CN1571788B - 光活化性氮碱 - Google Patents

光活化性氮碱 Download PDF

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Publication number
CN1571788B
CN1571788B CN028206002A CN02820600A CN1571788B CN 1571788 B CN1571788 B CN 1571788B CN 028206002 A CN028206002 A CN 028206002A CN 02820600 A CN02820600 A CN 02820600A CN 1571788 B CN1571788 B CN 1571788B
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CN
China
Prior art keywords
alkyl
group
general formula
phenyl
base
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
CN028206002A
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English (en)
Chinese (zh)
Other versions
CN1571788A (zh
Inventor
G·博丹
K·迪特利克
T·容
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BASF Schweiz AG
Original Assignee
Ciba Spezialitaetenchemie Holding AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Spezialitaetenchemie Holding AG filed Critical Ciba Spezialitaetenchemie Holding AG
Publication of CN1571788A publication Critical patent/CN1571788A/zh
Application granted granted Critical
Publication of CN1571788B publication Critical patent/CN1571788B/zh
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D487/00—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, not provided for by groups C07D451/00 - C07D477/00
    • C07D487/02—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, not provided for by groups C07D451/00 - C07D477/00 in which the condensed system contains two hetero rings
    • C07D487/04—Ortho-condensed systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G03F7/0295—Photolytic halogen compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Inorganic Chemistry (AREA)
  • Nitrogen Condensed Heterocyclic Rings (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Paints Or Removers (AREA)
  • Polymerisation Methods In General (AREA)
  • Photoreceptors In Electrophotography (AREA)
  • Nitrogen And Oxygen Or Sulfur-Condensed Heterocyclic Ring Systems (AREA)
  • Polyurethanes Or Polyureas (AREA)
  • Epoxy Resins (AREA)
  • Light Receiving Elements (AREA)
  • Luminescent Compositions (AREA)
  • Polyesters Or Polycarbonates (AREA)
  • Heterocyclic Carbon Compounds Containing A Hetero Ring Having Nitrogen And Oxygen As The Only Ring Hetero Atoms (AREA)
  • Plural Heterocyclic Compounds (AREA)
  • Indole Compounds (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
CN028206002A 2001-10-17 2002-10-08 光活化性氮碱 Expired - Lifetime CN1571788B (zh)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
CH19112001 2001-10-17
CH20011911/01 2001-10-17
CH20011911/2001 2001-10-17
PCT/EP2002/011238 WO2003033500A1 (en) 2001-10-17 2002-10-08 Photoactivable nitrogen bases

Publications (2)

Publication Number Publication Date
CN1571788A CN1571788A (zh) 2005-01-26
CN1571788B true CN1571788B (zh) 2012-08-01

Family

ID=4566758

Family Applications (1)

Application Number Title Priority Date Filing Date
CN028206002A Expired - Lifetime CN1571788B (zh) 2001-10-17 2002-10-08 光活化性氮碱

Country Status (14)

Country Link
US (2) US7538104B2 (https=)
EP (1) EP1436297B1 (https=)
JP (1) JP4454309B2 (https=)
KR (1) KR100938769B1 (https=)
CN (1) CN1571788B (https=)
AT (1) ATE360629T1 (https=)
AU (1) AU2002346968B2 (https=)
BR (1) BR0213354A (https=)
CA (1) CA2459374C (https=)
DE (1) DE60219812T8 (https=)
MX (1) MXPA04003564A (https=)
RU (1) RU2332419C2 (https=)
WO (1) WO2003033500A1 (https=)
ZA (1) ZA200401523B (https=)

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RU2009115962A (ru) * 2006-09-29 2010-11-10 Циба Холдинг Инк. (Ch) Фотолатентные основания для систем, основанных на блокированных изоцианатах
KR101514093B1 (ko) 2007-04-03 2015-04-21 바스프 에스이 광활성화가능한 질소 염기
JP4874854B2 (ja) * 2007-04-10 2012-02-15 富士フイルム株式会社 ホログラフィック記録用組成物およびホログラフィック記録媒体
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JP5339907B2 (ja) * 2007-06-14 2013-11-13 積水化学工業株式会社 光硬化型粘接着剤組成物
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JP2013532223A (ja) * 2010-06-30 2013-08-15 スリーエム イノベイティブ プロパティズ カンパニー オンデマンド型硬化性ポリシロキサンコーティング組成物
JP5818890B2 (ja) 2010-06-30 2015-11-18 スリーエム イノベイティブ プロパティズ カンパニー 二重反応性シラン官能基を含む硬化性組成物
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KR102305831B1 (ko) 2013-07-18 2021-09-27 세메다인 가부시키 가이샤 광경화성 조성물, 경화물 및 그의 제조 방법, 그리고 관련 제품 및 그의 제조 방법
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Also Published As

Publication number Publication date
DE60219812T2 (de) 2008-01-24
JP4454309B2 (ja) 2010-04-21
WO2003033500B1 (en) 2003-12-11
US20090076200A1 (en) 2009-03-19
KR20050034614A (ko) 2005-04-14
US8252784B2 (en) 2012-08-28
CA2459374A1 (en) 2003-04-24
MXPA04003564A (es) 2004-07-23
EP1436297A1 (en) 2004-07-14
RU2004115329A (ru) 2005-10-27
ATE360629T1 (de) 2007-05-15
DE60219812D1 (de) 2007-06-06
AU2002346968B2 (en) 2008-04-10
CA2459374C (en) 2011-02-08
US20040242867A1 (en) 2004-12-02
ZA200401523B (en) 2004-12-14
JP2005511536A (ja) 2005-04-28
US7538104B2 (en) 2009-05-26
RU2332419C2 (ru) 2008-08-27
DE60219812T8 (de) 2008-05-21
EP1436297B1 (en) 2007-04-25
WO2003033500A1 (en) 2003-04-24
CN1571788A (zh) 2005-01-26
BR0213354A (pt) 2004-10-26
KR100938769B1 (ko) 2010-01-27

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Granted publication date: 20120801