IL138374A - An ultraviolet laser device and an exposure device that includes such a device - Google Patents

An ultraviolet laser device and an exposure device that includes such a device

Info

Publication number
IL138374A
IL138374A IL13837498A IL13837498A IL138374A IL 138374 A IL138374 A IL 138374A IL 13837498 A IL13837498 A IL 13837498A IL 13837498 A IL13837498 A IL 13837498A IL 138374 A IL138374 A IL 138374A
Authority
IL
Israel
Prior art keywords
light
wavelength
laser
fiber
ultraviolet
Prior art date
Application number
IL13837498A
Other languages
English (en)
Hebrew (he)
Other versions
IL138374A0 (en
Inventor
Tomoko Ohtsuki
Soichi Owa
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of IL138374A0 publication Critical patent/IL138374A0/xx
Publication of IL138374A publication Critical patent/IL138374A/en

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/06Construction or shape of active medium
    • H01S3/063Waveguide lasers, i.e. whereby the dimensions of the waveguide are of the order of the light wavelength
    • H01S3/067Fibre lasers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/106Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity
    • H01S3/108Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity using non-linear optical devices, e.g. exhibiting Brillouin or Raman scattering
    • H01S3/109Frequency multiplication, e.g. harmonic generation
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/14Mode converters
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/24Coupling light guides
    • G02B6/26Optical coupling means
    • G02B6/32Optical coupling means having lens focusing means positioned between opposed fibre ends
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303Apparatus specially adapted to the manufacture of LCDs
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/35Non-linear optics
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/35Non-linear optics
    • G02F1/3501Constructional details or arrangements of non-linear optical devices, e.g. shape of non-linear crystals
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/35Non-linear optics
    • G02F1/353Frequency conversion, i.e. wherein a light beam is generated with frequency components different from those of the incident light beams
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008Production of exposure light, i.e. light sources
    • G03F7/70025Production of exposure light, i.e. light sources by lasers
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70575Wavelength control, e.g. control of bandwidth, multiple wavelength, selection of wavelength or matching of optical components to wavelength
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/06Construction or shape of active medium
    • H01S3/063Waveguide lasers, i.e. whereby the dimensions of the waveguide are of the order of the light wavelength
    • H01S3/067Fibre lasers
    • H01S3/06754Fibre amplifiers
    • H01S3/06758Tandem amplifiers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/23Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media
    • H01S3/2383Parallel arrangements
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/35Non-linear optics
    • G02F1/3501Constructional details or arrangements of non-linear optical devices, e.g. shape of non-linear crystals
    • G02F1/3503Structural association of optical elements, e.g. lenses, with the non-linear optical device
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/35Non-linear optics
    • G02F1/353Frequency conversion, i.e. wherein a light beam is generated with frequency components different from those of the incident light beams
    • G02F1/354Third or higher harmonic generation
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/35Non-linear optics
    • G02F1/37Non-linear optics for second-harmonic generation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/005Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/005Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
    • H01S3/0057Temporal shaping, e.g. pulse compression, frequency chirping
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/005Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
    • H01S3/0064Anti-reflection devices, e.g. optical isolaters
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/005Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
    • H01S3/0078Frequency filtering
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/005Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
    • H01S3/0085Modulating the output, i.e. the laser beam is modulated outside the laser cavity
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/06Construction or shape of active medium
    • H01S3/063Waveguide lasers, i.e. whereby the dimensions of the waveguide are of the order of the light wavelength
    • H01S3/067Fibre lasers
    • H01S3/06708Constructional details of the fibre, e.g. compositions, cross-section, shape or tapering
    • H01S3/06716Fibre compositions or doping with active elements
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/06Construction or shape of active medium
    • H01S3/063Waveguide lasers, i.e. whereby the dimensions of the waveguide are of the order of the light wavelength
    • H01S3/067Fibre lasers
    • H01S3/06708Constructional details of the fibre, e.g. compositions, cross-section, shape or tapering
    • H01S3/06729Peculiar transverse fibre profile
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/06Construction or shape of active medium
    • H01S3/063Waveguide lasers, i.e. whereby the dimensions of the waveguide are of the order of the light wavelength
    • H01S3/067Fibre lasers
    • H01S3/06708Constructional details of the fibre, e.g. compositions, cross-section, shape or tapering
    • H01S3/06745Tapering of the fibre, core or active region
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/06Construction or shape of active medium
    • H01S3/063Waveguide lasers, i.e. whereby the dimensions of the waveguide are of the order of the light wavelength
    • H01S3/067Fibre lasers
    • H01S3/06754Fibre amplifiers
    • H01S3/06762Fibre amplifiers having a specific amplification band
    • H01S3/06766C-band amplifiers, i.e. amplification in the range of about 1530 nm to 1560 nm
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09Processes or apparatus for excitation, e.g. pumping
    • H01S3/091Processes or apparatus for excitation, e.g. pumping using optical pumping
    • H01S3/094Processes or apparatus for excitation, e.g. pumping using optical pumping by coherent light
    • H01S3/094003Processes or apparatus for excitation, e.g. pumping using optical pumping by coherent light the pumped medium being a fibre
    • H01S3/094011Processes or apparatus for excitation, e.g. pumping using optical pumping by coherent light the pumped medium being a fibre with bidirectional pumping, i.e. with injection of the pump light from both two ends of the fibre
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09Processes or apparatus for excitation, e.g. pumping
    • H01S3/091Processes or apparatus for excitation, e.g. pumping using optical pumping
    • H01S3/094Processes or apparatus for excitation, e.g. pumping using optical pumping by coherent light
    • H01S3/0941Processes or apparatus for excitation, e.g. pumping using optical pumping by coherent light of a laser diode
    • H01S3/09415Processes or apparatus for excitation, e.g. pumping using optical pumping by coherent light of a laser diode the pumping beam being parallel to the lasing mode of the pumped medium, e.g. end-pumping
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/16Solid materials
    • H01S3/1601Solid materials characterised by an active (lasing) ion
    • H01S3/1603Solid materials characterised by an active (lasing) ion rare earth
    • H01S3/1608Solid materials characterised by an active (lasing) ion rare earth erbium
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/23Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media

Landscapes

  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Optical Modulation, Optical Deflection, Nonlinear Optics, Optical Demodulation, Optical Logic Elements (AREA)
  • Lasers (AREA)
IL13837498A 1998-03-11 1998-11-30 An ultraviolet laser device and an exposure device that includes such a device IL138374A (en)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP5945398 1998-03-11
JP13058098 1998-05-13
JP22733398 1998-08-11
JP31114798 1998-10-30
PCT/JP1998/005367 WO1999046835A1 (fr) 1998-03-11 1998-11-30 Dispositif a laser ultraviolet et appareil d'exposition comportant un tel dispositif a laser ultraviolet

Publications (2)

Publication Number Publication Date
IL138374A0 IL138374A0 (en) 2001-10-31
IL138374A true IL138374A (en) 2004-07-25

Family

ID=27463766

Family Applications (1)

Application Number Title Priority Date Filing Date
IL13837498A IL138374A (en) 1998-03-11 1998-11-30 An ultraviolet laser device and an exposure device that includes such a device

Country Status (7)

Country Link
US (4) US6590698B1 (zh)
EP (1) EP1063742A4 (zh)
KR (2) KR100819239B1 (zh)
CN (1) CN100578876C (zh)
AU (1) AU1262499A (zh)
IL (1) IL138374A (zh)
WO (1) WO1999046835A1 (zh)

Families Citing this family (279)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005022705A2 (en) * 1997-03-21 2005-03-10 Imra America, Inc. High energy optical fiber amplifier for picosecond-nanosecond pulses for advanced material processing applications
KR100819239B1 (ko) * 1998-03-11 2008-04-03 가부시키가이샤 니콘 자외 레이저 장치, 레이저 장치, 노광 장치와 노광 방법, 디바이스 제조 방법, 자외광 조사 장치, 물체 패턴 검출 장치, 자외광 조사 방법 및 물체 패턴 검출 방법
JP2001353176A (ja) * 2000-04-13 2001-12-25 Nikon Corp レーザ治療装置
JP2000260684A (ja) * 1999-03-08 2000-09-22 Nikon Corp 露光装置、及び照明装置
JP4517271B2 (ja) 1999-09-10 2010-08-04 株式会社ニコン レーザ装置を備えた露光装置
US7136402B1 (en) 1999-09-10 2006-11-14 Nikon Corporation Laser device and exposure method
AU6875000A (en) 1999-09-10 2001-04-17 Nikon Corporation Exposure device with laser device
WO2001020733A1 (fr) 1999-09-10 2001-03-22 Nikon Corporation Source lumineuse et procede de commande de stabilisation de longueur d'onde, appareil et procede d'exposition, procede de production d'un appareil d'exposition et procede de fabrication d'un dispositif et dispositif associe
US6369888B1 (en) * 1999-11-17 2002-04-09 Applied Materials, Inc. Method and apparatus for article inspection including speckle reduction
ATE360291T1 (de) * 2000-03-24 2007-05-15 British Telecomm Optisches übertragungssystem und verfahren zum schützen einer optischen strecke
AU2001271955A1 (en) * 2000-07-10 2002-01-21 Corporation For Laser Optics Research Systems and methods for speckle reduction through bandwidth enhancement
JPWO2002065597A1 (ja) 2001-02-14 2004-06-17 株式会社ニコン 光源装置及び光照射装置、並びにデバイス製造方法
JPWO2002071143A1 (ja) * 2001-03-02 2004-07-02 株式会社ニコン 光源装置、光照射装置及び露光装置、並びにデバイス製造方法
JP4123791B2 (ja) * 2001-03-05 2008-07-23 富士ゼロックス株式会社 発光素子駆動装置および発光素子駆動システム
JP2002280324A (ja) * 2001-03-16 2002-09-27 Sony Corp レーザ装置
EP1245973A1 (en) * 2001-03-30 2002-10-02 University Of Southampton Optical fiber terminations, optical couplers and optical coupling methods
US6931179B2 (en) * 2001-10-29 2005-08-16 Harris Corporation Lossless optical splitter
TW200304175A (en) * 2001-11-12 2003-09-16 Sony Corp Laser annealing device and thin-film transistor manufacturing method
US7105048B2 (en) * 2001-11-30 2006-09-12 Semiconductor Energy Laboratory Co., Ltd. Laser irradiation apparatus
KR100967824B1 (ko) * 2001-11-30 2010-07-05 가부시키가이샤 한도오따이 에네루기 켄큐쇼 반도체장치의 제작방법
US7133737B2 (en) 2001-11-30 2006-11-07 Semiconductor Energy Laboratory Co., Ltd. Program for controlling laser apparatus and recording medium for recording program for controlling laser apparatus and capable of being read out by computer
US7214573B2 (en) * 2001-12-11 2007-05-08 Semiconductor Energy Laboratory Co., Ltd. Method of manufacturing a semiconductor device that includes patterning sub-islands
AU2003221350A1 (en) * 2002-03-13 2003-09-22 Nikon Corporation Light amplifying device and method of manufacturing the device, light source device using the light amplifying device, light treatment device using the light source device, and exposure device using the light source device
US6984573B2 (en) * 2002-06-14 2006-01-10 Semiconductor Energy Laboratory Co., Ltd. Laser irradiation method and apparatus
JP4347545B2 (ja) * 2002-06-28 2009-10-21 株式会社 液晶先端技術開発センター 結晶化装置および結晶化方法
JP4347546B2 (ja) * 2002-06-28 2009-10-21 株式会社 液晶先端技術開発センター 結晶化装置、結晶化方法および光学系
TWI301295B (en) * 2002-07-24 2008-09-21 Adv Lcd Tech Dev Ct Co Ltd Crystallization apparatus, crystallization method, thim film transistor and display apparatus
KR100479078B1 (ko) * 2002-08-14 2005-03-25 엘지전자 주식회사 노광장치의 이송식 기판 스테이지
US7196744B1 (en) * 2002-10-18 2007-03-27 Finisar Corporation Optical transceiver package with a liquid crystal variable optical attenuator
JP2004335937A (ja) * 2002-11-25 2004-11-25 Nikon Corp 露光装置の製造方法、光源ユニット、露光装置、露光方法及び露光装置の調整方法
WO2004054050A1 (ja) * 2002-12-10 2004-06-24 Nikon Corporation 紫外光源、紫外光源を用いた光治療装置、および紫外光源を用いた露光装置
US6935444B2 (en) * 2003-02-24 2005-08-30 Baker Hughes Incorporated Superabrasive cutting elements with cutting edge geometry having enhanced durability, method of producing same, and drill bits so equipped
KR20060014359A (ko) 2003-03-24 2006-02-15 가부시키가이샤 니콘 광학 소자, 광학계, 레이저 장치, 노광 장치, 마스크 검사장치 및 고분자 결정 가공 장치
KR100531416B1 (ko) * 2003-09-17 2005-11-29 엘지.필립스 엘시디 주식회사 Sls 장비 및 이를 이용한 실리콘 결정화 방법
US7738514B2 (en) * 2003-12-04 2010-06-15 Optical Air Data Systems, Llc Very high power pulsed fiber laser
DE102004013886A1 (de) 2004-03-16 2005-10-06 Carl Zeiss Smt Ag Verfahren zur Mehrfachbelichtung, Mikrolithografie-Projektionsbelichtungsanlage und Projektionssystem
EP1772771A4 (en) * 2004-07-15 2008-06-25 Matsushita Electric Ind Co Ltd COHERENT LIGHT SOURCE AND OPTICAL APPARATUS USING THE SAME
DE102004037781A1 (de) * 2004-08-03 2006-02-23 Carl Zeiss Nts Gmbh Elektronenstrahlgerät
US7397598B2 (en) * 2004-08-20 2008-07-08 Nikon Corporation Light source unit and light irradiation unit
US7602822B2 (en) * 2004-09-28 2009-10-13 Hitachi Via Mechanics, Ltd Fiber laser based production of laser drilled microvias for multi-layer drilling, dicing, trimming of milling applications
JP2006189587A (ja) * 2005-01-05 2006-07-20 Nidek Co Ltd 医療用レーザ装置
US7593440B2 (en) * 2005-03-29 2009-09-22 Coherent, Inc. MOPA laser apparatus with two master oscillators for generating ultraviolet radiation
JP5172336B2 (ja) * 2005-06-02 2013-03-27 パナソニック株式会社 2次元画像表示装置
US20060274404A1 (en) * 2005-06-06 2006-12-07 Francois Brunet Optical fiber amplifier system and method
JP5104305B2 (ja) 2005-07-01 2012-12-19 株式会社ニコン 露光装置、露光方法及びデバイス製造方法
CN101263421A (zh) * 2005-09-14 2008-09-10 松下电器产业株式会社 图像形成装置
US7692848B2 (en) * 2005-10-12 2010-04-06 Panasonic Corporation Wavelength conversion module, laser light source device, two-dimensional image display device, backlight light source, liquid crystal display device and laser processing device
GB0520853D0 (en) * 2005-10-14 2005-11-23 Gsi Lumonics Ltd Optical fibre laser
US7746913B2 (en) 2005-11-01 2010-06-29 Cymer, Inc. Laser system
US20090296755A1 (en) * 2005-11-01 2009-12-03 Cymer, Inc. Laser system
US20090296758A1 (en) * 2005-11-01 2009-12-03 Cymer, Inc. Laser system
US7999915B2 (en) * 2005-11-01 2011-08-16 Cymer, Inc. Laser system
US7630424B2 (en) * 2005-11-01 2009-12-08 Cymer, Inc. Laser system
US7885309B2 (en) 2005-11-01 2011-02-08 Cymer, Inc. Laser system
US7715459B2 (en) * 2005-11-01 2010-05-11 Cymer, Inc. Laser system
US7778302B2 (en) * 2005-11-01 2010-08-17 Cymer, Inc. Laser system
US7643529B2 (en) * 2005-11-01 2010-01-05 Cymer, Inc. Laser system
US7920616B2 (en) * 2005-11-01 2011-04-05 Cymer, Inc. Laser system
EP1952493A4 (en) * 2005-11-01 2017-05-10 Cymer, LLC Laser system
US20070127002A1 (en) * 2005-11-09 2007-06-07 Nikon Corporation Exposure apparatus and method, and device manufacturing method
US7471705B2 (en) * 2005-11-09 2008-12-30 Lockheed Martin Corporation Ultraviolet laser system and method having wavelength in the 200-nm range
JPWO2007055199A1 (ja) 2005-11-09 2009-04-30 株式会社ニコン 露光装置及び方法、並びにデバイス製造方法
JPWO2007058188A1 (ja) 2005-11-15 2009-04-30 株式会社ニコン 露光装置及び露光方法、並びにデバイス製造方法
KR20080068820A (ko) 2005-11-16 2008-07-24 가부시키가이샤 니콘 기판 처리 방법, 포토마스크의 제조 방법 및 포토마스크,그리고 디바이스 제조 방법
US20070127005A1 (en) * 2005-12-02 2007-06-07 Asml Holding N.V. Illumination system
US7782442B2 (en) 2005-12-06 2010-08-24 Nikon Corporation Exposure apparatus, exposure method, projection optical system and device producing method
WO2007066679A1 (ja) 2005-12-06 2007-06-14 Nikon Corporation 露光装置、露光方法、投影光学系及びデバイス製造方法
KR20080088579A (ko) 2005-12-28 2008-10-02 가부시키가이샤 니콘 노광 장치 및 노광 방법, 디바이스 제조 방법
US8411271B2 (en) 2005-12-28 2013-04-02 Nikon Corporation Pattern forming method, pattern forming apparatus, and device manufacturing method
EP1975982A1 (en) 2005-12-28 2008-10-01 Nikon Corporation Pattern formation method and pattern formation apparatus, exposure metho and exposure apparatus, and device manufacturing method
CN102681368B (zh) 2005-12-28 2015-09-30 株式会社尼康 图案形成方法及图案形成装置、以及元件制造方法
US8953148B2 (en) 2005-12-28 2015-02-10 Nikon Corporation Exposure apparatus and making method thereof
TWI393171B (zh) 2006-01-19 2013-04-11 尼康股份有限公司 A moving body driving method and a moving body driving system, a pattern forming method and a pattern forming apparatus, an exposure method and an exposure apparatus, and an element manufacturing method
GB2434483A (en) 2006-01-20 2007-07-25 Fianium Ltd High-Power Short Optical Pulse Source
KR20080103564A (ko) 2006-02-16 2008-11-27 가부시키가이샤 니콘 노광 장치, 노광 방법 및 디바이스 제조 방법
EP1986222A4 (en) 2006-02-16 2010-09-01 Nikon Corp EXPOSURE DEVICE, EXPOSURE METHOD AND COMPONENT MANUFACTURING METHOD
WO2007094414A1 (ja) 2006-02-16 2007-08-23 Nikon Corporation 露光装置、露光方法及びデバイス製造方法
JPWO2007094470A1 (ja) * 2006-02-16 2009-07-09 株式会社ニコン 露光装置、露光方法及びデバイス製造方法
SG170010A1 (en) 2006-02-21 2011-04-29 Nikon Corp Measuring apparatus and method, processing apparatus and method, pattern forming apparatus and method, exposure appararus and method, and device manufacturing method
SG170012A1 (en) 2006-02-21 2011-04-29 Nikon Corp Pattern forming apparatus and pattern forming method, movable body drive system and movable body drive method, exposure apparatus and exposure method, and device manufacturing method
KR101495471B1 (ko) 2006-02-21 2015-02-23 가부시키가이샤 니콘 패턴 형성 장치, 마크 검출 장치, 노광 장치, 패턴 형성 방법, 노광 방법 및 디바이스 제조 방법
KR20080114691A (ko) 2006-03-13 2008-12-31 가부시키가이샤 니콘 노광 장치, 메인터넌스 방법, 노광 방법 및 디바이스 제조 방법
US7443903B2 (en) * 2006-04-19 2008-10-28 Mobius Photonics, Inc. Laser apparatus having multiple synchronous amplifiers tied to one master oscillator
US7593437B2 (en) 2006-05-15 2009-09-22 Coherent, Inc. MOPA laser apparatus with two master oscillators for generating ultraviolet radiation
WO2007135990A1 (ja) 2006-05-18 2007-11-29 Nikon Corporation 露光方法及び装置、メンテナンス方法、並びにデバイス製造方法
KR20090023335A (ko) * 2006-05-22 2009-03-04 가부시키가이샤 니콘 노광 방법 및 장치, 메인터넌스 방법, 그리고 디바이스 제조 방법
KR20090023331A (ko) 2006-05-23 2009-03-04 가부시키가이샤 니콘 메인터넌스 방법, 노광 방법 및 장치, 그리고 디바이스 제조 방법
WO2007135998A1 (ja) 2006-05-24 2007-11-29 Nikon Corporation 保持装置及び露光装置
CN101479832B (zh) 2006-06-09 2011-05-11 株式会社尼康 移动体装置、曝光装置和曝光方法以及元件制造方法
WO2007142350A1 (ja) 2006-06-09 2007-12-13 Nikon Corporation パターン形成方法及びパターン形成装置、露光方法及び露光装置、並びにデバイス製造方法
CN101390194B (zh) 2006-06-30 2011-04-20 株式会社尼康 维修方法、曝光方法及装置、以及元件制造方法
EP2045645A1 (en) 2006-07-06 2009-04-08 Nikon Corporation Micro actuator, optical unit, exposure device, and device manufacturing method
US7529281B2 (en) 2006-07-11 2009-05-05 Mobius Photonics, Inc. Light source with precisely controlled wavelength-converted average power
KR101634893B1 (ko) 2006-08-31 2016-06-29 가부시키가이샤 니콘 이동체 구동 방법 및 이동체 구동 시스템, 패턴 형성 방법 및 장치, 노광 방법 및 장치, 그리고 디바이스 제조 방법
KR101638306B1 (ko) 2006-08-31 2016-07-08 가부시키가이샤 니콘 이동체 구동 시스템 및 이동체 구동 방법, 패턴 형성 장치 및 방법, 노광 장치 및 방법, 디바이스 제조 방법, 그리고 결정 방법
KR101824374B1 (ko) 2006-08-31 2018-01-31 가부시키가이샤 니콘 이동체 구동 방법 및 이동체 구동 시스템, 패턴 형성 방법 및 장치, 노광 방법 및 장치, 그리고 디바이스 제조 방법
WO2008029758A1 (en) 2006-09-01 2008-03-13 Nikon Corporation Mobile body driving method, mobile body driving system, pattern forming method and apparatus, exposure method and apparatus and device manufacturing method
KR101511929B1 (ko) 2006-09-01 2015-04-13 가부시키가이샤 니콘 이동체 구동 방법 및 이동체 구동 시스템, 패턴 형성 방법 및 장치, 노광 방법 및 장치, 디바이스 제조 방법, 그리고 캘리브레이션 방법
US7469081B2 (en) * 2006-09-01 2008-12-23 Mobius Photonics, Inc. Reducing thermal load on optical head
KR101360507B1 (ko) 2006-09-29 2014-02-07 가부시키가이샤 니콘 이동체 시스템, 패턴 형성 장치, 노광 장치 및 노광 방법, 그리고 디바이스 제조 방법
KR101549709B1 (ko) 2006-11-09 2015-09-11 가부시키가이샤 니콘 유지 장치, 위치 검출 장치 및 노광 장치, 이동 방법, 위치검출 방법, 노광 방법, 검출계의 조정 방법, 그리고 디바이스 제조 방법
US20090323739A1 (en) * 2006-12-22 2009-12-31 Uv Tech Systems Laser optical system
US8004651B2 (en) 2007-01-23 2011-08-23 Nikon Corporation Liquid recovery system, immersion exposure apparatus, immersion exposing method, and device fabricating method
JP2010519722A (ja) * 2007-02-23 2010-06-03 株式会社ニコン 露光方法、露光装置、デバイス製造方法、及び液浸露光用基板
US8953647B1 (en) 2007-03-21 2015-02-10 Lockheed Martin Corporation High-power laser using thulium-doped fiber amplifier and frequency quadrupling for blue output
US8134685B2 (en) 2007-03-23 2012-03-13 Nikon Corporation Liquid recovery system, immersion exposure apparatus, immersion exposing method, and device fabricating method
US8300207B2 (en) 2007-05-17 2012-10-30 Nikon Corporation Exposure apparatus, immersion system, exposing method, and device fabricating method
US20090122282A1 (en) * 2007-05-21 2009-05-14 Nikon Corporation Exposure apparatus, liquid immersion system, exposing method, and device fabricating method
WO2008146819A1 (ja) * 2007-05-28 2008-12-04 Nikon Corporation 露光装置、デバイス製造方法、洗浄装置、及びクリーニング方法並びに露光方法
US8164736B2 (en) * 2007-05-29 2012-04-24 Nikon Corporation Exposure method, exposure apparatus, and method for producing device
US8098362B2 (en) 2007-05-30 2012-01-17 Nikon Corporation Detection device, movable body apparatus, pattern formation apparatus and pattern formation method, exposure apparatus and exposure method, and device manufacturing method
CN101325376B (zh) * 2007-06-15 2012-05-02 力博特公司 开关器件的驱动电路
US8009705B2 (en) * 2007-07-05 2011-08-30 Mobius Photonics, Inc. Fiber MOPA system without stimulated brillouin scattering
TWI443472B (zh) 2007-07-13 2014-07-01 尼康股份有限公司 Pattern forming method and apparatus, exposure method and apparatus, and component manufacturing method and element
JP5177449B2 (ja) 2007-07-24 2013-04-03 株式会社ニコン 移動体駆動方法及び移動体駆動システム、パターン形成方法及び装置、露光方法及び装置、並びにデバイス製造方法
WO2009013905A1 (ja) 2007-07-24 2009-01-29 Nikon Corporation 位置計測システム、露光装置、位置計測方法、露光方法及びデバイス製造方法、並びに工具及び計測方法
US8194232B2 (en) 2007-07-24 2012-06-05 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, position control method and position control system, and device manufacturing method
US8547527B2 (en) 2007-07-24 2013-10-01 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and pattern formation apparatus, and device manufacturing method
US9025126B2 (en) * 2007-07-31 2015-05-05 Nikon Corporation Exposure apparatus adjusting method, exposure apparatus, and device fabricating method
US9304412B2 (en) 2007-08-24 2016-04-05 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, device manufacturing method, and measuring method
US8023106B2 (en) 2007-08-24 2011-09-20 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing method
US8218129B2 (en) 2007-08-24 2012-07-10 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, device manufacturing method, measuring method, and position measurement system
US20090051895A1 (en) * 2007-08-24 2009-02-26 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, device manufacturing method, and processing system
US8867022B2 (en) 2007-08-24 2014-10-21 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, and device manufacturing method
US8237919B2 (en) 2007-08-24 2012-08-07 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing method for continuous position measurement of movable body before and after switching between sensor heads
WO2009028494A1 (ja) 2007-08-28 2009-03-05 Nikon Corporation 位置検出装置、位置検出方法、露光装置、およびデバイス製造方法
US8421994B2 (en) 2007-09-27 2013-04-16 Nikon Corporation Exposure apparatus
US8279399B2 (en) 2007-10-22 2012-10-02 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
CA2703642C (en) 2007-10-26 2018-01-09 Corporation For Laser Optics Research Laser illuminated backlight for flat panel displays
US9013681B2 (en) * 2007-11-06 2015-04-21 Nikon Corporation Movable body apparatus, pattern formation apparatus and exposure apparatus, and device manufacturing method
US9256140B2 (en) * 2007-11-07 2016-02-09 Nikon Corporation Movable body apparatus, pattern formation apparatus and exposure apparatus, and device manufacturing method with measurement device to measure movable body in Z direction
CN101675500B (zh) * 2007-11-07 2011-05-18 株式会社尼康 曝光装置、曝光方法以及元件制造方法
US8665455B2 (en) * 2007-11-08 2014-03-04 Nikon Corporation Movable body apparatus, pattern formation apparatus and exposure apparatus, and device manufacturing method
US8422015B2 (en) * 2007-11-09 2013-04-16 Nikon Corporation Movable body apparatus, pattern formation apparatus and exposure apparatus, and device manufacturing method
TWI418850B (zh) 2007-11-09 2013-12-11 尼康股份有限公司 微致動器、光學設備、顯示裝置、曝光裝置及設備製造方法
KR20100091885A (ko) * 2007-12-11 2010-08-19 가부시키가이샤 니콘 이동체 장치, 노광 장치 및 패턴 형성 장치, 그리고 디바이스 제조 방법
US8115906B2 (en) * 2007-12-14 2012-02-14 Nikon Corporation Movable body system, pattern formation apparatus, exposure apparatus and measurement device, and device manufacturing method
US8711327B2 (en) * 2007-12-14 2014-04-29 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
US8964166B2 (en) * 2007-12-17 2015-02-24 Nikon Corporation Stage device, exposure apparatus and method of producing device
JP5446875B2 (ja) * 2007-12-17 2014-03-19 株式会社ニコン 露光装置、露光方法及びデバイス製造方法
US20090174873A1 (en) * 2007-12-17 2009-07-09 Nikon Corporation Exposure apparatus, exposure method and device manufacturing method
US8237916B2 (en) * 2007-12-28 2012-08-07 Nikon Corporation Movable body drive system, pattern formation apparatus, exposure apparatus and exposure method, and device manufacturing method
WO2009084244A1 (ja) 2007-12-28 2009-07-09 Nikon Corporation 露光装置、移動体駆動システム、パターン形成装置、及び露光方法、並びにデバイス製造方法
US8792079B2 (en) * 2007-12-28 2014-07-29 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method having encoders to measure displacement between optical member and measurement mount and between measurement mount and movable body
US8269945B2 (en) * 2007-12-28 2012-09-18 Nikon Corporation Movable body drive method and apparatus, exposure method and apparatus, pattern formation method and apparatus, and device manufacturing method
US8451425B2 (en) * 2007-12-28 2013-05-28 Nikon Corporation Exposure apparatus, exposure method, cleaning apparatus, and device manufacturing method
KR100944959B1 (ko) * 2008-01-17 2010-03-02 주식회사 와이텔포토닉스 파장변환 레이저 시스템
JP5369443B2 (ja) 2008-02-05 2013-12-18 株式会社ニコン ステージ装置、露光装置、露光方法、及びデバイス製造方法
US8208128B2 (en) * 2008-02-08 2012-06-26 Nikon Corporation Position measuring system and position measuring method, Movable body apparatus, movable body drive method, exposure apparatus and exposure method, pattern forming apparatus, and device manufacturing method
US20090218743A1 (en) * 2008-02-29 2009-09-03 Nikon Corporation Substrate holding apparatus, exposure apparatus, exposing method, device fabricating method, plate member, and wall
US20100039628A1 (en) * 2008-03-19 2010-02-18 Nikon Corporation Cleaning tool, cleaning method, and device fabricating method
US8233139B2 (en) * 2008-03-27 2012-07-31 Nikon Corporation Immersion system, exposure apparatus, exposing method, and device fabricating method
JP5602718B2 (ja) * 2008-04-08 2014-10-08 マサチューセッツ インスティテュート オブ テクノロジー 三次元マイクロ流体プラットホームおよびその使用方法
JPWO2009125867A1 (ja) * 2008-04-11 2011-08-04 株式会社ニコン ステージ装置、露光装置、及びデバイス製造方法
US8654306B2 (en) * 2008-04-14 2014-02-18 Nikon Corporation Exposure apparatus, cleaning method, and device fabricating method
JP5071894B2 (ja) 2008-04-30 2012-11-14 株式会社ニコン ステージ装置、パターン形成装置、露光装置、ステージ駆動方法、露光方法、並びにデバイス製造方法
US8786829B2 (en) * 2008-05-13 2014-07-22 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
US8817236B2 (en) 2008-05-13 2014-08-26 Nikon Corporation Movable body system, movable body drive method, pattern formation apparatus, pattern formation method, exposure apparatus, exposure method, and device manufacturing method
US8228482B2 (en) * 2008-05-13 2012-07-24 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
US7580609B1 (en) * 2008-06-20 2009-08-25 Gooch & Housego Plc Fiber intensity reducing devices and related systems
US20110116520A1 (en) 2008-07-07 2011-05-19 Koninklijke Philips Electronics N.V. Eye-safe laser-based lighting
WO2010005081A1 (ja) * 2008-07-10 2010-01-14 株式会社ニコン 変形計測装置、露光装置、変形計測装置用治具、位置計測方法、及びデバイス製造方法
US20100045949A1 (en) * 2008-08-11 2010-02-25 Nikon Corporation Exposure apparatus, maintaining method and device fabricating method
US8994923B2 (en) * 2008-09-22 2015-03-31 Nikon Corporation Movable body apparatus, exposure apparatus, exposure method, and device manufacturing method
US8508735B2 (en) 2008-09-22 2013-08-13 Nikon Corporation Movable body apparatus, movable body drive method, exposure apparatus, exposure method, and device manufacturing method
US8325325B2 (en) 2008-09-22 2012-12-04 Nikon Corporation Movable body apparatus, movable body drive method, exposure apparatus, exposure method, and device manufacturing method
US8384875B2 (en) 2008-09-29 2013-02-26 Nikon Corporation Exposure apparatus, exposure method, and method for producing device
US8773635B2 (en) * 2008-12-19 2014-07-08 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
US8902402B2 (en) 2008-12-19 2014-12-02 Nikon Corporation Movable body apparatus, exposure apparatus, exposure method, and device manufacturing method
US8760629B2 (en) 2008-12-19 2014-06-24 Nikon Corporation Exposure apparatus including positional measurement system of movable body, exposure method of exposing object including measuring positional information of movable body, and device manufacturing method that includes exposure method of exposing object, including measuring positional information of movable body
US8599359B2 (en) 2008-12-19 2013-12-03 Nikon Corporation Exposure apparatus, exposure method, device manufacturing method, and carrier method
US8896806B2 (en) 2008-12-29 2014-11-25 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
US8334946B2 (en) * 2009-01-16 2012-12-18 Corporation For Laser Optics Research Laser illuminated backlight for liquid crystal displays
US20100196832A1 (en) * 2009-01-30 2010-08-05 Nikon Corporation Exposure apparatus, exposing method, liquid immersion member and device fabricating method
KR101712219B1 (ko) 2009-03-10 2017-03-03 가부시키가이샤 니콘 노광 장치, 노광 방법, 및 디바이스 제조 방법
US8665918B2 (en) * 2009-03-20 2014-03-04 Bae Systems Information And Electronic Systems Integration Inc. Fiber-based wavelength agile visible laser source
US8953143B2 (en) * 2009-04-24 2015-02-10 Nikon Corporation Liquid immersion member
US20100296074A1 (en) * 2009-04-30 2010-11-25 Nikon Corporation Exposure method, and device manufacturing method
US20110085152A1 (en) * 2009-05-07 2011-04-14 Hideaki Nishino Vibration control apparatus, vibration control method, exposure apparatus, and device manufacturing method
US20100323303A1 (en) * 2009-05-15 2010-12-23 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, and device fabricating method
TW201115280A (en) * 2009-05-15 2011-05-01 Nikon Corp Exposure apparatus and device manufacturing method
US8553204B2 (en) 2009-05-20 2013-10-08 Nikon Corporation Movable body apparatus, exposure apparatus, exposure method, and device manufacturing method
US8792084B2 (en) * 2009-05-20 2014-07-29 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
US8970820B2 (en) * 2009-05-20 2015-03-03 Nikon Corporation Object exchange method, exposure method, carrier system, exposure apparatus, and device manufacturing method
US8339573B2 (en) * 2009-05-27 2012-12-25 3M Innovative Properties Company Method and apparatus for photoimaging a substrate
CN102449520B (zh) * 2009-05-28 2015-01-07 西铁城控股株式会社 光源装置
US20110008734A1 (en) * 2009-06-19 2011-01-13 Nikon Corporation Exposure apparatus and device manufacturing method
US8446569B2 (en) 2009-06-19 2013-05-21 Nikon Corporation Exposure apparatus, exposure method and device manufacturing method
US8472008B2 (en) 2009-06-19 2013-06-25 Nikon Corporation Movable body apparatus, exposure apparatus and device manufacturing method
US8355116B2 (en) 2009-06-19 2013-01-15 Nikon Corporation Exposure apparatus and device manufacturing method
US8355114B2 (en) 2009-06-19 2013-01-15 Nikon Corporation Exposure apparatus and device manufacturing method
US8294878B2 (en) 2009-06-19 2012-10-23 Nikon Corporation Exposure apparatus and device manufacturing method
TWI514087B (zh) * 2009-08-07 2015-12-21 尼康股份有限公司 A method of manufacturing an exposure apparatus and an element
KR20140108348A (ko) 2009-08-07 2014-09-05 가부시키가이샤 니콘 이동체 장치, 노광 장치 및 노광 방법, 그리고 디바이스 제조 방법
US8488109B2 (en) 2009-08-25 2013-07-16 Nikon Corporation Exposure method, exposure apparatus, and device manufacturing method
US8493547B2 (en) 2009-08-25 2013-07-23 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
US8514395B2 (en) 2009-08-25 2013-08-20 Nikon Corporation Exposure method, exposure apparatus, and device manufacturing method
US20110096318A1 (en) 2009-09-28 2011-04-28 Nikon Corporation Exposure apparatus and device fabricating method
US20110096312A1 (en) * 2009-09-28 2011-04-28 Nikon Corporation Exposure apparatus and device fabricating method
US20110102761A1 (en) * 2009-09-28 2011-05-05 Nikon Corporation Stage apparatus, exposure apparatus, and device fabricating method
US20110096306A1 (en) 2009-09-28 2011-04-28 Nikon Corporation Stage apparatus, exposure apparatus, driving method, exposing method, and device fabricating method
US20110075120A1 (en) 2009-09-30 2011-03-31 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
US20110085150A1 (en) 2009-09-30 2011-04-14 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
US20110086315A1 (en) 2009-09-30 2011-04-14 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
US20110102762A1 (en) * 2009-10-30 2011-05-05 Nikon Corporation Exposure apparatus and device manufacturing method
US10061214B2 (en) 2009-11-09 2018-08-28 Nikon Corporation Exposure apparatus, exposure method, exposure apparatus maintenance method, exposure apparatus adjustment method and device manufacturing method
US20110123913A1 (en) * 2009-11-19 2011-05-26 Nikon Corporation Exposure apparatus, exposing method, and device fabricating method
US20110128523A1 (en) 2009-11-19 2011-06-02 Nikon Corporation Stage apparatus, exposure apparatus, driving method, exposing method, and device fabricating method
US20110164238A1 (en) 2009-12-02 2011-07-07 Nikon Corporation Exposure apparatus and device fabricating method
US20110134400A1 (en) 2009-12-04 2011-06-09 Nikon Corporation Exposure apparatus, liquid immersion member, and device manufacturing method
US8488106B2 (en) * 2009-12-28 2013-07-16 Nikon Corporation Movable body drive method, movable body apparatus, exposure method, exposure apparatus, and device manufacturing method
US8841065B2 (en) 2010-02-12 2014-09-23 Nikon Corporation Manufacturing method of exposure apparatus and device manufacturing method
KR20120116329A (ko) 2010-02-20 2012-10-22 가부시키가이샤 니콘 광원 최적화 방법, 노광 방법, 디바이스 제조 방법, 프로그램, 노광 장치, 리소그래피 시스템, 광원 평가 방법 및 광원 변조 방법
JP5240526B2 (ja) * 2010-03-15 2013-07-17 オムロン株式会社 レーザ加工装置、レーザ光源装置、および、レーザ光源装置の制御方法
KR101539153B1 (ko) 2010-12-14 2015-07-23 가부시키가이샤 니콘 노광 방법 및 노광 장치, 그리고 디바이스 제조 방법
DE102011004375B3 (de) * 2011-02-18 2012-05-31 Carl Zeiss Smt Gmbh Vorrichtung zur Führung von elektromagnetischer Strahlung in eine Projektionsbelichtungsanlage
KR101962487B1 (ko) 2011-02-22 2019-07-17 가부시키가이샤 니콘 유지 장치, 노광 장치, 및 디바이스의 제조 방법
CN103403537B (zh) * 2011-02-28 2016-07-27 东芝三菱电机产业系统株式会社 金属材料的特性测定装置
JP5790040B2 (ja) * 2011-03-11 2015-10-07 ソニー株式会社 照明装置および表示装置
US8792762B2 (en) * 2011-05-31 2014-07-29 Corning Incorporated Low loss aluminum doped optical fiber for UV applications
US9599905B2 (en) 2011-06-07 2017-03-21 Nikon Corporation Illumination optical system, exposure apparatus, device production method, and light polarization unit
TWI652508B (zh) 2011-06-13 2019-03-01 尼康股份有限公司 照明方法
US8873596B2 (en) 2011-07-22 2014-10-28 Kla-Tencor Corporation Laser with high quality, stable output beam, and long life high conversion efficiency non-linear crystal
JP5398804B2 (ja) * 2011-09-16 2014-01-29 株式会社東芝 ファイバレーザ装置
US20130077086A1 (en) * 2011-09-23 2013-03-28 Kla-Tencor Corporation Solid-State Laser And Inspection System Using 193nm Laser
US9250178B2 (en) 2011-10-07 2016-02-02 Kla-Tencor Corporation Passivation of nonlinear optical crystals
US9207549B2 (en) 2011-12-29 2015-12-08 Nikon Corporation Exposure apparatus and exposure method, and device manufacturing method with encoder of higher reliability for position measurement
US9360772B2 (en) 2011-12-29 2016-06-07 Nikon Corporation Carrier method, exposure method, carrier system and exposure apparatus, and device manufacturing method
JPWO2013133278A1 (ja) * 2012-03-05 2015-07-30 株式会社ニコン レーザ装置、このレーザ装置を備えた露光装置及び検査装置
US9678350B2 (en) 2012-03-20 2017-06-13 Kla-Tencor Corporation Laser with integrated multi line or scanning beam capability
WO2013161428A1 (ja) 2012-04-26 2013-10-31 株式会社ニコン 計測方法及びエンコーダ装置、並びに露光方法及び装置
US9581811B2 (en) 2012-05-02 2017-02-28 Nikon Corporation Method for evaluating and improving pupil luminance distribution, illumination optical system and adjustment method thereof, exposure apparatus, exposure method, and device manufacturing method
US20130313440A1 (en) * 2012-05-22 2013-11-28 Kla-Tencor Corporation Solid-State Laser And Inspection System Using 193nm Laser
US8993974B2 (en) 2012-06-12 2015-03-31 Nikon Corporation Color time domain integration camera having a single charge coupled device and fringe projection auto-focus system
US9243896B2 (en) 2012-08-15 2016-01-26 Nikon Corporation Two axis encoder head assembly
US9042006B2 (en) * 2012-09-11 2015-05-26 Kla-Tencor Corporation Solid state illumination source and inspection system
EP2905804B1 (en) 2012-10-02 2019-05-01 Nikon Corporation Mobile body device, exposure device, and device manufacturing method
US9678433B2 (en) 2012-10-02 2017-06-13 Nikon Corporation Exposure apparatus and exposure method, and device manufacturing method
US9772564B2 (en) 2012-11-12 2017-09-26 Nikon Corporation Exposure apparatus and exposure method, and device manufacturing method
CN104937696B (zh) 2012-11-20 2019-03-15 株式会社尼康 曝光装置、移动体装置以及器件制造方法
KR102373075B1 (ko) 2012-11-30 2022-03-11 가부시키가이샤 니콘 반송 시스템, 노광 장치, 반송 방법, 노광 방법 및 디바이스 제조방법, 및 흡인 장치
CN108336011B (zh) 2012-11-30 2022-08-02 株式会社尼康 搬入方法、搬送系统及曝光装置、和器件制造方法
US8929406B2 (en) 2013-01-24 2015-01-06 Kla-Tencor Corporation 193NM laser and inspection system
US9529182B2 (en) 2013-02-13 2016-12-27 KLA—Tencor Corporation 193nm laser and inspection system
US9608399B2 (en) 2013-03-18 2017-03-28 Kla-Tencor Corporation 193 nm laser and an inspection system using a 193 nm laser
JP6384479B2 (ja) 2013-06-28 2018-09-05 株式会社ニコン 移動体装置及び露光装置、並びにデバイス製造方法
WO2015034005A1 (ja) 2013-09-04 2015-03-12 Ckd株式会社 電磁アクチュエータ用電機子コイル、電磁アクチュエータ、露光装置、及びデバイス製造方法
CN105830208B (zh) 2013-10-30 2019-07-16 株式会社尼康 基板保持装置、曝光装置及器件制造方法
US9638906B2 (en) 2013-11-22 2017-05-02 Nikon Corporation Catadioptric imaging systems for digital scanner
US9703085B2 (en) 2013-11-22 2017-07-11 Nikon Corporation Catadioptric imaging systems for digital scanner
KR20190032647A (ko) 2014-01-16 2019-03-27 가부시키가이샤 니콘 노광 장치 및 노광 방법, 그리고 디바이스 제조 방법
JP6291875B2 (ja) * 2014-01-31 2018-03-14 セイコーエプソン株式会社 血糖値計測装置及び血糖値計測方法
CN104897280B (zh) * 2014-03-05 2017-05-03 北京大学深圳研究生院 一种紫外光传感电路及感应系统
US9804101B2 (en) 2014-03-20 2017-10-31 Kla-Tencor Corporation System and method for reducing the bandwidth of a laser and an inspection system and method using a laser
US9419407B2 (en) 2014-09-25 2016-08-16 Kla-Tencor Corporation Laser assembly and inspection system using monolithic bandwidth narrowing apparatus
US9748729B2 (en) 2014-10-03 2017-08-29 Kla-Tencor Corporation 183NM laser and inspection system
EP3239776B1 (en) 2014-12-24 2021-07-07 Nikon Corporation Measurement device and measurement method, exposure device and exposure method, and device production method
WO2016104513A1 (ja) 2014-12-24 2016-06-30 株式会社ニコン 移動体の制御方法、露光方法、デバイス製造方法、移動体装置、及び露光装置
EP3291011A4 (en) 2015-03-25 2019-02-27 Nikon Corporation LAYOUT METHOD, BRAND DETECTION METHOD, LIGHT EXPOSURE METHOD, MEASURING APPARATUS, LIGHT EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD
CN105186279B (zh) * 2015-09-30 2018-02-13 北京大学 一种激光脉冲开关装置及其控制方法
US10078269B2 (en) 2015-10-02 2018-09-18 Nikon Corporation Array of encoders for alignment measurement
US10488228B2 (en) 2016-04-11 2019-11-26 Nikon Corporation Transparent-block encoder head with isotropic wedged elements
CN109791368B (zh) 2016-09-27 2021-11-26 株式会社尼康 决定方法及装置、程序、信息记录媒体、曝光装置、布局信息提供方法、布局方法、标记检测方法、曝光方法、以及器件制造方法
JP6306659B1 (ja) * 2016-10-19 2018-04-04 ファナック株式会社 ビーム分配器
US10175555B2 (en) 2017-01-03 2019-01-08 KLA—Tencor Corporation 183 nm CW laser and inspection system
US10451890B2 (en) 2017-01-16 2019-10-22 Cymer, Llc Reducing speckle in an excimer light source
WO2018168923A1 (ja) 2017-03-16 2018-09-20 株式会社ニコン 制御装置及び制御方法、露光装置及び露光方法、デバイス製造方法、データ生成方法、並びに、プログラム
CN107463070B (zh) * 2017-09-22 2019-08-30 深圳市华星光电技术有限公司 曝光用光源系统
CN108287455B (zh) * 2018-02-12 2020-06-26 京东方科技集团股份有限公司 曝光装置中的光线转换结构、曝光装置及曝光方法
DE102020202317A1 (de) * 2019-03-28 2020-10-01 Advantest Corporation Vorrichtung zur messung photoakustischer wellen
US11581696B2 (en) * 2019-08-14 2023-02-14 Open Water Internet Inc. Multi-channel laser
US20240004208A1 (en) * 2020-09-21 2024-01-04 Optonomous Technologies, Inc. Laser light sources and methods
CN116348814A (zh) * 2020-10-11 2023-06-27 维林光电公司 紫外激光系统、设备和方法
CN114488715B (zh) * 2022-02-18 2023-09-29 西湖大学 一种光纤阵列光刻机
CN114442440A (zh) * 2022-02-18 2022-05-06 西湖大学 一种光刻机
WO2023158720A1 (en) * 2022-02-18 2023-08-24 Uviquity, Inc. Nonlinear solid state devices for optical radiation in far-uvc spectrum
CN114488714B (zh) * 2022-02-18 2024-07-02 西湖大学 一种光纤阵列光刻机
KR102620196B1 (ko) * 2023-05-11 2024-01-02 람다이노비전 주식회사 발진할 레이저의 주파수 특성을 안정화시킬 수 있는 레이저 발진 장치
CN116819908B (zh) * 2023-08-31 2023-11-21 光科芯图(北京)科技有限公司 一种激光系统及控制方法

Family Cites Families (31)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02107034A (ja) * 1988-10-17 1990-04-19 Hitachi Ltd 光時分割多重方式
JPH03102898A (ja) 1989-09-18 1991-04-30 Fujitsu Ltd 丸型パッケージ用キャリア
US5137026A (en) 1990-01-04 1992-08-11 Glaxo Australia Pty., Ltd. Personal spirometer
JP2612080B2 (ja) 1990-01-19 1997-05-21 日本電信電話株式会社 光ソリトン発生方法およびソリトン伝送方法
US5050949A (en) 1990-06-22 1991-09-24 At&T Bell Laboratories Multi-stage optical fiber amplifier
JPH04111484A (ja) 1990-08-31 1992-04-13 Ishikawajima Harima Heavy Ind Co Ltd Nd:YAGレーザーの第4高調波発生方法
JPH04196280A (ja) * 1990-11-27 1992-07-16 Matsushita Electric Ind Co Ltd 照明装置
JPH04347945A (ja) * 1991-01-25 1992-12-03 Hitachi Ltd Cdma光受信器
JPH053455A (ja) * 1991-06-21 1993-01-08 Nippon Telegr & Teleph Corp <Ntt> 光増幅装置
JPH05102565A (ja) * 1991-10-09 1993-04-23 Kimmon Electric Co Ltd レーザーシステム
JP2566120Y2 (ja) * 1991-11-19 1998-03-25 日本電気株式会社 光パルスのパルス幅可変回路
US5341445A (en) * 1992-03-27 1994-08-23 General Electric Company Polygonal-shaped optical coupling member for use with a high brightness light source
JPH05275793A (ja) * 1992-03-27 1993-10-22 Seiko Epson Corp レーザーガラス及びレーザー装置
CN1026955C (zh) 1992-05-20 1994-12-14 天津市激光技术研究所 聚集式大功率氦氖激光治疗仪
CN1027348C (zh) * 1992-06-08 1995-01-11 杨继萍 健坤袋及其制作方法
JPH0677572A (ja) * 1992-08-28 1994-03-18 Sumitomo Electric Ind Ltd 光パルス増幅器
JPH06110102A (ja) 1992-09-30 1994-04-22 Nippon Telegr & Teleph Corp <Ntt> 光周波数掃引装置
JPH07161625A (ja) * 1993-12-02 1995-06-23 Sony Corp 半導体露光装置及び露光方法
JPH08116122A (ja) * 1994-10-18 1996-05-07 Sony Corp 連続発振紫外線レーザー光発生装置
JPH08248455A (ja) * 1995-03-09 1996-09-27 Fujitsu Ltd 波長多重用光増幅器
US5838709A (en) * 1995-06-07 1998-11-17 Nikon Corporation Ultraviolet laser source
US5694408A (en) * 1995-06-07 1997-12-02 Mcdonnell Douglas Corporation Fiber optic laser system and associated lasing method
JPH09265A (ja) 1995-06-22 1997-01-07 Eisai Co Ltd 新規ヒトsmall TIMP2遺伝子
JP3594384B2 (ja) * 1995-12-08 2004-11-24 ソニー株式会社 半導体露光装置、投影露光装置及び回路パターン製造方法
US5909306A (en) * 1996-02-23 1999-06-01 President And Fellows Of Harvard College Solid-state spectrally-pure linearly-polarized pulsed fiber amplifier laser system useful for ultraviolet radiation generation
US5745284A (en) 1996-02-23 1998-04-28 President And Fellows Of Harvard College Solid-state laser source of tunable narrow-bandwidth ultraviolet radiation
JPH09256060A (ja) 1996-03-22 1997-09-30 Nippon Steel Corp 表面特性及びイアリング特性が良好な低炭素薄鋼板の製造方法
JP3154396B2 (ja) * 1996-03-29 2001-04-09 日本電信電話株式会社 光cdm回路
KR100819239B1 (ko) * 1998-03-11 2008-04-03 가부시키가이샤 니콘 자외 레이저 장치, 레이저 장치, 노광 장치와 노광 방법, 디바이스 제조 방법, 자외광 조사 장치, 물체 패턴 검출 장치, 자외광 조사 방법 및 물체 패턴 검출 방법
JP2000260684A (ja) * 1999-03-08 2000-09-22 Nikon Corp 露光装置、及び照明装置
JP2007086101A (ja) * 2005-09-20 2007-04-05 Megaopto Co Ltd 深紫外レーザー装置

Also Published As

Publication number Publication date
KR100819239B1 (ko) 2008-04-03
KR100841147B1 (ko) 2008-06-24
AU1262499A (en) 1999-09-27
CN1286818A (zh) 2001-03-07
US7023610B2 (en) 2006-04-04
EP1063742A1 (en) 2000-12-27
US6590698B1 (en) 2003-07-08
KR20070101404A (ko) 2007-10-16
EP1063742A4 (en) 2005-04-20
US7126745B2 (en) 2006-10-24
WO1999046835A1 (fr) 1999-09-16
KR20010041764A (ko) 2001-05-25
US20070008609A1 (en) 2007-01-11
IL138374A0 (en) 2001-10-31
US20030231663A1 (en) 2003-12-18
CN100578876C (zh) 2010-01-06
US20060098269A1 (en) 2006-05-11
US7277220B2 (en) 2007-10-02

Similar Documents

Publication Publication Date Title
IL138374A (en) An ultraviolet laser device and an exposure device that includes such a device
US7212275B2 (en) Exposure apparatus with laser device
US7136402B1 (en) Laser device and exposure method
US6901090B1 (en) Exposure apparatus with laser device
JP4232130B2 (ja) レーザ装置並びにこのレーザ装置を用いた光照射装置および露光方法
US5838709A (en) Ultraviolet laser source
US5694408A (en) Fiber optic laser system and associated lasing method
US7233442B1 (en) Method and apparatus for spectral-beam combining of high-power fiber lasers
JP2001083557A (ja) レーザ装置
US20030081192A1 (en) Exposure apparatus and method using light having a wavelength less than 200 nm
JP4375846B2 (ja) レーザ装置
JP2001352116A (ja) レーザ装置並びにこのレーザ装置を用いた露光装置及び方法
TWI525398B (zh) Light generating device, light source device and its adjustment method, light irradiation device, exposure device, and element manufacturing method
US6314116B1 (en) Single resonator for simultaneous multiple single-frequency wavelengths
JP2001085314A (ja) 露光方法及び装置、デバイスの製造方法、及び露光装置の製造方法
US6836592B2 (en) Method and apparatus for fiber Bragg grating production
JP2001148345A (ja) 照明光学装置、並びに該装置を用いた露光方法及び装置
JPH09246648A (ja) レーザー光源および照明光学装置
JPH09236837A (ja) レーザー光源
TW469501B (en) Laser apparatus, exposure apparatus and method, and device manufacturing method
JP2002261361A (ja) 光増幅装置、光源装置、及び光照射装置
JP2002050815A (ja) 光源装置、露光装置、露光装置の製造方法、及びデバイス製造方法
JP2001085306A (ja) 光源装置、露光装置及び露光方法、並びにデバイス及びその製造方法

Legal Events

Date Code Title Description
FF Patent granted
KB Patent renewed
KB Patent renewed
KB Patent renewed
EXP Patent expired