JP6548991B2 - プラズマ生成装置 - Google Patents
プラズマ生成装置 Download PDFInfo
- Publication number
- JP6548991B2 JP6548991B2 JP2015168894A JP2015168894A JP6548991B2 JP 6548991 B2 JP6548991 B2 JP 6548991B2 JP 2015168894 A JP2015168894 A JP 2015168894A JP 2015168894 A JP2015168894 A JP 2015168894A JP 6548991 B2 JP6548991 B2 JP 6548991B2
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- JP
- Japan
- Prior art keywords
- chamber
- plasma
- high frequency
- main body
- plasma generation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32321—Discharge generated by other radiation
- H01J37/32339—Discharge generated by other radiation using electromagnetic radiation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32458—Vessel
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/3266—Magnetic control means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/32—Processing objects by plasma generation
- H01J2237/327—Arrangements for generating the plasma
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/32—Processing objects by plasma generation
- H01J2237/33—Processing objects by plasma generation characterised by the type of processing
- H01J2237/332—Coating
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/32—Processing objects by plasma generation
- H01J2237/33—Processing objects by plasma generation characterised by the type of processing
- H01J2237/334—Etching
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32458—Vessel
- H01J37/32513—Sealing means, e.g. sealing between different parts of the vessel
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Electromagnetism (AREA)
- Toxicology (AREA)
- Plasma Technology (AREA)
- Chemical Vapour Deposition (AREA)
Description
V1=j(X1−X2)×I=j(1/2)X1×I
V2=−jX2×I=−j(1/2)X1×I
1 チャンバ
11 本体
11a,11a’ 絶縁ギャップ
11b 外壁
11c 内壁
11d フランジ
12 インレットポート
13 アウトレットポート
14 絶縁スペーサ
15 中継アダプタ
16 Oリング
17 Oリング加圧リング
2 磁気コア
3 高周波電源
4、5 接続線
6,6’ コンデンサ
7,7’,8 スイッチ
91,92,93 回路
P トロイダルプラズマ
Claims (6)
- トロイダル形状の放電空間を有する導体製のチャンバであって、トロイダルの周方向の一部分であり、かつ、前記周方向に直交する断面の全周にわたる絶縁部が設けられているチャンバと、
高周波電流を出力する高周波電源と、
前記高周波電源の一方の出力端子と、前記チャンバの前記絶縁部の近辺とを接続する第1の接続線と、
前記高周波電源の他方の出力端子と、前記チャンバの、前記第1の接続線が接続された位置に対して前記絶縁部を挟んだ側の近辺とを接続する第2の接続線と、
を備えていることを特徴とするプラズマ生成装置。 - 前記チャンバの一部を取り囲むように配置された磁気コアをさらに備えている、
請求項1に記載のプラズマ生成装置。 - 前記絶縁部は、前記チャンバを前記周方向の一部で切り離した隙間を維持したものである、
請求項1または2に記載のプラズマ生成装置。 - 前記チャンバの前記絶縁部を挟んだ両側には、それぞれ外壁にフランジが設けられており、
前記チャンバの切り離された部分が両側から挿入された状態で、2つの前記フランジの間に配置されて、前記隙間の大きさを規定する中継アダプタをさらに備えている、
請求項3に記載のプラズマ生成装置。 - 前記中継アダプタの内面と前記チャンバの外壁との間に配置され、両者に密着するように変形することで前記チャンバを密封状態に保つ弾性リングをさらに備えている、
請求項4に記載のプラズマ生成装置。 - 前記チャンバには、前記周方向の一部分であり、かつ、前記断面の全周にわたる第2の絶縁部がさらに設けられており、
前記第2の絶縁部を挟んだ、前記チャンバの両側の間には、コンデンサが接続されており、
前記コンデンサのリアクタンスは、プラズマが発生した後の状態における前記チャンバのリアクタンスの約2分の1である、
請求項1ないし5のいずれかに記載のプラズマ生成装置。
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2015168894A JP6548991B2 (ja) | 2015-08-28 | 2015-08-28 | プラズマ生成装置 |
US15/247,517 US10014162B2 (en) | 2015-08-28 | 2016-08-25 | Plasma generation apparatus for generating toroidal plasma |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2015168894A JP6548991B2 (ja) | 2015-08-28 | 2015-08-28 | プラズマ生成装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2017045676A JP2017045676A (ja) | 2017-03-02 |
JP6548991B2 true JP6548991B2 (ja) | 2019-07-24 |
Family
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2015168894A Active JP6548991B2 (ja) | 2015-08-28 | 2015-08-28 | プラズマ生成装置 |
Country Status (2)
Country | Link |
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US (1) | US10014162B2 (ja) |
JP (1) | JP6548991B2 (ja) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6746865B2 (ja) * | 2016-09-23 | 2020-08-26 | 株式会社ダイヘン | プラズマ生成装置 |
CN111492577B (zh) * | 2017-12-28 | 2024-04-02 | 日本碍子株式会社 | 压电性材料基板与支撑基板的接合体及其制造方法 |
DE112018005782B4 (de) * | 2017-12-28 | 2024-02-22 | Ngk Insulators, Ltd. | Anordnung eines Substrats aus einem piezoelektrischen Material und eines Trägersubstrats |
US10593560B2 (en) * | 2018-03-01 | 2020-03-17 | Applied Materials, Inc. | Magnetic induction plasma source for semiconductor processes and equipment |
US11019715B2 (en) | 2018-07-13 | 2021-05-25 | Mks Instruments, Inc. | Plasma source having a dielectric plasma chamber with improved plasma resistance |
GB201813451D0 (en) | 2018-08-17 | 2018-10-03 | Spts Technologies Ltd | Plasma apparatus |
US10553403B1 (en) * | 2019-05-08 | 2020-02-04 | Mks Instruments, Inc. | Polygonal toroidal plasma source |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60165893U (ja) * | 1984-04-12 | 1985-11-02 | 三菱重工業株式会社 | 核融合装置の絶縁ブレ−ク構造 |
US6924455B1 (en) * | 1997-06-26 | 2005-08-02 | Applied Science & Technology, Inc. | Integrated plasma chamber and inductively-coupled toroidal plasma source |
US6150628A (en) * | 1997-06-26 | 2000-11-21 | Applied Science And Technology, Inc. | Toroidal low-field reactive gas source |
US6855906B2 (en) * | 2001-10-16 | 2005-02-15 | Adam Alexander Brailove | Induction plasma reactor |
US20090290673A1 (en) * | 2008-05-20 | 2009-11-26 | Vladimir Aleksandrovich Svidzinski | Method and device for realizing stable plasma confinement by pressure of AC magnetic field which can be used for controlled nuclear fusion |
KR101241049B1 (ko) * | 2011-08-01 | 2013-03-15 | 주식회사 플라즈마트 | 플라즈마 발생 장치 및 플라즈마 발생 방법 |
US9035553B2 (en) * | 2011-11-09 | 2015-05-19 | Dae-Kyu Choi | Hybrid plasma reactor |
KR101314666B1 (ko) * | 2011-11-28 | 2013-10-04 | 최대규 | 하이브리드 플라즈마 반응기 |
US20140062285A1 (en) * | 2012-08-29 | 2014-03-06 | Mks Instruments, Inc. | Method and Apparatus for a Large Area Inductive Plasma Source |
WO2014104753A1 (ko) * | 2012-12-28 | 2014-07-03 | 주식회사 뉴파워 프라즈마 | 플라즈마 반응기 및 이를 이용한 플라즈마 점화 방법 |
KR20140137172A (ko) * | 2013-05-22 | 2014-12-02 | 최대규 | 자기 관리 기능을 갖는 원격 플라즈마 시스템 및 이의 자기 관리 방법 |
US10573496B2 (en) * | 2014-12-09 | 2020-02-25 | Applied Materials, Inc. | Direct outlet toroidal plasma source |
-
2015
- 2015-08-28 JP JP2015168894A patent/JP6548991B2/ja active Active
-
2016
- 2016-08-25 US US15/247,517 patent/US10014162B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
US10014162B2 (en) | 2018-07-03 |
JP2017045676A (ja) | 2017-03-02 |
US20170062183A1 (en) | 2017-03-02 |
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