JP2009010356A5 - - Google Patents

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Publication number
JP2009010356A5
JP2009010356A5 JP2008137405A JP2008137405A JP2009010356A5 JP 2009010356 A5 JP2009010356 A5 JP 2009010356A5 JP 2008137405 A JP2008137405 A JP 2008137405A JP 2008137405 A JP2008137405 A JP 2008137405A JP 2009010356 A5 JP2009010356 A5 JP 2009010356A5
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JP
Japan
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semiconductor
layer
halogen element
semiconductor layer
manufacturing
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JP2008137405A
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Japanese (ja)
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JP5305737B2 (ja
JP2009010356A (ja
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Publication of JP2009010356A5 publication Critical patent/JP2009010356A5/ja
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JP2008137405A 2007-05-31 2008-05-27 半導体装置 Active JP5305737B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2008137405A JP5305737B2 (ja) 2007-05-31 2008-05-27 半導体装置

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2007144360 2007-05-31
JP2007144360 2007-05-31
JP2008137405A JP5305737B2 (ja) 2007-05-31 2008-05-27 半導体装置

Related Child Applications (1)

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JP2013132333A Division JP5745723B2 (ja) 2007-05-31 2013-06-25 半導体装置

Publications (3)

Publication Number Publication Date
JP2009010356A JP2009010356A (ja) 2009-01-15
JP2009010356A5 true JP2009010356A5 (enExample) 2011-04-21
JP5305737B2 JP5305737B2 (ja) 2013-10-02

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JP2008137405A Active JP5305737B2 (ja) 2007-05-31 2008-05-27 半導体装置
JP2013132333A Expired - Fee Related JP5745723B2 (ja) 2007-05-31 2013-06-25 半導体装置

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US (2) US7897482B2 (enExample)
JP (2) JP5305737B2 (enExample)
KR (2) KR101442523B1 (enExample)

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