JP2008218431A - トロイダル・プラズマ・チャンバ - Google Patents
トロイダル・プラズマ・チャンバ Download PDFInfo
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- JP2008218431A JP2008218431A JP2008126850A JP2008126850A JP2008218431A JP 2008218431 A JP2008218431 A JP 2008218431A JP 2008126850 A JP2008126850 A JP 2008126850A JP 2008126850 A JP2008126850 A JP 2008126850A JP 2008218431 A JP2008218431 A JP 2008218431A
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J27/00—Ion beam tubes
- H01J27/02—Ion sources; Ion guns
- H01J27/16—Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32357—Generation remote from the workpiece, e.g. down-stream
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32798—Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus
- H01J37/32853—Hygiene
- H01J37/32862—In situ cleaning of vessels and/or internal parts
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- Combustion & Propulsion (AREA)
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- Plasma Technology (AREA)
- Drying Of Semiconductors (AREA)
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Abstract
【解決手段】トロイダル低電場プラズマソースとともに用いられ得る金属製プラズマチャンバ100は、第1の誘電体領域108および第2の誘電体領域110を含む。誘電体領域108および110は、プラズマチャンバ100を、第1の領域112および第2の領域114に電気的に分離する。第1の領域112および第2の領域114の各々は、高度真空シールにより誘電体領域108、110に接続されることにより、プラズマチャンバ100を形成している。誘電体領域108、110は、プラズマチャンバ100の組み合わせ面116を分離する誘電体スペーサを有してなっていてもよい。
【選択図】図3
Description
本発明の主要な発見は、スイッチング半導体デバイスが、変圧器の2次回路を形成するように、電磁的エネルギーをプラズマへ連結する電力変圧器の1次巻線を効率的に駆動させるために用いられ得ることである。誘導的駆動型トロイダルプラズマソースが金属性プラズマチャンバを備えて構成され得ることは、本発明の別の主要な発見である。
Claims (5)
- 反応性ガスを発生するトロイダル・プラズマ・チャンバであって、
ガスを受け取る入口と、
金属材料とコーティングされた金属材料との少なくとも一方で構成されており前記ガスを保持する少なくとも1つのプラズマ・チャンバ壁と、
前記プラズマ・チャンバの複数の部分を電気的に分離して前記プラズマ・チャンバの内部に誘導電流が形成されることを防止し、前記プラズマ・チャンバの内部に形成されたプラズマから少なくとも1つのプラズマ・チャンバ壁によって保護される少なくとも1つの誘電スペーサと、
前記プラズマと前記ガスとの相互作用によって発生された反応性ガスを出力する出口と、
を含むことを特徴とするトロイダル・プラズマ・チャンバ。 - 反応性ガスを発生するトロイダル・プラズマ・チャンバであって、
ガスを受け取る入口と、
金属材料とコーティングされた金属材料と誘電材料との少なくとも1つで構成されており前記ガスを保持する1又は複数のプラズマ・チャンバ壁であって、前記プラズマ・チャンバのある領域を電気的に分離して前記プラズマ・チャンバの内部に誘導電流が形成されることを防止する少なくとも1つの誘電スペーサを受け取ることができ、前記プラズマ・チャンバの内部に形成されたプラズマから前記少なくとも1つの誘電スペーサを保護することができる1又は複数のプラズマ・チャンバ壁と、
前記プラズマと前記ガスとの相互作用によって発生された反応性ガスを出力する出口と、
を含むことを特徴とするトロイダル・プラズマ・チャンバ。 - 請求項2記載のトロイダル・プラズマ・チャンバにおいて、少なくとも1つの誘電スペーサを更に含むことを特徴とするトロイダル・プラズマ・チャンバ。
- 請求項2記載のトロイダル・プラズマ・チャンバにおいて、前記誘電スペーサに隣接して配置された真空シールを更に含むことを特徴とするトロイダル・プラズマ・チャンバ。
- 請求項3記載のトロイダル・プラズマ・チャンバにおいて、前記誘電スペーサに隣接して配置された真空シールを更に含むことを特徴とするトロイダル・プラズマ・チャンバ。
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US08/883,281 US6150628A (en) | 1997-06-26 | 1997-06-26 | Toroidal low-field reactive gas source |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2006317424A Division JP4791941B2 (ja) | 1997-06-26 | 2006-11-24 | トロイダル・プラズマ・チャンバ |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2008218431A true JP2008218431A (ja) | 2008-09-18 |
JP4431183B2 JP4431183B2 (ja) | 2010-03-10 |
Family
ID=25382309
Family Applications (5)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP50568899A Expired - Lifetime JP4070152B2 (ja) | 1997-06-26 | 1998-06-23 | トロイダル低電場反応性ガスソース |
JP2006317424A Expired - Lifetime JP4791941B2 (ja) | 1997-06-26 | 2006-11-24 | トロイダル・プラズマ・チャンバ |
JP2006354857A Pending JP2007165325A (ja) | 1997-06-26 | 2006-12-28 | 反応性ガス発生装置及び方法 |
JP2008126850A Expired - Lifetime JP4431183B2 (ja) | 1997-06-26 | 2008-05-14 | トロイダル・プラズマ・チャンバ |
JP2009106092A Expired - Lifetime JP4608583B2 (ja) | 1997-06-26 | 2009-04-24 | トロイダル・プラズマ・チャンバ |
Family Applications Before (3)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP50568899A Expired - Lifetime JP4070152B2 (ja) | 1997-06-26 | 1998-06-23 | トロイダル低電場反応性ガスソース |
JP2006317424A Expired - Lifetime JP4791941B2 (ja) | 1997-06-26 | 2006-11-24 | トロイダル・プラズマ・チャンバ |
JP2006354857A Pending JP2007165325A (ja) | 1997-06-26 | 2006-12-28 | 反応性ガス発生装置及び方法 |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2009106092A Expired - Lifetime JP4608583B2 (ja) | 1997-06-26 | 2009-04-24 | トロイダル・プラズマ・チャンバ |
Country Status (5)
Country | Link |
---|---|
US (5) | US6150628A (ja) |
EP (9) | EP1313131B1 (ja) |
JP (5) | JP4070152B2 (ja) |
DE (8) | DE69842259D1 (ja) |
WO (1) | WO1999000823A1 (ja) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
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KR100989316B1 (ko) | 2010-06-25 | 2010-10-25 | 이창경 | 플라즈마-강화 화학 증착장치 |
JP2015500557A (ja) * | 2011-12-08 | 2015-01-05 | エム ケー エス インストルメンツインコーポレーテッドMks Instruments,Incorporated | プラズマ・アプリケーター用のガス注入器 |
KR101507738B1 (ko) | 2009-02-27 | 2015-04-06 | 주식회사 뉴파워 프라즈마 | 플라즈마 점화와 전력 제어를 위한 방법 및 장치 |
JP2015176820A (ja) * | 2014-03-17 | 2015-10-05 | 株式会社リコー | プラズマ発生装置及び表面改質装置 |
JP2017503307A (ja) * | 2013-11-18 | 2017-01-26 | アプライド マテリアルズ インコーポレイテッドApplied Materials,Incorporated | 取り外し可能なインターフェイスを有する誘電体導管アセンブリを使用したプラズマ発生源及び関連するアセンブリ及び方法 |
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JP2015500557A (ja) * | 2011-12-08 | 2015-01-05 | エム ケー エス インストルメンツインコーポレーテッドMks Instruments,Incorporated | プラズマ・アプリケーター用のガス注入器 |
JP2017503307A (ja) * | 2013-11-18 | 2017-01-26 | アプライド マテリアルズ インコーポレイテッドApplied Materials,Incorporated | 取り外し可能なインターフェイスを有する誘電体導管アセンブリを使用したプラズマ発生源及び関連するアセンブリ及び方法 |
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