JP2008510676A - 石英ガラスの被覆部材および前記部材の製造方法 - Google Patents
石英ガラスの被覆部材および前記部材の製造方法 Download PDFInfo
- Publication number
- JP2008510676A JP2008510676A JP2007528725A JP2007528725A JP2008510676A JP 2008510676 A JP2008510676 A JP 2008510676A JP 2007528725 A JP2007528725 A JP 2007528725A JP 2007528725 A JP2007528725 A JP 2007528725A JP 2008510676 A JP2008510676 A JP 2008510676A
- Authority
- JP
- Japan
- Prior art keywords
- silicon dioxide
- quartz glass
- slip layer
- glass
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims abstract description 345
- 238000000034 method Methods 0.000 title claims abstract description 58
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 30
- 235000012239 silicon dioxide Nutrition 0.000 claims abstract description 116
- 239000000377 silicon dioxide Substances 0.000 claims abstract description 113
- 239000002245 particle Substances 0.000 claims abstract description 74
- 239000011521 glass Substances 0.000 claims abstract description 68
- 239000000758 substrate Substances 0.000 claims abstract description 37
- 239000000463 material Substances 0.000 claims description 69
- 238000005245 sintering Methods 0.000 claims description 25
- 239000001257 hydrogen Substances 0.000 claims description 20
- 229910052739 hydrogen Inorganic materials 0.000 claims description 20
- 239000008187 granular material Substances 0.000 claims description 19
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 18
- 238000010438 heat treatment Methods 0.000 claims description 17
- 238000001035 drying Methods 0.000 claims description 16
- 230000003746 surface roughness Effects 0.000 claims description 15
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 14
- 229910021486 amorphous silicon dioxide Inorganic materials 0.000 claims description 13
- 230000008569 process Effects 0.000 claims description 13
- 239000000126 substance Substances 0.000 claims description 10
- 239000012535 impurity Substances 0.000 claims description 7
- 229910052757 nitrogen Inorganic materials 0.000 claims description 7
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 6
- 239000007788 liquid Substances 0.000 claims description 6
- 230000003287 optical effect Effects 0.000 claims description 6
- 229910052727 yttrium Inorganic materials 0.000 claims description 6
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 claims description 6
- 229910052782 aluminium Inorganic materials 0.000 claims description 5
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 5
- 229910052799 carbon Inorganic materials 0.000 claims description 5
- 238000001238 wet grinding Methods 0.000 claims description 5
- 239000011248 coating agent Substances 0.000 claims description 4
- 238000000576 coating method Methods 0.000 claims description 4
- 150000001875 compounds Chemical class 0.000 claims description 4
- 238000005266 casting Methods 0.000 claims description 3
- 239000010453 quartz Substances 0.000 claims description 3
- 238000007569 slipcasting Methods 0.000 claims description 3
- 238000004512 die casting Methods 0.000 claims description 2
- 239000004065 semiconductor Substances 0.000 abstract description 15
- 239000010410 layer Substances 0.000 description 124
- 238000004017 vitrification Methods 0.000 description 36
- 238000005530 etching Methods 0.000 description 9
- 239000000203 mixture Substances 0.000 description 8
- 238000009826 distribution Methods 0.000 description 7
- 239000007787 solid Substances 0.000 description 7
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 6
- 230000009471 action Effects 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 6
- 239000002344 surface layer Substances 0.000 description 6
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- 238000005498 polishing Methods 0.000 description 5
- 239000002994 raw material Substances 0.000 description 5
- 239000007858 starting material Substances 0.000 description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- 239000011324 bead Substances 0.000 description 4
- 238000004140 cleaning Methods 0.000 description 4
- 238000001816 cooling Methods 0.000 description 4
- 238000007598 dipping method Methods 0.000 description 4
- 230000003993 interaction Effects 0.000 description 4
- 239000000843 powder Substances 0.000 description 4
- 238000002360 preparation method Methods 0.000 description 4
- 238000010298 pulverizing process Methods 0.000 description 4
- 239000011265 semifinished product Substances 0.000 description 4
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical compound [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 4
- 230000008719 thickening Effects 0.000 description 4
- 238000007740 vapor deposition Methods 0.000 description 4
- 238000011109 contamination Methods 0.000 description 3
- 229910052906 cristobalite Inorganic materials 0.000 description 3
- 230000008014 freezing Effects 0.000 description 3
- 238000007710 freezing Methods 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 239000000155 melt Substances 0.000 description 3
- 239000002243 precursor Substances 0.000 description 3
- 230000002829 reductive effect Effects 0.000 description 3
- 238000007788 roughening Methods 0.000 description 3
- 230000035939 shock Effects 0.000 description 3
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 229910002092 carbon dioxide Inorganic materials 0.000 description 2
- 239000001569 carbon dioxide Substances 0.000 description 2
- 238000003486 chemical etching Methods 0.000 description 2
- 238000005336 cracking Methods 0.000 description 2
- 238000002425 crystallisation Methods 0.000 description 2
- 230000008025 crystallization Effects 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 238000000280 densification Methods 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- 239000011737 fluorine Substances 0.000 description 2
- 238000000227 grinding Methods 0.000 description 2
- 239000001307 helium Substances 0.000 description 2
- 229910052734 helium Inorganic materials 0.000 description 2
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 2
- 150000002431 hydrogen Chemical class 0.000 description 2
- 230000007062 hydrolysis Effects 0.000 description 2
- 238000006460 hydrolysis reaction Methods 0.000 description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- 239000012212 insulator Substances 0.000 description 2
- 239000007791 liquid phase Substances 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- 230000036961 partial effect Effects 0.000 description 2
- 239000004033 plastic Substances 0.000 description 2
- 230000001737 promoting effect Effects 0.000 description 2
- 238000005488 sandblasting Methods 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- -1 CHF 3 or CF 4 Chemical compound 0.000 description 1
- 238000007605 air drying Methods 0.000 description 1
- 239000008346 aqueous phase Substances 0.000 description 1
- 239000007900 aqueous suspension Substances 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 238000005422 blasting Methods 0.000 description 1
- 235000011089 carbon dioxide Nutrition 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000005660 chlorination reaction Methods 0.000 description 1
- 239000011362 coarse particle Substances 0.000 description 1
- 238000004040 coloring Methods 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 238000012937 correction Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 238000007606 doctor blade method Methods 0.000 description 1
- 238000001312 dry etching Methods 0.000 description 1
- 238000007590 electrostatic spraying Methods 0.000 description 1
- 230000003628 erosive effect Effects 0.000 description 1
- 238000004880 explosion Methods 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 238000007730 finishing process Methods 0.000 description 1
- 239000006260 foam Substances 0.000 description 1
- 238000004108 freeze drying Methods 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 239000003966 growth inhibitor Substances 0.000 description 1
- 238000002329 infrared spectrum Methods 0.000 description 1
- 230000000977 initiatory effect Effects 0.000 description 1
- 230000000670 limiting effect Effects 0.000 description 1
- 238000011068 loading method Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 235000013372 meat Nutrition 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 238000003801 milling Methods 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- SIWVEOZUMHYXCS-UHFFFAOYSA-N oxo(oxoyttriooxy)yttrium Chemical compound O=[Y]O[Y]=O SIWVEOZUMHYXCS-UHFFFAOYSA-N 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000013618 particulate matter Substances 0.000 description 1
- 235000011837 pasties Nutrition 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 239000011505 plaster Substances 0.000 description 1
- 230000002028 premature Effects 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 238000010008 shearing Methods 0.000 description 1
- 150000003377 silicon compounds Chemical class 0.000 description 1
- 238000003980 solgel method Methods 0.000 description 1
- 238000007711 solidification Methods 0.000 description 1
- 230000008023 solidification Effects 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000003892 spreading Methods 0.000 description 1
- 230000007480 spreading Effects 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000005728 strengthening Methods 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 230000008646 thermal stress Effects 0.000 description 1
- 230000010512 thermal transition Effects 0.000 description 1
- 239000002562 thickening agent Substances 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 238000013519 translation Methods 0.000 description 1
- 238000002211 ultraviolet spectrum Methods 0.000 description 1
- 238000005019 vapor deposition process Methods 0.000 description 1
- 238000001429 visible spectrum Methods 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
- C03C17/25—Oxides by deposition from the liquid phase
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/06—Other methods of shaping glass by sintering, e.g. by cold isostatic pressing of powders and subsequent sintering, by hot pressing of powders, by sintering slurries or dispersions not undergoing a liquid phase reaction
- C03B19/066—Other methods of shaping glass by sintering, e.g. by cold isostatic pressing of powders and subsequent sintering, by hot pressing of powders, by sintering slurries or dispersions not undergoing a liquid phase reaction for the production of quartz or fused silica articles
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/02—Surface treatment of glass, not in the form of fibres or filaments, by coating with glass
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/213—SiO2
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Geochemistry & Mineralogy (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Dispersion Chemistry (AREA)
- Glass Melting And Manufacturing (AREA)
- Glass Compositions (AREA)
- Surface Treatment Of Glass (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102004040833 | 2004-08-23 | ||
| DE102004052312A DE102004052312A1 (de) | 2004-08-23 | 2004-10-28 | Beschichtetes Bauteil aus Quarzglas sowie Verfahren zur Herstellung des Bauteils |
| PCT/EP2005/009073 WO2006021415A2 (de) | 2004-08-23 | 2005-08-23 | Beschichtetes bauteil aus quarzglas sowie verfahren zur herstellung des bauteils |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2008510676A true JP2008510676A (ja) | 2008-04-10 |
| JP2008510676A5 JP2008510676A5 (enExample) | 2011-01-27 |
Family
ID=35355640
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007528725A Pending JP2008510676A (ja) | 2004-08-23 | 2005-08-23 | 石英ガラスの被覆部材および前記部材の製造方法 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US20080075949A1 (enExample) |
| EP (2) | EP1789370B1 (enExample) |
| JP (1) | JP2008510676A (enExample) |
| DE (1) | DE102004052312A1 (enExample) |
| WO (1) | WO2006021415A2 (enExample) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009302547A (ja) * | 2008-06-13 | 2009-12-24 | Asm Internatl Nv | 改善された熱特性を具えた半導体処理装置およびその処理装置を提供する方法 |
| JP2010508232A (ja) * | 2006-11-06 | 2010-03-18 | ヘレウス・クアルツグラース・ゲゼルシャフト・ミット・ベシュレンクテル・ハフツング・ウント・コンパニー・コマンディット・ゲゼルシャフト | 不透明石英ガラスを製造するための方法及び半製品、並びにその半製品から製造される部材 |
| JP2010531799A (ja) * | 2007-06-30 | 2010-09-30 | ヘレウス クワルツグラス ゲーエムベーハー ウント コンパニー カーゲー | 不透明石英ガラスの基体と緻密封止層から複合体を製造する方法 |
| WO2020079975A1 (ja) | 2018-10-17 | 2020-04-23 | 信越石英株式会社 | 多層構造シリカガラス体の製造方法 |
Families Citing this family (25)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5050363B2 (ja) * | 2005-08-12 | 2012-10-17 | 株式会社Ｓｕｍｃｏ | 半導体シリコン基板用熱処理治具およびその製作方法 |
| JP2007261875A (ja) * | 2006-03-28 | 2007-10-11 | Tosoh Quartz Corp | 表面に粗面化層を形成した石英ガラス部材 |
| DE102006043738B4 (de) * | 2006-09-13 | 2008-10-16 | Heraeus Quarzglas Gmbh & Co. Kg | Bauteil aus Quarzglas zum Einsatz bei der Halbleiterfertigung und Verfahren zur Herstellung desselben |
| DE102006062166B4 (de) | 2006-12-22 | 2009-05-14 | Heraeus Quarzglas Gmbh & Co. Kg | Quarzglas-Bauteil mit Reflektorschicht sowie Verfahren zur Herstellung desselben |
| DE102007008696B3 (de) * | 2007-02-20 | 2008-10-02 | Heraeus Noblelight Gmbh | Infrarotstrahler mit opakem Reflektor und seine Herstellung |
| DE102007017004A1 (de) * | 2007-02-27 | 2008-08-28 | Heraeus Quarzglas Gmbh & Co. Kg | Optisches Bauteil aus synthetischem Quarzglas mit erhöhter Strahlenbeständigkeit, sowie Verfahren zur Herstellung des Bauteils |
| US7718559B2 (en) * | 2007-04-20 | 2010-05-18 | Applied Materials, Inc. | Erosion resistance enhanced quartz used in plasma etch chamber |
| DE102008049325B4 (de) * | 2008-09-29 | 2011-08-25 | Heraeus Quarzglas GmbH & Co. KG, 63450 | Verfahren zur Herstellung eines rohrförmigen Halbzeugs aus Quarzglas sowie Halbzeug aus Quarzglas |
| JP5402391B2 (ja) * | 2009-01-27 | 2014-01-29 | 信越化学工業株式会社 | 半導体用合成石英ガラス基板の加工方法 |
| KR20150041610A (ko) * | 2012-07-18 | 2015-04-16 | 호야 가부시키가이샤 | 유리 성형품 및 그 제조 방법, 광학 소자 블랭크, 그리고 광학 소자 및 그 제조 방법 |
| DE102012109930A1 (de) * | 2012-10-18 | 2014-04-24 | Heraeus Noblelight Gmbh | Strahlereinheit zur Erzeugung ultravioletter Strahlung sowie Verfahren zu deren Herstellung |
| SG11201508512PA (en) * | 2013-05-23 | 2015-12-30 | Applied Materials Inc | A coated liner assembly for a semiconductor processing chamber |
| US9296614B1 (en) * | 2014-11-12 | 2016-03-29 | Corning Incorporated | Substrate such as for use with carbon nanotubes |
| EP3173386B1 (de) * | 2015-11-25 | 2018-05-02 | Heraeus Quarzglas GmbH & Co. KG | Verfahren zur herstellung eines verbundkörpers aus hochkieselsäurehaltigem werkstoff |
| CN108698894A (zh) | 2015-12-18 | 2018-10-23 | 贺利氏石英玻璃有限两合公司 | 在多腔式烘箱中制备石英玻璃体 |
| WO2017103131A1 (de) | 2015-12-18 | 2017-06-22 | Heraeus Quarzglas Gmbh & Co. Kg | Verringern des erdalkalimetallgehalts von siliziumdioxidgranulat durch behandlung von kohlenstoffdotiertem siliziumdioxidgranulat bei hoher temperatur |
| TWI733723B (zh) | 2015-12-18 | 2021-07-21 | 德商何瑞斯廓格拉斯公司 | 不透明石英玻璃體的製備 |
| KR20180094087A (ko) | 2015-12-18 | 2018-08-22 | 헤래우스 크바르츠글라스 게엠베하 ＆ 컴파니 케이지 | 실리카 과립으로부터 실리카 유리 제품의 제조 |
| CN108698883A (zh) | 2015-12-18 | 2018-10-23 | 贺利氏石英玻璃有限两合公司 | 石英玻璃制备中的二氧化硅的喷雾造粒 |
| JP6940235B2 (ja) | 2015-12-18 | 2021-09-22 | ヘレウス クワルツグラス ゲーエムベーハー ウント コンパニー カーゲー | 高融点金属の溶融坩堝内での石英ガラス体の調製 |
| EP3390303B1 (de) | 2015-12-18 | 2024-02-07 | Heraeus Quarzglas GmbH & Co. KG | Herstellung von quarzglaskörpern mit taupunktkontrolle im schmelzofen |
| WO2017103153A1 (de) | 2015-12-18 | 2017-06-22 | Heraeus Quarzglas Gmbh & Co. Kg | Glasfasern und vorformen aus quarzglas mit geringem oh-, cl- und al-gehalt |
| CN109153593A (zh) | 2015-12-18 | 2019-01-04 | 贺利氏石英玻璃有限两合公司 | 合成石英玻璃粉粒的制备 |
| KR20180095619A (ko) | 2015-12-18 | 2018-08-27 | 헤래우스 크바르츠글라스 게엠베하 ＆ 컴파니 케이지 | 실리카 유리 제조 동안 규소 함량의 증가 |
| EP3428132B1 (de) | 2017-07-10 | 2023-08-30 | Heraeus Quarzglas GmbH & Co. KG | Quarzglasbauteil mit hoher thermischer stabilität, halbzeug dafür und verfahren zur herstellung desselben |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04124044A (ja) * | 1990-09-15 | 1992-04-24 | Furukawa Electric Co Ltd:The | 石英系ガラス母材の製造方法 |
| JP2000103630A (ja) * | 1998-09-28 | 2000-04-11 | Ushio Inc | 焼結石英ガラス成形体の製造方法 |
| JP2001163629A (ja) * | 1999-12-08 | 2001-06-19 | Toshiba Ceramics Co Ltd | 半導体処理炉用断熱体とその製造方法 |
| JP2004131317A (ja) * | 2002-10-09 | 2004-04-30 | Japan Siper Quarts Corp | 石英ガラス部材の強化方法と強化処理した石英ガラスルツボ |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| US2976171A (en) * | 1957-10-14 | 1961-03-21 | Smith Corp A O | Glass coated steel structure and method of making the same |
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- 2005-08-23 EP EP05781997.1A patent/EP1789370B1/de not_active Expired - Lifetime
- 2005-08-23 EP EP10182969.5A patent/EP2263981B1/de not_active Expired - Lifetime
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Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010508232A (ja) * | 2006-11-06 | 2010-03-18 | ヘレウス・クアルツグラース・ゲゼルシャフト・ミット・ベシュレンクテル・ハフツング・ウント・コンパニー・コマンディット・ゲゼルシャフト | 不透明石英ガラスを製造するための方法及び半製品、並びにその半製品から製造される部材 |
| JP2010531799A (ja) * | 2007-06-30 | 2010-09-30 | ヘレウス クワルツグラス ゲーエムベーハー ウント コンパニー カーゲー | 不透明石英ガラスの基体と緻密封止層から複合体を製造する方法 |
| KR101482591B1 (ko) | 2007-06-30 | 2015-01-14 | 헤래우스 크바르츠글라스 게엠베하 ＆ 컴파니 케이지 | 불투명한 석영 글라스 본체 및 고밀도 실링 층으로부터 복합체를 제조하는 방법 |
| JP2009302547A (ja) * | 2008-06-13 | 2009-12-24 | Asm Internatl Nv | 改善された熱特性を具えた半導体処理装置およびその処理装置を提供する方法 |
| WO2020079975A1 (ja) | 2018-10-17 | 2020-04-23 | 信越石英株式会社 | 多層構造シリカガラス体の製造方法 |
| KR20210074295A (ko) | 2018-10-17 | 2021-06-21 | 신에쯔 세끼에이 가부시키가이샤 | 다층구조 실리카유리체의 제조방법 |
| EP3868723A4 (en) * | 2018-10-17 | 2022-07-13 | Shin-Etsu Quartz Products Co., Ltd. | PROCESS FOR MAKING A MULTILAYER QUARTZ GLASS BODY |
Also Published As
| Publication number | Publication date |
|---|---|
| US20080075949A1 (en) | 2008-03-27 |
| EP1789370B1 (de) | 2014-01-15 |
| WO2006021415A2 (de) | 2006-03-02 |
| EP2263981A2 (de) | 2010-12-22 |
| EP1789370A2 (de) | 2007-05-30 |
| DE102004052312A1 (de) | 2006-03-02 |
| WO2006021415A3 (de) | 2006-10-26 |
| EP2263981A3 (de) | 2013-09-04 |
| EP2263981B1 (de) | 2014-10-01 |
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