FR2413791A1 - Fabrication de piles solaires - Google Patents

Fabrication de piles solaires

Info

Publication number
FR2413791A1
FR2413791A1 FR7834964A FR7834964A FR2413791A1 FR 2413791 A1 FR2413791 A1 FR 2413791A1 FR 7834964 A FR7834964 A FR 7834964A FR 7834964 A FR7834964 A FR 7834964A FR 2413791 A1 FR2413791 A1 FR 2413791A1
Authority
FR
France
Prior art keywords
layer
openings
diffused regions
conductivity
alignment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7834964A
Other languages
English (en)
Other versions
FR2413791B1 (fr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Schott Solar CSP Inc
Original Assignee
Mobil Tyco Solar Energy Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mobil Tyco Solar Energy Corp filed Critical Mobil Tyco Solar Energy Corp
Publication of FR2413791A1 publication Critical patent/FR2413791A1/fr
Application granted granted Critical
Publication of FR2413791B1 publication Critical patent/FR2413791B1/fr
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/04Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
    • H01L31/06Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers
    • H01L31/068Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers the potential barriers being only of the PN homojunction type, e.g. bulk silicon PN homojunction solar cells or thin film polycrystalline silicon PN homojunction solar cells
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18Pretreatment of the material to be coated
    • C23C18/1851Pretreatment of the material to be coated of surfaces of non-metallic or semiconducting in organic material
    • C23C18/1872Pretreatment of the material to be coated of surfaces of non-metallic or semiconducting in organic material by chemical pretreatment
    • C23C18/1875Pretreatment of the material to be coated of surfaces of non-metallic or semiconducting in organic material by chemical pretreatment only one step pretreatment
    • C23C18/1879Use of metal, e.g. activation, sensitisation with noble metals
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/22Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities
    • H01L21/223Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities using diffusion into or out of a solid from or into a gaseous phase
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/22Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities
    • H01L21/225Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities using diffusion into or out of a solid from or into a solid phase, e.g. a doped oxide layer
    • H01L21/2251Diffusion into or out of group IV semiconductors
    • H01L21/2254Diffusion into or out of group IV semiconductors from or through or into an applied layer, e.g. photoresist, nitrides
    • H01L21/2255Diffusion into or out of group IV semiconductors from or through or into an applied layer, e.g. photoresist, nitrides the applied layer comprising oxides only, e.g. P2O5, PSG, H3BO3, doped oxides
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/18Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
    • H01L31/1804Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof comprising only elements of Group IV of the Periodic Table
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy
    • Y02E10/547Monocrystalline silicon PV cells
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50Manufacturing or production processes characterised by the final manufactured product
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00Metal treatment
    • Y10S148/033Diffusion of aluminum
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00Metal treatment
    • Y10S148/153Solar cells-implantations-laser beam

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Electromagnetism (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Sustainable Development (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Photovoltaic Devices (AREA)

Abstract

SUR LA SURFACE D'UN SUBSTRAT SEMI-CONDUCTEUR 2 D'UN PREMIER TYPE DE CONDUCTIVITE, ON FORME UNE COUCHE CONTINUE 4 D'UN MATERIAU CONTENANT UN DOPANT CAPABLE DE FORMER UNE REGION 12 D'UN SECOND TYPE DE CONDUCTIVITE. UNE COUCHE 5 D'OXYDE NON DOPE EST DEPOSEE SUR LA COUCHE 4. DES OUVERTURES 6 SONT PRATIQUEES PAR ATTAQUE CHIMIQUE DES COUCHES 4 ET 5. LE SUBSTRAT EST ENSUITE CHAUFFE DANS UNE ATMOSPHERE CONTENANT LE DOPANT DE MANIERE A FORMER A PARTIR DE LA COUCHE 4 ET DE L'ATMOSPHERE DES REGIONS DIFFUSEES RELATIVEMENT EPAISSES 10 DANS L'ALIGNEMENT DES OUVERTURES 4 ET DES REGIONS DIFFUSEES RELATIVEMENT SUPERFICIELLES 12 DANS L'ALIGNEMENT DES PARTIES SITUEES ENTRE LES OUVERTURES 4, CES REGIONS FORMANT UNE JONCTION. DES CONTACTS CONDUCTEURS SONT ENFIN FORMES SUR LA SURFACE EPOUSANT LA FORME DES REGIONS DIFFUSEES PROFONDES QU'ILS RECOUVRENT. APPLICATIONS: PILES SOLAIRES PHOTOVOLTAIQUES A SEMI-CONDUCTEUR.
FR7834964A 1977-12-30 1978-12-12 Fabrication de piles solaires Granted FR2413791A1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/865,953 US4152824A (en) 1977-12-30 1977-12-30 Manufacture of solar cells

Publications (2)

Publication Number Publication Date
FR2413791A1 true FR2413791A1 (fr) 1979-07-27
FR2413791B1 FR2413791B1 (fr) 1984-12-14

Family

ID=25346596

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7834964A Granted FR2413791A1 (fr) 1977-12-30 1978-12-12 Fabrication de piles solaires

Country Status (10)

Country Link
US (1) US4152824A (fr)
JP (1) JPS5498189A (fr)
AU (1) AU521800B2 (fr)
CA (1) CA1114050A (fr)
DE (1) DE2856797A1 (fr)
FR (1) FR2413791A1 (fr)
GB (1) GB2012107B (fr)
IL (1) IL55866A (fr)
IN (1) IN150245B (fr)
NL (1) NL7812620A (fr)

Families Citing this family (99)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4198262A (en) * 1979-03-29 1980-04-15 Atlantic Richfield Company Solar cell manufacture
EP0018744B1 (fr) * 1979-05-01 1984-07-18 The Secretary of State for Defence in Her Britannic Majesty's Government of the United Kingdom of Great Britain and Détecteurs de rayonnement
US4255212A (en) * 1979-07-02 1981-03-10 The Regents Of The University Of California Method of fabricating photovoltaic cells
US4321283A (en) * 1979-10-26 1982-03-23 Mobil Tyco Solar Energy Corporation Nickel plating method
JPS5927579A (ja) * 1982-08-04 1984-02-14 Hoxan Corp 太陽電池の製造方法
GB2130793B (en) * 1982-11-22 1986-09-03 Gen Electric Co Plc Forming a doped region in a semiconductor body
US4451969A (en) * 1983-01-10 1984-06-05 Mobil Solar Energy Corporation Method of fabricating solar cells
DE3490600T1 (de) * 1983-12-19 1985-11-28 Mobil Solar Energy Corp., Waltham, Mass. Verfahren zur Herstellung von Solarzellen
AU574761B2 (en) * 1983-12-19 1988-07-14 Mobil Solar Energy Corp. Method of fabricating solar cells
US4650695A (en) * 1985-05-13 1987-03-17 Mobil Solar Energy Corporation Method of fabricating solar cells
JPS6215864A (ja) * 1985-07-15 1987-01-24 Hitachi Ltd 太陽電池の製造方法
US4818337A (en) * 1986-04-11 1989-04-04 University Of Delaware Thin active-layer solar cell with multiple internal reflections
JPS6445176A (en) * 1987-08-14 1989-02-17 Hitachi Ltd Manufacture of solar cell element
US5075259A (en) * 1989-08-22 1991-12-24 Motorola, Inc. Method for forming semiconductor contacts by electroless plating
US5110369A (en) * 1990-10-24 1992-05-05 Mobil Solar Energy Corporation Cable interconnections for solar cell modules
US5225372A (en) * 1990-12-24 1993-07-06 Motorola, Inc. Method of making a semiconductor device having an improved metallization structure
US5112409A (en) * 1991-01-23 1992-05-12 Solarex Corporation Solar cells with reduced recombination under grid lines, and method of manufacturing same
JPH0812849B2 (ja) * 1991-05-31 1996-02-07 株式会社日立製作所 太陽電池の製造方法
US5424570A (en) * 1992-01-31 1995-06-13 Sgs-Thomson Microelectronics, Inc. Contact structure for improving photoresist adhesion on a dielectric layer
US5270248A (en) * 1992-08-07 1993-12-14 Mobil Solar Energy Corporation Method for forming diffusion junctions in solar cell substrates
US6153501A (en) 1998-05-19 2000-11-28 Micron Technology, Inc. Method of reducing overetch during the formation of a semiconductor device
US5498570A (en) * 1994-09-15 1996-03-12 Micron Technology Inc. Method of reducing overetch during the formation of a semiconductor device
DE19522539C2 (de) * 1995-06-21 1997-06-12 Fraunhofer Ges Forschung Solarzelle mit einem, eine Oberflächentextur aufweisenden Emitter sowie Verfahren zur Herstellung derselben
US5716873A (en) * 1996-05-06 1998-02-10 Micro Technology, Inc. Method for cleaning waste matter from the backside of a semiconductor wafer substrate
US6051501A (en) * 1996-10-09 2000-04-18 Micron Technology, Inc. Method of reducing overetch during the formation of a semiconductor device
US6552414B1 (en) 1996-12-24 2003-04-22 Imec Vzw Semiconductor device with selectively diffused regions
EP0851511A1 (fr) * 1996-12-24 1998-07-01 IMEC vzw Dispositif semi-conducteur avec deux régions diffusées sélectivement
DE19910816A1 (de) 1999-03-11 2000-10-05 Merck Patent Gmbh Dotierpasten zur Erzeugung von p,p+ und n,n+ Bereichen in Halbleitern
NL1012961C2 (nl) * 1999-09-02 2001-03-05 Stichting Energie Werkwijze voor het vervaardigen van een halfgeleiderinrichting.
DE10021440A1 (de) * 2000-05-03 2001-11-15 Univ Konstanz Verfahren zur Herstellung einer Solarzelle und nach diesem Verfahren hergestellte Solarzelle
WO2002019390A2 (fr) * 2000-08-31 2002-03-07 Chemtrace, Inc. Nettoyage de parties des chambres d'équipement de traitement de semi-conducteurs au moyen de solvants organiques
US20040005468A1 (en) * 2002-07-03 2004-01-08 Steinecker Carl P. Method of providing a metallic contact on a silicon solar cell
US7170001B2 (en) * 2003-06-26 2007-01-30 Advent Solar, Inc. Fabrication of back-contacted silicon solar cells using thermomigration to create conductive vias
US7649141B2 (en) * 2003-06-30 2010-01-19 Advent Solar, Inc. Emitter wrap-through back contact solar cells on thin silicon wafers
JP4232597B2 (ja) * 2003-10-10 2009-03-04 株式会社日立製作所 シリコン太陽電池セルとその製造方法
US8502064B2 (en) * 2003-12-11 2013-08-06 Philip Morris Usa Inc. Hybrid system for generating power
US20060060238A1 (en) * 2004-02-05 2006-03-23 Advent Solar, Inc. Process and fabrication methods for emitter wrap through back contact solar cells
US20050172996A1 (en) * 2004-02-05 2005-08-11 Advent Solar, Inc. Contact fabrication of emitter wrap-through back contact silicon solar cells
US7335555B2 (en) * 2004-02-05 2008-02-26 Advent Solar, Inc. Buried-contact solar cells with self-doping contacts
US7144751B2 (en) * 2004-02-05 2006-12-05 Advent Solar, Inc. Back-contact solar cells and methods for fabrication
US7790574B2 (en) * 2004-12-20 2010-09-07 Georgia Tech Research Corporation Boron diffusion in silicon devices
JP4481869B2 (ja) * 2005-04-26 2010-06-16 信越半導体株式会社 太陽電池の製造方法及び太陽電池並びに半導体装置の製造方法
DE102006003283A1 (de) * 2006-01-23 2007-07-26 Gp Solar Gmbh Verfahren zur Herstellung eines Halbleiterbauelements mit unterschiedlich stark dotierten Bereichen
EP1843389B1 (fr) * 2006-04-04 2008-08-13 SolarWorld Industries Deutschland GmbH Procédé de dopage au moyen de diffusion, oxydation superficielle et rétrogravure ainsi que procédé de fabrication d'une cellule solaire
JP2008066437A (ja) * 2006-09-06 2008-03-21 Mitsubishi Heavy Ind Ltd 太陽電池パネルの製造方法
CA2568136C (fr) * 2006-11-30 2008-07-29 Tenxc Wireless Inc. Implementation de matrice de butler
WO2008080160A1 (fr) * 2006-12-22 2008-07-03 Advent Solar, Inc. Technologies d'interconnexion pour cellules et modules solaires à contact arrière
GB2449504A (en) * 2007-05-25 2008-11-26 Renewable Energy Corp Asa Photovoltaic module with reflective V-grooves
WO2009029901A1 (fr) * 2007-08-31 2009-03-05 Applied Materials, Inc. Module de chaîne de production pour former des dispositifs photovoltaïques de plusieurs tailles
US20100047954A1 (en) * 2007-08-31 2010-02-25 Su Tzay-Fa Jeff Photovoltaic production line
DE102007051725B4 (de) * 2007-10-27 2014-10-30 Centrotherm Photovoltaics Ag Verfahren zur Kontaktierung von Solarzellen
WO2009064870A2 (fr) * 2007-11-13 2009-05-22 Advent Solar, Inc. Procédés de fabrication de photopiles à contact arrière du type à texture et émetteur sélectif
US20090139568A1 (en) * 2007-11-19 2009-06-04 Applied Materials, Inc. Crystalline Solar Cell Metallization Methods
CN101889348B (zh) * 2007-11-19 2013-03-27 应用材料公司 使用图案化蚀刻剂物质以形成太阳能电池接点的工艺
US20090188603A1 (en) * 2008-01-25 2009-07-30 Applied Materials, Inc. Method and apparatus for controlling laminator temperature on a solar cell
DE102008017647A1 (de) * 2008-04-04 2009-10-29 Centrotherm Photovoltaics Technology Gmbh Verfahren zur Herstellung einer Solarzelle mit einer zweistufigen Dotierung
DE102008019402A1 (de) * 2008-04-14 2009-10-15 Gebr. Schmid Gmbh & Co. Verfahren zur selektiven Dotierung von Silizium sowie damit behandeltes Silizium-Substrat
TWI390747B (zh) * 2008-04-29 2013-03-21 Applied Materials Inc 使用單石模組組合技術製造的光伏打模組
US20100116942A1 (en) * 2008-06-09 2010-05-13 Fitzgerald Eugene A High-efficiency solar cell structures
EP2304803A1 (fr) * 2008-06-11 2011-04-06 Solar Implant Technologies Inc. Fabrication de cellule solaire à l aide d une implantation
WO2010009295A2 (fr) * 2008-07-16 2010-01-21 Applied Materials, Inc. Confection de cellules solaires hybrides à hétérojonction à l’aide d’un masque en couche métallique
US7951637B2 (en) * 2008-08-27 2011-05-31 Applied Materials, Inc. Back contact solar cells using printed dielectric barrier
JP5344872B2 (ja) * 2008-08-27 2013-11-20 三菱電機株式会社 光起電力装置
TWI371115B (en) * 2008-09-16 2012-08-21 Gintech Energy Corp One-step diffusion method for fabricating a differential doped solar cell
DE102009008786A1 (de) * 2008-10-31 2010-06-10 Bosch Solar Energy Ag Verfahren zur Herstellung einer Solarzelle und Solarzelle
DE102008056456A1 (de) * 2008-11-07 2010-06-17 Centrotherm Photovoltaics Technology Gmbh Verfahren zur Herstellung einer Solarzelle mit einer zweistufigen Dotierung
US20110162703A1 (en) * 2009-03-20 2011-07-07 Solar Implant Technologies, Inc. Advanced high efficientcy crystalline solar cell fabrication method
US8749053B2 (en) 2009-06-23 2014-06-10 Intevac, Inc. Plasma grid implant system for use in solar cell fabrications
US8163587B2 (en) * 2009-07-02 2012-04-24 Innovalight, Inc. Methods of using a silicon nanoparticle fluid to control in situ a set of dopant diffusion profiles
DE102009034087A1 (de) * 2009-07-21 2011-01-27 Solsol Gmbh Verfahren zur Herstellung eines selektiven Solarzellenemitters
US8574950B2 (en) * 2009-10-30 2013-11-05 International Business Machines Corporation Electrically contactable grids manufacture
US8796060B2 (en) 2009-11-18 2014-08-05 Solar Wind Technologies, Inc. Method of manufacturing photovoltaic cells, photovoltaic cells produced thereby and uses thereof
US8586862B2 (en) * 2009-11-18 2013-11-19 Solar Wind Technologies, Inc. Method of manufacturing photovoltaic cells, photovoltaic cells produced thereby and uses thereof
US20110114147A1 (en) * 2009-11-18 2011-05-19 Solar Wind Ltd. Method of manufacturing photovoltaic cells, photovoltaic cells produced thereby and uses thereof
DE102009058786A1 (de) * 2009-12-18 2011-06-22 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V., 80686 Verfahren zur Herstellung lokal strukturierter Halbleiterschichten
US20110162701A1 (en) * 2010-01-03 2011-07-07 Claudio Truzzi Photovoltaic Cells
FR2959351B1 (fr) * 2010-04-26 2013-11-08 Photowatt Int Procede de preparation d’une structure de type n+pp+ ou de type p+nn+ sur plaques de silicium
DE102010016992B4 (de) * 2010-05-18 2015-07-23 Hanwha Q.CELLS GmbH Herstellungsverfahren einer Halbleitervorrichtung
US8981208B2 (en) 2010-06-21 2015-03-17 Lg Electronics Inc. Solar cell
KR101835293B1 (ko) * 2010-09-03 2018-03-06 테트라썬, 아이엔씨. 광학코팅의 부분적 리프트-오프에 의한 광기전력 장치의 미세라인 금속화
US8969122B2 (en) * 2011-06-14 2015-03-03 International Business Machines Corporation Processes for uniform metal semiconductor alloy formation for front side contact metallization and photovoltaic device formed therefrom
WO2013070978A2 (fr) 2011-11-08 2013-05-16 Intevac, Inc. Système et procédé de traitement de substrat
US8679889B2 (en) * 2011-12-21 2014-03-25 Sunpower Corporation Hybrid polysilicon heterojunction back contact cell
US8597970B2 (en) 2011-12-21 2013-12-03 Sunpower Corporation Hybrid polysilicon heterojunction back contact cell
TWI559563B (zh) * 2011-12-21 2016-11-21 太陽電子公司 混合式多晶矽異質接面背接觸電池
CN104011882A (zh) 2012-01-12 2014-08-27 应用材料公司 制造太阳能电池装置的方法
DE102012200559A1 (de) * 2012-01-16 2013-07-18 Deutsche Cell Gmbh Verfahren zur Herstellung eines Emitters einer Solarzelle und Solarzelle
KR20140142690A (ko) * 2012-03-30 2014-12-12 데이진 가부시키가이샤 반도체 적층체 및 그 제조 방법, 반도체 디바이스의 제조 방법, 반도체 디바이스, 도펀트 조성물, 도펀트 주입층, 그리고 도프층의 형성 방법
KR20140011462A (ko) * 2012-07-18 2014-01-28 엘지전자 주식회사 태양 전지 및 이의 제조 방법
BR102012030606B1 (pt) * 2012-11-30 2021-02-09 União Brasileira De Educação E Assistência - Mantenedora Da Puc Rs processo de difusão de dopantes em lâminas de silício para a fabricação de células solares
WO2014100506A1 (fr) 2012-12-19 2014-06-26 Intevac, Inc. Grille pour implantation ionique par plasma
FR3002545B1 (fr) * 2013-02-22 2016-01-08 Alchimer Procede de formation d'un siliciure metallique a l'aide d'une solution contenant des ions or et des ions fluor
US9455368B2 (en) * 2014-07-03 2016-09-27 Varian Semiconductor Equipment Associates, Inc. Method of forming an interdigitated back contact solar cell
JPWO2016111132A1 (ja) * 2015-01-07 2017-04-27 三菱電機株式会社 太陽電池の製造方法
FR3035740B1 (fr) * 2015-04-28 2017-05-12 Commissariat Energie Atomique Procede de fabrication d'une cellule photovoltaique.
FR3035741B1 (fr) * 2015-04-28 2018-03-02 Commissariat A L'energie Atomique Et Aux Energies Alternatives Procede de fabrication d'une cellule photovoltaique.
US9673341B2 (en) 2015-05-08 2017-06-06 Tetrasun, Inc. Photovoltaic devices with fine-line metallization and methods for manufacture
US10126656B2 (en) * 2016-09-08 2018-11-13 Goodrich Corporation Apparatus and methods of electrically conductive optical semiconductor coating
US10228495B2 (en) 2016-09-08 2019-03-12 Goodrich Corporation Apparatus and methods of electrically conductive optical semiconductor coating

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2080611A1 (fr) * 1970-02-19 1971-11-19 Siemens Ag
FR2238251A1 (fr) * 1973-07-03 1975-02-14 Telecommunications Sa
FR2246066A1 (fr) * 1973-09-17 1975-04-25 Ibm
US4029518A (en) * 1974-11-20 1977-06-14 Sharp Kabushiki Kaisha Solar cell
US4070689A (en) * 1975-12-31 1978-01-24 Motorola Inc. Semiconductor solar energy device

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3492167A (en) * 1966-08-26 1970-01-27 Matsushita Electric Ind Co Ltd Photovoltaic cell and method of making the same
US3841928A (en) * 1969-06-06 1974-10-15 I Miwa Production of semiconductor photoelectric conversion target

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2080611A1 (fr) * 1970-02-19 1971-11-19 Siemens Ag
FR2238251A1 (fr) * 1973-07-03 1975-02-14 Telecommunications Sa
FR2246066A1 (fr) * 1973-09-17 1975-04-25 Ibm
US4029518A (en) * 1974-11-20 1977-06-14 Sharp Kabushiki Kaisha Solar cell
US4070689A (en) * 1975-12-31 1978-01-24 Motorola Inc. Semiconductor solar energy device

Also Published As

Publication number Publication date
DE2856797A1 (de) 1979-07-12
IN150245B (fr) 1982-08-21
CA1114050A (fr) 1981-12-08
GB2012107B (en) 1982-05-12
IL55866A0 (en) 1979-01-31
GB2012107A (en) 1979-07-18
FR2413791B1 (fr) 1984-12-14
NL7812620A (nl) 1979-07-03
JPS5498189A (en) 1979-08-02
IL55866A (en) 1981-09-13
US4152824A (en) 1979-05-08
AU4133678A (en) 1979-07-05
AU521800B2 (en) 1982-04-29

Similar Documents

Publication Publication Date Title
FR2413791A1 (fr) Fabrication de piles solaires
FR2363898A1 (fr) Pile solaire et procede pour la fabrication de celle-ci
FR2455363A1 (fr) Procede continu de fabrication de cellules solaires et produit ainsi obtenu
US3686036A (en) Solar cell with metal layered contact and method of manufacture
JPS56100486A (en) Photoelectric conversion element
JPS57188105A (en) Electret constituent
JPS5681982A (en) Power phototransistor
JPS5661175A (en) Thin-film solar cell
JPS5567161A (en) Semiconductor memory storage
JPS55158680A (en) Solar cell and manufacture thereof
GB2160360A (en) Method of fabricating solar cells
JPS5578571A (en) Manufacture of semiconductor device
JPS5541751A (en) Manufacturing semiconductor device
JPS54101278A (en) Manufacture for semiconductor device
JPS5493366A (en) Bipolar type transistor
JPS5633855A (en) Semiconductor device and its manufacture
JPS5583230A (en) Producing semiconductor device
JPS56122162A (en) Semiconductor device and manufacture thereof
GB2162998A (en) Method of fabricating solar cells
JPS5768022A (en) Manufacture of compound semiconductor device
JPS5578568A (en) Manufacture of semiconductor device
JPS5489477A (en) Production of semiconductor device
JPS5723221A (en) Manufacture of semiconductor device
JPS57184219A (en) Manufacture of semiconductor device
JPS6468976A (en) Manufacture of semiconductor radiation detector

Legal Events

Date Code Title Description
CD Change of name or company name
ST Notification of lapse