AU2002346968B2 - Photoactivable nitrogen bases - Google Patents

Photoactivable nitrogen bases Download PDF

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Publication number
AU2002346968B2
AU2002346968B2 AU2002346968A AU2002346968A AU2002346968B2 AU 2002346968 B2 AU2002346968 B2 AU 2002346968B2 AU 2002346968 A AU2002346968 A AU 2002346968A AU 2002346968 A AU2002346968 A AU 2002346968A AU 2002346968 B2 AU2002346968 B2 AU 2002346968B2
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AU
Australia
Prior art keywords
alkyl
substituted
unsubstituted
formula
hydrogen
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
AU2002346968A
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English (en)
Other versions
AU2002346968A1 (en
Inventor
Gisele Baudin
Kurt Dietliker
Tunja Jung
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BASF Schweiz AG
Original Assignee
Ciba Spezialitaetenchemie Holding AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Spezialitaetenchemie Holding AG filed Critical Ciba Spezialitaetenchemie Holding AG
Publication of AU2002346968A1 publication Critical patent/AU2002346968A1/en
Application granted granted Critical
Publication of AU2002346968B2 publication Critical patent/AU2002346968B2/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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Classifications

    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D487/00Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, not provided for by groups C07D451/00 - C07D477/00
    • C07D487/02Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, not provided for by groups C07D451/00 - C07D477/00 in which the condensed system contains two hetero rings
    • C07D487/04Ortho-condensed systems
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/0045Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G03F7/0295Photolytic halogen compounds
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031Organic compounds not covered by group G03F7/029

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  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Inorganic Chemistry (AREA)
  • Nitrogen Condensed Heterocyclic Rings (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Paints Or Removers (AREA)
  • Polymerisation Methods In General (AREA)
  • Photoreceptors In Electrophotography (AREA)
  • Nitrogen And Oxygen Or Sulfur-Condensed Heterocyclic Ring Systems (AREA)
  • Polyurethanes Or Polyureas (AREA)
  • Epoxy Resins (AREA)
  • Light Receiving Elements (AREA)
  • Luminescent Compositions (AREA)
  • Polyesters Or Polycarbonates (AREA)
  • Heterocyclic Carbon Compounds Containing A Hetero Ring Having Nitrogen And Oxygen As The Only Ring Hetero Atoms (AREA)
  • Plural Heterocyclic Compounds (AREA)
  • Indole Compounds (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
AU2002346968A 2001-10-17 2002-10-08 Photoactivable nitrogen bases Ceased AU2002346968B2 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
CH19112001 2001-10-17
CH20011911/01 2001-10-17
PCT/EP2002/011238 WO2003033500A1 (en) 2001-10-17 2002-10-08 Photoactivable nitrogen bases

Publications (2)

Publication Number Publication Date
AU2002346968A1 AU2002346968A1 (en) 2003-07-03
AU2002346968B2 true AU2002346968B2 (en) 2008-04-10

Family

ID=4566758

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2002346968A Ceased AU2002346968B2 (en) 2001-10-17 2002-10-08 Photoactivable nitrogen bases

Country Status (14)

Country Link
US (2) US7538104B2 (https=)
EP (1) EP1436297B1 (https=)
JP (1) JP4454309B2 (https=)
KR (1) KR100938769B1 (https=)
CN (1) CN1571788B (https=)
AT (1) ATE360629T1 (https=)
AU (1) AU2002346968B2 (https=)
BR (1) BR0213354A (https=)
CA (1) CA2459374C (https=)
DE (1) DE60219812T8 (https=)
MX (1) MXPA04003564A (https=)
RU (1) RU2332419C2 (https=)
WO (1) WO2003033500A1 (https=)
ZA (1) ZA200401523B (https=)

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Also Published As

Publication number Publication date
DE60219812T2 (de) 2008-01-24
JP4454309B2 (ja) 2010-04-21
WO2003033500B1 (en) 2003-12-11
US20090076200A1 (en) 2009-03-19
KR20050034614A (ko) 2005-04-14
US8252784B2 (en) 2012-08-28
CN1571788B (zh) 2012-08-01
CA2459374A1 (en) 2003-04-24
MXPA04003564A (es) 2004-07-23
EP1436297A1 (en) 2004-07-14
RU2004115329A (ru) 2005-10-27
ATE360629T1 (de) 2007-05-15
DE60219812D1 (de) 2007-06-06
CA2459374C (en) 2011-02-08
US20040242867A1 (en) 2004-12-02
ZA200401523B (en) 2004-12-14
JP2005511536A (ja) 2005-04-28
US7538104B2 (en) 2009-05-26
RU2332419C2 (ru) 2008-08-27
DE60219812T8 (de) 2008-05-21
EP1436297B1 (en) 2007-04-25
WO2003033500A1 (en) 2003-04-24
CN1571788A (zh) 2005-01-26
BR0213354A (pt) 2004-10-26
KR100938769B1 (ko) 2010-01-27

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FGA Letters patent sealed or granted (standard patent)
MK14 Patent ceased section 143(a) (annual fees not paid) or expired