JP2005511536A5 - - Google Patents
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- Publication number
- JP2005511536A5 JP2005511536A5 JP2003536239A JP2003536239A JP2005511536A5 JP 2005511536 A5 JP2005511536 A5 JP 2005511536A5 JP 2003536239 A JP2003536239 A JP 2003536239A JP 2003536239 A JP2003536239 A JP 2003536239A JP 2005511536 A5 JP2005511536 A5 JP 2005511536A5
- Authority
- JP
- Japan
- Prior art keywords
- alkyl
- diazabicyclo
- benzyl
- unsubstituted
- substituted
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CH19112001 | 2001-10-17 | ||
| PCT/EP2002/011238 WO2003033500A1 (en) | 2001-10-17 | 2002-10-08 | Photoactivable nitrogen bases |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2005511536A JP2005511536A (ja) | 2005-04-28 |
| JP2005511536A5 true JP2005511536A5 (https=) | 2009-07-30 |
| JP4454309B2 JP4454309B2 (ja) | 2010-04-21 |
Family
ID=4566758
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2003536239A Expired - Fee Related JP4454309B2 (ja) | 2001-10-17 | 2002-10-08 | 光活性化窒素塩基 |
Country Status (14)
| Country | Link |
|---|---|
| US (2) | US7538104B2 (https=) |
| EP (1) | EP1436297B1 (https=) |
| JP (1) | JP4454309B2 (https=) |
| KR (1) | KR100938769B1 (https=) |
| CN (1) | CN1571788B (https=) |
| AT (1) | ATE360629T1 (https=) |
| AU (1) | AU2002346968B2 (https=) |
| BR (1) | BR0213354A (https=) |
| CA (1) | CA2459374C (https=) |
| DE (1) | DE60219812T8 (https=) |
| MX (1) | MXPA04003564A (https=) |
| RU (1) | RU2332419C2 (https=) |
| WO (1) | WO2003033500A1 (https=) |
| ZA (1) | ZA200401523B (https=) |
Families Citing this family (49)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5283303B2 (ja) * | 2003-12-25 | 2013-09-04 | Ｄｉｃ株式会社 | 転写材用硬化性樹脂組成物、転写材および保護層の形成方法 |
| US20050234208A1 (en) | 2004-04-14 | 2005-10-20 | Matthias Koch | Fast curing polydiorganosiloxanes |
| EP1789188A2 (en) * | 2004-07-21 | 2007-05-30 | CIBA SPECIALTY CHEMICALS HOLDING INC. Patent Departement | Process for the photoactivation and use of a catalyst by an inverted two-stage procedure |
| RU2414471C2 (ru) * | 2005-02-02 | 2011-03-20 | Циба Спешиалти Кемикэлз Холдинг Инк. | Бензотриазоловые поглотители уф-лучей со смещенным в длинноволновую область спектром поглощения и их применение |
| RU2009115962A (ru) * | 2006-09-29 | 2010-11-10 | Циба Холдинг Инк. (Ch) | Фотолатентные основания для систем, основанных на блокированных изоцианатах |
| KR101514093B1 (ko) | 2007-04-03 | 2015-04-21 | 바스프 에스이 | 광활성화가능한 질소 염기 |
| JP4874854B2 (ja) * | 2007-04-10 | 2012-02-15 | 富士フイルム株式会社 | ホログラフィック記録用組成物およびホログラフィック記録媒体 |
| US20080308003A1 (en) * | 2007-06-13 | 2008-12-18 | Krol Andrew M | UV inkjet resist |
| JP5339907B2 (ja) * | 2007-06-14 | 2013-11-13 | 積水化学工業株式会社 | 光硬化型粘接着剤組成物 |
| JP2009126974A (ja) * | 2007-11-26 | 2009-06-11 | Three Bond Co Ltd | 樹脂組成物 |
| EP2238178B1 (en) * | 2008-01-28 | 2014-09-10 | Basf Se | Photolatent amidine bases for redox curing of radically curable formulations |
| US8329771B2 (en) | 2008-03-31 | 2012-12-11 | San-Apro Limited | Photobase generator |
| DE102008043218A1 (de) | 2008-09-24 | 2010-04-01 | Evonik Goldschmidt Gmbh | Polymere Werkstoffe sowie daraus bestehende Kleber- und Beschichtungsmittel auf Basis multialkoxysilylfunktioneller Präpolymerer |
| DE102008049848A1 (de) | 2008-10-01 | 2010-04-08 | Tesa Se | Mehrbereichsindikator |
| JP5521999B2 (ja) * | 2009-11-26 | 2014-06-18 | 住友化学株式会社 | 化学増幅型フォトレジスト組成物及びレジストパターンの製造方法 |
| JP2013532223A (ja) * | 2010-06-30 | 2013-08-15 | スリーエム イノベイティブ プロパティズ カンパニー | オンデマンド型硬化性ポリシロキサンコーティング組成物 |
| JP5818890B2 (ja) | 2010-06-30 | 2015-11-18 | スリーエム イノベイティブ プロパティズ カンパニー | 二重反応性シラン官能基を含む硬化性組成物 |
| US8840993B2 (en) | 2010-06-30 | 2014-09-23 | 3M Innovative Properties Company | Curable polysiloxane coating composition |
| WO2013089100A1 (ja) | 2011-12-16 | 2013-06-20 | 株式会社スリーボンド | 硬化性樹脂組成物 |
| WO2013101477A1 (en) | 2011-12-29 | 2013-07-04 | 3M Innovative Properties Company | Curable polysiloxane coating composition |
| JP6223357B2 (ja) * | 2011-12-29 | 2017-11-01 | スリーエム イノベイティブ プロパティズ カンパニー | 硬化性ポリシロキサン組成物及びそれらから作製される感圧接着剤 |
| US9035008B2 (en) | 2011-12-29 | 2015-05-19 | 3M Innovative Properties Company | Curable-on-demand polysiloxane coating composition |
| WO2013106193A1 (en) | 2011-12-29 | 2013-07-18 | 3M Innovative Properties Company | Curable polysiloxane composition |
| US9018322B2 (en) * | 2012-06-21 | 2015-04-28 | FRC-DeSoto International, Inc. | Controlled release amine-catalyzed, Michael addition-curable sulfur-containing polymer compositions |
| JP6183642B2 (ja) * | 2012-08-10 | 2017-08-23 | 株式会社リコー | 活性光線硬化組成物、並びにこれを用いた活性光線硬化型インクジェット印刷用インク組成物及び活性光線硬化型接着剤組成物 |
| KR102305831B1 (ko) | 2013-07-18 | 2021-09-27 | 세메다인 가부시키 가이샤 | 광경화성 조성물, 경화물 및 그의 제조 방법, 그리고 관련 제품 및 그의 제조 방법 |
| KR102330121B1 (ko) | 2013-12-13 | 2021-11-23 | 세메다인 가부시키 가이샤 | 접착성을 갖는 광경화성 조성물 |
| DE102014202609B4 (de) * | 2014-02-13 | 2020-06-04 | tooz technologies GmbH | Aminkatalysierte Thiolhärtung von Epoxidharzen |
| US9328274B2 (en) | 2014-03-07 | 2016-05-03 | Prc-Desoto International, Inc. | Michael acceptor-terminated urethane-containing fuel resistant prepolymers and compositions thereof |
| US9328275B2 (en) | 2014-03-07 | 2016-05-03 | Prc Desoto International, Inc. | Phosphine-catalyzed, michael addition-curable sulfur-containing polymer compositions |
| CN107148458A (zh) | 2014-10-29 | 2017-09-08 | 德莎欧洲公司 | 包含可活化的吸气剂材料的胶粘剂混合物 |
| CN105630255B (zh) * | 2014-10-31 | 2019-01-18 | 昆山瑞咏成精密设备有限公司 | 单片式ogs触摸屏及其制作方法 |
| AU2016256186B2 (en) | 2015-04-29 | 2020-01-16 | Bsn Medical Gmbh | Multi-step process for no production |
| BR112017023446A2 (pt) | 2015-04-29 | 2018-07-31 | 3M Innovative Properties Co | método para a fabricação de uma rede polimérica a partir de um politiol e um poliepóxido |
| WO2016174192A1 (de) | 2015-04-29 | 2016-11-03 | Bsn Medical Gmbh | Medizinische badevorrichtung |
| WO2018085190A1 (en) | 2016-11-03 | 2018-05-11 | 3M Innovative Properties Company | Polythiol sealant compositions |
| JP2019534363A (ja) | 2016-11-03 | 2019-11-28 | スリーエム イノベイティブ プロパティズ カンパニー | シーラントを航空機用部品に適用する方法 |
| WO2018085534A1 (en) * | 2016-11-03 | 2018-05-11 | 3M Innovative Properties Company | Compositions including a photolatent amine, camphorquinone, and a coumarin and related methods |
| US20190369494A1 (en) | 2016-12-05 | 2019-12-05 | Arkemea Inc. | Initiator blends and photocurable compositions containing such initiator blends useful for 3d printing |
| WO2019149583A1 (de) | 2018-02-02 | 2019-08-08 | Basf Se | Polyurethane mit geringen emissionen organischer verbindungen |
| WO2019206416A1 (en) * | 2018-04-26 | 2019-10-31 | Henkel Ag & Co. Kgaa | A quaternary nitrogen compound for use as a latent catalyst in curable compositions |
| CN110643286B (zh) | 2018-06-27 | 2021-11-19 | 3M创新有限公司 | Uv固化组合物及包含该组合物的胶膜、胶带和粘结构件 |
| CN112752803A (zh) | 2018-09-27 | 2021-05-04 | 3M创新有限公司 | 包含氨基官能硅烷的组合物以及将密封剂施用到基材的方法 |
| WO2020202076A1 (en) | 2019-04-04 | 2020-10-08 | 3M Innovative Properties Company | Method of irradiating a composition through a substrate |
| CN113150714B (zh) | 2020-01-07 | 2023-03-10 | 3M创新有限公司 | 聚氨酯基可uv固化组合物及包含其的胶膜、胶带和粘结构件 |
| EP3848179A1 (de) | 2020-01-10 | 2021-07-14 | Carl Zeiss Vision International GmbH | Inkjet-verfahren zur herstellung eines brillenglases |
| CN111795960B (zh) * | 2020-08-10 | 2022-08-09 | 齐齐哈尔大学 | 一种光谱法和比色法检测不同形式碘的分子平台及其制备方法和应用 |
| CN115389476B (zh) * | 2022-08-30 | 2026-01-02 | 广西大学 | 无损可视化监测鱼和肉类食品新鲜度的荧光标签及其制备方法 |
| WO2026077954A1 (en) * | 2024-10-08 | 2026-04-16 | Chemetall Gmbh | Photo-latent bases |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0448154A1 (en) | 1990-03-20 | 1991-09-25 | Akzo Nobel N.V. | Coating composition including a blocked basic catalyst |
| HU225047B1 (en) * | 1991-03-28 | 2006-05-29 | Eisai Co Ltd | Heterocyclic-piperidin-derivatives, pharmaceutical compositions containing them and process for their production |
| JP2654339B2 (ja) * | 1992-11-24 | 1997-09-17 | インターナショナル・ビジネス・マシーンズ・コーポレイション | 感光性レジスト組成物及び基板上にレジスト像を形成する方法 |
| WO1994028075A1 (en) | 1993-05-26 | 1994-12-08 | Akzo Nobel N.V. | Coating composition including a uv-deblockable basic catalyst |
| JP3206310B2 (ja) * | 1994-07-01 | 2001-09-10 | ダイキン工業株式会社 | 表面改質されたフッ素樹脂成形品 |
| US5998496A (en) | 1995-10-31 | 1999-12-07 | Spectra Group Limited, Inc. | Photosensitive intramolecular electron transfer compounds |
| AU713498B2 (en) | 1996-02-22 | 1999-12-02 | Ciba Specialty Chemicals Holding Inc. | Anionic photocatalyst |
| ES2181162T3 (es) * | 1997-01-22 | 2003-02-16 | Ciba Sc Holding Ag | Bases fotoactivables que contienen nitrogeno, basadas en alfa-amino-cetonas. |
| WO1998038195A1 (en) | 1997-02-26 | 1998-09-03 | Ciba Specialty Chemicals Holding Inc. | PHOTOACTIVATABLE NITROGEN-CONTAINING BASES BASED ON α-AMMONIUM KETONES, IMINIUM KETONES OR AMIDINIUM KETONES AND ARYL BORATES |
| JPH10306141A (ja) | 1997-03-06 | 1998-11-17 | Toray Ind Inc | 半導体装置およびエポキシ樹脂組成物 |
| CA2283446C (en) * | 1997-03-18 | 2008-05-06 | Ciba Specialty Chemicals Holding Inc. | Photoactivatable nitrogen-containing bases based on .alpha.-amino alkenes |
| EP0898202B1 (en) | 1997-08-22 | 2000-07-19 | Ciba SC Holding AG | Photogeneration of amines from alpha-aminoacetophenones |
| JP2002523393A (ja) | 1998-08-21 | 2002-07-30 | チバ スペシャルティ ケミカルズ ホールディング インコーポレーテッド | 光活性化が可能な窒素含有塩基 |
| WO2001092362A1 (en) | 2000-05-26 | 2001-12-06 | Akzo Nobel N.V. | Photoactivatable coating composition |
-
2002
- 2002-10-08 US US10/491,813 patent/US7538104B2/en not_active Expired - Lifetime
- 2002-10-08 CA CA2459374A patent/CA2459374C/en not_active Expired - Fee Related
- 2002-10-08 AT AT02782851T patent/ATE360629T1/de not_active IP Right Cessation
- 2002-10-08 KR KR1020047005628A patent/KR100938769B1/ko not_active Expired - Fee Related
- 2002-10-08 AU AU2002346968A patent/AU2002346968B2/en not_active Ceased
- 2002-10-08 RU RU2004115329/04A patent/RU2332419C2/ru not_active IP Right Cessation
- 2002-10-08 DE DE60219812T patent/DE60219812T8/de active Active
- 2002-10-08 BR BR0213354-7A patent/BR0213354A/pt not_active Application Discontinuation
- 2002-10-08 WO PCT/EP2002/011238 patent/WO2003033500A1/en not_active Ceased
- 2002-10-08 EP EP02782851A patent/EP1436297B1/en not_active Expired - Lifetime
- 2002-10-08 JP JP2003536239A patent/JP4454309B2/ja not_active Expired - Fee Related
- 2002-10-08 MX MXPA04003564A patent/MXPA04003564A/es active IP Right Grant
- 2002-10-08 CN CN028206002A patent/CN1571788B/zh not_active Expired - Lifetime
-
2004
- 2004-02-25 ZA ZA200401523A patent/ZA200401523B/en unknown
-
2008
- 2008-11-12 US US12/291,604 patent/US8252784B2/en not_active Expired - Fee Related
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