JP2010010667A5 - - Google Patents
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- Publication number
- JP2010010667A5 JP2010010667A5 JP2009125340A JP2009125340A JP2010010667A5 JP 2010010667 A5 JP2010010667 A5 JP 2010010667A5 JP 2009125340 A JP2009125340 A JP 2009125340A JP 2009125340 A JP2009125340 A JP 2009125340A JP 2010010667 A5 JP2010010667 A5 JP 2010010667A5
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor layer
- conductivity type
- impurity element
- crystal
- photoelectric conversion
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 claims 78
- 239000013078 crystal Substances 0.000 claims 18
- 239000012535 impurity Substances 0.000 claims 16
- 238000006243 chemical reaction Methods 0.000 claims 14
- 239000007789 gas Substances 0.000 claims 7
- 238000004519 manufacturing process Methods 0.000 claims 6
- 239000000758 substrate Substances 0.000 claims 6
- 238000000034 method Methods 0.000 claims 5
- 230000000149 penetrating effect Effects 0.000 claims 5
- 239000000463 material Substances 0.000 claims 3
- 238000010790 dilution Methods 0.000 claims 2
- 239000012895 dilution Substances 0.000 claims 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims 1
- 239000003085 diluting agent Substances 0.000 claims 1
- 239000001257 hydrogen Substances 0.000 claims 1
- 229910052739 hydrogen Inorganic materials 0.000 claims 1
- 239000012495 reaction gas Substances 0.000 claims 1
- 229910052990 silicon hydride Inorganic materials 0.000 claims 1
- FDNAPBUWERUEDA-UHFFFAOYSA-N silicon tetrachloride Chemical compound Cl[Si](Cl)(Cl)Cl FDNAPBUWERUEDA-UHFFFAOYSA-N 0.000 claims 1
- ABTOQLMXBSRXSM-UHFFFAOYSA-N silicon tetrafluoride Chemical compound F[Si](F)(F)F ABTOQLMXBSRXSM-UHFFFAOYSA-N 0.000 claims 1
- 230000003746 surface roughness Effects 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009125340A JP5667750B2 (ja) | 2008-05-30 | 2009-05-25 | 光電変換装置および光電変換装置の作製方法 |
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2008143277 | 2008-05-30 | ||
| JP2008143277 | 2008-05-30 | ||
| JP2008143301 | 2008-05-30 | ||
| JP2008143301 | 2008-05-30 | ||
| JP2009125340A JP5667750B2 (ja) | 2008-05-30 | 2009-05-25 | 光電変換装置および光電変換装置の作製方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2010010667A JP2010010667A (ja) | 2010-01-14 |
| JP2010010667A5 true JP2010010667A5 (enExample) | 2012-07-05 |
| JP5667750B2 JP5667750B2 (ja) | 2015-02-12 |
Family
ID=41378278
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2009125340A Expired - Fee Related JP5667750B2 (ja) | 2008-05-30 | 2009-05-25 | 光電変換装置および光電変換装置の作製方法 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US20090293954A1 (enExample) |
| JP (1) | JP5667750B2 (enExample) |
| KR (1) | KR101560174B1 (enExample) |
| CN (1) | CN101593778B (enExample) |
| TW (1) | TWI464890B (enExample) |
Families Citing this family (25)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7888167B2 (en) * | 2008-04-25 | 2011-02-15 | Semiconductor Energy Laboratory Co., Ltd. | Photoelectric conversion device and method for manufacturing the same |
| JP5377061B2 (ja) * | 2008-05-09 | 2013-12-25 | 株式会社半導体エネルギー研究所 | 光電変換装置 |
| EP2256762A1 (en) * | 2009-05-27 | 2010-12-01 | Honeywell International Inc. | Improved hole transfer polymer solar cell |
| JP4802286B2 (ja) * | 2009-08-28 | 2011-10-26 | 富士フイルム株式会社 | 光電変換素子及び撮像素子 |
| TWI399337B (zh) * | 2009-12-21 | 2013-06-21 | Univ Nat Cheng Kung | 奈米感測器之製造方法 |
| TWI401812B (zh) * | 2009-12-31 | 2013-07-11 | Metal Ind Res Anddevelopment Ct | Solar battery |
| FR2955702B1 (fr) * | 2010-01-27 | 2012-01-27 | Commissariat Energie Atomique | Cellule photovoltaique comprenant un film mince de passivation en oxyde cristallin de silicium et procede de realisation |
| DE102010006314A1 (de) * | 2010-01-29 | 2011-08-04 | EWE-Forschungszentrum für Energietechnologie e. V., 26129 | Photovoltaische Mehrfach-Dünnschichtsolarzelle |
| US8704083B2 (en) * | 2010-02-11 | 2014-04-22 | Semiconductor Energy Laboratory Co., Ltd. | Photoelectric conversion device and fabrication method thereof |
| US9537043B2 (en) | 2010-04-23 | 2017-01-03 | Semiconductor Energy Laboratory Co., Ltd. | Photoelectric conversion device and manufacturing method thereof |
| JP5714972B2 (ja) | 2010-05-07 | 2015-05-07 | 株式会社半導体エネルギー研究所 | 光電変換装置 |
| JP5783796B2 (ja) | 2010-05-26 | 2015-09-24 | 株式会社半導体エネルギー研究所 | 光電変換装置 |
| JP2012009816A (ja) * | 2010-05-28 | 2012-01-12 | Casio Comput Co Ltd | 半導体装置およびその製造方法 |
| JP2012015491A (ja) | 2010-06-04 | 2012-01-19 | Semiconductor Energy Lab Co Ltd | 光電変換装置 |
| US9076909B2 (en) * | 2010-06-18 | 2015-07-07 | Semiconductor Energy Laboratory Co., Ltd. | Photoelectric conversion device and method for manufacturing the same |
| JP5894379B2 (ja) * | 2010-06-18 | 2016-03-30 | 株式会社半導体エネルギー研究所 | 光電変換装置 |
| JP2012023343A (ja) * | 2010-06-18 | 2012-02-02 | Semiconductor Energy Lab Co Ltd | 光電変換装置及びその作製方法 |
| EP2593970B1 (en) * | 2010-07-13 | 2017-05-24 | Philips Lighting Holding B.V. | Converter material for luminescent solar concentrators |
| JP5719846B2 (ja) * | 2010-07-28 | 2015-05-20 | 株式会社カネカ | 薄膜太陽電池用透明電極、それを用いた薄膜太陽電池用透明電極付き基板および薄膜太陽電池、ならびに薄膜太陽電池用透明電極の製造方法 |
| JP5866768B2 (ja) * | 2011-02-16 | 2016-02-17 | セイコーエプソン株式会社 | 光電変換装置、電子機器 |
| CN102856419A (zh) * | 2012-08-16 | 2013-01-02 | 常州天合光能有限公司 | 叠层硅基异质结太阳能电池 |
| KR101361476B1 (ko) | 2013-06-04 | 2014-02-21 | 충남대학교산학협력단 | 태양전지 제조 방법 |
| US20150093889A1 (en) * | 2013-10-02 | 2015-04-02 | Intermolecular | Methods for removing a native oxide layer from germanium susbtrates in the fabrication of integrated circuits |
| CN105392089A (zh) * | 2015-12-03 | 2016-03-09 | 瑞声声学科技(深圳)有限公司 | 复合层结构及其制造方法 |
| US10854646B2 (en) | 2018-10-19 | 2020-12-01 | Attollo Engineering, LLC | PIN photodetector |
Family Cites Families (37)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS56122123A (en) * | 1980-03-03 | 1981-09-25 | Shunpei Yamazaki | Semiamorphous semiconductor |
| JPS57160174A (en) * | 1981-03-30 | 1982-10-02 | Hitachi Ltd | Thin film solar battery |
| US4528065A (en) * | 1982-11-24 | 1985-07-09 | Semiconductor Energy Laboratory Co., Ltd. | Photoelectric conversion device and its manufacturing method |
| JPS61231771A (ja) * | 1985-04-05 | 1986-10-16 | Semiconductor Energy Lab Co Ltd | 半導体装置の作製方法 |
| JP3250573B2 (ja) * | 1992-12-28 | 2002-01-28 | キヤノン株式会社 | 光起電力素子及びその製造方法、並びに発電システム |
| JPH06291345A (ja) * | 1993-04-02 | 1994-10-18 | Toray Ind Inc | 光起電力素子 |
| DE4315959C2 (de) * | 1993-05-12 | 1997-09-11 | Max Planck Gesellschaft | Verfahren zur Herstellung einer strukturierten Schicht eines Halbleitermaterials sowie einer Dotierungsstruktur in einem Halbleitermaterial unter Einwirkung von Laserstrahlung |
| JP2699867B2 (ja) * | 1994-04-28 | 1998-01-19 | 株式会社日立製作所 | 薄膜太陽電池とその製造方法 |
| US5677236A (en) * | 1995-02-24 | 1997-10-14 | Mitsui Toatsu Chemicals, Inc. | Process for forming a thin microcrystalline silicon semiconductor film |
| JPH1093122A (ja) * | 1996-09-10 | 1998-04-10 | Nippon Telegr & Teleph Corp <Ntt> | 薄膜太陽電池の製造方法 |
| JP3679561B2 (ja) * | 1996-09-19 | 2005-08-03 | キヤノン株式会社 | 光電変換素子 |
| US6177711B1 (en) * | 1996-09-19 | 2001-01-23 | Canon Kabushiki Kaisha | Photoelectric conversion element |
| JPH10335683A (ja) * | 1997-05-28 | 1998-12-18 | Ion Kogaku Kenkyusho:Kk | タンデム型太陽電池およびその製造方法 |
| JPH1140832A (ja) * | 1997-07-17 | 1999-02-12 | Ion Kogaku Kenkyusho:Kk | 薄膜太陽電池およびその製造方法 |
| JPH1187742A (ja) * | 1997-09-01 | 1999-03-30 | Kanegafuchi Chem Ind Co Ltd | シリコン系薄膜光電変換装置 |
| US6287888B1 (en) * | 1997-12-26 | 2001-09-11 | Semiconductor Energy Laboratory Co., Ltd. | Photoelectric conversion device and process for producing photoelectric conversion device |
| JP4293385B2 (ja) * | 1998-01-27 | 2009-07-08 | 株式会社半導体エネルギー研究所 | 光電変換装置の作製方法 |
| JPH11317538A (ja) * | 1998-02-17 | 1999-11-16 | Canon Inc | 光導電性薄膜および光起電力素子 |
| US6303945B1 (en) * | 1998-03-16 | 2001-10-16 | Canon Kabushiki Kaisha | Semiconductor element having microcrystalline semiconductor material |
| EP0994515B1 (en) * | 1998-10-12 | 2007-08-22 | Kaneka Corporation | Method of manufacturing silicon-based thin-film photoelectric conversion device |
| US6472248B2 (en) * | 1999-07-04 | 2002-10-29 | Canon Kabushiki Kaisha | Microcrystalline series photovoltaic element and process for fabrication of same |
| JP2001028453A (ja) * | 1999-07-14 | 2001-01-30 | Canon Inc | 光起電力素子及びその製造方法、建築材料並びに発電装置 |
| JP2002348198A (ja) * | 2001-05-28 | 2002-12-04 | Nissin Electric Co Ltd | 半導体素子エピタキシャル成長用基板及びその製造方法 |
| JP2004095881A (ja) * | 2002-08-30 | 2004-03-25 | Toppan Printing Co Ltd | 薄膜太陽電池 |
| JP4240984B2 (ja) | 2002-10-08 | 2009-03-18 | 三洋電機株式会社 | 光電変換装置 |
| JP2005050905A (ja) * | 2003-07-30 | 2005-02-24 | Sharp Corp | シリコン薄膜太陽電池の製造方法 |
| KR100669270B1 (ko) * | 2003-08-25 | 2007-01-16 | 도시바 마쯔시따 디스플레이 테크놀로지 컴퍼니, 리미티드 | 표시 장치 및 광전 변환 소자 |
| JPWO2005109526A1 (ja) * | 2004-05-12 | 2008-03-21 | 株式会社カネカ | 薄膜光電変換装置 |
| TWI296859B (en) * | 2006-01-25 | 2008-05-11 | Neo Solar Power Corp | Photovoltaic device, photovoltaic element and substrate and manufacturing method thereof |
| US7863157B2 (en) * | 2006-03-17 | 2011-01-04 | Silicon Genesis Corporation | Method and structure for fabricating solar cells using a layer transfer process |
| US20070277875A1 (en) * | 2006-05-31 | 2007-12-06 | Kishor Purushottam Gadkaree | Thin film photovoltaic structure |
| US7501305B2 (en) * | 2006-10-23 | 2009-03-10 | Canon Kabushiki Kaisha | Method for forming deposited film and photovoltaic element |
| JP2008112847A (ja) * | 2006-10-30 | 2008-05-15 | Shin Etsu Chem Co Ltd | 単結晶シリコン太陽電池の製造方法及び単結晶シリコン太陽電池 |
| US8207010B2 (en) * | 2007-06-05 | 2012-06-26 | Semiconductor Energy Laboratory Co., Ltd. | Method for manufacturing photoelectric conversion device |
| JP5248995B2 (ja) * | 2007-11-30 | 2013-07-31 | 株式会社半導体エネルギー研究所 | 光電変換装置の製造方法 |
| US7888167B2 (en) * | 2008-04-25 | 2011-02-15 | Semiconductor Energy Laboratory Co., Ltd. | Photoelectric conversion device and method for manufacturing the same |
| JP5377061B2 (ja) * | 2008-05-09 | 2013-12-25 | 株式会社半導体エネルギー研究所 | 光電変換装置 |
-
2009
- 2009-05-08 US US12/437,954 patent/US20090293954A1/en not_active Abandoned
- 2009-05-19 TW TW098116552A patent/TWI464890B/zh not_active IP Right Cessation
- 2009-05-20 CN CN2009102038572A patent/CN101593778B/zh not_active Expired - Fee Related
- 2009-05-25 JP JP2009125340A patent/JP5667750B2/ja not_active Expired - Fee Related
- 2009-05-29 KR KR1020090047279A patent/KR101560174B1/ko not_active Expired - Fee Related