JP4454309B2 - 光活性化窒素塩基 - Google Patents

光活性化窒素塩基 Download PDF

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Publication number
JP4454309B2
JP4454309B2 JP2003536239A JP2003536239A JP4454309B2 JP 4454309 B2 JP4454309 B2 JP 4454309B2 JP 2003536239 A JP2003536239 A JP 2003536239A JP 2003536239 A JP2003536239 A JP 2003536239A JP 4454309 B2 JP4454309 B2 JP 4454309B2
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JP
Japan
Prior art keywords
alkyl
substituted
unsubstituted
formula
groups
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2003536239A
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English (en)
Japanese (ja)
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JP2005511536A (ja
JP2005511536A5 (https=
Inventor
ボーダン，ジゼル
ディートリカー，クルト
ユング，トゥニヤ
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BASF Schweiz AG
Original Assignee
Ciba Holding AG
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Publication date
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Publication of JP2005511536A5 publication Critical patent/JP2005511536A5/ja
Application granted granted Critical
Publication of JP4454309B2 publication Critical patent/JP4454309B2/ja
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Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D487/00—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, not provided for by groups C07D451/00 - C07D477/00
    • C07D487/02—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, not provided for by groups C07D451/00 - C07D477/00 in which the condensed system contains two hetero rings
    • C07D487/04—Ortho-condensed systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G03F7/0295—Photolytic halogen compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Inorganic Chemistry (AREA)
  • Nitrogen Condensed Heterocyclic Rings (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Paints Or Removers (AREA)
  • Polymerisation Methods In General (AREA)
  • Photoreceptors In Electrophotography (AREA)
  • Nitrogen And Oxygen Or Sulfur-Condensed Heterocyclic Ring Systems (AREA)
  • Polyurethanes Or Polyureas (AREA)
  • Epoxy Resins (AREA)
  • Light Receiving Elements (AREA)
  • Luminescent Compositions (AREA)
  • Polyesters Or Polycarbonates (AREA)
  • Heterocyclic Carbon Compounds Containing A Hetero Ring Having Nitrogen And Oxygen As The Only Ring Hetero Atoms (AREA)
  • Plural Heterocyclic Compounds (AREA)
  • Indole Compounds (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
JP2003536239A 2001-10-17 2002-10-08 光活性化窒素塩基 Expired - Fee Related JP4454309B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CH19112001 2001-10-17
PCT/EP2002/011238 WO2003033500A1 (en) 2001-10-17 2002-10-08 Photoactivable nitrogen bases

Publications (3)

Publication Number Publication Date
JP2005511536A JP2005511536A (ja) 2005-04-28
JP2005511536A5 JP2005511536A5 (https=) 2009-07-30
JP4454309B2 true JP4454309B2 (ja) 2010-04-21

Family

ID=4566758

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003536239A Expired - Fee Related JP4454309B2 (ja) 2001-10-17 2002-10-08 光活性化窒素塩基

Country Status (14)

Country Link
US (2) US7538104B2 (https=)
EP (1) EP1436297B1 (https=)
JP (1) JP4454309B2 (https=)
KR (1) KR100938769B1 (https=)
CN (1) CN1571788B (https=)
AT (1) ATE360629T1 (https=)
AU (1) AU2002346968B2 (https=)
BR (1) BR0213354A (https=)
CA (1) CA2459374C (https=)
DE (1) DE60219812T8 (https=)
MX (1) MXPA04003564A (https=)
RU (1) RU2332419C2 (https=)
WO (1) WO2003033500A1 (https=)
ZA (1) ZA200401523B (https=)

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RU2009115962A (ru) * 2006-09-29 2010-11-10 Циба Холдинг Инк. (Ch) Фотолатентные основания для систем, основанных на блокированных изоцианатах
KR101514093B1 (ko) 2007-04-03 2015-04-21 바스프 에스이 광활성화가능한 질소 염기
JP4874854B2 (ja) * 2007-04-10 2012-02-15 富士フイルム株式会社 ホログラフィック記録用組成物およびホログラフィック記録媒体
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KR102305831B1 (ko) 2013-07-18 2021-09-27 세메다인 가부시키 가이샤 광경화성 조성물, 경화물 및 그의 제조 방법, 그리고 관련 제품 및 그의 제조 방법
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CN105630255B (zh) * 2014-10-31 2019-01-18 昆山瑞咏成精密设备有限公司 单片式ogs触摸屏及其制作方法
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Also Published As

Publication number Publication date
DE60219812T2 (de) 2008-01-24
WO2003033500B1 (en) 2003-12-11
US20090076200A1 (en) 2009-03-19
KR20050034614A (ko) 2005-04-14
US8252784B2 (en) 2012-08-28
CN1571788B (zh) 2012-08-01
CA2459374A1 (en) 2003-04-24
MXPA04003564A (es) 2004-07-23
EP1436297A1 (en) 2004-07-14
RU2004115329A (ru) 2005-10-27
ATE360629T1 (de) 2007-05-15
DE60219812D1 (de) 2007-06-06
AU2002346968B2 (en) 2008-04-10
CA2459374C (en) 2011-02-08
US20040242867A1 (en) 2004-12-02
ZA200401523B (en) 2004-12-14
JP2005511536A (ja) 2005-04-28
US7538104B2 (en) 2009-05-26
RU2332419C2 (ru) 2008-08-27
DE60219812T8 (de) 2008-05-21
EP1436297B1 (en) 2007-04-25
WO2003033500A1 (en) 2003-04-24
CN1571788A (zh) 2005-01-26
BR0213354A (pt) 2004-10-26
KR100938769B1 (ko) 2010-01-27

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