JP6688199B2 - プラズマ発生装置 - Google Patents
プラズマ発生装置 Download PDFInfo
- Publication number
- JP6688199B2 JP6688199B2 JP2016194060A JP2016194060A JP6688199B2 JP 6688199 B2 JP6688199 B2 JP 6688199B2 JP 2016194060 A JP2016194060 A JP 2016194060A JP 2016194060 A JP2016194060 A JP 2016194060A JP 6688199 B2 JP6688199 B2 JP 6688199B2
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- JP
- Japan
- Prior art keywords
- chamber
- insulator
- plasma
- plasma generator
- main body
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 239000012212 insulator Substances 0.000 claims description 37
- 239000004020 conductor Substances 0.000 claims description 18
- 239000000463 material Substances 0.000 claims description 12
- 239000003566 sealing material Substances 0.000 claims description 8
- 239000011810 insulating material Substances 0.000 claims description 6
- 239000000919 ceramic Substances 0.000 claims description 5
- 238000007789 sealing Methods 0.000 claims description 5
- 238000001816 cooling Methods 0.000 description 29
- 125000006850 spacer group Chemical group 0.000 description 26
- 229910052751 metal Inorganic materials 0.000 description 7
- 239000002184 metal Substances 0.000 description 7
- 230000008878 coupling Effects 0.000 description 6
- 238000010168 coupling process Methods 0.000 description 6
- 238000005859 coupling reaction Methods 0.000 description 6
- 230000005684 electric field Effects 0.000 description 6
- 230000002159 abnormal effect Effects 0.000 description 4
- 230000004907 flux Effects 0.000 description 4
- 239000007769 metal material Substances 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- 239000002826 coolant Substances 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 238000009616 inductively coupled plasma Methods 0.000 description 3
- 230000013011 mating Effects 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000009471 action Effects 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 239000000498 cooling water Substances 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005674 electromagnetic induction Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 230000001939 inductive effect Effects 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000000696 magnetic material Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 230000008439 repair process Effects 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
- 229910000859 α-Fe Inorganic materials 0.000 description 1
Images
Landscapes
- Plasma Technology (AREA)
- Chemical Vapour Deposition (AREA)
Description
2 チャンバ
20 本体部分
20a,20b 分体
23 絶縁体
231 空洞部分
24 スペーサ
241 空洞部分
26 管体
261 Oリング(シーリング材)
29 ガス流路
3 磁性コア
4 高周波電源
5 冷却部
Claims (3)
- 導電性材料により環状に形成され、形状に沿って材料ガスの流路が内部に形成されてあるチャンバと、該チャンバへ高周波電流を供給する高周波電源とを備えるプラズマ発生装置であって、
前記チャンバは、
環形状の一部を欠落させた本体部分と、
該本体部分と対応する断面形状を有して前記本体部分の欠落部に介装されている絶縁体と、
該絶縁体の空洞部分に内嵌されており、絶縁性材料により形成された前記絶縁体よりも長い管体と
を備えることを特徴とするプラズマ発生装置。 - 前記管体はセラミックス製である
ことを特徴とする請求項1に記載のプラズマ発生装置。 - 前記管体の外周が、前記本体部分の欠落部に面する端面近くの内壁に設けられたシーリング材に弾接された封止構造を有する
ことを特徴とする請求項1に記載のプラズマ発生装置。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2016194060A JP6688199B2 (ja) | 2016-09-30 | 2016-09-30 | プラズマ発生装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2016194060A JP6688199B2 (ja) | 2016-09-30 | 2016-09-30 | プラズマ発生装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2018056074A JP2018056074A (ja) | 2018-04-05 |
JP6688199B2 true JP6688199B2 (ja) | 2020-04-28 |
Family
ID=61836040
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2016194060A Active JP6688199B2 (ja) | 2016-09-30 | 2016-09-30 | プラズマ発生装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP6688199B2 (ja) |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0590799U (ja) * | 1991-08-30 | 1993-12-10 | 日電アネルバ株式会社 | 継 手 |
WO2002052060A1 (en) * | 2000-12-26 | 2002-07-04 | Valery Godyak | Inductively coupled plasma reactor |
US6855906B2 (en) * | 2001-10-16 | 2005-02-15 | Adam Alexander Brailove | Induction plasma reactor |
KR100542740B1 (ko) * | 2002-11-11 | 2006-01-11 | 삼성전자주식회사 | 가스 플라즈마 생성 방법 및 장치, 플라즈마 생성용 가스조성물 및 이를 이용한 반도체 장치의 제조 방법 |
JP2007073539A (ja) * | 2003-12-18 | 2007-03-22 | Tokyo Electron Ltd | 成膜方法およびプラズマ発生方法、基板処理装置 |
JP5257917B2 (ja) * | 2006-04-24 | 2013-08-07 | 株式会社ニューパワープラズマ | 多重マグネチックコアが結合された誘導結合プラズマ反応器 |
KR101241049B1 (ko) * | 2011-08-01 | 2013-03-15 | 주식회사 플라즈마트 | 플라즈마 발생 장치 및 플라즈마 발생 방법 |
-
2016
- 2016-09-30 JP JP2016194060A patent/JP6688199B2/ja active Active
Also Published As
Publication number | Publication date |
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JP2018056074A (ja) | 2018-04-05 |
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