JP2006344939A - エッチング液、エッチング液及びその結果構造物を用いた導電性配線を含む薄膜トランジスタ基板の製造方法 - Google Patents
エッチング液、エッチング液及びその結果構造物を用いた導電性配線を含む薄膜トランジスタ基板の製造方法 Download PDFInfo
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- 238000000034 method Methods 0.000 title claims abstract description 89
- 239000000758 substrate Substances 0.000 title claims abstract description 75
- 239000010409 thin film Substances 0.000 title claims abstract description 49
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 31
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims abstract description 99
- 229910052709 silver Inorganic materials 0.000 claims abstract description 99
- 239000004332 silver Substances 0.000 claims abstract description 99
- 239000000126 substance Substances 0.000 claims abstract description 45
- USFZMSVCRYTOJT-UHFFFAOYSA-N Ammonium acetate Chemical compound N.CC(O)=O USFZMSVCRYTOJT-UHFFFAOYSA-N 0.000 claims abstract description 16
- 239000005695 Ammonium acetate Substances 0.000 claims abstract description 16
- 229940043376 ammonium acetate Drugs 0.000 claims abstract description 16
- 235000019257 ammonium acetate Nutrition 0.000 claims abstract description 16
- 229910052760 oxygen Inorganic materials 0.000 claims abstract description 9
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 8
- 229910052782 aluminium Inorganic materials 0.000 claims abstract description 8
- 229910052788 barium Inorganic materials 0.000 claims abstract description 8
- 229910052804 chromium Inorganic materials 0.000 claims abstract description 8
- 229910052742 iron Inorganic materials 0.000 claims abstract description 8
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 8
- 229910052718 tin Inorganic materials 0.000 claims abstract description 8
- 229910052719 titanium Inorganic materials 0.000 claims abstract description 8
- 229910052725 zinc Inorganic materials 0.000 claims abstract description 8
- 239000010408 film Substances 0.000 claims description 225
- 238000005530 etching Methods 0.000 claims description 111
- 239000000243 solution Substances 0.000 claims description 40
- 239000004065 semiconductor Substances 0.000 claims description 36
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 claims description 30
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 claims description 16
- 229910045601 alloy Inorganic materials 0.000 claims description 15
- 239000000956 alloy Substances 0.000 claims description 15
- 230000015572 biosynthetic process Effects 0.000 claims description 11
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 claims description 10
- 229910017604 nitric acid Inorganic materials 0.000 claims description 10
- 239000000463 material Substances 0.000 claims description 9
- 229910021642 ultra pure water Inorganic materials 0.000 claims description 9
- 239000012498 ultrapure water Substances 0.000 claims description 9
- 229910000147 aluminium phosphate Inorganic materials 0.000 claims description 8
- 229910052796 boron Inorganic materials 0.000 claims description 7
- 238000000059 patterning Methods 0.000 claims description 7
- 239000007788 liquid Substances 0.000 claims description 4
- 238000002347 injection Methods 0.000 claims description 2
- 239000007924 injection Substances 0.000 claims description 2
- 239000012212 insulator Substances 0.000 claims 1
- 239000007921 spray Substances 0.000 claims 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 3
- 239000010410 layer Substances 0.000 description 143
- 229910021417 amorphous silicon Inorganic materials 0.000 description 36
- 238000003860 storage Methods 0.000 description 27
- 230000001681 protective effect Effects 0.000 description 20
- 239000004973 liquid crystal related substance Substances 0.000 description 11
- 229910052581 Si3N4 Inorganic materials 0.000 description 9
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 9
- 239000002184 metal Substances 0.000 description 8
- 229910052751 metal Inorganic materials 0.000 description 8
- 229910001316 Ag alloy Inorganic materials 0.000 description 7
- 229910004205 SiNX Inorganic materials 0.000 description 7
- 239000007789 gas Substances 0.000 description 7
- 239000011368 organic material Substances 0.000 description 6
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 description 6
- 238000004544 sputter deposition Methods 0.000 description 6
- 238000001039 wet etching Methods 0.000 description 6
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 5
- 239000003990 capacitor Substances 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- 239000010419 fine particle Substances 0.000 description 5
- 206010034972 Photosensitivity reaction Diseases 0.000 description 4
- 239000012535 impurity Substances 0.000 description 4
- 230000036211 photosensitivity Effects 0.000 description 4
- 229920000642 polymer Polymers 0.000 description 4
- 239000004094 surface-active agent Substances 0.000 description 4
- 239000011701 zinc Substances 0.000 description 4
- 230000001154 acute effect Effects 0.000 description 3
- 229910010272 inorganic material Inorganic materials 0.000 description 3
- 239000011147 inorganic material Substances 0.000 description 3
- 239000011810 insulating material Substances 0.000 description 3
- 238000010030 laminating Methods 0.000 description 3
- 238000001259 photo etching Methods 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- 241000408495 Iton Species 0.000 description 2
- GQPLMRYTRLFLPF-UHFFFAOYSA-N Nitrous Oxide Chemical compound [O-][N+]#N GQPLMRYTRLFLPF-UHFFFAOYSA-N 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000001312 dry etching Methods 0.000 description 2
- 230000005684 electric field Effects 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 2
- 238000003475 lamination Methods 0.000 description 2
- 230000014759 maintenance of location Effects 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 229920002120 photoresistant polymer Polymers 0.000 description 2
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 2
- 229910021332 silicide Inorganic materials 0.000 description 2
- FVBUAEGBCNSCDD-UHFFFAOYSA-N silicide(4-) Chemical compound [Si-4] FVBUAEGBCNSCDD-UHFFFAOYSA-N 0.000 description 2
- 229910052814 silicon oxide Inorganic materials 0.000 description 2
- 238000002834 transmittance Methods 0.000 description 2
- YVTHLONGBIQYBO-UHFFFAOYSA-N zinc indium(3+) oxygen(2-) Chemical compound [O--].[Zn++].[In+3] YVTHLONGBIQYBO-UHFFFAOYSA-N 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 239000003945 anionic surfactant Substances 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 238000004380 ashing Methods 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 239000003093 cationic surfactant Substances 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 238000009313 farming Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000000670 limiting effect Effects 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 238000001471 micro-filtration Methods 0.000 description 1
- 239000011859 microparticle Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000001272 nitrous oxide Substances 0.000 description 1
- 239000002736 nonionic surfactant Substances 0.000 description 1
- 229920003986 novolac Polymers 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 230000036961 partial effect Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000002161 passivation Methods 0.000 description 1
- 230000002829 reductive effect Effects 0.000 description 1
- 230000002441 reversible effect Effects 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000005477 sputtering target Methods 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- ISIJQEHRDSCQIU-UHFFFAOYSA-N tert-butyl 2,7-diazaspiro[4.5]decane-7-carboxylate Chemical compound C1N(C(=O)OC(C)(C)C)CCCC11CNCC1 ISIJQEHRDSCQIU-UHFFFAOYSA-N 0.000 description 1
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/10—Etching compositions
- C23F1/14—Aqueous compositions
- C23F1/16—Acidic compositions
- C23F1/30—Acidic compositions for etching other metallic material
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/28—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body
- H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
- H01L27/124—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs with a particular composition, shape or layout of the wiring layers specially adapted to the circuit arrangement, e.g. scanning lines in LCD pixel circuits
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body
- H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
- H01L27/1259—Multistep manufacturing methods
- H01L27/1288—Multistep manufacturing methods employing particular masking sequences or specially adapted masks, e.g. half-tone mask
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/40—Electrodes ; Multistep manufacturing processes therefor
- H01L29/43—Electrodes ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
- H01L29/45—Ohmic electrodes
- H01L29/456—Ohmic electrodes on silicon
- H01L29/458—Ohmic electrodes on silicon for thin film silicon, e.g. source or drain electrode
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/40—Electrodes ; Multistep manufacturing processes therefor
- H01L29/43—Electrodes ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
- H01L29/49—Metal-insulator-semiconductor electrodes, e.g. gates of MOSFET
- H01L29/4908—Metal-insulator-semiconductor electrodes, e.g. gates of MOSFET for thin film semiconductor, e.g. gate of TFT
Abstract
【解決手段】本発明により、エッチング液、これを用いた配線形成方法及び薄膜トランジスタ基板の製造方法が提供される。エッチング液は下記化学式1で表示される物質、酢酸アンモニウム及び超純水を含む。
(化学式1)
M(OH)XLY
(ただし、前記式でMはZn、Sn、Cr、Al、Ba、Fe、Ti、SiまたはBであり、Xは2または3であり、LはH2O、NH3、CN、COR、NH2Rであり、Yは0、1、2または3であり、Rはアルキル基である。)
【選択図】図4
Description
(化学式1)
M(OH)XLY
(ただし、前記式でMはZn、Sn、Cr、Al、Ba、Fe、Ti、SiまたはBであり、Xは2または3であり、LはH2O、NH3、CN、COR、NH2Rであり、Yは0、1、2または3であり、Rはアルキル基である。)
(化学式1)
M(OH)XLY
(ただし、前記式でMはZn、Sn、Cr、Al、Ba、Fe、Ti、SiまたはBであり、Xは2または3であり、LはH2O、NH3、CN、COR、NH2Rであり、Yは0、1、2または3であり、Rはアルキル基である。)
(化学式1)
M(OH)XLY
(ただし、前記式でMはZn、Sn、Cr、Al、Ba、Fe、Ti、SiまたはBであり、Xは2または3でありて、LはH2O、NH3、CN、COR、NH2Rであり、Yは0、1、2または3であり、Rはアルキル基である。)
(化学式1)
M(OH)XLY
(ただし、前記式でMはZn、Sn、Cr、Al、Ba、Fe、Ti、SiまたはBであり、Xは2または3であり、LはH2O、NH3、CN、COR、NH2Rであり、Yは0、1、2または3であり、Rはアルキル基である。)
22:ゲート線
24:ゲート終端
26:ゲート電極
27:維持電極
28:維持電極線
30:ゲート絶縁膜
40:半導体層
55、56:接触性抵抗層
62:データ線
65:ソース電極
66:ドレイン電極
67:ドレイン電極拡張部
68:データ終端
70:保護膜
82:画素電極
Claims (23)
- 下記化学式1で表示される物質、酢酸アンモニウム及び超純水を含むことを特徴とするエッチング液。
化学式1
M(OH)XLY
(ただし、前記式でMはZn、Sn、Cr、Al、Ba、Fe、Ti、SiまたはBであり、Xは2または3であり、LはH2O、NH3、CN、COR、NH2Rであり、Yは0、1、2または3であり、Rはアルキル基である。) - 前記化学式1で表示される物質は0.1〜5重量%であって、前記酢酸アンモニウムの含有量は0.001〜0.1重量%であることを特徴とする請求項1に記載のエッチング液。
- 更に、燐酸を60〜70重量%で含み、硝酸を0.5〜5重量%で含み、且つ酢酸を2〜10重量%で含むことを特徴とする請求項1または2に記載のエッチング液。
- 基板上に導電性酸化膜及び銀(Ag)または銀(Ag)合金を含む導電層を具備する多重膜を形成し
前記多重膜を下記化学式1で表示される物質、酢酸アンモニウム及び超純水を含むエッチング液を用いてエッチングすることを含むことを特徴とする配線形成方法。
(化1)
M(OH)XLY
(ただし、前記式でMはZn、Sn、Cr、Al、Ba、Fe、Ti、SiまたはBであり、Xは2または3であり、LはH2O、NH3、CN、COR、NH2R であり、Yは0、1、2または3であり、Rはアルキル基である。) - 前記多重膜を形成することは前記基板上に前記導電性酸化膜、前記銀(Ag)または銀(Ag)合金を含む導電層及び前記導電性酸化膜を順次的に積層することを含むことを特徴とする請求項4に記載の配線形成方法。
- 前記化学式1で表示される物質の含有量は0.1〜5重量%であり、且つ前記酢酸アンモニウムの含有量は0.001〜0.1重量%であることを特徴とする請求項4に記載の配線形成方法。
- 更に、燐酸を60〜70重量%で含み、硝酸を0.5〜5重量%で含み、且つ酢酸を2〜し10重量%で含むことを特徴とする請求項4または6に記載の配線形成方法。
- 前記基板は絶縁体または半導体で構成されることを特徴とする請求項4に記載の配線形成方法。
- 前記エッチングは30〜50℃で行われることを特徴とする請求項4に記載の配線形成方法。
- 前記エッチングは噴射方式で行われることを特徴とする請求項4に記載の配線形成方法。
- 前記エッチングは30〜100秒間行われることを特徴とする請求項4に記載の配線形成方法。
- 前記エッチングは前記多重膜を構成する膜を一括的にエッチングすることを特徴とする請求項4に記載の配線形成方法。
- 前記導電性酸化膜はITOまたはIZOで構成されることを特徴とする請求項4に記載の配線形成方法。
- 基板上に導電性酸化膜及び銀(Ag)または銀(Ag)合金を含む導電層を具備するゲート多重膜を形成して、前記ゲート多重膜をパターニングしてゲート配線を形成し、
前記基板及び前記ゲート配線上にゲート絶縁膜及び半導体層を形成し、
前記半導体層上に導電性酸化膜及び銀(Ag)または銀(Ag)合金を含む導電層を具備するデータ多重膜を形成して、前記データ多重膜をパターニングしてデータ配線を形成することを含み、
前記ゲート配線及び/または前記データ配線を形成する段階は下記化学式1で表示される物質、酢酸アンモニウム及び超純水を含むエッチング液を用いてエッチングすることを含むことを特徴とする薄膜トランジスタ基板の製造方法。
(化1)
M(OH)XLY
(ただし、前記式でMはZn、Sn、Cr、Al、Ba、Fe、Ti、SiまたはBであり、Xは2または3であり、LはH2O、NH3、CN、COR、NH2R であり、Yは0、1、2または3であり、Rはアルキル基である。) - 前記ゲート多重膜を形成することは前記導電性酸化膜、前記銀(Ag)または銀(Ag)合金を含む導電層及び前記導電性酸化膜を順次的に積層することを含むことを特徴とする請求項14に記載の薄膜トランジスタ基板の製造方法。
- 前記データ多重膜を形成することは前記導電性酸化膜、前記銀(Ag)または銀(Ag)合金を含む導電層及び前記導電性酸化膜を順次的に積層することを含むことを特徴とする請求項14に記載の薄膜トランジスタ基板の製造方法。
- 前記化学式1で表示される物質の含有量は0.1〜5重量%であり、前記酢酸アンモニウムの含有量は0.001〜0.1重量%であることを特徴とする請求項14に記載の薄膜トランジスタ基板の製造方法。
- 更に、燐酸を60〜70重量%で含み、硝酸を0.5〜5重量%で含み、且つ酢酸2〜10重量%で含むことを特徴とする請求項14または17に記載の薄膜トランジスタ基板の製造方法。
- 前記エッチングは30〜50℃で行われることを特徴とする請求項14に記載の薄膜トランジスタ基板の製造方法。
- 前記エッチングは噴射方式で行われることを特徴とする請求項14に記載の薄膜トランジスタ基板の製造方法。
- 前記エッチングは30〜100秒間行われることを特徴とする請求項14に記載の薄膜トランジスタ基板の製造方法。
- 前記エッチングは前記多重膜を構成する膜を一括的にエッチングすることを特徴とする請求項14に記載の薄膜トランジスタ基板の製造方法。
- 前記導電性酸化膜はITOまたはIZOで構成されることを特徴とする請求項14に記載の薄膜トランジスタ基板の製造方法。
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