DE60219812T8 - Photoaktivierbare stickstoffbasen - Google Patents

Photoaktivierbare stickstoffbasen Download PDF

Info

Publication number
DE60219812T8
DE60219812T8 DE60219812T DE60219812T DE60219812T8 DE 60219812 T8 DE60219812 T8 DE 60219812T8 DE 60219812 T DE60219812 T DE 60219812T DE 60219812 T DE60219812 T DE 60219812T DE 60219812 T8 DE60219812 T8 DE 60219812T8
Authority
DE
Germany
Prior art keywords
base
photoactivable
bottoms
nitrogen bottoms
photoactivable nitrogen
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE60219812T
Other languages
German (de)
English (en)
Other versions
DE60219812T2 (de
DE60219812D1 (de
Inventor
Gisèle BAUDIN
Kurt Dietliker
Tunja Jung
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BASF Schweiz AG
Original Assignee
Ciba Spezialitaetenchemie Holding AG
Ciba SC Holding AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Spezialitaetenchemie Holding AG, Ciba SC Holding AG filed Critical Ciba Spezialitaetenchemie Holding AG
Application granted granted Critical
Publication of DE60219812D1 publication Critical patent/DE60219812D1/de
Publication of DE60219812T2 publication Critical patent/DE60219812T2/de
Publication of DE60219812T8 publication Critical patent/DE60219812T8/de
Active legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D487/00—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, not provided for by groups C07D451/00 - C07D477/00
    • C07D487/02—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, not provided for by groups C07D451/00 - C07D477/00 in which the condensed system contains two hetero rings
    • C07D487/04—Ortho-condensed systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G03F7/0295—Photolytic halogen compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Inorganic Chemistry (AREA)
  • Nitrogen Condensed Heterocyclic Rings (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Paints Or Removers (AREA)
  • Polymerisation Methods In General (AREA)
  • Nitrogen And Oxygen Or Sulfur-Condensed Heterocyclic Ring Systems (AREA)
  • Light Receiving Elements (AREA)
  • Photoreceptors In Electrophotography (AREA)
  • Polyesters Or Polycarbonates (AREA)
  • Epoxy Resins (AREA)
  • Luminescent Compositions (AREA)
  • Polyurethanes Or Polyureas (AREA)
  • Indole Compounds (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
  • Plural Heterocyclic Compounds (AREA)
  • Heterocyclic Carbon Compounds Containing A Hetero Ring Having Nitrogen And Oxygen As The Only Ring Hetero Atoms (AREA)
  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
DE60219812T 2001-10-17 2002-10-08 Photoaktivierbare stickstoffbasen Active DE60219812T8 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
CH19112001 2001-10-17
CH19112001 2001-10-17
PCT/EP2002/011238 WO2003033500A1 (en) 2001-10-17 2002-10-08 Photoactivable nitrogen bases

Publications (3)

Publication Number Publication Date
DE60219812D1 DE60219812D1 (de) 2007-06-06
DE60219812T2 DE60219812T2 (de) 2008-01-24
DE60219812T8 true DE60219812T8 (de) 2008-05-21

Family

ID=4566758

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60219812T Active DE60219812T8 (de) 2001-10-17 2002-10-08 Photoaktivierbare stickstoffbasen

Country Status (14)

Country Link
US (2) US7538104B2 (https=)
EP (1) EP1436297B1 (https=)
JP (1) JP4454309B2 (https=)
KR (1) KR100938769B1 (https=)
CN (1) CN1571788B (https=)
AT (1) ATE360629T1 (https=)
AU (1) AU2002346968B2 (https=)
BR (1) BR0213354A (https=)
CA (1) CA2459374C (https=)
DE (1) DE60219812T8 (https=)
MX (1) MXPA04003564A (https=)
RU (1) RU2332419C2 (https=)
WO (1) WO2003033500A1 (https=)
ZA (1) ZA200401523B (https=)

Families Citing this family (49)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5283303B2 (ja) * 2003-12-25 2013-09-04 Ｄｉｃ株式会社 転写材用硬化性樹脂組成物、転写材および保護層の形成方法
US20050234208A1 (en) 2004-04-14 2005-10-20 Matthias Koch Fast curing polydiorganosiloxanes
WO2006008251A2 (en) * 2004-07-21 2006-01-26 Ciba Specialty Chemicals Holding Inc. Process for the photoactivation and use of a catalyst by an inverted two-stage procedure
RU2414471C2 (ru) * 2005-02-02 2011-03-20 Циба Спешиалти Кемикэлз Холдинг Инк. Бензотриазоловые поглотители уф-лучей со смещенным в длинноволновую область спектром поглощения и их применение
WO2008037635A1 (en) * 2006-09-29 2008-04-03 Ciba Holding Inc. Photolatent bases for systems based on blocked isocyanates
JP5606308B2 (ja) * 2007-04-03 2014-10-15 ビーエーエスエフ ソシエタス・ヨーロピア 光活性窒素塩基
JP4874854B2 (ja) * 2007-04-10 2012-02-15 富士フイルム株式会社 ホログラフィック記録用組成物およびホログラフィック記録媒体
US20080308003A1 (en) * 2007-06-13 2008-12-18 Krol Andrew M UV inkjet resist
JP5339907B2 (ja) * 2007-06-14 2013-11-13 積水化学工業株式会社 光硬化型粘接着剤組成物
JP2009126974A (ja) * 2007-11-26 2009-06-11 Three Bond Co Ltd 樹脂組成物
CN101925616A (zh) * 2008-01-28 2010-12-22 巴斯夫欧洲公司 用于氧化还原固化可自由基固化的配制剂的光潜脒碱
KR101588912B1 (ko) 2008-03-31 2016-01-26 산아프로 가부시키가이샤 광염기 발생제
DE102008043218A1 (de) 2008-09-24 2010-04-01 Evonik Goldschmidt Gmbh Polymere Werkstoffe sowie daraus bestehende Kleber- und Beschichtungsmittel auf Basis multialkoxysilylfunktioneller Präpolymerer
DE102008049848A1 (de) 2008-10-01 2010-04-08 Tesa Se Mehrbereichsindikator
JP5521999B2 (ja) * 2009-11-26 2014-06-18 住友化学株式会社 化学増幅型フォトレジスト組成物及びレジストパターンの製造方法
US8840993B2 (en) 2010-06-30 2014-09-23 3M Innovative Properties Company Curable polysiloxane coating composition
US8968868B2 (en) 2010-06-30 2015-03-03 3M Innovative Properties Company Curable-on-demand composition comprising dual reactive silane functionality
CN102985503A (zh) 2010-06-30 2013-03-20 3M创新有限公司 包含双重反应性硅烷官能团的可固化组合物
EP2792694A4 (en) 2011-12-16 2015-07-15 Three Bond Fine Chemical Co Ltd Curable resin composition
US9006336B2 (en) 2011-12-29 2015-04-14 3M Innovative Properties Company Curable polysiloxane coating composition
EP2797985B1 (en) 2011-12-29 2015-09-23 3M Innovative Properties Company Curable-on-demand polysiloxane coating composition
CN104470983A (zh) 2011-12-29 2015-03-25 3M创新有限公司 可固化聚硅氧烷组合物
CN104093785B (zh) 2011-12-29 2016-08-24 3M创新有限公司 可固化聚硅氧烷组合物和由其制得的压敏粘合剂
US9018322B2 (en) 2012-06-21 2015-04-28 FRC-DeSoto International, Inc. Controlled release amine-catalyzed, Michael addition-curable sulfur-containing polymer compositions
JP6183642B2 (ja) * 2012-08-10 2017-08-23 株式会社リコー 活性光線硬化組成物、並びにこれを用いた活性光線硬化型インクジェット印刷用インク組成物及び活性光線硬化型接着剤組成物
WO2015008709A1 (ja) 2013-07-18 2015-01-22 セメダイン株式会社 光硬化性組成物
CN105829485B (zh) 2013-12-13 2018-10-12 思美定株式会社 具有粘合性的光固化性组合物
DE102014202609B4 (de) * 2014-02-13 2020-06-04 tooz technologies GmbH Aminkatalysierte Thiolhärtung von Epoxidharzen
US9328274B2 (en) 2014-03-07 2016-05-03 Prc-Desoto International, Inc. Michael acceptor-terminated urethane-containing fuel resistant prepolymers and compositions thereof
US9328275B2 (en) 2014-03-07 2016-05-03 Prc Desoto International, Inc. Phosphine-catalyzed, michael addition-curable sulfur-containing polymer compositions
JP6474489B2 (ja) * 2014-10-29 2019-02-27 テーザ・ソシエタス・ヨーロピア 活性化可能なゲッター材料を含む接着剤
CN105630255B (zh) * 2014-10-31 2019-01-18 昆山瑞咏成精密设备有限公司 单片式ogs触摸屏及其制作方法
US10526440B2 (en) * 2015-04-29 2020-01-07 3M Innovative Properties Company Method of making a polymer network from a polythiol and a polyepoxide
AU2016256186B2 (en) 2015-04-29 2020-01-16 Bsn Medical Gmbh Multi-step process for no production
EP3288517B1 (de) 2015-04-29 2019-07-17 BSN Medical GmbH Medizinische badevorrichtung
WO2018085546A1 (en) 2016-11-03 2018-05-11 3M Innovative Properties Company Composition including a polythiol, a polyepoxide, a photolatent base, and an amine and methods relating to the composition
US11198757B2 (en) 2016-11-03 2021-12-14 3M Innovative Properties Company Compositions including a photolatent amine, camphorquinone, and coumarin and related methods
CA3042860A1 (en) 2016-11-03 2018-05-11 3M Innovative Properties Company Polythiol sealant compositions
JP7109438B2 (ja) 2016-12-05 2022-07-29 アーケマ・インコーポレイテッド 重合開始剤ブレンド物、およびそのような重合開始剤ブレンド物を含む３ｄプリンティングに有用な光硬化性組成物
CN111655749B (zh) 2018-02-02 2023-03-03 巴斯夫欧洲公司 低有机化合物释放的聚氨酯
CN112004851A (zh) * 2018-04-26 2020-11-27 汉高股份有限及两合公司 用作可固化组合物中的潜在催化剂的季氮化合物
CN110643286B (zh) 2018-06-27 2021-11-19 3M创新有限公司 Uv固化组合物及包含该组合物的胶膜、胶带和粘结构件
WO2020065588A1 (en) 2018-09-27 2020-04-02 3M Innovative Properties Company Composition including amino-functional silanes and method of applying a sealant to a substrate
WO2020202076A1 (en) 2019-04-04 2020-10-08 3M Innovative Properties Company Method of irradiating a composition through a substrate
CN113150714B (zh) 2020-01-07 2023-03-10 3M创新有限公司 聚氨酯基可uv固化组合物及包含其的胶膜、胶带和粘结构件
EP3848179A1 (de) 2020-01-10 2021-07-14 Carl Zeiss Vision International GmbH Inkjet-verfahren zur herstellung eines brillenglases
CN111795960B (zh) * 2020-08-10 2022-08-09 齐齐哈尔大学 一种光谱法和比色法检测不同形式碘的分子平台及其制备方法和应用
CN115389476B (zh) * 2022-08-30 2026-01-02 广西大学 无损可视化监测鱼和肉类食品新鲜度的荧光标签及其制备方法
WO2026077954A1 (en) * 2024-10-08 2026-04-16 Chemetall Gmbh Photo-latent bases

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0448154A1 (en) 1990-03-20 1991-09-25 Akzo Nobel N.V. Coating composition including a blocked basic catalyst
WO1992017475A1 (en) * 1991-03-28 1992-10-15 Pfizer Inc. Heterocyclic-cyclic amine derivatives
JP2654339B2 (ja) * 1992-11-24 1997-09-17 インターナショナル・ビジネス・マシーンズ・コーポレイション 感光性レジスト組成物及び基板上にレジスト像を形成する方法
EP0702707A1 (en) 1993-05-26 1996-03-27 Akzo Nobel N.V. Coating composition including a uv-deblockable basic catalyst
JP3206310B2 (ja) * 1994-07-01 2001-09-10 ダイキン工業株式会社 表面改質されたフッ素樹脂成形品
US5998496A (en) 1995-10-31 1999-12-07 Spectra Group Limited, Inc. Photosensitive intramolecular electron transfer compounds
AU713498B2 (en) 1996-02-22 1999-12-02 Ciba Specialty Chemicals Holding Inc. Anionic photocatalyst
BR9807502B1 (pt) * 1997-01-22 2008-11-18 compostos orgÂnicos, processo para sua preparaÇço, bem como composiÇço e aplicaÇço dos mesmos.
JP4155603B2 (ja) 1997-02-26 2008-09-24 チバ スペシャルティ ケミカルズ ホールディング インコーポレーテッド α−アンモニウムケトン、イミニウムケトンまたはアミジニウムケトンおよびアリールボラートに基づく、光による活性化が可能な窒素含有塩基
JPH10306141A (ja) 1997-03-06 1998-11-17 Toray Ind Inc 半導体装置およびエポキシ樹脂組成物
JP4308326B2 (ja) * 1997-03-18 2009-08-05 チバ スペシャルティ ケミカルズ ホールディング インコーポレーテッド α−アミノアルケン類に基づく光励起性の窒素含有塩基類
EP0898202B1 (en) 1997-08-22 2000-07-19 Ciba SC Holding AG Photogeneration of amines from alpha-aminoacetophenones
DE59903270D1 (de) 1998-08-21 2002-12-05 Ciba Sc Holding Ag Photoaktivierbare stickstoffhaltige basen
AU2001260325B2 (en) 2000-05-26 2005-03-10 Akzo Nobel N.V. Photoactivatable coating composition

Also Published As

Publication number Publication date
WO2003033500B1 (en) 2003-12-11
US20040242867A1 (en) 2004-12-02
AU2002346968B2 (en) 2008-04-10
EP1436297A1 (en) 2004-07-14
DE60219812T2 (de) 2008-01-24
RU2332419C2 (ru) 2008-08-27
JP2005511536A (ja) 2005-04-28
CA2459374A1 (en) 2003-04-24
US7538104B2 (en) 2009-05-26
RU2004115329A (ru) 2005-10-27
DE60219812D1 (de) 2007-06-06
KR20050034614A (ko) 2005-04-14
BR0213354A (pt) 2004-10-26
US20090076200A1 (en) 2009-03-19
EP1436297B1 (en) 2007-04-25
US8252784B2 (en) 2012-08-28
CN1571788B (zh) 2012-08-01
ZA200401523B (en) 2004-12-14
CA2459374C (en) 2011-02-08
ATE360629T1 (de) 2007-05-15
KR100938769B1 (ko) 2010-01-27
JP4454309B2 (ja) 2010-04-21
CN1571788A (zh) 2005-01-26
WO2003033500A1 (en) 2003-04-24
MXPA04003564A (es) 2004-07-23

Similar Documents

Publication Publication Date Title
DE60219812D1 (de) Photoaktivierbare stickstoffbasen
GB0115862D0 (en) Compounds
CY1110064T1 (el) Παραγωγα φαινυλ-πιπεραζινης ως αναστολεις επαναπροσληψης σεροτονινης
ATE365740T1 (de) Substituierte pyrazolopyrimidine
BRPI0411897A (pt) pirroldihidroisoquinolinas como inibidores de pde10
BR0313330A (pt) Piperidina-ftalazonas substituìdas com pirrolidinadiona como inibidores de pde4
GB0100889D0 (en) Compounds
DE60222396D1 (de) N-(2-arylethyl) benzylamine als 5-ht6 rezeptor-antagoniste
BRPI0416869A (pt) 5,7-diaminopirazolo '4,3-dipirimidinas com atividade de inibição de pde-5
DE60309848D1 (de) Purinderivate als kinaseinhibitoren
ATE423557T1 (de) Carbocyclische kaliumkanalhemmer
SE0301373D0 (sv) Novel compounds
BRPI0414593A (pt) derivados de ácido sulfonamida substituìda-indol-2-carboxìlico como inibidores de pai-1
BRPI0413973A (pt) compostos
EA200601007A1 (ru) 7-фенилалкилзамещённые 2-хинолиноны и 2-хиноксалиноны в качестве ингибиторов поли(адф-рибоза)полимеразы
ATE452892T1 (de) Substituierte 8-perfluoro-6,7,8,9- tetrahydropyrimido-(1,2a) pyrimidin-4-on derivate
ATE438398T1 (de) Pyrrolo-dihydroisochinolin-derivate als pde10- inhibitoren
DE60204701D1 (de) Tricyclische imidazopyridine
BR0317284A (pt) Inibidores aminocianopiridina de proteìna quinase-2 ativada com proteìna quinase ativada com mitógeno
DK1534707T3 (da) Substituerede 2,4-dihydropyrrolo[3,4-b]quinolin-9-on-derivater egnede som phosphodiesteraseinhibitorer
ATE256684T1 (de) Am sechsring substituierte, bicyclische imidazo-3-yl-aminderivate
SE9901077D0 (sv) Novel use
NO20050019L (no) Polytylenglykolaldehyd-derivater
HRP20080057T3 (en) 9,10-alpha,alpha-oh-taxane analogs and methods for production thereof
ATE282605T1 (de) 2-thio-subsituierte imidazolderivative und ihre verwendung in der pharmazie

Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: CIBA HOLDING INC., BASEL, CH

8328 Change in the person/name/address of the agent

Representative=s name: MAIWALD PATENTANWALTSGESELLSCHAFT MBH, 80335 MUENC