JP2009152566A5 - - Google Patents
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- Publication number
- JP2009152566A5 JP2009152566A5 JP2008294261A JP2008294261A JP2009152566A5 JP 2009152566 A5 JP2009152566 A5 JP 2009152566A5 JP 2008294261 A JP2008294261 A JP 2008294261A JP 2008294261 A JP2008294261 A JP 2008294261A JP 2009152566 A5 JP2009152566 A5 JP 2009152566A5
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor layer
- single crystal
- layer
- crystal semiconductor
- impurity
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 claims 41
- 239000013078 crystal Substances 0.000 claims 18
- 239000012535 impurity Substances 0.000 claims 18
- 239000007789 gas Substances 0.000 claims 16
- 239000000758 substrate Substances 0.000 claims 11
- 238000000034 method Methods 0.000 claims 10
- 150000002500 ions Chemical class 0.000 claims 9
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims 8
- 238000006243 chemical reaction Methods 0.000 claims 8
- 238000004519 manufacturing process Methods 0.000 claims 8
- 229910000077 silane Inorganic materials 0.000 claims 8
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims 4
- 238000005229 chemical vapour deposition Methods 0.000 claims 4
- 239000001257 hydrogen Substances 0.000 claims 3
- 229910052739 hydrogen Inorganic materials 0.000 claims 3
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Chemical compound P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 claims 2
- 238000000926 separation method Methods 0.000 claims 2
- 230000015572 biosynthetic process Effects 0.000 claims 1
- 150000002431 hydrogen Chemical class 0.000 claims 1
- 229910000073 phosphorus hydride Inorganic materials 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2008294261A JP5248994B2 (ja) | 2007-11-30 | 2008-11-18 | 光電変換装置の製造方法 |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007310817 | 2007-11-30 | ||
| JP2007310817 | 2007-11-30 | ||
| JP2008294261A JP5248994B2 (ja) | 2007-11-30 | 2008-11-18 | 光電変換装置の製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2009152566A JP2009152566A (ja) | 2009-07-09 |
| JP2009152566A5 true JP2009152566A5 (enExample) | 2012-01-05 |
| JP5248994B2 JP5248994B2 (ja) | 2013-07-31 |
Family
ID=40459831
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2008294261A Expired - Fee Related JP5248994B2 (ja) | 2007-11-30 | 2008-11-18 | 光電変換装置の製造方法 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US7985604B2 (enExample) |
| EP (1) | EP2065946A2 (enExample) |
| JP (1) | JP5248994B2 (enExample) |
| KR (1) | KR101483417B1 (enExample) |
Families Citing this family (25)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5248995B2 (ja) * | 2007-11-30 | 2013-07-31 | 株式会社半導体エネルギー研究所 | 光電変換装置の製造方法 |
| EP2075850A3 (en) * | 2007-12-28 | 2011-08-24 | Semiconductor Energy Laboratory Co, Ltd. | Photoelectric conversion device and manufacturing method thereof |
| JP5572307B2 (ja) * | 2007-12-28 | 2014-08-13 | 株式会社半導体エネルギー研究所 | 光電変換装置の製造方法 |
| EP2243866A1 (en) * | 2008-01-16 | 2010-10-27 | National University Corporation Tokyo University of Agriculture and Technology | Process for producing laminate comprising al-based group iii nitride single crystal layer, laminate produced by the process, process for producing al-based group iii nitride single crystal substrate using the laminate, and aluminum nitride single crystal substrate |
| US8017429B2 (en) | 2008-02-19 | 2011-09-13 | Semiconductor Energy Laboratory Co., Ltd. | Method for manufacturing photoelectric conversion device |
| JP5654206B2 (ja) * | 2008-03-26 | 2015-01-14 | 株式会社半導体エネルギー研究所 | Soi基板の作製方法及び該soi基板を用いた半導体装置 |
| US8338218B2 (en) * | 2008-06-26 | 2012-12-25 | Semiconductor Energy Laboratory Co., Ltd. | Photoelectric conversion device module and manufacturing method of the photoelectric conversion device module |
| US7943414B2 (en) * | 2008-08-01 | 2011-05-17 | Semiconductor Energy Laboratory Co., Ltd. | Method for manufacturing SOI substrate |
| SG182208A1 (en) * | 2008-12-15 | 2012-07-30 | Semiconductor Energy Lab | Manufacturing method of soi substrate and manufacturing method of semiconductor device |
| JP5706670B2 (ja) | 2009-11-24 | 2015-04-22 | 株式会社半導体エネルギー研究所 | Soi基板の作製方法 |
| US8704083B2 (en) * | 2010-02-11 | 2014-04-22 | Semiconductor Energy Laboratory Co., Ltd. | Photoelectric conversion device and fabrication method thereof |
| KR101112494B1 (ko) * | 2010-03-17 | 2012-03-13 | 한국과학기술원 | 광기전력 장치의 제조 방법 |
| JP5755931B2 (ja) | 2010-04-28 | 2015-07-29 | 株式会社半導体エネルギー研究所 | 半導体膜の作製方法、電極の作製方法、2次電池の作製方法、および太陽電池の作製方法 |
| NO20100616A1 (no) * | 2010-04-28 | 2011-10-31 | Innotech Solar Asa | Fremgangsmate og anordning for a fjerne en defekt fra en solcelle |
| US8435804B2 (en) | 2010-12-29 | 2013-05-07 | Gtat Corporation | Method and apparatus for forming a thin lamina |
| US8173452B1 (en) * | 2010-12-29 | 2012-05-08 | Twin Creeks Technologies, Inc. | Method to form a device by constructing a support element on a thin semiconductor lamina |
| US8536448B2 (en) | 2010-12-29 | 2013-09-17 | Gtat Corporation | Zener diode within a diode structure providing shunt protection |
| EP2659521A4 (en) * | 2010-12-29 | 2015-05-13 | Gtat Corp | METHOD AND DEVICE FOR PRODUCING A THIN LAYER |
| US8268645B2 (en) | 2010-12-29 | 2012-09-18 | Twin Creeks Technologies, Inc. | Method and apparatus for forming a thin lamina |
| KR20130143100A (ko) * | 2010-12-29 | 2013-12-30 | 지티에이티 코포레이션 | 얇은 반도체 라미나 상에 지지 요소를 구성함으로써 장치를 형성하는 방법 |
| JP2013058562A (ja) | 2011-09-07 | 2013-03-28 | Semiconductor Energy Lab Co Ltd | 光電変換装置 |
| US8841161B2 (en) | 2012-02-05 | 2014-09-23 | GTAT.Corporation | Method for forming flexible solar cells |
| US8916954B2 (en) * | 2012-02-05 | 2014-12-23 | Gtat Corporation | Multi-layer metal support |
| US8785294B2 (en) | 2012-07-26 | 2014-07-22 | Gtat Corporation | Silicon carbide lamina |
| JP6459948B2 (ja) * | 2015-12-15 | 2019-01-30 | 株式会社Sumco | 半導体エピタキシャルウェーハの製造方法および固体撮像素子の製造方法 |
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| JP5459899B2 (ja) * | 2007-06-01 | 2014-04-02 | 株式会社半導体エネルギー研究所 | 半導体装置の作製方法 |
| KR101608953B1 (ko) * | 2007-11-09 | 2016-04-04 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 광전 변환 장치 및 그 제조 방법 |
| TWI452703B (zh) * | 2007-11-16 | 2014-09-11 | 半導體能源研究所股份有限公司 | 光電轉換裝置及其製造方法 |
| JP5248995B2 (ja) | 2007-11-30 | 2013-07-31 | 株式会社半導体エネルギー研究所 | 光電変換装置の製造方法 |
| JP5286046B2 (ja) * | 2007-11-30 | 2013-09-11 | 株式会社半導体エネルギー研究所 | 光電変換装置の製造方法 |
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2008
- 2008-11-18 JP JP2008294261A patent/JP5248994B2/ja not_active Expired - Fee Related
- 2008-11-26 US US12/324,065 patent/US7985604B2/en not_active Expired - Fee Related
- 2008-11-26 EP EP08020573A patent/EP2065946A2/en not_active Withdrawn
- 2008-11-28 KR KR20080119602A patent/KR101483417B1/ko not_active Expired - Fee Related