DE69811511D1 - Herstellungsverfahren für ein photovoltaisches bauelement - Google Patents
Herstellungsverfahren für ein photovoltaisches bauelementInfo
- Publication number
- DE69811511D1 DE69811511D1 DE69811511T DE69811511T DE69811511D1 DE 69811511 D1 DE69811511 D1 DE 69811511D1 DE 69811511 T DE69811511 T DE 69811511T DE 69811511 T DE69811511 T DE 69811511T DE 69811511 D1 DE69811511 D1 DE 69811511D1
- Authority
- DE
- Germany
- Prior art keywords
- manufacturing
- photovoltaic component
- photovoltaic
- component
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000004519 manufacturing process Methods 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0236—Special surface textures
- H01L31/02363—Special surface textures of the semiconductor body itself, e.g. textured active layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
- H01L31/0352—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their shape or by the shapes, relative sizes or disposition of the semiconductor regions
- H01L31/035272—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their shape or by the shapes, relative sizes or disposition of the semiconductor regions characterised by at least one potential jump barrier or surface barrier
- H01L31/035281—Shape of the body
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
- H01L31/0352—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their shape or by the shapes, relative sizes or disposition of the semiconductor regions
- H01L31/035272—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their shape or by the shapes, relative sizes or disposition of the semiconductor regions characterised by at least one potential jump barrier or surface barrier
- H01L31/03529—Shape of the potential jump barrier or surface barrier
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/06—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers
- H01L31/072—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers the potential barriers being only of the PN heterojunction type
- H01L31/0745—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers the potential barriers being only of the PN heterojunction type comprising a AIVBIV heterojunction, e.g. Si/Ge, SiGe/Si or Si/SiC solar cells
- H01L31/0747—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers the potential barriers being only of the PN heterojunction type comprising a AIVBIV heterojunction, e.g. Si/Ge, SiGe/Si or Si/SiC solar cells comprising a heterojunction of crystalline and amorphous materials, e.g. heterojunction with intrinsic thin layer
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Electromagnetism (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Life Sciences & Earth Sciences (AREA)
- Sustainable Energy (AREA)
- Photovoltaic Devices (AREA)
- Weting (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6769097 | 1997-03-21 | ||
JP6769097 | 1997-03-21 | ||
PCT/JP1998/001204 WO1998043304A1 (fr) | 1997-03-21 | 1998-03-19 | Element photovoltaique et procede de fabrication dudit element |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69811511D1 true DE69811511D1 (de) | 2003-03-27 |
DE69811511T2 DE69811511T2 (de) | 2004-02-19 |
Family
ID=13352238
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69811511T Expired - Lifetime DE69811511T2 (de) | 1997-03-21 | 1998-03-19 | Herstellungsverfahren für ein photovoltaisches bauelement |
Country Status (7)
Country | Link |
---|---|
US (2) | US6207890B1 (de) |
EP (1) | EP1005095B1 (de) |
JP (1) | JP3271990B2 (de) |
CN (1) | CN1139997C (de) |
AU (1) | AU6420398A (de) |
DE (1) | DE69811511T2 (de) |
WO (1) | WO1998043304A1 (de) |
Families Citing this family (120)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3271990B2 (ja) * | 1997-03-21 | 2002-04-08 | 三洋電機株式会社 | 光起電力素子及びその製造方法 |
FR2784230B1 (fr) * | 1998-10-05 | 2000-12-29 | St Microelectronics Sa | Procede de realisation d'un isolement inter et/ou intra-metallique par air dans un circuit integre et circuit integre obtenu |
JP4111669B2 (ja) | 1999-11-30 | 2008-07-02 | シャープ株式会社 | シート製造方法、シートおよび太陽電池 |
JP4644914B2 (ja) * | 2000-06-02 | 2011-03-09 | 株式会社村田製作所 | プローブアレイ用固相基材、およびプローブアレイ |
KR100652041B1 (ko) * | 2000-12-29 | 2006-11-30 | 엘지.필립스 엘시디 주식회사 | 액정표시소자 및 그 제조방법 |
JP2003086554A (ja) * | 2001-09-11 | 2003-03-20 | Mitsubishi Heavy Ind Ltd | 半導体基板の製造装置、及び、その製造方法 |
JP3841790B2 (ja) * | 2002-03-06 | 2006-11-01 | シャープ株式会社 | 光電変換素子及びその製造方法 |
JP3679771B2 (ja) * | 2002-03-19 | 2005-08-03 | 三洋電機株式会社 | 光起電力装置、及び光起電力装置の製造方法 |
US20050150877A1 (en) * | 2002-07-29 | 2005-07-14 | Sumitomo Precision Products Co., Ltd. | Method and device for laser beam processing of silicon substrate, and method and device for laser beam cutting of silicon wiring |
JP2004235274A (ja) * | 2003-01-28 | 2004-08-19 | Kyocera Corp | 多結晶シリコン基板およびその粗面化法 |
US7402448B2 (en) * | 2003-01-31 | 2008-07-22 | Bp Corporation North America Inc. | Photovoltaic cell and production thereof |
JP4509498B2 (ja) * | 2003-07-09 | 2010-07-21 | 株式会社エンプラス | 太陽電池用基板及びそれを用いた太陽電池 |
JP2005175160A (ja) * | 2003-12-10 | 2005-06-30 | Sanyo Electric Co Ltd | 光起電力装置 |
DE112004002879A5 (de) | 2004-03-22 | 2007-05-24 | Rena Sondermaschinen Gmbh | Verfahren zur Behandlung von Substratoberflächen |
DE102005004795B9 (de) * | 2005-02-02 | 2012-01-19 | Avago Technologies Wireless Ip (Singapore) Pte. Ltd. | Konzept zur nass-chemischen Entfernung eines Opfermaterials in einer Materialstruktur |
US7927497B2 (en) * | 2005-03-16 | 2011-04-19 | Korea Advanced Institute Of Science And Technology | Integrated thin-film solar cells and method of manufacturing thereof and processing method of transparent electrode for integrated thin-film solar cells and structure thereof, and transparent substrate having processed transparent electrode |
US8816191B2 (en) * | 2005-11-29 | 2014-08-26 | Banpil Photonics, Inc. | High efficiency photovoltaic cells and manufacturing thereof |
KR100725110B1 (ko) * | 2005-12-14 | 2007-06-04 | 한국과학기술원 | 투과형 집적형 박막 태양전지 및 그 제조 방법. |
KR100656738B1 (ko) * | 2005-12-14 | 2006-12-14 | 한국과학기술원 | 집적형 박막 태양전지 및 그 제조 방법 |
ATE514193T1 (de) * | 2006-08-19 | 2011-07-15 | Univ Konstanz | Verfahren zum texturieren von siliziumwafern zur herstellung von solarzellen |
US20080072953A1 (en) * | 2006-09-27 | 2008-03-27 | Thinsilicon Corp. | Back contact device for photovoltaic cells and method of manufacturing a back contact device |
US7501305B2 (en) | 2006-10-23 | 2009-03-10 | Canon Kabushiki Kaisha | Method for forming deposited film and photovoltaic element |
TW200830563A (en) * | 2007-01-12 | 2008-07-16 | Jin-Yuan Lee | Photovoltaic device and method of manufacturing the same |
US7842596B2 (en) * | 2007-05-07 | 2010-11-30 | Georgia Tech Research Corporation | Method for formation of high quality back contact with screen-printed local back surface field |
US20080283503A1 (en) * | 2007-05-14 | 2008-11-20 | Cheng-Yi Liu | Method of Processing Nature Pattern on Expitaxial Substrate |
DE102007024478A1 (de) * | 2007-05-25 | 2008-11-27 | Friedrich-Schiller-Universität Jena | Fotoempfindliches Halbleiterbauelement |
WO2008150769A2 (en) * | 2007-05-31 | 2008-12-11 | Thinsilicon Corporation | Photovoltaic device and method of manufacturing photovoltaic devices |
US8017861B2 (en) * | 2007-09-18 | 2011-09-13 | Solopower, Inc. | Substrate preparation for thin film solar cell manufacturing |
EP2182556B1 (de) * | 2007-10-24 | 2013-01-16 | Mitsubishi Electric Corporation | Verfahren zum Herstellen einer Solarzelle |
WO2009062117A1 (en) * | 2007-11-09 | 2009-05-14 | Sunpreme, Inc. | Low-cost solar cells and methods for their production |
KR101000064B1 (ko) * | 2007-12-18 | 2010-12-10 | 엘지전자 주식회사 | 이종접합 태양전지 및 그 제조방법 |
KR101028085B1 (ko) * | 2008-02-19 | 2011-04-08 | 엘지전자 주식회사 | 비대칭 웨이퍼의 식각방법, 비대칭 식각의 웨이퍼를포함하는 태양전지, 및 태양전지의 제조방법 |
US8894803B2 (en) * | 2008-03-05 | 2014-11-25 | Heateflex Corporation | Apparatus and method for etching the surface of a semiconductor substrate |
TW201001508A (en) * | 2008-03-25 | 2010-01-01 | Applied Materials Inc | Surface cleaning and texturing process for crystalline solar cells |
KR101168589B1 (ko) * | 2008-03-26 | 2012-07-30 | 엘지전자 주식회사 | 계면 활성제를 이용한 실리콘 태양전지의 텍스처링 방법 |
US8198115B2 (en) * | 2008-04-25 | 2012-06-12 | Ulvac, Inc. | Solar cell, and method and apparatus for manufacturing the same |
US20090286349A1 (en) * | 2008-05-13 | 2009-11-19 | Georgia Tech Research Corporation | Solar cell spin-on based process for simultaneous diffusion and passivation |
KR20100013649A (ko) * | 2008-07-31 | 2010-02-10 | 삼성전자주식회사 | 광전소자 및 이의 제조 방법 |
EP2159851A1 (de) * | 2008-09-01 | 2010-03-03 | Université de Neuchâtel | Verfahren zur Beschränkung des epitaxialen Wachstums in einer fotoelektrischen Vorrichtung mit Heteroübergängen und eine solche fotoelektrische Vorrichtung |
FR2936905B1 (fr) * | 2008-10-02 | 2010-10-29 | Commissariat Energie Atomique | Cellule photovoltaique a heterojonction a deux dopages et procede de fabrication. |
TWI382551B (zh) * | 2008-11-06 | 2013-01-11 | Ind Tech Res Inst | 太陽能集光模組 |
US7951640B2 (en) * | 2008-11-07 | 2011-05-31 | Sunpreme, Ltd. | Low-cost multi-junction solar cells and methods for their production |
US8796066B2 (en) | 2008-11-07 | 2014-08-05 | Sunpreme, Inc. | Low-cost solar cells and methods for fabricating low cost substrates for solar cells |
JP5185236B2 (ja) * | 2009-02-24 | 2013-04-17 | 浜松ホトニクス株式会社 | フォトダイオードの製造方法及びフォトダイオード |
JP5185207B2 (ja) | 2009-02-24 | 2013-04-17 | 浜松ホトニクス株式会社 | フォトダイオードアレイ |
JP5185208B2 (ja) | 2009-02-24 | 2013-04-17 | 浜松ホトニクス株式会社 | フォトダイオード及びフォトダイオードアレイ |
JP5185206B2 (ja) | 2009-02-24 | 2013-04-17 | 浜松ホトニクス株式会社 | 半導体光検出素子 |
JP5185205B2 (ja) * | 2009-02-24 | 2013-04-17 | 浜松ホトニクス株式会社 | 半導体光検出素子 |
US7858427B2 (en) * | 2009-03-03 | 2010-12-28 | Applied Materials, Inc. | Crystalline silicon solar cells on low purity substrate |
WO2010126591A1 (en) * | 2009-04-29 | 2010-11-04 | Gobi Ramakrishnan Padmanabhan | Configurations and methods to manufacture solar cell device with larger capture cross section and higher optical utilization efficiency |
EP2432027A4 (de) * | 2009-04-30 | 2017-06-28 | Industry-University Cooperation Foundation Hanyang University | Siliciumsolarzelle mit einer kohlenstoffnanoröhrchenschicht |
WO2010129163A2 (en) * | 2009-05-06 | 2010-11-11 | Thinsilicon Corporation | Photovoltaic cells and methods to enhance light trapping in semiconductor layer stacks |
EP2441095A4 (de) * | 2009-06-10 | 2013-07-03 | Thinsilicon Corp | Pv-module und verfahren zur herstellung von pv-modulen mit tandem-halbleiterschichtstapeln |
US20110114156A1 (en) * | 2009-06-10 | 2011-05-19 | Thinsilicon Corporation | Photovoltaic modules having a built-in bypass diode and methods for manufacturing photovoltaic modules having a built-in bypass diode |
CN103515478A (zh) * | 2009-08-17 | 2014-01-15 | 聚日(苏州)科技有限公司 | 一种利用衬底进行绒面加工的基板单元及其形成方法 |
NL2003390C2 (en) * | 2009-08-25 | 2011-02-28 | Stichting Energie | Solar cell and method for manufacturing such a solar cell. |
US20110048518A1 (en) * | 2009-08-26 | 2011-03-03 | Molecular Imprints, Inc. | Nanostructured thin film inorganic solar cells |
CN102473761A (zh) * | 2009-09-18 | 2012-05-23 | 三洋电机株式会社 | 太阳能电池、太阳能电池模块和太阳能电池系统 |
TW201115749A (en) * | 2009-10-16 | 2011-05-01 | Motech Ind Inc | Surface structure of crystalline silicon solar cell and its manufacturing method |
US8896077B2 (en) * | 2009-10-23 | 2014-11-25 | The Board Of Trustees Of The Leland Stanford Junior University | Optoelectronic semiconductor device and method of fabrication |
US20120006390A1 (en) * | 2009-12-08 | 2012-01-12 | Yijie Huo | Nano-wire solar cell or detector |
DE102009060931A1 (de) * | 2009-12-23 | 2011-06-30 | Gebr. Schmid GmbH & Co., 72250 | Verfahren und Vorrichtung zur Behandlung von Siliziumsubstraten |
US20110162732A1 (en) * | 2010-01-07 | 2011-07-07 | Biel Vincent P | anti-siphon check valve |
FR2955707B1 (fr) * | 2010-01-27 | 2012-03-23 | Commissariat Energie Atomique | Procede de realisation d'une cellule photovoltaique avec preparation de surface d'un substrat en silicium cristallin |
FR2955702B1 (fr) | 2010-01-27 | 2012-01-27 | Commissariat Energie Atomique | Cellule photovoltaique comprenant un film mince de passivation en oxyde cristallin de silicium et procede de realisation |
JP5268976B2 (ja) * | 2010-03-12 | 2013-08-21 | 三菱電機株式会社 | 光起電力装置の製造方法 |
US8349626B2 (en) * | 2010-03-23 | 2013-01-08 | Gtat Corporation | Creation of low-relief texture for a photovoltaic cell |
US9991407B1 (en) * | 2010-06-22 | 2018-06-05 | Banpil Photonics Inc. | Process for creating high efficiency photovoltaic cells |
TWI447919B (zh) * | 2010-07-21 | 2014-08-01 | Asiatree Technology Co Ltd | 具有異質接面之矽基太陽能電池及其製程方法 |
EP2600411B1 (de) * | 2010-07-26 | 2019-08-21 | Hamamatsu Photonics K.K. | Verfahren zur herstellung eines lichtabsorbierenden substrats und verfahren zur herstellung einer form zur herstellung eines lichtabsorbierenden substrats |
JP2012059955A (ja) * | 2010-09-09 | 2012-03-22 | Fujifilm Corp | 光電変換素子及び太陽電池 |
JP5622231B2 (ja) * | 2010-10-06 | 2014-11-12 | 三菱重工業株式会社 | 光電変換装置の製造方法 |
US20120085397A1 (en) * | 2010-10-11 | 2012-04-12 | Choul Kim | Solar cell |
CN102097541B (zh) * | 2010-11-02 | 2012-12-12 | 南开大学 | 一种提高产业化单室沉积非晶硅基薄膜电池效率的方法 |
US9893223B2 (en) | 2010-11-16 | 2018-02-13 | Suncore Photovoltaics, Inc. | Solar electricity generation system |
CN102479876A (zh) * | 2010-11-19 | 2012-05-30 | 金元求 | 太阳能电池制造方法及根据该制造方法制造的太阳能电池 |
CN102064216A (zh) * | 2010-11-22 | 2011-05-18 | 晶澳(扬州)太阳能科技有限公司 | 一种新型晶体硅太阳电池及其制作方法 |
KR101757443B1 (ko) * | 2010-12-08 | 2017-07-13 | 엘지디스플레이 주식회사 | 미세 결정 실리콘 박막 트랜지스터와 이를 포함하는 표시장치 및 그 제조 방법 |
WO2012105155A1 (ja) * | 2011-01-31 | 2012-08-09 | 三洋電機株式会社 | 光電変換装置及びその製造方法 |
NL2006298C2 (en) | 2011-02-24 | 2012-08-27 | Energieonderzoek Ct Nederland | Solar cell and method for manufacturing such a solar cell. |
US20120273036A1 (en) * | 2011-04-29 | 2012-11-01 | Semiconductor Energy Laboratory Co., Ltd. | Photoelectric conversion device and manufacturing method thereof |
EP2717321B1 (de) | 2011-06-03 | 2020-07-29 | Panasonic Intellectual Property Management Co., Ltd. | Verfahren zur herstellung von solarzellen |
JP5917082B2 (ja) * | 2011-10-20 | 2016-05-11 | 株式会社半導体エネルギー研究所 | 光電変換装置の作製方法 |
TWI443846B (zh) * | 2011-11-01 | 2014-07-01 | Ind Tech Res Inst | 透明導電層結構 |
US20130180577A1 (en) * | 2012-01-18 | 2013-07-18 | Semiconductor Energy Laboratory Co., Ltd. | Photoelectric conversion device |
JP5554359B2 (ja) * | 2012-03-28 | 2014-07-23 | 三菱電機株式会社 | 基板の粗面化方法、太陽電池の製造方法および太陽電池、太陽電池モジュール |
JP5868503B2 (ja) * | 2012-06-13 | 2016-02-24 | 三菱電機株式会社 | 太陽電池およびその製造方法 |
JP2014007198A (ja) * | 2012-06-21 | 2014-01-16 | Kaneka Corp | 結晶シリコン系光電変換装置およびその製造方法 |
US8940580B2 (en) * | 2012-06-28 | 2015-01-27 | International Business Machines Corporation | Textured multi-junction solar cell and fabrication method |
KR20140029563A (ko) * | 2012-08-28 | 2014-03-11 | 엘지전자 주식회사 | 태양전지의 제조 방법 |
JP6092574B2 (ja) * | 2012-09-28 | 2017-03-08 | 京セラ株式会社 | 太陽電池素子の製造方法 |
JPWO2014064769A1 (ja) * | 2012-10-23 | 2016-09-05 | パナソニックIpマネジメント株式会社 | 太陽電池 |
JP6308438B2 (ja) * | 2012-10-23 | 2018-04-11 | パナソニックIpマネジメント株式会社 | 太陽電池 |
WO2014083804A1 (ja) * | 2012-11-29 | 2014-06-05 | 三洋電機株式会社 | 太陽電池 |
CN103943716B (zh) * | 2013-01-17 | 2016-08-03 | 上海交通大学 | 一种微纳结构太阳能电池及其背面陷光结构的制备方法 |
US9082925B2 (en) * | 2013-03-13 | 2015-07-14 | Sunpower Corporation | Methods for wet chemistry polishing for improved low viscosity printing in solar cell fabrication |
US20160284888A1 (en) | 2013-03-19 | 2016-09-29 | Choshu Industry Co., Ltd. | Photovoltaic element and manufacturing method therefor |
JP6191926B2 (ja) * | 2013-03-28 | 2017-09-06 | パナソニックIpマネジメント株式会社 | 太陽電池 |
WO2014175066A1 (ja) * | 2013-04-25 | 2014-10-30 | シャープ株式会社 | 光電変換素子 |
EP2854155B1 (de) | 2013-09-27 | 2017-11-08 | INDEOtec SA | Plasmareaktorgefäß und Anordnung sowie Verfahren zur Durchführung einer Plasmaverarbeitung |
AT516109A1 (de) * | 2014-07-29 | 2016-02-15 | Universität Linz | Optoelektronischer Infrarotsensor |
CN104218122B (zh) * | 2014-08-28 | 2016-08-17 | 奥特斯维能源(太仓)有限公司 | 一种降低金刚线切割的多晶硅反射率的制绒方法 |
CN107078179B (zh) | 2014-09-30 | 2019-04-26 | 株式会社钟化 | 晶体硅太阳能电池的制造方法、及太阳能电池模块的制造方法 |
CN104576803B (zh) * | 2015-01-21 | 2016-10-12 | 中电投西安太阳能电力有限公司 | 基于GaN纳米线三维结构的太阳能电池及其制备方法 |
WO2016152228A1 (ja) | 2015-03-24 | 2016-09-29 | 株式会社カネカ | 太陽電池用結晶シリコン基板の製造方法、結晶シリコン系太陽電池の製造方法および結晶シリコン系太陽電池モジュールの製造方法 |
CN107431100B (zh) | 2015-03-31 | 2019-05-10 | 松下知识产权经营株式会社 | 太阳能电池元件、太阳能电池组件、以及制造方法 |
CN106328736B (zh) * | 2015-06-16 | 2018-05-04 | 镇江大全太阳能有限公司 | 一种抗lid黑硅太阳能高效电池及其生产方法 |
WO2017051635A1 (ja) * | 2015-09-24 | 2017-03-30 | シャープ株式会社 | 半導体基板、光電変換素子、半導体基板の製造方法および光電変換素子の製造方法 |
NL2015987B1 (en) * | 2015-12-18 | 2017-07-10 | Stichting Energieonderzoek Centrum Nederland | Tandem solar cell and method for manufacturing such a solar cell. |
CN105895714A (zh) * | 2016-06-22 | 2016-08-24 | 苏州协鑫集成科技工业应用研究院有限公司 | 平滑修饰液及平滑修饰方法及异质结太阳能电池硅片及异质结太阳能电池 |
CN109690791B (zh) | 2016-06-30 | 2022-09-16 | 株式会社钟化 | 晶体硅系太阳能电池及其制造方法 |
JP2018026388A (ja) * | 2016-08-08 | 2018-02-15 | パナソニックIpマネジメント株式会社 | 太陽電池及び太陽電池の製造方法 |
JP7007088B2 (ja) * | 2016-12-07 | 2022-01-24 | ソニーセミコンダクタソリューションズ株式会社 | 受光素子、撮像素子および電子機器 |
KR102514785B1 (ko) * | 2017-05-19 | 2023-03-29 | 상라오 징코 솔라 테크놀러지 디벨롭먼트 컴퍼니, 리미티드 | 태양 전지 및 이의 제조 방법 |
KR102541379B1 (ko) * | 2017-05-29 | 2023-06-08 | 상라오 징코 솔라 테크놀러지 디벨롭먼트 컴퍼니, 리미티드 | 페로브스카이트 실리콘 탠덤 태양전지 및 제조 방법 |
CN110809827A (zh) | 2017-06-28 | 2020-02-18 | 株式会社钟化 | 光电转换装置的制造方法 |
CN107768472A (zh) * | 2017-10-23 | 2018-03-06 | 广西筑梦三体科技有限公司 | 一种打印的太阳能电池板及其制备方法 |
CN108346707A (zh) * | 2018-03-12 | 2018-07-31 | 南昌大学 | 一种进光区域无重掺杂层遮挡的异质结晶体硅双面太阳电池结构 |
KR102054977B1 (ko) * | 2019-04-05 | 2019-12-12 | 엘지전자 주식회사 | 태양전지의 제조 방법 |
CN111403503A (zh) * | 2020-04-24 | 2020-07-10 | 中威新能源(成都)有限公司 | 一种具有圆角金字塔结构的单晶硅片及制备方法 |
Family Cites Families (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4137123A (en) * | 1975-12-31 | 1979-01-30 | Motorola, Inc. | Texture etching of silicon: method |
US4253882A (en) | 1980-02-15 | 1981-03-03 | University Of Delaware | Multiple gap photovoltaic device |
JPS5914682A (ja) | 1982-07-16 | 1984-01-25 | Denkaihaku Kogyo:Kk | アモルフアスシリコン太陽電池 |
JPS59123283A (ja) * | 1982-12-28 | 1984-07-17 | Semiconductor Energy Lab Co Ltd | 光電変換装置 |
JPS59175170A (ja) * | 1983-03-24 | 1984-10-03 | Yoshihiro Hamakawa | タンデム型太陽電池 |
US4599482A (en) * | 1983-03-07 | 1986-07-08 | Semiconductor Energy Lab. Co., Ltd. | Semiconductor photoelectric conversion device and method of making the same |
JPH0680837B2 (ja) | 1983-08-29 | 1994-10-12 | 通商産業省工業技術院長 | 光路を延長した光電変換素子 |
JPS6063968A (ja) * | 1984-04-02 | 1985-04-12 | Nippon Telegr & Teleph Corp <Ntt> | 太陽電池 |
US4956685A (en) * | 1984-12-21 | 1990-09-11 | Licentia Patent-Verwaltungs Gmbh | Thin film solar cell having a concave n-i-p structure |
JPS61290712A (ja) * | 1985-06-19 | 1986-12-20 | Ricoh Co Ltd | 非晶質半導体膜の製造方法 |
JP2740284B2 (ja) * | 1989-08-09 | 1998-04-15 | 三洋電機株式会社 | 光起電力素子 |
JPH07105518B2 (ja) * | 1989-08-10 | 1995-11-13 | シャープ株式会社 | 光電変換装置用基板の加工方法 |
JPH03276682A (ja) * | 1990-03-26 | 1991-12-06 | Sharp Corp | 半導体装置 |
DE59008544D1 (de) * | 1990-09-28 | 1995-03-30 | Siemens Solar Gmbh | Nasschemische Strukturätzung von Silizium. |
JPH0766979B2 (ja) * | 1990-10-01 | 1995-07-19 | 株式会社日立製作所 | コルゲート型太陽電池の製造方法 |
US5356488A (en) * | 1991-12-27 | 1994-10-18 | Rudolf Hezel | Solar cell and method for its manufacture |
JP3276682B2 (ja) | 1992-08-06 | 2002-04-22 | オリンパス光学工業株式会社 | 内視鏡の湾曲操作装置 |
ES2169078T3 (es) * | 1993-07-29 | 2002-07-01 | Gerhard Willeke | Procedimiento para fabricacion de una celula solar, asi como la celula solar fabricada segun este procedimiento. |
JP2923193B2 (ja) * | 1993-12-30 | 1999-07-26 | キヤノン株式会社 | 光電変換素子の製造方法 |
JP3346907B2 (ja) * | 1994-09-06 | 2002-11-18 | シャープ株式会社 | 太陽電池及びその製造方法 |
JP3206339B2 (ja) * | 1994-11-30 | 2001-09-10 | トヨタ自動車株式会社 | 太陽電池 |
JP3158027B2 (ja) | 1995-06-21 | 2001-04-23 | シャープ株式会社 | 太陽電池及びその製造方法 |
JP3271990B2 (ja) * | 1997-03-21 | 2002-04-08 | 三洋電機株式会社 | 光起電力素子及びその製造方法 |
-
1998
- 1998-03-19 JP JP54542198A patent/JP3271990B2/ja not_active Expired - Lifetime
- 1998-03-19 DE DE69811511T patent/DE69811511T2/de not_active Expired - Lifetime
- 1998-03-19 CN CNB988035693A patent/CN1139997C/zh not_active Expired - Lifetime
- 1998-03-19 EP EP98909784A patent/EP1005095B1/de not_active Expired - Lifetime
- 1998-03-19 AU AU64203/98A patent/AU6420398A/en not_active Abandoned
- 1998-03-19 WO PCT/JP1998/001204 patent/WO1998043304A1/ja active Search and Examination
- 1998-03-19 US US09/355,311 patent/US6207890B1/en not_active Expired - Lifetime
-
2001
- 2001-03-21 US US09/813,296 patent/US6380479B2/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
EP1005095B1 (de) | 2003-02-19 |
WO1998043304A1 (fr) | 1998-10-01 |
CN1251210A (zh) | 2000-04-19 |
US6207890B1 (en) | 2001-03-27 |
CN1139997C (zh) | 2004-02-25 |
AU6420398A (en) | 1998-10-20 |
EP1005095A1 (de) | 2000-05-31 |
US6380479B2 (en) | 2002-04-30 |
DE69811511T2 (de) | 2004-02-19 |
JP3271990B2 (ja) | 2002-04-08 |
EP1005095A4 (de) | 2000-05-31 |
US20010029978A1 (en) | 2001-10-18 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
DE69811511D1 (de) | Herstellungsverfahren für ein photovoltaisches bauelement | |
DE69738595D1 (de) | Herstellungsmethode für ein Halbleiter-Bauteil | |
DE69841435D1 (de) | Ein herstellungsverfahren für hochfrequenz-ic-komponenten | |
DE69939895D1 (de) | Herstellungsverfahren für ein halbleiterbauelement | |
DE69832324D1 (de) | Herstellungsverfahren für einen Halbleiter | |
DE69840620D1 (de) | Herstellungsverfahren für ein Substratdurchkontakt | |
DE69532430D1 (de) | Ein Herstellungsverfahren einer Rückreflektorschicht für ein photovoltaisches Bauelement | |
DE69512282D1 (de) | Herstellungsverfahren für ein mikromechanisches Element | |
DE69734433D1 (de) | Verstaubare Toiletten für ein Flugzeug | |
DE69941357D1 (de) | Herstellungsverfahren für ein vorgefertigtes retroreflektierendes Schild | |
DE69841557D1 (de) | Herstellungsverfahren für ein Halbleitergehäuse mit einer integrierten Schaltung | |
DE69833958D1 (de) | Träger für ein fahrzeug | |
DE69823201D1 (de) | Schnittstelle für ein hochintegriertes ethernet netzwerk | |
DE60030743D1 (de) | Herstellungsmethode für eine leiterplatte | |
DE69907773D1 (de) | In-Situ Reparaturverfahren für ein Turbomaschinenbauteil. | |
DE59706819D1 (de) | Schaltungsanordnung für ein einrückrelais | |
DE69719097D1 (de) | Ladungspumpenschaltung für ein Halbleiter-Substrat | |
DE69818960D1 (de) | Planetengetriebe für ein fahrzeug | |
DE59802267D1 (de) | Sitzmodul für ein transportmittel | |
DE69834603D1 (de) | Rahmenstruktur für ein CDMA-Kommunikationssystem mit mehreren Bit-Raten | |
DE69842198D1 (de) | Herstellungsverfahren für ein Farbfilter | |
DE69402730D1 (de) | Sicherungsmethode für einen Turbinenfutter | |
DE59800930D1 (de) | Herstellungsverfahren für ein elektrooptisches modul | |
DE69738705D1 (de) | Herstellungsverfahren für eine Kontaktstruktur | |
DE69723270D1 (de) | Gehäuse für ein kleines elektrisches bauteil |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |