IL131248A - Tantalum powder, process for its preparation and compressed anodes obtained from this powder - Google Patents
Tantalum powder, process for its preparation and compressed anodes obtained from this powderInfo
- Publication number
- IL131248A IL131248A IL13124898A IL13124898A IL131248A IL 131248 A IL131248 A IL 131248A IL 13124898 A IL13124898 A IL 13124898A IL 13124898 A IL13124898 A IL 13124898A IL 131248 A IL131248 A IL 131248A
- Authority
- IL
- Israel
- Prior art keywords
- ppm
- tantalum
- tantalum powder
- content
- powder
- Prior art date
Links
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 title claims abstract description 88
- 238000004519 manufacturing process Methods 0.000 title description 18
- 238000005245 sintering Methods 0.000 claims abstract description 14
- 239000000843 powder Substances 0.000 claims description 61
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 52
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 34
- 239000001301 oxygen Substances 0.000 claims description 34
- 229910052760 oxygen Inorganic materials 0.000 claims description 34
- 229910052715 tantalum Inorganic materials 0.000 claims description 30
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims description 29
- 229910052757 nitrogen Inorganic materials 0.000 claims description 26
- 239000011574 phosphorus Substances 0.000 claims description 22
- 229910052698 phosphorus Inorganic materials 0.000 claims description 22
- 239000000203 mixture Substances 0.000 claims description 18
- OEIMLTQPLAGXMX-UHFFFAOYSA-I tantalum(v) chloride Chemical compound Cl[Ta](Cl)(Cl)(Cl)Cl OEIMLTQPLAGXMX-UHFFFAOYSA-I 0.000 claims description 17
- 238000005406 washing Methods 0.000 claims description 16
- 239000002253 acid Substances 0.000 claims description 12
- 239000002019 doping agent Substances 0.000 claims description 11
- 238000000034 method Methods 0.000 claims description 10
- 229910052500 inorganic mineral Inorganic materials 0.000 claims description 5
- 239000011707 mineral Substances 0.000 claims description 5
- 150000007513 acids Chemical class 0.000 claims description 4
- 239000003513 alkali Substances 0.000 claims description 4
- 239000012298 atmosphere Substances 0.000 claims description 4
- 239000000126 substance Substances 0.000 claims description 4
- 229910052731 fluorine Inorganic materials 0.000 claims description 3
- 239000011737 fluorine Substances 0.000 claims description 3
- 239000011261 inert gas Substances 0.000 claims description 3
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims 2
- 229910052784 alkaline earth metal Inorganic materials 0.000 claims 1
- 150000001342 alkaline earth metals Chemical class 0.000 claims 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 40
- 229910012375 magnesium hydride Inorganic materials 0.000 description 21
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 19
- 239000011777 magnesium Substances 0.000 description 18
- 238000004458 analytical method Methods 0.000 description 17
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 16
- 229910052749 magnesium Inorganic materials 0.000 description 14
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 13
- 239000003990 capacitor Substances 0.000 description 13
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 12
- 239000011734 sodium Substances 0.000 description 12
- 229910052708 sodium Inorganic materials 0.000 description 12
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 11
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 11
- 238000006243 chemical reaction Methods 0.000 description 11
- 238000001035 drying Methods 0.000 description 11
- 238000002386 leaching Methods 0.000 description 11
- 239000001117 sulphuric acid Substances 0.000 description 11
- 235000011149 sulphuric acid Nutrition 0.000 description 11
- 229910004537 TaCl5 Inorganic materials 0.000 description 10
- 239000000243 solution Substances 0.000 description 10
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 9
- 239000000463 material Substances 0.000 description 9
- 239000011591 potassium Substances 0.000 description 9
- 229910052700 potassium Inorganic materials 0.000 description 9
- 229910052786 argon Inorganic materials 0.000 description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 8
- 150000003839 salts Chemical class 0.000 description 7
- 239000011164 primary particle Substances 0.000 description 6
- 239000007795 chemical reaction product Substances 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 4
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 4
- 239000007789 gas Substances 0.000 description 4
- 230000001681 protective effect Effects 0.000 description 4
- 239000011541 reaction mixture Substances 0.000 description 4
- 239000011163 secondary particle Substances 0.000 description 4
- 238000012360 testing method Methods 0.000 description 4
- 238000011282 treatment Methods 0.000 description 4
- 238000005054 agglomeration Methods 0.000 description 3
- 239000003638 chemical reducing agent Substances 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- 238000011010 flushing procedure Methods 0.000 description 3
- 238000005470 impregnation Methods 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- CSDQQAQKBAQLLE-UHFFFAOYSA-N 4-(4-chlorophenyl)-4,5,6,7-tetrahydrothieno[3,2-c]pyridine Chemical compound C1=CC(Cl)=CC=C1C1C(C=CS2)=C2CCN1 CSDQQAQKBAQLLE-UHFFFAOYSA-N 0.000 description 2
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- TWRXJAOTZQYOKJ-UHFFFAOYSA-L Magnesium chloride Chemical compound [Mg+2].[Cl-].[Cl-] TWRXJAOTZQYOKJ-UHFFFAOYSA-L 0.000 description 2
- 230000002776 aggregation Effects 0.000 description 2
- 229910021529 ammonia Inorganic materials 0.000 description 2
- LFVGISIMTYGQHF-UHFFFAOYSA-N ammonium dihydrogen phosphate Chemical compound [NH4+].OP(O)([O-])=O LFVGISIMTYGQHF-UHFFFAOYSA-N 0.000 description 2
- 229910000387 ammonium dihydrogen phosphate Inorganic materials 0.000 description 2
- 230000003466 anti-cipated effect Effects 0.000 description 2
- 239000012300 argon atmosphere Substances 0.000 description 2
- 238000000354 decomposition reaction Methods 0.000 description 2
- 239000003085 diluting agent Substances 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 235000019837 monoammonium phosphate Nutrition 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 239000011780 sodium chloride Substances 0.000 description 2
- 239000007858 starting material Substances 0.000 description 2
- SXAMGRAIZSSWIH-UHFFFAOYSA-N 2-[3-[2-(2,3-dihydro-1H-inden-2-ylamino)pyrimidin-5-yl]-1,2,4-oxadiazol-5-yl]-1-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)ethanone Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)C1=NOC(=N1)CC(=O)N1CC2=C(CC1)NN=N2 SXAMGRAIZSSWIH-UHFFFAOYSA-N 0.000 description 1
- 239000004254 Ammonium phosphate Substances 0.000 description 1
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 1
- 238000010306 acid treatment Methods 0.000 description 1
- 229910000095 alkaline earth hydride Inorganic materials 0.000 description 1
- 235000019270 ammonium chloride Nutrition 0.000 description 1
- 229910000148 ammonium phosphate Inorganic materials 0.000 description 1
- 235000019289 ammonium phosphates Nutrition 0.000 description 1
- 150000003863 ammonium salts Chemical class 0.000 description 1
- 150000001450 anions Chemical class 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- 238000002485 combustion reaction Methods 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000010908 decantation Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- MNNHAPBLZZVQHP-UHFFFAOYSA-N diammonium hydrogen phosphate Chemical compound [NH4+].[NH4+].OP([O-])([O-])=O MNNHAPBLZZVQHP-UHFFFAOYSA-N 0.000 description 1
- 238000010790 dilution Methods 0.000 description 1
- 239000012895 dilution Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 150000002222 fluorine compounds Chemical class 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 1
- 229910000041 hydrogen chloride Inorganic materials 0.000 description 1
- WABPQHHGFIMREM-UHFFFAOYSA-N lead(0) Chemical compound [Pb] WABPQHHGFIMREM-UHFFFAOYSA-N 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 229910001629 magnesium chloride Inorganic materials 0.000 description 1
- OHZZTXYKLXZFSZ-UHFFFAOYSA-I manganese(3+) 5,10,15-tris(1-methylpyridin-1-ium-4-yl)-20-(1-methylpyridin-4-ylidene)porphyrin-22-ide pentachloride Chemical compound [Cl-].[Cl-].[Cl-].[Cl-].[Cl-].[Mn+3].C1=CN(C)C=CC1=C1C(C=C2)=NC2=C(C=2C=C[N+](C)=CC=2)C([N-]2)=CC=C2C(C=2C=C[N+](C)=CC=2)=C(C=C2)N=C2C(C=2C=C[N+](C)=CC=2)=C2N=C1C=C2 OHZZTXYKLXZFSZ-UHFFFAOYSA-I 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000005121 nitriding Methods 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 230000001603 reducing effect Effects 0.000 description 1
- 238000007873 sieving Methods 0.000 description 1
- 238000009210 therapy by ultrasound Methods 0.000 description 1
- 238000007669 thermal treatment Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C1/00—Making non-ferrous alloys
- C22C1/04—Making non-ferrous alloys by powder metallurgy
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G9/00—Electrolytic capacitors, rectifiers, detectors, switching devices, light-sensitive or temperature-sensitive devices; Processes of their manufacture
- H01G9/004—Details
- H01G9/04—Electrodes or formation of dielectric layers thereon
- H01G9/048—Electrodes or formation of dielectric layers thereon characterised by their structure
- H01G9/052—Sintered electrodes
- H01G9/0525—Powder therefor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F9/00—Making metallic powder or suspensions thereof
- B22F9/16—Making metallic powder or suspensions thereof using chemical processes
- B22F9/18—Making metallic powder or suspensions thereof using chemical processes with reduction of metal compounds
- B22F9/20—Making metallic powder or suspensions thereof using chemical processes with reduction of metal compounds starting from solid metal compounds
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
- C22B34/00—Obtaining refractory metals
- C22B34/20—Obtaining niobium, tantalum or vanadium
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C1/00—Making non-ferrous alloys
- C22C1/04—Making non-ferrous alloys by powder metallurgy
- C22C1/045—Alloys based on refractory metals
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Power Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Powder Metallurgy (AREA)
- Manufacture Of Metal Powder And Suspensions Thereof (AREA)
- Manufacture And Refinement Of Metals (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
IL146669A IL146669A (en) | 1997-02-19 | 2001-11-22 | Tantalum powder, process for its preparation and compressed anodes obtained from this powder |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19706416 | 1997-02-19 | ||
PCT/EP1998/000698 WO1998037248A1 (de) | 1997-02-19 | 1998-02-09 | Tantal-pulver, verfahren zu seiner herstellung, sowie daraus erhältliche sinteranoden |
Publications (2)
Publication Number | Publication Date |
---|---|
IL131248A0 IL131248A0 (en) | 2001-01-28 |
IL131248A true IL131248A (en) | 2002-09-12 |
Family
ID=7820742
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
IL13124898A IL131248A (en) | 1997-02-19 | 1998-02-09 | Tantalum powder, process for its preparation and compressed anodes obtained from this powder |
IL146669A IL146669A (en) | 1997-02-19 | 2001-11-22 | Tantalum powder, process for its preparation and compressed anodes obtained from this powder |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
IL146669A IL146669A (en) | 1997-02-19 | 2001-11-22 | Tantalum powder, process for its preparation and compressed anodes obtained from this powder |
Country Status (13)
Country | Link |
---|---|
US (1) | US6193779B1 (zh) |
EP (1) | EP0964936B1 (zh) |
JP (4) | JP3817742B2 (zh) |
KR (1) | KR100511027B1 (zh) |
CN (2) | CN1080319C (zh) |
AU (1) | AU6396398A (zh) |
BR (1) | BR9807239A (zh) |
CZ (2) | CZ304759B6 (zh) |
DE (1) | DE59801634D1 (zh) |
HK (2) | HK1026459A1 (zh) |
IL (2) | IL131248A (zh) |
PT (1) | PT964936E (zh) |
WO (1) | WO1998037248A1 (zh) |
Families Citing this family (85)
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---|---|---|---|---|
US20030145682A1 (en) * | 1994-08-01 | 2003-08-07 | Kroftt-Brakston International, Inc. | Gel of elemental material or alloy and liquid metal and salt |
AU686444B2 (en) * | 1994-08-01 | 1998-02-05 | Kroftt-Brakston International, Inc. | Method of making metals and other elements |
US7435282B2 (en) | 1994-08-01 | 2008-10-14 | International Titanium Powder, Llc | Elemental material and alloy |
US7445658B2 (en) | 1994-08-01 | 2008-11-04 | Uchicago Argonne, Llc | Titanium and titanium alloys |
US20030061907A1 (en) * | 1994-08-01 | 2003-04-03 | Kroftt-Brakston International, Inc. | Gel of elemental material or alloy and liquid metal and salt |
US6576038B1 (en) * | 1998-05-22 | 2003-06-10 | Cabot Corporation | Method to agglomerate metal particles and metal particles having improved properties |
DE19847012A1 (de) * | 1998-10-13 | 2000-04-20 | Starck H C Gmbh Co Kg | Niobpulver und Verfahren zu dessen Herstellung |
JP3871824B2 (ja) * | 1999-02-03 | 2007-01-24 | キャボットスーパーメタル株式会社 | 高容量コンデンサー用タンタル粉末 |
JP2000306781A (ja) * | 1999-04-21 | 2000-11-02 | Showa Kyabotto Super Metal Kk | 電解コンデンサ用金属粉末ならびにこれを用いた電解コンデンサ用陽極体および電解コンデンサ |
US6375704B1 (en) * | 1999-05-12 | 2002-04-23 | Cabot Corporation | High capacitance niobium powders and electrolytic capacitor anodes |
US6358625B1 (en) * | 1999-10-11 | 2002-03-19 | H. C. Starck, Inc. | Refractory metals with improved adhesion strength |
JP3585791B2 (ja) * | 1999-11-04 | 2004-11-04 | Necトーキン株式会社 | 固体電解コンデンサ用陽極体の製造方法及びその製造方法に用いられる連続焼結装置 |
US6432161B1 (en) | 2000-02-08 | 2002-08-13 | Cabot Supermetals K.K. | Nitrogen-containing metal powder, production process thereof, and porous sintered body and solid electrolytic capacitor using the metal powder |
JP4049964B2 (ja) | 2000-02-08 | 2008-02-20 | キャボットスーパーメタル株式会社 | 窒素含有金属粉末およびその製造方法ならびにそれを用いた多孔質焼結体および固体電解コンデンサー |
CA2401779A1 (en) * | 2000-03-01 | 2001-09-07 | Cabot Corporation | Nitrided valve metals and processes for making the same |
JP3718412B2 (ja) * | 2000-06-01 | 2005-11-24 | キャボットスーパーメタル株式会社 | ニオブまたはタンタル粉末およびその製造方法 |
JP2002060803A (ja) * | 2000-08-10 | 2002-02-28 | Showa Kyabotto Super Metal Kk | 電解コンデンサ用タンタル焼結体の製造方法 |
JP4187953B2 (ja) * | 2001-08-15 | 2008-11-26 | キャボットスーパーメタル株式会社 | 窒素含有金属粉末の製造方法 |
US7442227B2 (en) * | 2001-10-09 | 2008-10-28 | Washington Unniversity | Tightly agglomerated non-oxide particles and method for producing the same |
JP3610942B2 (ja) * | 2001-10-12 | 2005-01-19 | 住友金属鉱山株式会社 | ニオブおよび/またはタンタルの粉末の製造法 |
US7049679B2 (en) * | 2001-11-08 | 2006-05-23 | Matsushita Electric Industrial Co., Ltd. | Capacitor and production method therefor |
GB2410251B8 (en) * | 2002-03-12 | 2018-07-25 | Starck H C Gmbh | Valve metal powders and process for producing them |
DE10307716B4 (de) * | 2002-03-12 | 2021-11-18 | Taniobis Gmbh | Ventilmetall-Pulver und Verfahren zu deren Herstellung |
UA79310C2 (en) * | 2002-09-07 | 2007-06-11 | Int Titanium Powder Llc | Methods for production of alloys or ceramics with the use of armstrong method and device for their realization |
AU2003273279B2 (en) * | 2002-09-07 | 2007-05-03 | Cristal Us, Inc. | Process for separating ti from a ti slurry |
WO2004028655A2 (en) * | 2002-09-07 | 2004-04-08 | International Titanium Powder, Llc. | Filter cake treatment method |
AU2003263082A1 (en) * | 2002-10-07 | 2004-05-04 | International Titanium Powder, Llc. | System and method of producing metals and alloys |
WO2004033737A1 (en) * | 2002-10-07 | 2004-04-22 | International Titanium Powder, Llc. | System and method of producing metals and alloys |
ATE366105T1 (de) * | 2003-03-03 | 2007-07-15 | Sprl Franpharma | Stabilisierte pharmazeutische zusammensetzung enthaltend einen nsaid und einen prostaglandin |
EP1620868A2 (en) * | 2003-04-25 | 2006-02-01 | Cabot Corporation | A method of forming sintered valve metal material |
JP2007511667A (ja) * | 2003-06-10 | 2007-05-10 | キャボット コーポレイション | タンタル粉末およびその製造方法 |
US20070180951A1 (en) * | 2003-09-03 | 2007-08-09 | Armstrong Donn R | Separation system, method and apparatus |
WO2005099935A1 (ja) * | 2004-04-15 | 2005-10-27 | Jfe Mineral Company, Ltd. | タンタル粉末およびそれを用いた固体電解コンデンサ |
DE102004020052B4 (de) * | 2004-04-23 | 2008-03-06 | H.C. Starck Gmbh | Verfahren zur Herstellung von Niob- und Tantalpulver |
KR20070027731A (ko) * | 2004-06-24 | 2007-03-09 | 에이치. 씨. 스타아크 아이앤씨 | 향상된 물리적 및 전기적 특성을 갖는 밸브 금속 분말의생성 |
JP2008504692A (ja) * | 2004-06-28 | 2008-02-14 | キャボット コーポレイション | 高キャパシタンスのタンタルフレークス及びその生産方法 |
DE102004049040B4 (de) * | 2004-10-08 | 2008-11-27 | H.C. Starck Gmbh | Verfahren zur Herstellung von Festelektrolytkondensatoren |
US20070017319A1 (en) * | 2005-07-21 | 2007-01-25 | International Titanium Powder, Llc. | Titanium alloy |
DE102005038551B3 (de) * | 2005-08-12 | 2007-04-05 | W.C. Heraeus Gmbh | Draht und Gestell für einseitig gesockelte Lampen auf Basis von Niob oder Tantal sowie Herstellungsverfahren und Verwendung |
WO2007044635A2 (en) | 2005-10-06 | 2007-04-19 | International Titanium Powder, Llc | Titanium or titanium alloy with titanium boride dispersion |
WO2007130483A2 (en) * | 2006-05-05 | 2007-11-15 | Cabot Corporation | Tantalum powder with smooth surface and methods of manufacturing same |
US20080031766A1 (en) * | 2006-06-16 | 2008-02-07 | International Titanium Powder, Llc | Attrited titanium powder |
GB0622463D0 (en) * | 2006-11-10 | 2006-12-20 | Avx Ltd | Powder modification in the manufacture of solid state capacitor anodes |
US7753989B2 (en) * | 2006-12-22 | 2010-07-13 | Cristal Us, Inc. | Direct passivation of metal powder |
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1998
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- 1998-02-09 CZ CZ2009-453A patent/CZ304759B6/cs not_active IP Right Cessation
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- 1998-02-09 KR KR10-1999-7007465A patent/KR100511027B1/ko not_active IP Right Cessation
- 1998-02-09 PT PT98909422T patent/PT964936E/pt unknown
- 1998-02-09 AU AU63963/98A patent/AU6396398A/en not_active Abandoned
- 1998-02-09 DE DE59801634T patent/DE59801634D1/de not_active Expired - Lifetime
- 1998-02-09 WO PCT/EP1998/000698 patent/WO1998037248A1/de active Search and Examination
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EP0964936B1 (de) | 2001-10-04 |
JP4974799B2 (ja) | 2012-07-11 |
JP2007335885A (ja) | 2007-12-27 |
JP2007335884A (ja) | 2007-12-27 |
JP2001512530A (ja) | 2001-08-21 |
CZ296199A3 (cs) | 2000-08-16 |
EP0964936A1 (de) | 1999-12-22 |
JP2006183150A (ja) | 2006-07-13 |
CZ304759B6 (cs) | 2014-09-24 |
IL146669A (en) | 2007-02-11 |
HK1026459A1 (en) | 2000-12-15 |
US6193779B1 (en) | 2001-02-27 |
IL146669A0 (en) | 2002-07-25 |
KR100511027B1 (ko) | 2005-08-31 |
CN1258785C (zh) | 2006-06-07 |
BR9807239A (pt) | 2000-04-25 |
CN1368744A (zh) | 2002-09-11 |
JP3817742B2 (ja) | 2006-09-06 |
HK1047188B (zh) | 2007-01-19 |
CN1080319C (zh) | 2002-03-06 |
DE59801634D1 (de) | 2001-11-08 |
CZ301097B6 (cs) | 2009-11-04 |
HK1047188A1 (en) | 2003-02-07 |
IL131248A0 (en) | 2001-01-28 |
JP4137125B2 (ja) | 2008-08-20 |
AU6396398A (en) | 1998-09-09 |
WO1998037248A1 (de) | 1998-08-27 |
JP4616313B2 (ja) | 2011-01-19 |
CN1247575A (zh) | 2000-03-15 |
KR20000071175A (ko) | 2000-11-25 |
PT964936E (pt) | 2002-03-28 |
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