JP2016512651A5 - - Google Patents
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- Publication number
- JP2016512651A5 JP2016512651A5 JP2016500984A JP2016500984A JP2016512651A5 JP 2016512651 A5 JP2016512651 A5 JP 2016512651A5 JP 2016500984 A JP2016500984 A JP 2016500984A JP 2016500984 A JP2016500984 A JP 2016500984A JP 2016512651 A5 JP2016512651 A5 JP 2016512651A5
- Authority
- JP
- Japan
- Prior art keywords
- inorganic
- layer
- oled device
- oled
- layers
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 claims description 6
- 239000010410 layer Substances 0.000 claims 31
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims 4
- 238000002347 injection Methods 0.000 claims 4
- 239000007924 injection Substances 0.000 claims 4
- 239000001301 oxygen Substances 0.000 claims 4
- 229910052760 oxygen Inorganic materials 0.000 claims 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 3
- 239000007789 gas Substances 0.000 claims 3
- 229910052710 silicon Inorganic materials 0.000 claims 3
- 239000010703 silicon Substances 0.000 claims 3
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical class N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims 3
- MWUXSHHQAYIFBG-UHFFFAOYSA-N Nitric oxide Chemical compound O=[N] MWUXSHHQAYIFBG-UHFFFAOYSA-N 0.000 claims 2
- GQPLMRYTRLFLPF-UHFFFAOYSA-N Nitrous Oxide Chemical compound [O-][N+]#N GQPLMRYTRLFLPF-UHFFFAOYSA-N 0.000 claims 2
- 229910052581 Si3N4 Inorganic materials 0.000 claims 2
- 230000005540 biological transmission Effects 0.000 claims 2
- 230000005525 hole transport Effects 0.000 claims 2
- 229910052809 inorganic oxide Inorganic materials 0.000 claims 2
- 150000004767 nitrides Chemical class 0.000 claims 2
- 239000012044 organic layer Substances 0.000 claims 2
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 claims 2
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical compound [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 claims 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims 2
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 claims 1
- 238000005538 encapsulation Methods 0.000 claims 1
- 239000001272 nitrous oxide Substances 0.000 claims 1
- 230000008021 deposition Effects 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 1
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 description 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201361778067P | 2013-03-12 | 2013-03-12 | |
| US61/778,067 | 2013-03-12 | ||
| PCT/US2014/022498 WO2014164465A1 (en) | 2013-03-12 | 2014-03-10 | Improvement of barrier film performance with n2o dilution process for thin film encapsulation |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2016512651A JP2016512651A (ja) | 2016-04-28 |
| JP2016512651A5 true JP2016512651A5 (enExample) | 2016-10-06 |
| JP6312791B2 JP6312791B2 (ja) | 2018-04-18 |
Family
ID=51523573
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2016500984A Active JP6312791B2 (ja) | 2013-03-12 | 2014-03-10 | 薄膜封止用ｎ２ｏ希釈プロセスによるバリア膜性能の向上 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US9269923B2 (enExample) |
| JP (1) | JP6312791B2 (enExample) |
| KR (2) | KR102057176B1 (enExample) |
| CN (1) | CN105190932A (enExample) |
| TW (1) | TWI578592B (enExample) |
| WO (1) | WO2014164465A1 (enExample) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2016167226A1 (ja) * | 2015-04-17 | 2016-10-20 | シャープ株式会社 | Ｅｌ表示装置及びｅｌ表示装置の製造方法 |
| KR102364708B1 (ko) * | 2017-07-12 | 2022-02-21 | 삼성디스플레이 주식회사 | 표시 장치의 제조 방법 |
| CN108305954B (zh) * | 2018-01-24 | 2020-07-31 | 武汉华星光电半导体显示技术有限公司 | Oled器件的薄膜封装方法及oled器件 |
| GB201806865D0 (en) * | 2018-04-26 | 2018-06-13 | Spts Technologies Ltd | Method of depositing a SiN film |
| US11038153B2 (en) * | 2019-01-15 | 2021-06-15 | Applied Materials, Inc. | Methods for HMDSO thermal stability |
| CN118251042A (zh) * | 2019-04-25 | 2024-06-25 | 应用材料公司 | 具有低折射率和低水蒸气穿透率的湿气阻挡膜 |
| CN113053941B (zh) * | 2019-12-27 | 2025-05-27 | 中芯国际集成电路制造(上海)有限公司 | 半导体结构及其形成方法 |
| KR102741002B1 (ko) | 2020-04-29 | 2024-12-12 | 삼성디스플레이 주식회사 | 유기발광 디스플레이 장치 및 그 제조방법 |
| US11987884B2 (en) | 2021-04-15 | 2024-05-21 | Jnk Tech | Glass and wafer inspection system and a method of use thereof |
| US11508590B2 (en) * | 2021-04-15 | 2022-11-22 | Jnk Tech | Substrate inspection system and method of use thereof |
| CN115623811A (zh) * | 2022-11-10 | 2023-01-17 | 中山大学 | 一种柔性oled面板的封装方法及封装结构 |
Family Cites Families (25)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004039468A (ja) * | 2002-07-04 | 2004-02-05 | Tdk Corp | 有機ｅｌカラーディスプレイ |
| CN102281659B (zh) * | 2002-12-26 | 2014-06-04 | 株式会社半导体能源研究所 | 发光装置和制造发光装置的方法 |
| US20060110580A1 (en) * | 2003-04-28 | 2006-05-25 | Aylward Peter T | Article comprising conductive conduit channels |
| US7371452B2 (en) | 2003-04-28 | 2008-05-13 | Eastman Kodak Company | Conductive patterned sheet utilizing multi-layered conductive conduit channels |
| KR100563057B1 (ko) | 2003-11-14 | 2006-03-24 | 삼성에스디아이 주식회사 | 초박형 유기 전계 발광 표시장치 및 그 제조방법 |
| US7060961B2 (en) * | 2003-12-12 | 2006-06-13 | Canon Kabushiki Kaisha | Image sensing element and optical instrument having improved incident light use efficiency |
| US7220687B2 (en) * | 2004-06-25 | 2007-05-22 | Applied Materials, Inc. | Method to improve water-barrier performance by changing film surface morphology |
| JP2007038529A (ja) * | 2005-08-03 | 2007-02-15 | Konica Minolta Holdings Inc | ガスバリア性薄膜積層体、ガスバリア性樹脂基材および有機エレクトロルミネッセンスデバイス |
| JP2007220646A (ja) * | 2006-01-19 | 2007-08-30 | Toppan Printing Co Ltd | 有機エレクトロルミネッセンス素子 |
| KR100873082B1 (ko) * | 2007-05-30 | 2008-12-09 | 삼성모바일디스플레이주식회사 | 유기전계발광 표시 장치 및 그의 제조 방법 |
| TWI388078B (zh) * | 2008-01-30 | 2013-03-01 | 歐斯朗奧托半導體股份有限公司 | 電子組件之製造方法及電子組件 |
| KR20100126428A (ko) * | 2008-02-22 | 2010-12-01 | 코닌클리즈케 필립스 일렉트로닉스 엔.브이. | 양면형 유기 발광 다이오드(ｏｌｅｄ) |
| JP5024220B2 (ja) * | 2008-07-24 | 2012-09-12 | セイコーエプソン株式会社 | 有機エレクトロルミネッセンス装置、有機エレクトロルミネッセンス装置の製造方法、電子機器 |
| US8487299B2 (en) * | 2008-09-26 | 2013-07-16 | Sharp Kabushiki Kaisha | Organic EL device and method of manufacturing same |
| KR101560234B1 (ko) | 2009-06-29 | 2015-10-15 | 엘지디스플레이 주식회사 | 유기전계발광 표시장치 및 그 제조방법 |
| JP2011210544A (ja) * | 2010-03-30 | 2011-10-20 | Canon Inc | 有機発光装置及びその製造方法 |
| JP5673927B2 (ja) * | 2010-10-08 | 2015-02-18 | 住友化学株式会社 | 積層フィルム |
| US9603268B2 (en) * | 2010-11-19 | 2017-03-21 | Konica Minolta, Inc. | Gas barrier film, method of producing a gas barrier film, and electronic device |
| US8329575B2 (en) * | 2010-12-22 | 2012-12-11 | Applied Materials, Inc. | Fabrication of through-silicon vias on silicon wafers |
| CN103348502B (zh) * | 2011-02-08 | 2016-01-27 | 应用材料公司 | 有机发光二极管的混合式封装方法 |
| KR20120109083A (ko) * | 2011-03-24 | 2012-10-08 | 삼성디스플레이 주식회사 | 유기 발광 표시 장치 및 유기 발광 표시 장치의 제조 방법 |
| JP2012216452A (ja) * | 2011-04-01 | 2012-11-08 | Hitachi High-Technologies Corp | 光半導体装置およびその製造方法 |
| JP2013022820A (ja) * | 2011-07-20 | 2013-02-04 | Nitto Denko Corp | 透明ガスバリアフィルム、透明ガスバリアフィルムの製造方法、有機エレクトロルミネッセンス素子、太陽電池および薄膜電池 |
| KR101901832B1 (ko) * | 2011-12-14 | 2018-09-28 | 삼성디스플레이 주식회사 | 유기 발광 표시 장치 및 유기 발광 표시 장치의 제조 방법 |
| US8735255B2 (en) * | 2012-05-01 | 2014-05-27 | Taiwan Semiconductor Manufacturing Company, Ltd. | Method of manufacturing semiconductor device |
-
2014
- 2014-03-05 TW TW103107322A patent/TWI578592B/zh active
- 2014-03-10 KR KR1020177032410A patent/KR102057176B1/ko active Active
- 2014-03-10 KR KR1020157027762A patent/KR20150131098A/ko not_active Ceased
- 2014-03-10 JP JP2016500984A patent/JP6312791B2/ja active Active
- 2014-03-10 CN CN201480014618.1A patent/CN105190932A/zh active Pending
- 2014-03-10 WO PCT/US2014/022498 patent/WO2014164465A1/en not_active Ceased
- 2014-03-10 US US14/203,419 patent/US9269923B2/en active Active
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