1992-07-15 | 1995-08-29 | Kim; Dae S. | Automatic computer-controlled liquid dispenser |
US5601641A (en) | 1992-07-21 | 1997-02-11 | Tse Industries, Inc. | Mold release composition with polybutadiene and method of coating a mold core |
US5250472A (en) | 1992-09-03 | 1993-10-05 | Industrial Technology Research Institute | Spin-on-glass integration planarization having siloxane partial etchback and silicate processes |
US5431777A (en) * | 1992-09-17 | 1995-07-11 | International Business Machines Corporation | Methods and compositions for the selective etching of silicon |
TW227628B (ja) * | 1992-12-10 | 1994-08-01 | Samsung Electronics Co Ltd | |
DE69405451T2 (de) * | 1993-03-16 | 1998-03-12 | Koninkl Philips Electronics Nv | Verfahren und Vorrichtung zur Herstellung eines strukturierten Reliefbildes aus vernetztem Photoresist auf einer flachen Substratoberfläche |
US5324683A (en) * | 1993-06-02 | 1994-06-28 | Motorola, Inc. | Method of forming a semiconductor structure having an air region |
JP2837063B2 (ja) * | 1993-06-04 | 1998-12-14 | シャープ株式会社 | レジストパターンの形成方法 |
US5900160A (en) * | 1993-10-04 | 1999-05-04 | President And Fellows Of Harvard College | Methods of etching articles via microcontact printing |
US6180239B1 (en) * | 1993-10-04 | 2001-01-30 | President And Fellows Of Harvard College | Microcontact printing on surfaces and derivative articles |
US6776094B1 (en) | 1993-10-04 | 2004-08-17 | President & Fellows Of Harvard College | Kit For Microcontact Printing |
US5512131A (en) | 1993-10-04 | 1996-04-30 | President And Fellows Of Harvard College | Formation of microstamped patterns on surfaces and derivative articles |
US5776748A (en) | 1993-10-04 | 1998-07-07 | President And Fellows Of Harvard College | Method of formation of microstamped patterns on plates for adhesion of cells and other biological materials, devices and uses therefor |
US5449117A (en) | 1993-10-04 | 1995-09-12 | Technical Concepts, L.P. | Apparatus and method for controllably dispensing drops of liquid |
NL9401260A (nl) * | 1993-11-12 | 1995-06-01 | Cornelis Johannes Maria Van Ri | Membraan voor microfiltratie, ultrafiltratie, gasscheiding en katalyse, werkwijze ter vervaardiging van een dergelijk membraan, mal ter vervaardiging van een dergelijk membraan, alsmede diverse scheidingssystemen omvattende een dergelijk membraan. |
US5434107A (en) * | 1994-01-28 | 1995-07-18 | Texas Instruments Incorporated | Method for planarization |
DE4408537A1 (de) | 1994-03-14 | 1995-09-21 | Leybold Ag | Vorrichtung für den Transport von Substraten |
US5542605A (en) | 1994-04-07 | 1996-08-06 | Flow-Rite Controls, Ltd. | Automatic liquid dispenser |
US5453157A (en) | 1994-05-16 | 1995-09-26 | Texas Instruments Incorporated | Low temperature anisotropic ashing of resist for semiconductor fabrication |
WO1996004210A1 (fr) * | 1994-08-04 | 1996-02-15 | Hitachi Chemical Company, Ltd. | Procede de production de verre de silice |
US5686356A (en) | 1994-09-30 | 1997-11-11 | Texas Instruments Incorporated | Conductor reticulation for improved device planarity |
DE69509046T2 (de) * | 1994-11-30 | 1999-10-21 | Applied Materials Inc | Plasmareaktoren zur Behandlung von Halbleiterscheiben |
US5458520A (en) | 1994-12-13 | 1995-10-17 | International Business Machines Corporation | Method for producing planar field emission structure |
US5628917A (en) * | 1995-02-03 | 1997-05-13 | Cornell Research Foundation, Inc. | Masking process for fabricating ultra-high aspect ratio, wafer-free micro-opto-electromechanical structures |
US5849209A (en) | 1995-03-31 | 1998-12-15 | Johnson & Johnson Vision Products, Inc. | Mold material made with additives |
US5843363A (en) | 1995-03-31 | 1998-12-01 | Siemens Aktiengesellschaft | Ablation patterning of multi-layered structures |
US6342389B1 (en) | 1995-04-10 | 2002-01-29 | Roger S. Cubicciotti | Modified phycobilisomes and uses therefore |
GB9509487D0 (en) | 1995-05-10 | 1995-07-05 | Ici Plc | Micro relief element & preparation thereof |
US5820769A (en) | 1995-05-24 | 1998-10-13 | Regents Of The University Of Minnesota | Method for making magnetic storage having discrete elements with quantized magnetic moments |
US5948570A (en) | 1995-05-26 | 1999-09-07 | Lucent Technologies Inc. | Process for dry lithographic etching |
US5654238A (en) | 1995-08-03 | 1997-08-05 | International Business Machines Corporation | Method for etching vertical contact holes without substrate damage caused by directional etching |
US5849222A (en) | 1995-09-29 | 1998-12-15 | Johnson & Johnson Vision Products, Inc. | Method for reducing lens hole defects in production of contact lens blanks |
US5772905A (en) * | 1995-11-15 | 1998-06-30 | Regents Of The University Of Minnesota | Nanoimprint lithography |
US20040137734A1 (en) | 1995-11-15 | 2004-07-15 | Princeton University | Compositions and processes for nanoimprinting |
US6518189B1 (en) | 1995-11-15 | 2003-02-11 | Regents Of The University Of Minnesota | Method and apparatus for high density nanostructures |
US7758794B2 (en) | 2001-10-29 | 2010-07-20 | Princeton University | Method of making an article comprising nanoscale patterns with reduced edge roughness |
US6482742B1 (en) | 2000-07-18 | 2002-11-19 | Stephen Y. Chou | Fluid pressure imprint lithography |
US6309580B1 (en) | 1995-11-15 | 2001-10-30 | Regents Of The University Of Minnesota | Release surfaces, particularly for use in nanoimprint lithography |
US20040036201A1 (en) * | 2000-07-18 | 2004-02-26 | Princeton University | Methods and apparatus of field-induced pressure imprint lithography |
US6355198B1 (en) | 1996-03-15 | 2002-03-12 | President And Fellows Of Harvard College | Method of forming articles including waveguides via capillary micromolding and microtransfer molding |
US20030179354A1 (en) | 1996-03-22 | 2003-09-25 | Nikon Corporation | Mask-holding apparatus for a light exposure apparatus and related scanning-exposure method |
JPH09283621A (ja) | 1996-04-10 | 1997-10-31 | Murata Mfg Co Ltd | 半導体装置のt型ゲート電極形成方法およびその構造 |
US5942443A (en) * | 1996-06-28 | 1999-08-24 | Caliper Technologies Corporation | High throughput screening assay systems in microscale fluidic devices |
US5888650A (en) * | 1996-06-03 | 1999-03-30 | Minnesota Mining And Manufacturing Company | Temperature-responsive adhesive article |
US6074827A (en) * | 1996-07-30 | 2000-06-13 | Aclara Biosciences, Inc. | Microfluidic method for nucleic acid purification and processing |
JP2002513445A (ja) * | 1996-09-06 | 2002-05-08 | オブデュキャット、アクチボラグ | 導電材料内の構造の異方性エッチング方法 |
US5858580A (en) | 1997-09-17 | 1999-01-12 | Numerical Technologies, Inc. | Phase shifting circuit manufacture method and apparatus |
US6228539B1 (en) | 1996-09-18 | 2001-05-08 | Numerical Technologies, Inc. | Phase shifting circuit manufacture method and apparatus |
JPH10123534A (ja) * | 1996-10-23 | 1998-05-15 | Toshiba Corp | 液晶表示素子 |
US5895263A (en) * | 1996-12-19 | 1999-04-20 | International Business Machines Corporation | Process for manufacture of integrated circuit device |
US5983906A (en) | 1997-01-24 | 1999-11-16 | Applied Materials, Inc. | Methods and apparatus for a cleaning process in a high temperature, corrosive, plasma environment |
US5817579A (en) | 1997-04-09 | 1998-10-06 | Vanguard International Semiconductor Corporation | Two step plasma etch method for forming self aligned contact |
US5948470A (en) | 1997-04-28 | 1999-09-07 | Harrison; Christopher | Method of nanoscale patterning and products made thereby |
US5812629A (en) | 1997-04-30 | 1998-09-22 | Clauser; John F. | Ultrahigh resolution interferometric x-ray imaging |
US5926690A (en) * | 1997-05-28 | 1999-07-20 | Advanced Micro Devices, Inc. | Run-to-run control process for controlling critical dimensions |
US5974150A (en) | 1997-09-30 | 1999-10-26 | Tracer Detection Technology Corp. | System and method for authentication of goods |
US6150680A (en) | 1998-03-05 | 2000-11-21 | Welch Allyn, Inc. | Field effect semiconductor device having dipole barrier |
WO1999045179A1 (en) * | 1998-03-05 | 1999-09-10 | Obducat Ab | Method of etching |
JP3780700B2 (ja) | 1998-05-26 | 2006-05-31 | セイコーエプソン株式会社 | パターン形成方法、パターン形成装置、パターン形成用版、パターン形成用版の製造方法、カラーフィルタの製造方法、導電膜の製造方法及び液晶パネルの製造方法 |
FI109944B (fi) | 1998-08-11 | 2002-10-31 | Valtion Teknillinen | Optoelektroninen komponentti ja valmistusmenetelmä |
US5907782A (en) * | 1998-08-15 | 1999-05-25 | Acer Semiconductor Manufacturing Inc. | Method of forming a multiple fin-pillar capacitor for a high density dram cell |
US6713238B1 (en) | 1998-10-09 | 2004-03-30 | Stephen Y. Chou | Microscale patterning and articles formed thereby |
US6218316B1 (en) * | 1998-10-22 | 2001-04-17 | Micron Technology, Inc. | Planarization of non-planar surfaces in device fabrication |
US6665014B1 (en) | 1998-11-25 | 2003-12-16 | Intel Corporation | Microlens and photodetector |
US6247986B1 (en) | 1998-12-23 | 2001-06-19 | 3M Innovative Properties Company | Method for precise molding and alignment of structures on a substrate using a stretchable mold |
US6521536B1 (en) * | 1999-01-11 | 2003-02-18 | Micron Technology, Inc. | Planarization process |
US6274294B1 (en) | 1999-02-03 | 2001-08-14 | Electroformed Stents, Inc. | Cylindrical photolithography exposure process and apparatus |
US6565928B2 (en) * | 1999-03-08 | 2003-05-20 | Tokyo Electron Limited | Film forming method and film forming apparatus |
US6334960B1 (en) * | 1999-03-11 | 2002-01-01 | Board Of Regents, The University Of Texas System | Step and flash imprint lithography |
US6387783B1 (en) * | 1999-04-26 | 2002-05-14 | International Business Machines Corporation | Methods of T-gate fabrication using a hybrid resist |
JP2001058352A (ja) * | 1999-06-14 | 2001-03-06 | Dainippon Printing Co Ltd | 密着転写方法および装置ならびに転写型 |
US6255022B1 (en) * | 1999-06-17 | 2001-07-03 | Taiwan Semiconductor Manufacturing Company | Dry development process for a bi-layer resist system utilized to reduce microloading |
EP1065567A3 (en) * | 1999-06-29 | 2001-05-16 | Applied Materials, Inc. | Integrated critical dimension control |
US6242363B1 (en) * | 1999-08-11 | 2001-06-05 | Adc Telecommunications, Inc. | Method of etching a wafer layer using a sacrificial wall to form vertical sidewall |
US6383928B1 (en) * | 1999-09-02 | 2002-05-07 | Texas Instruments Incorporated | Post copper CMP clean |
US6517995B1 (en) * | 1999-09-14 | 2003-02-11 | Massachusetts Institute Of Technology | Fabrication of finely featured devices by liquid embossing |
US6329256B1 (en) | 1999-09-24 | 2001-12-11 | Advanced Micro Devices, Inc. | Self-aligned damascene gate formation with low gate resistance |
US6623579B1 (en) | 1999-11-02 | 2003-09-23 | Alien Technology Corporation | Methods and apparatus for fluidic self assembly |
SE515607C2 (sv) * | 1999-12-10 | 2001-09-10 | Obducat Ab | Anordning och metod vid tillverkning av strukturer |
US6391217B2 (en) | 1999-12-23 | 2002-05-21 | University Of Massachusetts | Methods and apparatus for forming submicron patterns on films |
US6498640B1 (en) | 1999-12-30 | 2002-12-24 | Koninklijke Philips Electronics N.V. | Method to measure alignment using latent image grating structures |
US6376379B1 (en) * | 2000-02-01 | 2002-04-23 | Chartered Semiconductor Manufacturing Ltd. | Method of hard mask patterning |
US6337262B1 (en) * | 2000-03-06 | 2002-01-08 | Chartered Semiconductor Manufacturing Ltd. | Self aligned T-top gate process integration |
US6387330B1 (en) | 2000-04-12 | 2002-05-14 | George Steven Bova | Method and apparatus for storing and dispensing reagents |
US7859519B2 (en) | 2000-05-01 | 2010-12-28 | Tulbert David J | Human-machine interface |
US6593240B1 (en) | 2000-06-28 | 2003-07-15 | Infineon Technologies, North America Corp | Two step chemical mechanical polishing process |
CN100504598C (zh) * | 2000-07-16 | 2009-06-24 | 得克萨斯州大学系统董事会 | 用于平版印刷工艺中的高分辨率重叠对齐方法和系统 |
AU2001277907A1 (en) * | 2000-07-17 | 2002-01-30 | Board Of Regents, The University Of Texas System | Method and system of automatic fluid dispensing for imprint lithography processes |
US20050037143A1 (en) | 2000-07-18 | 2005-02-17 | Chou Stephen Y. | Imprint lithography with improved monitoring and control and apparatus therefor |
US7635262B2 (en) | 2000-07-18 | 2009-12-22 | Princeton University | Lithographic apparatus for fluid pressure imprint lithography |
US7211214B2 (en) * | 2000-07-18 | 2007-05-01 | Princeton University | Laser assisted direct imprint lithography |
US6326627B1 (en) | 2000-08-02 | 2001-12-04 | Archimedes Technology Group, Inc. | Mass filtering sputtered ion source |
KR100350811B1 (ko) * | 2000-08-19 | 2002-09-05 | 삼성전자 주식회사 | 반도체 장치의 금속 비아 콘택 및 그 형성방법 |
US6629292B1 (en) | 2000-10-06 | 2003-09-30 | International Business Machines Corporation | Method for forming graphical images in semiconductor devices |
EP2306242A3 (en) * | 2000-10-12 | 2011-11-02 | Board of Regents, The University of Texas System | Method of forming a pattern on a substrate |
US6879162B2 (en) | 2000-11-07 | 2005-04-12 | Sri International | System and method of micro-fluidic handling and dispensing using micro-nozzle structures |
CN1260778C (zh) * | 2000-12-04 | 2006-06-21 | 株式会社荏原制作所 | 基片加工方法 |
US6632742B2 (en) | 2001-04-18 | 2003-10-14 | Promos Technologies Inc. | Method for avoiding defects produced in the CMP process |
US6620733B2 (en) | 2001-02-12 | 2003-09-16 | Lam Research Corporation | Use of hydrocarbon addition for the elimination of micromasking during etching of organic low-k dielectrics |
US6841483B2 (en) | 2001-02-12 | 2005-01-11 | Lam Research Corporation | Unique process chemistry for etching organic low-k materials |
US6387787B1 (en) | 2001-03-02 | 2002-05-14 | Motorola, Inc. | Lithographic template and method of formation and use |
US6955767B2 (en) | 2001-03-22 | 2005-10-18 | Hewlett-Packard Development Company, Lp. | Scanning probe based lithographic alignment |
US6517977B2 (en) * | 2001-03-28 | 2003-02-11 | Motorola, Inc. | Lithographic template and method of formation and use |
US6534418B1 (en) * | 2001-04-30 | 2003-03-18 | Advanced Micro Devices, Inc. | Use of silicon containing imaging layer to define sub-resolution gate structures |
US6541360B1 (en) * | 2001-04-30 | 2003-04-01 | Advanced Micro Devices, Inc. | Bi-layer trim etch process to form integrated circuit gate structures |
US6964793B2 (en) | 2002-05-16 | 2005-11-15 | Board Of Regents, The University Of Texas System | Method for fabricating nanoscale patterns in light curable compositions using an electric field |
JP2002348680A (ja) | 2001-05-22 | 2002-12-04 | Sharp Corp | 金属膜パターンおよびその製造方法 |
US6847433B2 (en) | 2001-06-01 | 2005-01-25 | Agere Systems, Inc. | Holder, system, and process for improving overlay in lithography |
TW488080B (en) | 2001-06-08 | 2002-05-21 | Au Optronics Corp | Method for producing thin film transistor |
TWI285279B (en) | 2001-06-14 | 2007-08-11 | Himax Tech Ltd | Liquid crystal display panel having sealant |
US7049049B2 (en) | 2001-06-27 | 2006-05-23 | University Of South Florida | Maskless photolithography for using photoreactive agents |
SG187992A1 (en) | 2001-07-25 | 2013-03-28 | Univ Princeton | Nanochannel arrays and their preparation and use for high throughput macromolecular analysis |
US6678038B2 (en) | 2001-08-03 | 2004-01-13 | Nikon Corporation | Apparatus and methods for detecting tool-induced shift in microlithography apparatus |
WO2003035932A1 (en) | 2001-09-25 | 2003-05-01 | Minuta Technology Co., Ltd. | Method for forming a micro-pattern on a substrate by using capillary force |
US20030080472A1 (en) | 2001-10-29 | 2003-05-01 | Chou Stephen Y. | Lithographic method with bonded release layer for molding small patterns |
US6716767B2 (en) * | 2001-10-31 | 2004-04-06 | Brewer Science, Inc. | Contact planarization materials that generate no volatile byproducts or residue during curing |
JP2003202584A (ja) | 2002-01-08 | 2003-07-18 | Toshiba Corp | 液晶表示装置 |
US6621960B2 (en) | 2002-01-24 | 2003-09-16 | Oplink Communications, Inc. | Method of fabricating multiple superimposed fiber Bragg gratings |
US7455955B2 (en) * | 2002-02-27 | 2008-11-25 | Brewer Science Inc. | Planarization method for multi-layer lithography processing |
US7117583B2 (en) | 2002-03-18 | 2006-10-10 | International Business Machines Corporation | Method and apparatus using a pre-patterned seed layer for providing an aligned coil for an inductive head structure |
US7223350B2 (en) | 2002-03-29 | 2007-05-29 | International Business Machines Corporation | Planarization in an encapsulation process for thin film surfaces |
US6783717B2 (en) | 2002-04-22 | 2004-08-31 | International Business Machines Corporation | Process of fabricating a precision microcontact printing stamp |
US6849558B2 (en) | 2002-05-22 | 2005-02-01 | The Board Of Trustees Of The Leland Stanford Junior University | Replication and transfer of microstructures and nanostructures |
US20030224116A1 (en) | 2002-05-30 | 2003-12-04 | Erli Chen | Non-conformal overcoat for nonometer-sized surface structure |
US6926929B2 (en) | 2002-07-09 | 2005-08-09 | Molecular Imprints, Inc. | System and method for dispensing liquids |
US6900881B2 (en) | 2002-07-11 | 2005-05-31 | Molecular Imprints, Inc. | Step and repeat imprint lithography systems |
US7077992B2 (en) * | 2002-07-11 | 2006-07-18 | Molecular Imprints, Inc. | Step and repeat imprint lithography processes |
US6908861B2 (en) | 2002-07-11 | 2005-06-21 | Molecular Imprints, Inc. | Method for imprint lithography using an electric field |
US7442336B2 (en) * | 2003-08-21 | 2008-10-28 | Molecular Imprints, Inc. | Capillary imprinting technique |
US6932934B2 (en) | 2002-07-11 | 2005-08-23 | Molecular Imprints, Inc. | Formation of discontinuous films during an imprint lithography process |
US7019819B2 (en) * | 2002-11-13 | 2006-03-28 | Molecular Imprints, Inc. | Chucking system for modulating shapes of substrates |
US6916584B2 (en) | 2002-08-01 | 2005-07-12 | Molecular Imprints, Inc. | Alignment methods for imprint lithography |
US7071088B2 (en) * | 2002-08-23 | 2006-07-04 | Molecular Imprints, Inc. | Method for fabricating bulbous-shaped vias |
US6936194B2 (en) | 2002-09-05 | 2005-08-30 | Molecular Imprints, Inc. | Functional patterning material for imprint lithography processes |
US20040065252A1 (en) * | 2002-10-04 | 2004-04-08 | Sreenivasan Sidlgata V. | Method of forming a layer on a substrate to facilitate fabrication of metrology standards |
US8349241B2 (en) * | 2002-10-04 | 2013-01-08 | Molecular Imprints, Inc. | Method to arrange features on a substrate to replicate features having minimal dimensional variability |
US6833325B2 (en) | 2002-10-11 | 2004-12-21 | Lam Research Corporation | Method for plasma etching performance enhancement |
US6980282B2 (en) | 2002-12-11 | 2005-12-27 | Molecular Imprints, Inc. | Method for modulating shapes of substrates |
US7750059B2 (en) | 2002-12-04 | 2010-07-06 | Hewlett-Packard Development Company, L.P. | Polymer solution for nanoimprint lithography to reduce imprint temperature and pressure |
US6871558B2 (en) * | 2002-12-12 | 2005-03-29 | Molecular Imprints, Inc. | Method for determining characteristics of substrate employing fluid geometries |
US7113336B2 (en) | 2002-12-30 | 2006-09-26 | Ian Crosby | Microlens including wire-grid polarizer and methods of manufacture |
US6943117B2 (en) | 2003-03-27 | 2005-09-13 | Korea Institute Of Machinery & Materials | UV nanoimprint lithography process using elementwise embossed stamp and selectively additive pressurization |
TWI228638B (en) | 2003-06-10 | 2005-03-01 | Ind Tech Res Inst | Method for and apparatus for bonding patterned imprint to a substrate by adhering means |
US7790231B2 (en) * | 2003-07-10 | 2010-09-07 | Brewer Science Inc. | Automated process and apparatus for planarization of topographical surfaces |
US7090716B2 (en) | 2003-10-02 | 2006-08-15 | Molecular Imprints, Inc. | Single phase fluid imprint lithography method |
US20050106321A1 (en) * | 2003-11-14 | 2005-05-19 | Molecular Imprints, Inc. | Dispense geometery to achieve high-speed filling and throughput |
JP4322096B2 (ja) | 2003-11-14 | 2009-08-26 | Tdk株式会社 | レジストパターン形成方法並びに磁気記録媒体及び磁気ヘッドの製造方法 |
US20050189676A1 (en) | 2004-02-27 | 2005-09-01 | Molecular Imprints, Inc. | Full-wafer or large area imprinting with multiple separated sub-fields for high throughput lithography |
US20050276919A1 (en) | 2004-06-01 | 2005-12-15 | Molecular Imprints, Inc. | Method for dispensing a fluid on a substrate |
US20050270516A1 (en) | 2004-06-03 | 2005-12-08 | Molecular Imprints, Inc. | System for magnification and distortion correction during nano-scale manufacturing |
US7673775B2 (en) | 2004-06-25 | 2010-03-09 | Cristian Penciu | Apparatus for mixing and dispensing fluids |
US20060017876A1 (en) * | 2004-07-23 | 2006-01-26 | Molecular Imprints, Inc. | Displays and method for fabricating displays |
US7105452B2 (en) | 2004-08-13 | 2006-09-12 | Molecular Imprints, Inc. | Method of planarizing a semiconductor substrate with an etching chemistry |
US7547504B2 (en) * | 2004-09-21 | 2009-06-16 | Molecular Imprints, Inc. | Pattern reversal employing thick residual layers |
US7244386B2 (en) * | 2004-09-27 | 2007-07-17 | Molecular Imprints, Inc. | Method of compensating for a volumetric shrinkage of a material disposed upon a substrate to form a substantially planar structure therefrom |
US7357876B2 (en) * | 2004-12-01 | 2008-04-15 | Molecular Imprints, Inc. | Eliminating printability of sub-resolution defects in imprint lithography |
KR20070086766A (ko) * | 2004-12-01 | 2007-08-27 | 몰레큘러 임프린츠 인코퍼레이티드 | 임프린트 리소그래피 공정용 열관리를 위한 노출 방법 |
US7281919B2 (en) | 2004-12-07 | 2007-10-16 | Molecular Imprints, Inc. | System for controlling a volume of material on a mold |
US20060177532A1 (en) | 2005-02-04 | 2006-08-10 | Molecular Imprints, Inc. | Imprint lithography method to control extrusion of a liquid from a desired region on a substrate |
US20060177535A1 (en) | 2005-02-04 | 2006-08-10 | Molecular Imprints, Inc. | Imprint lithography template to facilitate control of liquid movement |
JP4787993B2 (ja) * | 2005-04-22 | 2011-10-05 | 株式会社日立製作所 | インプリント方式の転写印刷方法、および転写印刷版 |
US7316554B2 (en) * | 2005-09-21 | 2008-01-08 | Molecular Imprints, Inc. | System to control an atmosphere between a body and a substrate |
JP2007134368A (ja) * | 2005-11-08 | 2007-05-31 | Nikon Corp | パターン転写装置、露光装置及びパターン転写方法 |
US7803308B2 (en) | 2005-12-01 | 2010-09-28 | Molecular Imprints, Inc. | Technique for separating a mold from solidified imprinting material |
US7670529B2 (en) | 2005-12-08 | 2010-03-02 | Molecular Imprints, Inc. | Method and system for double-sided patterning of substrates |
US7670530B2 (en) | 2006-01-20 | 2010-03-02 | Molecular Imprints, Inc. | Patterning substrates employing multiple chucks |
US8142850B2 (en) | 2006-04-03 | 2012-03-27 | Molecular Imprints, Inc. | Patterning a plurality of fields on a substrate to compensate for differing evaporation times |
WO2007117524A2 (en) | 2006-04-03 | 2007-10-18 | Molecular Imprints, Inc. | Method of concurrently patterning a substrate having a plurality of fields and alignment marks |
US7802978B2 (en) | 2006-04-03 | 2010-09-28 | Molecular Imprints, Inc. | Imprinting of partial fields at the edge of the wafer |
US7547398B2 (en) | 2006-04-18 | 2009-06-16 | Molecular Imprints, Inc. | Self-aligned process for fabricating imprint templates containing variously etched features |
-
2005
- 2005-12-16 US US11/303,777 patent/US7906058B2/en active Active
-
2006
- 2006-09-22 EP EP11186734A patent/EP2413189A1/en not_active Withdrawn
- 2006-09-22 JP JP2008543272A patent/JP5236484B2/ja active Active
- 2006-09-22 KR KR1020087012782A patent/KR101340922B1/ko active IP Right Grant
- 2006-09-22 EP EP06804074A patent/EP1954472A4/en not_active Withdrawn
- 2006-09-22 WO PCT/US2006/037109 patent/WO2007064386A1/en active Application Filing
- 2006-09-22 KR KR1020137014437A patent/KR101375132B1/ko active IP Right Grant
- 2006-10-13 TW TW095137688A patent/TWI310730B/zh not_active IP Right Cessation
-
2012
- 2012-01-30 JP JP2012016219A patent/JP5543502B2/ja active Active
Patent Citations (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2124711A (en) * | 1937-06-25 | 1938-07-26 | George S Rowell | Method and apparatus for reproducing images on curved surfaces |
JPH09240125A (ja) * | 1996-03-04 | 1997-09-16 | Motorola Inc | 物品の面をスタンピングするための装置および方法 |
JP2001068411A (ja) * | 1999-07-28 | 2001-03-16 | Lucent Technol Inc | デバイス製作のためのリソグラフィ・プロセス |
JP2003517727A (ja) * | 1999-10-29 | 2003-05-27 | ボード・オブ・リージエンツ,ザ・ユニバーシテイ・オブ・テキサス・システム | インプリント・リソグラフィのための高精度方向付けアライメントデバイスおよびギャップ制御デバイス |
JP2001138482A (ja) * | 1999-11-17 | 2001-05-22 | Fujitsu Ltd | 立体構造物転写方法及びその装置 |
US20030017424A1 (en) * | 2001-07-18 | 2003-01-23 | Miri Park | Method and apparatus for fabricating complex grating structures |
JP2005527406A (ja) * | 2002-05-27 | 2005-09-15 | コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ | スタンプから基板にパターンを転写する方法及び装置 |
JP2005533393A (ja) * | 2002-07-11 | 2005-11-04 | モレキュラー・インプリンツ・インコーポレーテッド | インプリント・リソグラフィ・プロセスおよびシステム |
JP2006510223A (ja) * | 2002-12-13 | 2006-03-23 | モレキュラー・インプリンツ・インコーポレーテッド | 基板の面曲がりを使用する倍率補正 |
JP2004335012A (ja) * | 2003-05-09 | 2004-11-25 | Tdk Corp | インプリント装置およびインプリント方法 |
WO2005006076A2 (en) * | 2003-07-09 | 2005-01-20 | Molecular Imprints, Inc. | Systems for magnification and distortion correction for imprint lithography processes |
JP2007535121A (ja) * | 2003-07-09 | 2007-11-29 | モレキュラー・インプリンツ・インコーポレーテッド | インプリント・リソグラフィ・プロセスにおける倍率拡大及びゆがみを補正するためのシステム |
JP2005053214A (ja) * | 2003-07-22 | 2005-03-03 | Meiki Co Ltd | 樹脂成形品の成形装置および成形方法 |
JP2006326927A (ja) * | 2005-05-24 | 2006-12-07 | Hitachi High-Technologies Corp | インプリント装置、及び微細構造転写方法 |
JP2007083626A (ja) * | 2005-09-22 | 2007-04-05 | Ricoh Co Ltd | 微細構造転写装置 |
Cited By (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008098633A (ja) * | 2006-10-06 | 2008-04-24 | Asml Netherlands Bv | インプリントリソグラフィ |
KR20130009983A (ko) | 2010-03-29 | 2013-01-24 | 후지필름 가부시키가이샤 | 미세 요철 패턴의 형성 방법 및 형성 장치, 전사용 기판의 제조 방법, 및 전사용 기판 |
US9272462B2 (en) | 2010-03-29 | 2016-03-01 | Fujifilm Corporation | Minute convexo-concave pattern forming method and forming device, and transfer substrate producing method and transfer substrate |
JP2011210942A (ja) * | 2010-03-30 | 2011-10-20 | Fujifilm Corp | ナノインプリント方法およびモールド製造方法 |
JP2013532369A (ja) * | 2010-04-27 | 2013-08-15 | モレキュラー・インプリンツ・インコーポレーテッド | ナノインプリント・リソグラフィのテンプレート製作方法およびそのシステム |
US11020894B2 (en) | 2010-04-27 | 2021-06-01 | Molecular Imprints, Inc. | Safe separation for nano imprinting |
JP2015195409A (ja) * | 2010-04-27 | 2015-11-05 | モレキュラー・インプリンツ・インコーポレーテッド | ナノインプリント・リソグラフィのテンプレート製作方法およびそのシステム |
JP2012256680A (ja) * | 2011-06-08 | 2012-12-27 | Toshiba Corp | テンプレート、テンプレートの製造方法及びテンプレートの製造装置 |
US9541825B2 (en) | 2012-01-16 | 2017-01-10 | Canon Kabushiki Kaisha | Imprint apparatus and article manufacturing method |
US9910351B2 (en) | 2012-01-16 | 2018-03-06 | Canon Kabushiki Kaisha | Imprint apparatus and article manufacturing method |
JP2013162046A (ja) * | 2012-02-07 | 2013-08-19 | Canon Inc | インプリント装置及び物品の製造方法 |
US9798231B2 (en) | 2012-02-07 | 2017-10-24 | Canon Kabushiki Kaisha | Imprint apparatus and method of manufacturing article |
KR20140121869A (ko) | 2012-02-07 | 2014-10-16 | 캐논 가부시끼가이샤 | 임프린트 장치 및 물품의 제조 방법 |
US10018909B2 (en) | 2012-02-07 | 2018-07-10 | Canon Kabushiki Kaisha | Imprint apparatus and method of manufacturing article |
US10705422B2 (en) | 2012-02-07 | 2020-07-07 | Canon Kabushiki Kaisha | Imprint method |
JP2013162045A (ja) * | 2012-02-07 | 2013-08-19 | Canon Inc | インプリント装置及び物品の製造方法 |
JP2018503251A (ja) * | 2014-12-22 | 2018-02-01 | コーニンクレッカ フィリップス エヌ ヴェKoninklijke Philips N.V. | パターン化されたスタンプの製造方法、パターン化されたスタンプ及びインプリント方法 |
US11086217B2 (en) | 2014-12-22 | 2021-08-10 | Koninklijke Philips N.V. | Patterned stamp manufacturing method, patterned stamp and imprinting method |
JP2018531786A (ja) * | 2015-10-15 | 2018-11-01 | ボード・オブ・リージエンツ,ザ・ユニバーシテイ・オブ・テキサス・システム | 精密なナノスケール製造のための汎用性のある方法 |
JP7077223B2 (ja) | 2015-10-15 | 2022-05-30 | ボード オブ リージェンツ,ザ ユニバーシティ オブ テキサス システム | 精密なナノスケール製造のための汎用性のある方法 |
KR20230053678A (ko) | 2020-09-08 | 2023-04-21 | 캐논 가부시끼가이샤 | 성형 장치 및 물품의 제조 방법 |
Also Published As
Publication number | Publication date |
---|---|
EP2413189A1 (en) | 2012-02-01 |
US20070126150A1 (en) | 2007-06-07 |
JP2012094901A (ja) | 2012-05-17 |
TWI310730B (en) | 2009-06-11 |
JP5236484B2 (ja) | 2013-07-17 |
KR20130065741A (ko) | 2013-06-19 |
EP1954472A4 (en) | 2009-01-07 |
US7906058B2 (en) | 2011-03-15 |
TW200722273A (en) | 2007-06-16 |
JP5543502B2 (ja) | 2014-07-09 |
KR101375132B1 (ko) | 2014-03-17 |
EP1954472A1 (en) | 2008-08-13 |
KR101340922B1 (ko) | 2013-12-13 |
WO2007064386A1 (en) | 2007-06-07 |
KR20080071151A (ko) | 2008-08-01 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP5543502B2 (ja) | 固化したインプリンティング材料からモールドを分離する方法 | |
US7803308B2 (en) | Technique for separating a mold from solidified imprinting material | |
TWI327351B (en) | Method of retaining a substrate to a wafer chuck | |
JP5411557B2 (ja) | 微細構造転写装置 | |
JP4514754B2 (ja) | 毛管作用によるインプリント技術 | |
US9440254B2 (en) | Method and apparatus for applying a sheet to a substrate | |
JP6538695B2 (ja) | パーシャルフィールドインプリントのための非対称的なテンプレート形状の調節 | |
US8087922B2 (en) | Imprint lithography with improved substrate/mold separation | |
KR20130125307A (ko) | 임프린트 장치 및 물품 제조 방법 | |
JP2011528506A (ja) | ナノ−インプリント・リソグラフィのための内部空洞システム | |
TWI277504B (en) | Method of separating a mold from a solidified layer disposed on a substrate | |
JP2012532448A (ja) | 引っ込んだ支持特徴部を有するチャッキングシステム | |
KR102022745B1 (ko) | 임프린트 방법, 임프린트 장치, 몰드 및, 물품 제조 방법 | |
KR102518784B1 (ko) | 성형 장치 및 물품 제조 방법 | |
KR102602905B1 (ko) | 성형 장치 및 물품 제조 방법 | |
JP2019216196A (ja) | 成形装置及び物品の製造方法 | |
TW202314840A (zh) | 使表面成形的方法、成形系統、及製造物品的方法 | |
JP2023171283A (ja) | 平坦化プロセス、装置、及び物品製造方法 | |
CN117930591A (en) | Planarization system and planarization method | |
JP2021061328A (ja) | 型を用いて基板上の組成物を成形する成形装置、成形方法、及び、物品製造方法 | |
JP2021068849A (ja) | モールド、成形装置、および物品の製造方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20090924 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20110830 |
|
A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20111130 |
|
A602 | Written permission of extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A602 Effective date: 20111207 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20120130 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20120313 |
|
A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20120613 |
|
A602 | Written permission of extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A602 Effective date: 20120620 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20120813 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20130312 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20130327 |
|
R150 | Certificate of patent or registration of utility model |
Free format text: JAPANESE INTERMEDIATE CODE: R150 Ref document number: 5236484 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20160405 Year of fee payment: 3 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |