FR2413791A1 - Fabrication de piles solaires - Google Patents
Fabrication de piles solairesInfo
- Publication number
- FR2413791A1 FR2413791A1 FR7834964A FR7834964A FR2413791A1 FR 2413791 A1 FR2413791 A1 FR 2413791A1 FR 7834964 A FR7834964 A FR 7834964A FR 7834964 A FR7834964 A FR 7834964A FR 2413791 A1 FR2413791 A1 FR 2413791A1
- Authority
- FR
- France
- Prior art keywords
- layer
- openings
- diffused regions
- conductivity
- alignment
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F10/00—Individual photovoltaic cells, e.g. solar cells
- H10F10/10—Individual photovoltaic cells, e.g. solar cells having potential barriers
- H10F10/14—Photovoltaic cells having only PN homojunction potential barriers
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
- C23C18/1851—Pretreatment of the material to be coated of surfaces of non-metallic or semiconducting in organic material
- C23C18/1872—Pretreatment of the material to be coated of surfaces of non-metallic or semiconducting in organic material by chemical pretreatment
- C23C18/1875—Pretreatment of the material to be coated of surfaces of non-metallic or semiconducting in organic material by chemical pretreatment only one step pretreatment
- C23C18/1879—Use of metal, e.g. activation, sensitisation with noble metals
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F71/00—Manufacture or treatment of devices covered by this subclass
- H10F71/121—The active layers comprising only Group IV materials
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P32/00—Diffusion of dopants within, into or out of wafers, substrates or parts of devices
- H10P32/10—Diffusion of dopants within, into or out of semiconductor bodies or layers
- H10P32/12—Diffusion of dopants within, into or out of semiconductor bodies or layers between a solid phase and a gaseous phase
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P32/00—Diffusion of dopants within, into or out of wafers, substrates or parts of devices
- H10P32/10—Diffusion of dopants within, into or out of semiconductor bodies or layers
- H10P32/14—Diffusion of dopants within, into or out of semiconductor bodies or layers within a single semiconductor body or layer in a solid phase; between different semiconductor bodies or layers, both in a solid phase
- H10P32/1408—Diffusion of dopants within, into or out of semiconductor bodies or layers within a single semiconductor body or layer in a solid phase; between different semiconductor bodies or layers, both in a solid phase from or through or into an external applied layer, e.g. photoresist or nitride layers
- H10P32/141—Diffusion of dopants within, into or out of semiconductor bodies or layers within a single semiconductor body or layer in a solid phase; between different semiconductor bodies or layers, both in a solid phase from or through or into an external applied layer, e.g. photoresist or nitride layers the applied layer comprising oxides only
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P32/00—Diffusion of dopants within, into or out of wafers, substrates or parts of devices
- H10P32/10—Diffusion of dopants within, into or out of semiconductor bodies or layers
- H10P32/17—Diffusion of dopants within, into or out of semiconductor bodies or layers characterised by the semiconductor material
- H10P32/171—Diffusion of dopants within, into or out of semiconductor bodies or layers characterised by the semiconductor material being group IV material
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/547—Monocrystalline silicon PV cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S148/00—Metal treatment
- Y10S148/033—Diffusion of aluminum
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S148/00—Metal treatment
- Y10S148/153—Solar cells-implantations-laser beam
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Photovoltaic Devices (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US05/865,953 US4152824A (en) | 1977-12-30 | 1977-12-30 | Manufacture of solar cells |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| FR2413791A1 true FR2413791A1 (fr) | 1979-07-27 |
| FR2413791B1 FR2413791B1 (https=) | 1984-12-14 |
Family
ID=25346596
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| FR7834964A Granted FR2413791A1 (fr) | 1977-12-30 | 1978-12-12 | Fabrication de piles solaires |
Country Status (10)
| Country | Link |
|---|---|
| US (1) | US4152824A (https=) |
| JP (1) | JPS5498189A (https=) |
| AU (1) | AU521800B2 (https=) |
| CA (1) | CA1114050A (https=) |
| DE (1) | DE2856797A1 (https=) |
| FR (1) | FR2413791A1 (https=) |
| GB (1) | GB2012107B (https=) |
| IL (1) | IL55866A (https=) |
| IN (1) | IN150245B (https=) |
| NL (1) | NL7812620A (https=) |
Families Citing this family (100)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4198262A (en) * | 1979-03-29 | 1980-04-15 | Atlantic Richfield Company | Solar cell manufacture |
| DE3068571D1 (en) * | 1979-05-01 | 1984-08-23 | Secr Defence Brit | Radiation detectors |
| US4255212A (en) * | 1979-07-02 | 1981-03-10 | The Regents Of The University Of California | Method of fabricating photovoltaic cells |
| US4321283A (en) * | 1979-10-26 | 1982-03-23 | Mobil Tyco Solar Energy Corporation | Nickel plating method |
| JPS5927579A (ja) * | 1982-08-04 | 1984-02-14 | Hoxan Corp | 太陽電池の製造方法 |
| GB2130793B (en) * | 1982-11-22 | 1986-09-03 | Gen Electric Co Plc | Forming a doped region in a semiconductor body |
| US4451969A (en) * | 1983-01-10 | 1984-06-05 | Mobil Solar Energy Corporation | Method of fabricating solar cells |
| EP0168431A4 (en) * | 1983-12-19 | 1989-01-19 | Mobil Solar Energy Corp | Method of fabricating solar cells. |
| EP0167589A4 (en) * | 1983-12-19 | 1989-01-19 | Mobil Solar Energy Corp | Method of fabricating solar cells. |
| US4650695A (en) * | 1985-05-13 | 1987-03-17 | Mobil Solar Energy Corporation | Method of fabricating solar cells |
| JPS6215864A (ja) * | 1985-07-15 | 1987-01-24 | Hitachi Ltd | 太陽電池の製造方法 |
| US4818337A (en) * | 1986-04-11 | 1989-04-04 | University Of Delaware | Thin active-layer solar cell with multiple internal reflections |
| JPS6445176A (en) * | 1987-08-14 | 1989-02-17 | Hitachi Ltd | Manufacture of solar cell element |
| US5075259A (en) * | 1989-08-22 | 1991-12-24 | Motorola, Inc. | Method for forming semiconductor contacts by electroless plating |
| US5110369A (en) * | 1990-10-24 | 1992-05-05 | Mobil Solar Energy Corporation | Cable interconnections for solar cell modules |
| US5225372A (en) * | 1990-12-24 | 1993-07-06 | Motorola, Inc. | Method of making a semiconductor device having an improved metallization structure |
| US5112409A (en) * | 1991-01-23 | 1992-05-12 | Solarex Corporation | Solar cells with reduced recombination under grid lines, and method of manufacturing same |
| JPH0812849B2 (ja) * | 1991-05-31 | 1996-02-07 | 株式会社日立製作所 | 太陽電池の製造方法 |
| US5424570A (en) * | 1992-01-31 | 1995-06-13 | Sgs-Thomson Microelectronics, Inc. | Contact structure for improving photoresist adhesion on a dielectric layer |
| US5270248A (en) * | 1992-08-07 | 1993-12-14 | Mobil Solar Energy Corporation | Method for forming diffusion junctions in solar cell substrates |
| US6153501A (en) | 1998-05-19 | 2000-11-28 | Micron Technology, Inc. | Method of reducing overetch during the formation of a semiconductor device |
| US5498570A (en) * | 1994-09-15 | 1996-03-12 | Micron Technology Inc. | Method of reducing overetch during the formation of a semiconductor device |
| DE19522539C2 (de) * | 1995-06-21 | 1997-06-12 | Fraunhofer Ges Forschung | Solarzelle mit einem, eine Oberflächentextur aufweisenden Emitter sowie Verfahren zur Herstellung derselben |
| US5716873A (en) * | 1996-05-06 | 1998-02-10 | Micro Technology, Inc. | Method for cleaning waste matter from the backside of a semiconductor wafer substrate |
| US6051501A (en) * | 1996-10-09 | 2000-04-18 | Micron Technology, Inc. | Method of reducing overetch during the formation of a semiconductor device |
| US6552414B1 (en) | 1996-12-24 | 2003-04-22 | Imec Vzw | Semiconductor device with selectively diffused regions |
| EP0851511A1 (en) * | 1996-12-24 | 1998-07-01 | IMEC vzw | Semiconductor device with two selectively diffused regions |
| DE19910816A1 (de) | 1999-03-11 | 2000-10-05 | Merck Patent Gmbh | Dotierpasten zur Erzeugung von p,p+ und n,n+ Bereichen in Halbleitern |
| NL1012961C2 (nl) * | 1999-09-02 | 2001-03-05 | Stichting Energie | Werkwijze voor het vervaardigen van een halfgeleiderinrichting. |
| DE10021440A1 (de) * | 2000-05-03 | 2001-11-15 | Univ Konstanz | Verfahren zur Herstellung einer Solarzelle und nach diesem Verfahren hergestellte Solarzelle |
| AU2001288629A1 (en) * | 2000-08-31 | 2002-03-13 | Chemtrace, Inc. | Cleaning of semiconductor process equipment chamber parts using organic solvents |
| US20040005468A1 (en) * | 2002-07-03 | 2004-01-08 | Steinecker Carl P. | Method of providing a metallic contact on a silicon solar cell |
| US7170001B2 (en) * | 2003-06-26 | 2007-01-30 | Advent Solar, Inc. | Fabrication of back-contacted silicon solar cells using thermomigration to create conductive vias |
| US7649141B2 (en) * | 2003-06-30 | 2010-01-19 | Advent Solar, Inc. | Emitter wrap-through back contact solar cells on thin silicon wafers |
| JP4232597B2 (ja) * | 2003-10-10 | 2009-03-04 | 株式会社日立製作所 | シリコン太陽電池セルとその製造方法 |
| US8502064B2 (en) * | 2003-12-11 | 2013-08-06 | Philip Morris Usa Inc. | Hybrid system for generating power |
| US20050172996A1 (en) * | 2004-02-05 | 2005-08-11 | Advent Solar, Inc. | Contact fabrication of emitter wrap-through back contact silicon solar cells |
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| US20060060238A1 (en) * | 2004-02-05 | 2006-03-23 | Advent Solar, Inc. | Process and fabrication methods for emitter wrap through back contact solar cells |
| US7335555B2 (en) * | 2004-02-05 | 2008-02-26 | Advent Solar, Inc. | Buried-contact solar cells with self-doping contacts |
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| US10228495B2 (en) * | 2016-09-08 | 2019-03-12 | Goodrich Corporation | Apparatus and methods of electrically conductive optical semiconductor coating |
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| CN114583012B (zh) * | 2022-03-07 | 2026-01-30 | 通威太阳能(成都)有限公司 | 一种金属电极、晶硅太阳电池及制备方法 |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2080611A1 (https=) * | 1970-02-19 | 1971-11-19 | Siemens Ag | |
| FR2238251A1 (https=) * | 1973-07-03 | 1975-02-14 | Telecommunications Sa | |
| FR2246066A1 (https=) * | 1973-09-17 | 1975-04-25 | Ibm | |
| US4029518A (en) * | 1974-11-20 | 1977-06-14 | Sharp Kabushiki Kaisha | Solar cell |
| US4070689A (en) * | 1975-12-31 | 1978-01-24 | Motorola Inc. | Semiconductor solar energy device |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3492167A (en) * | 1966-08-26 | 1970-01-27 | Matsushita Electric Industrial Co Ltd | Photovoltaic cell and method of making the same |
| US3841928A (en) * | 1969-06-06 | 1974-10-15 | I Miwa | Production of semiconductor photoelectric conversion target |
| BE789331A (fr) | 1971-09-28 | 1973-01-15 | Communications Satellite Corp | Cellule solaire a geometrie fine |
-
1977
- 1977-12-30 US US05/865,953 patent/US4152824A/en not_active Expired - Lifetime
-
1978
- 1978-10-31 CA CA315,184A patent/CA1114050A/en not_active Expired
- 1978-11-03 IN IN791/DEL/78A patent/IN150245B/en unknown
- 1978-11-03 IL IL55866A patent/IL55866A/xx unknown
- 1978-11-03 AU AU41336/78A patent/AU521800B2/en not_active Expired
- 1978-11-15 GB GB7844665A patent/GB2012107B/en not_active Expired
- 1978-12-12 FR FR7834964A patent/FR2413791A1/fr active Granted
- 1978-12-28 NL NL7812620A patent/NL7812620A/xx not_active Application Discontinuation
- 1978-12-29 JP JP16451378A patent/JPS5498189A/ja active Pending
- 1978-12-29 DE DE19782856797 patent/DE2856797A1/de not_active Withdrawn
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2080611A1 (https=) * | 1970-02-19 | 1971-11-19 | Siemens Ag | |
| FR2238251A1 (https=) * | 1973-07-03 | 1975-02-14 | Telecommunications Sa | |
| FR2246066A1 (https=) * | 1973-09-17 | 1975-04-25 | Ibm | |
| US4029518A (en) * | 1974-11-20 | 1977-06-14 | Sharp Kabushiki Kaisha | Solar cell |
| US4070689A (en) * | 1975-12-31 | 1978-01-24 | Motorola Inc. | Semiconductor solar energy device |
Also Published As
| Publication number | Publication date |
|---|---|
| AU521800B2 (en) | 1982-04-29 |
| GB2012107A (en) | 1979-07-18 |
| FR2413791B1 (https=) | 1984-12-14 |
| US4152824A (en) | 1979-05-08 |
| CA1114050A (en) | 1981-12-08 |
| IL55866A (en) | 1981-09-13 |
| IN150245B (https=) | 1982-08-21 |
| IL55866A0 (en) | 1979-01-31 |
| JPS5498189A (en) | 1979-08-02 |
| GB2012107B (en) | 1982-05-12 |
| DE2856797A1 (de) | 1979-07-12 |
| AU4133678A (en) | 1979-07-05 |
| NL7812620A (nl) | 1979-07-03 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| CD | Change of name or company name | ||
| ST | Notification of lapse |