CN1571788B - 光活化性氮碱 - Google Patents

光活化性氮碱 Download PDF

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Publication number
CN1571788B
CN1571788B CN028206002A CN02820600A CN1571788B CN 1571788 B CN1571788 B CN 1571788B CN 028206002 A CN028206002 A CN 028206002A CN 02820600 A CN02820600 A CN 02820600A CN 1571788 B CN1571788 B CN 1571788B
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CN
China
Prior art keywords
alkyl
group
general formula
phenyl
base
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
CN028206002A
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English (en)
Chinese (zh)
Other versions
CN1571788A (zh
Inventor
G·博丹
K·迪特利克
T·容
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BASF Schweiz AG
Original Assignee
Ciba Spezialitaetenchemie Holding AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Spezialitaetenchemie Holding AG filed Critical Ciba Spezialitaetenchemie Holding AG
Publication of CN1571788A publication Critical patent/CN1571788A/zh
Application granted granted Critical
Publication of CN1571788B publication Critical patent/CN1571788B/zh
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D487/00—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, not provided for by groups C07D451/00 - C07D477/00
    • C07D487/02—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, not provided for by groups C07D451/00 - C07D477/00 in which the condensed system contains two hetero rings
    • C07D487/04—Ortho-condensed systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G03F7/0295—Photolytic halogen compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Inorganic Chemistry (AREA)
  • Nitrogen Condensed Heterocyclic Rings (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Paints Or Removers (AREA)
  • Polymerisation Methods In General (AREA)
  • Nitrogen And Oxygen Or Sulfur-Condensed Heterocyclic Ring Systems (AREA)
  • Light Receiving Elements (AREA)
  • Photoreceptors In Electrophotography (AREA)
  • Polyesters Or Polycarbonates (AREA)
  • Epoxy Resins (AREA)
  • Luminescent Compositions (AREA)
  • Polyurethanes Or Polyureas (AREA)
  • Indole Compounds (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
  • Plural Heterocyclic Compounds (AREA)
  • Heterocyclic Carbon Compounds Containing A Hetero Ring Having Nitrogen And Oxygen As The Only Ring Hetero Atoms (AREA)
  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
CN028206002A 2001-10-17 2002-10-08 光活化性氮碱 Expired - Lifetime CN1571788B (zh)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
CH20011911/2001 2001-10-17
CH20011911/01 2001-10-17
CH19112001 2001-10-17
PCT/EP2002/011238 WO2003033500A1 (en) 2001-10-17 2002-10-08 Photoactivable nitrogen bases

Publications (2)

Publication Number Publication Date
CN1571788A CN1571788A (zh) 2005-01-26
CN1571788B true CN1571788B (zh) 2012-08-01

Family

ID=4566758

Family Applications (1)

Application Number Title Priority Date Filing Date
CN028206002A Expired - Lifetime CN1571788B (zh) 2001-10-17 2002-10-08 光活化性氮碱

Country Status (14)

Country Link
US (2) US7538104B2 (https=)
EP (1) EP1436297B1 (https=)
JP (1) JP4454309B2 (https=)
KR (1) KR100938769B1 (https=)
CN (1) CN1571788B (https=)
AT (1) ATE360629T1 (https=)
AU (1) AU2002346968B2 (https=)
BR (1) BR0213354A (https=)
CA (1) CA2459374C (https=)
DE (1) DE60219812T8 (https=)
MX (1) MXPA04003564A (https=)
RU (1) RU2332419C2 (https=)
WO (1) WO2003033500A1 (https=)
ZA (1) ZA200401523B (https=)

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US20050234208A1 (en) 2004-04-14 2005-10-20 Matthias Koch Fast curing polydiorganosiloxanes
WO2006008251A2 (en) * 2004-07-21 2006-01-26 Ciba Specialty Chemicals Holding Inc. Process for the photoactivation and use of a catalyst by an inverted two-stage procedure
RU2414471C2 (ru) * 2005-02-02 2011-03-20 Циба Спешиалти Кемикэлз Холдинг Инк. Бензотриазоловые поглотители уф-лучей со смещенным в длинноволновую область спектром поглощения и их применение
WO2008037635A1 (en) * 2006-09-29 2008-04-03 Ciba Holding Inc. Photolatent bases for systems based on blocked isocyanates
JP5606308B2 (ja) * 2007-04-03 2014-10-15 ビーエーエスエフ ソシエタス・ヨーロピア 光活性窒素塩基
JP4874854B2 (ja) * 2007-04-10 2012-02-15 富士フイルム株式会社 ホログラフィック記録用組成物およびホログラフィック記録媒体
US20080308003A1 (en) * 2007-06-13 2008-12-18 Krol Andrew M UV inkjet resist
JP5339907B2 (ja) * 2007-06-14 2013-11-13 積水化学工業株式会社 光硬化型粘接着剤組成物
JP2009126974A (ja) * 2007-11-26 2009-06-11 Three Bond Co Ltd 樹脂組成物
CN101925616A (zh) * 2008-01-28 2010-12-22 巴斯夫欧洲公司 用于氧化还原固化可自由基固化的配制剂的光潜脒碱
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DE102008043218A1 (de) 2008-09-24 2010-04-01 Evonik Goldschmidt Gmbh Polymere Werkstoffe sowie daraus bestehende Kleber- und Beschichtungsmittel auf Basis multialkoxysilylfunktioneller Präpolymerer
DE102008049848A1 (de) 2008-10-01 2010-04-08 Tesa Se Mehrbereichsindikator
JP5521999B2 (ja) * 2009-11-26 2014-06-18 住友化学株式会社 化学増幅型フォトレジスト組成物及びレジストパターンの製造方法
US8840993B2 (en) 2010-06-30 2014-09-23 3M Innovative Properties Company Curable polysiloxane coating composition
US8968868B2 (en) 2010-06-30 2015-03-03 3M Innovative Properties Company Curable-on-demand composition comprising dual reactive silane functionality
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CN104470983A (zh) 2011-12-29 2015-03-25 3M创新有限公司 可固化聚硅氧烷组合物
CN104093785B (zh) 2011-12-29 2016-08-24 3M创新有限公司 可固化聚硅氧烷组合物和由其制得的压敏粘合剂
US9018322B2 (en) 2012-06-21 2015-04-28 FRC-DeSoto International, Inc. Controlled release amine-catalyzed, Michael addition-curable sulfur-containing polymer compositions
JP6183642B2 (ja) * 2012-08-10 2017-08-23 株式会社リコー 活性光線硬化組成物、並びにこれを用いた活性光線硬化型インクジェット印刷用インク組成物及び活性光線硬化型接着剤組成物
WO2015008709A1 (ja) 2013-07-18 2015-01-22 セメダイン株式会社 光硬化性組成物
CN105829485B (zh) 2013-12-13 2018-10-12 思美定株式会社 具有粘合性的光固化性组合物
DE102014202609B4 (de) * 2014-02-13 2020-06-04 tooz technologies GmbH Aminkatalysierte Thiolhärtung von Epoxidharzen
US9328274B2 (en) 2014-03-07 2016-05-03 Prc-Desoto International, Inc. Michael acceptor-terminated urethane-containing fuel resistant prepolymers and compositions thereof
US9328275B2 (en) 2014-03-07 2016-05-03 Prc Desoto International, Inc. Phosphine-catalyzed, michael addition-curable sulfur-containing polymer compositions
JP6474489B2 (ja) * 2014-10-29 2019-02-27 テーザ・ソシエタス・ヨーロピア 活性化可能なゲッター材料を含む接着剤
CN105630255B (zh) * 2014-10-31 2019-01-18 昆山瑞咏成精密设备有限公司 单片式ogs触摸屏及其制作方法
US10526440B2 (en) * 2015-04-29 2020-01-07 3M Innovative Properties Company Method of making a polymer network from a polythiol and a polyepoxide
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WO2018085546A1 (en) 2016-11-03 2018-05-11 3M Innovative Properties Company Composition including a polythiol, a polyepoxide, a photolatent base, and an amine and methods relating to the composition
US11198757B2 (en) 2016-11-03 2021-12-14 3M Innovative Properties Company Compositions including a photolatent amine, camphorquinone, and coumarin and related methods
CA3042860A1 (en) 2016-11-03 2018-05-11 3M Innovative Properties Company Polythiol sealant compositions
JP7109438B2 (ja) 2016-12-05 2022-07-29 アーケマ・インコーポレイテッド 重合開始剤ブレンド物、およびそのような重合開始剤ブレンド物を含む３ｄプリンティングに有用な光硬化性組成物
CN111655749B (zh) 2018-02-02 2023-03-03 巴斯夫欧洲公司 低有机化合物释放的聚氨酯
CN112004851A (zh) * 2018-04-26 2020-11-27 汉高股份有限及两合公司 用作可固化组合物中的潜在催化剂的季氮化合物
CN110643286B (zh) 2018-06-27 2021-11-19 3M创新有限公司 Uv固化组合物及包含该组合物的胶膜、胶带和粘结构件
WO2020065588A1 (en) 2018-09-27 2020-04-02 3M Innovative Properties Company Composition including amino-functional silanes and method of applying a sealant to a substrate
WO2020202076A1 (en) 2019-04-04 2020-10-08 3M Innovative Properties Company Method of irradiating a composition through a substrate
CN113150714B (zh) 2020-01-07 2023-03-10 3M创新有限公司 聚氨酯基可uv固化组合物及包含其的胶膜、胶带和粘结构件
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Also Published As

Publication number Publication date
WO2003033500B1 (en) 2003-12-11
US20040242867A1 (en) 2004-12-02
DE60219812T8 (de) 2008-05-21
AU2002346968B2 (en) 2008-04-10
EP1436297A1 (en) 2004-07-14
DE60219812T2 (de) 2008-01-24
RU2332419C2 (ru) 2008-08-27
JP2005511536A (ja) 2005-04-28
CA2459374A1 (en) 2003-04-24
US7538104B2 (en) 2009-05-26
RU2004115329A (ru) 2005-10-27
DE60219812D1 (de) 2007-06-06
KR20050034614A (ko) 2005-04-14
BR0213354A (pt) 2004-10-26
US20090076200A1 (en) 2009-03-19
EP1436297B1 (en) 2007-04-25
US8252784B2 (en) 2012-08-28
ZA200401523B (en) 2004-12-14
CA2459374C (en) 2011-02-08
ATE360629T1 (de) 2007-05-15
KR100938769B1 (ko) 2010-01-27
JP4454309B2 (ja) 2010-04-21
CN1571788A (zh) 2005-01-26
WO2003033500A1 (en) 2003-04-24
MXPA04003564A (es) 2004-07-23

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