EP1182692A3 - Appareil de traitement thermique et méthode pour le traitement de semiconducteurs - Google Patents

Appareil de traitement thermique et méthode pour le traitement de semiconducteurs Download PDF

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Publication number
EP1182692A3
EP1182692A3 EP01203167A EP01203167A EP1182692A3 EP 1182692 A3 EP1182692 A3 EP 1182692A3 EP 01203167 A EP01203167 A EP 01203167A EP 01203167 A EP01203167 A EP 01203167A EP 1182692 A3 EP1182692 A3 EP 1182692A3
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EP
European Patent Office
Prior art keywords
zones
cooling gas
processing apparatus
zone
flow velocity
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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EP01203167A
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German (de)
English (en)
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EP1182692B1 (fr
EP1182692A2 (fr
Inventor
Kazuhiko. c/o Tohoku Jigyosyo Tokyo Electron Kato
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Tokyo Electron Ltd
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Tokyo Electron Ltd
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Publication of EP1182692A3 publication Critical patent/EP1182692A3/fr
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Publication of EP1182692B1 publication Critical patent/EP1182692B1/fr
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67098—Apparatus for thermal treatment
    • H01L21/67109—Apparatus for thermal treatment mainly by convection

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Chemical Vapour Deposition (AREA)
  • Muffle Furnaces And Rotary Kilns (AREA)
EP01203167A 2000-08-23 2001-08-22 Appareil de traitement thermique et méthode pour le traitement de semiconducteurs Expired - Lifetime EP1182692B1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2000252249A JP4365017B2 (ja) 2000-08-23 2000-08-23 熱処理装置の降温レート制御方法および熱処理装置
JP2000252249 2000-08-23

Publications (3)

Publication Number Publication Date
EP1182692A2 EP1182692A2 (fr) 2002-02-27
EP1182692A3 true EP1182692A3 (fr) 2006-05-31
EP1182692B1 EP1182692B1 (fr) 2009-05-13

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EP01203167A Expired - Lifetime EP1182692B1 (fr) 2000-08-23 2001-08-22 Appareil de traitement thermique et méthode pour le traitement de semiconducteurs

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US (1) US6403927B1 (fr)
EP (1) EP1182692B1 (fr)
JP (1) JP4365017B2 (fr)

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US20020025688A1 (en) 2002-02-28
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